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    • 6. 发明授权
    • Removal of metal skin from a copper-Invar-copper laminate
    • 从铜Inv铜层压板去除金属表皮
    • US06228246B1
    • 2001-05-08
    • US09347581
    • 1999-07-01
    • Madhav DattaRaymond T. GalascoLawrence P. LehmanRoy H. MagnusonRobin A. SuskoRobert D. Topa
    • Madhav DattaRaymond T. GalascoLawrence P. LehmanRoy H. MagnusonRobin A. SuskoRobert D. Topa
    • C25F300
    • H05K3/44C25F3/00H05K3/07H05K2201/0338H05K2201/0347H05K2203/0285H05K2203/0361
    • A method of removing a metal skin from a through-hole surface of a copper-Invar-copper (CIC) laminate without causing differential etchback of the laminate. The metal skin includes debris deposited on the through-hole surface as the through hole is being formed by laser or mechanical drilling of a substrate that includes the laminate as an inner plane. Removing the metal skin combines electrochemical polishing (ECP) with ultrasonics. ECP dissolves the metal skin in an acid solution, while ultrasonics agitates and circulates the acid solution to sweep the metal skin out of the through hole. ECP is activated when a pulse power supply is turned on and generates a periodic voltage pulse from a pulse power supply whose positive terminal is coupled to the laminate and whose negative terminal is coupled to a conductive cathode. After the metal skin is removed, the laminate is differentially etched such that the copper is etched at a faster rate than the Invar. To prevent the differential etching, a copper layer is formed on a surface of the substrate with an electrical resistance R1 between the copper layer and the positive terminal of the pulse power supply. Additionally, an electrical resistance R2 is formed between the laminate and the positive terminal of the pulse power supply. Adjustment of R1 and R2 controls the relative etch rates of the copper and the Invar.
    • 从铜 - 堇青铜(CIC)层压板的通孔表面去除金属表皮而不会引起层压板的不均匀回蚀的方法。 金属皮肤包括沉积在通孔表面上的碎屑,因为通孔是通过激光或机械钻孔形成的,所述基底包括层压体作为内平面。 去除金属皮肤结合电化学抛光(ECP)与超声波。 ECP将金属皮肤溶解在酸性溶液中,同时超声波搅拌并循环酸溶液以将金属皮肤从通孔中扫出。 当脉冲电源接通时,ECP被激活,并从脉冲电源产生周期性的电压脉冲,该脉冲电源的正极端子耦合到层压板并且其负极端子连接到导电阴极。 在去除金属表皮之后,层压体被差异蚀刻,使得以比Invar更快的速度蚀刻铜。 为了防止差分蚀刻,在衬底的表面上在铜层和脉冲电源的正端之间具有电阻R1形成铜层。 此外,在层压体和脉冲电源的正极端之间形成电阻R2。 R1和R2的调整控制铜和殷钢的相对蚀刻速率。
    • 7. 发明授权
    • Method of making sloped vias
    • 制作倾斜通孔的方法
    • US4830706A
    • 1989-05-16
    • US915462
    • 1986-10-06
    • Ronald S. HorwathJohn R. SuskoRobin A. Susko
    • Ronald S. HorwathJohn R. SuskoRobin A. Susko
    • H01L21/302H01L21/3065H01L21/311H01L21/48H01L21/768H01L23/522
    • H01L21/4803H01L21/31138
    • Sloped vias are formed in a resinous layer made from a material which is curable in stages, which can be coated on a substrate prior to partial curing, which adheres to the substrate and which shrinks upon full curing by a process which includes first using a dry, directional etch to form straight walled vias in a partially cured layer of the material coated on the substrate and then fully curing the layer. The straight walled vias are changed to sloped vias during final cure when adhesive contact between the substrate and the layer of resinous material inhibits shrinking of the side of the resinous layer which contacts the substrate, while the unsupported side of the layer is free to shrink. Such sloped vias are observed to improve the integrity of conductive coatings placed in the vias by reducing cracking, peeling and flaking thereof. Sloped vias with conductive coatings are useful in the construction of computer components.
    • 倾斜通孔形成在由可分阶段固化的材料制成的树脂层中,其可以在部分固化之前涂覆在基底上,该部分固化粘附到基底上,并且通过包括首先使用干燥的方法完全固化的收缩 定向蚀刻以在涂覆在基材上的材料的部分固化层中形成直壁通孔,然后完全固化该层。 当基材和树脂材料层之间的粘合剂接触抑制与基材接触的树脂层的侧面的收缩,同时层的无支撑侧自由收缩时,在最终固化期间将直壁通孔改变为倾斜的通孔。 观察到这样的倾斜通孔,通过减少开裂,剥离和剥落来改善放置在通孔中的导电涂层的完整性。 带导电涂层的斜槽可用于计算机部件的构造。