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1. 发明授权

US07405817B2 Method and apparatus for classifying defects of an object 有权
标题翻译：用于分类物体缺陷的方法和装置
公开(公告)号：US07405817B2
公开(公告)日：2008-07-29
申请号：US10786137
申请日：2004-02-26
申请人： Pil-Sik Hyun , Sun-Yong Choi , Sang-Kil Lee , Chung-Sam Jun , Sang-Min Kim
发明人： Pil-Sik Hyun , Sun-Yong Choi , Sang-Kil Lee , Chung-Sam Jun , Sang-Min Kim
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： A method for classifying defects of an object includes irradiating lights having different polarizations onto the object to create an inspection spot on the object, collecting scattered lights generated by the irradiated lights scattering from the inspection spot, and classifying defects of the object by type of defect by analyzing the scattered lights. An apparatus for classifying defects of an object includes light creating means emitting lights having different polarizations to create an inspection spot on the object, and a detecting member for collecting scattered lights that are created from the lights scattering from the inspection spot, wherein the scattered lights are analyzed and classified in accordance with defects positioned on the inspection spot of the object.
摘要翻译：用于对物体的缺陷进行分类的方法包括将具有不同极化的光照射到物体上以在物体上产生检查点，收集由检查点散射的照射光产生的散射光，并根据缺陷类型对物体的缺陷进行分类通过分析散射光。用于对物体的缺陷进行分类的装置包括发光装置，其发射具有不同偏振度的光以在物体上产生检查点;以及检测部件，用于收集从检查点散射的光产生的散射光，其中散射光根据位于物体检查点的缺陷进行分析和分类。

2. 发明申请

US20050018182A1 Method and apparatus for classifying defects of an object 有权
标题翻译：用于分类物体缺陷的方法和装置
公开(公告)号：US20050018182A1
公开(公告)日：2005-01-27
申请号：US10786137
申请日：2004-02-26
申请人： Pil-Sik Hyun , Sun-Yong Choi , Sang-Kil Lee , Chung-Sam Jun , Sang-Min Kim
发明人： Pil-Sik Hyun , Sun-Yong Choi , Sang-Kil Lee , Chung-Sam Jun , Sang-Min Kim
IPC分类号： H01L21/66 , G01N21/95 , G01N21/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： A method for classifying defects of an object includes irradiating lights having different wavelengths onto the object to create an inspection spot on the object, collecting scattered lights generated by the irradiated lights scattering from the inspection spot, and classifying defects of the object by type of defect by analyzing the scattered lights. An apparatus for classifying defects of an object includes light creating means emitting lights having different wavelengths to create an inspection spot on the object, and a detecting member for collecting scattered lights that are created from the lights scattering from the inspection spot, wherein the scattered lights are analyzed and classified in accordance with defects positioned on the inspection spot of the object.
摘要翻译：用于对物体的缺陷进行分类的方法包括将不同波长的光照射到物体上以在物体上产生检查点，收集由检查点散射的照射光产生的散射光，并根据缺陷类型对物体的缺陷进行分类通过分析散射光。用于对物体的缺陷进行分类的装置包括：发光装置，其发射具有不同波长的光，以在物体上产生检查点;以及检测部件，用于收集从检查点散射的光产生的散射光，其中散射光根据位于物体检查点的缺陷进行分析和分类。

3. 发明授权

US06912056B2 Apparatus and method for measuring each thickness of a multilayer stacked on a substrate 失效
标题翻译：用于测量层叠在基板上的多层厚度的装置和方法
公开(公告)号：US06912056B2
公开(公告)日：2005-06-28
申请号：US10914149
申请日：2004-08-10
申请人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
发明人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
IPC分类号： G01B11/06 , H01L21/66 , G01B11/28
CPC分类号： G01B11/0641
摘要： In an apparatus and a method of measuring a thickness of a multilayer on a substrate, a spectrum of reflected light reflected from the substrate is measured. A plurality of recipe data, each corresponding to one of a plurality of hypothetical multilayers, is stored. One of the plurality of hypothetical multilayers is initially assumed to be the multilayer actually formed on the substrate. A plurality of theoretical spectra is calculated using one of the plurality of recipe data in accordance with various theoretical thicknesses of one of the plurality of hypothetical multilayers. The measured spectrum is compared with the plurality of theoretical spectra to determine a temporary thickness of the multilayer. A reliability of the temporary thickness of the multilayer is estimated. The temporary thickness is output as a thickness of the multilayer on the substrate when the reliability of the temporary thickness is within an allowable range.
摘要翻译：在测量基板上的多层厚度的装置和方法中，测量从基板反射的反射光的光谱。存储多个与多个假想多层中的一个对应的食谱数据。多个假想多层中的一个最初被假设为实际形成在基底上的多层。根据多个假想多层之一的各种理论厚度，使用多个配方数据中的一个来计算多个理论光谱。将测量的光谱与多个理论光谱进行比较，以确定多层的临时厚度。估计多层的临时厚度的可靠性。当临时厚度的可靠性在允许范围内时，临时厚度作为衬底上的多层的厚度输出。

4. 发明申请

US20050041255A1 Apparatus and method for measuring each thickness of a multilayer stacked on a substrate 失效
公开(公告)号：US20050041255A1
公开(公告)日：2005-02-24
申请号：US10914149
申请日：2004-08-10
申请人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
发明人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
IPC分类号： G01B11/06 , H01L21/66 , G01B9/02
CPC分类号： G01B11/0641
摘要： In an apparatus and a method of measuring a thickness of a multilayer on a substrate, a spectrum of reflected light reflected from the substrate is measured. A plurality of recipe data, each corresponding to one of a plurality of hypothetical multilayers, is stored. One of the plurality of hypothetical multilayers is initially assumed to be the multilayer actually formed on the substrate. A plurality of theoretical spectra is calculated using one of the plurality of recipe data in accordance with various theoretical thicknesses of one of the plurality of hypothetical multilayers. The measured spectrum is compared with the plurality of theoretical spectra to determine a temporary thickness of the multilayer. A reliability of the temporary thickness of the multilayer is estimated. The temporary thickness is output as a thickness of the multilayer on the substrate when the reliability of the temporary thickness is within an allowable range.

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