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1. 发明授权

US06602397B1 Method for producing a filter 失效
标题翻译：过滤器的制造方法
公开(公告)号：US06602397B1
公开(公告)日：2003-08-05
申请号：US10031799
申请日：2001-10-26
申请人： Wilfried Hofmann
发明人： Wilfried Hofmann
IPC分类号： C25F300
CPC分类号： B01D67/0062 , B01D67/0058 , B01D71/02 , B01D2239/10 , C25F3/12
摘要： A method for the production of filters in which a blank of n- or p-doped etchable semiconductor material is connected as an anode or a cathode according to doping. The method includes contacting a first side of the blank with an etching solution in which a counterelectrode is arranged to electrochemically etch the first side, and supplying activation energy to generate minority charge carriers to the blank during the etching process. The activation energy supplied per unit time is reduced with increasing etching progress.
摘要翻译：用于制造其中根据掺杂将n或p掺杂的可蚀刻半导体材料的空白连接作为阳极或阴极的滤光器的方法。该方法包括使坯料的第一侧与蚀刻溶液接触，其中布置反电极以电化学蚀刻第一侧，并且在蚀刻过程期间提供活化能以产生少量电荷载体至坯料。随着蚀刻进程的增加，每单位时间内提供的激活能量减少。

2. 发明授权

US06599415B1 Apparatus and method for electropolishing surfaces 有权
标题翻译：电抛光表面的装置和方法
公开(公告)号：US06599415B1
公开(公告)日：2003-07-29
申请号：US09846114
申请日：2001-04-30
申请人： Yu-Chun Ku , Ryan John Santos
发明人： Yu-Chun Ku , Ryan John Santos
IPC分类号： C25F300
CPC分类号： C25F7/00 , C25F3/16
摘要： A method and apparatus for electropolishing a workpiece without immersing the workpiece in a bath of electrolytic solution. The workpiece is held in an atmospheric environment, while electrolytic solution is discharged from a reservoir in the form of a plurality of jet streams onto the surface of the workpiece. A voltage difference is applied across the workpiece and the jet streams, thereby inducing a current to flow, between the workpiece acting as anode and the jet streams acting as cathode. The workpiece may be rotated about an axis and moved linearly along the same axis while the jet streams of electrolytic solution are discharged onto the workpiece. Anodic dissolution causes polishing of the workpiece surface. The electrolytic solution may be collected after discharge and recycled back into the reservoir, after being filtered and cooled.
摘要翻译：一种用于在不将工件浸入电解液浴的情况下电抛光工件的方法和装置。工件被保持在大气环境中，而电解液从多个喷射流形式的储存器排出到工件的表面上。在工件和喷射流之间施加电压差，从而在作为阳极的工件和作为阴极的射流之间引起电流流动。工件可以围绕轴线旋转并且沿着相同的轴线线性移动，同时电解溶液的喷射流被排出到工件上。阳极溶解导致工件表面的抛光。电解液可以在排放后收集，并在过滤和冷却后循环回到储存器中。

3. 发明授权

US06592743B2 Production of gas separators for use in fuel cells and equipment used therefor 失效
标题翻译：生产用于燃料电池及其设备的气体分离器
公开(公告)号：US06592743B2
公开(公告)日：2003-07-15
申请号：US09892618
申请日：2001-06-28
申请人： Masanori Matsukawa , Ryuta Kimata , Youhei Kuwabara , Kenji Dewaki , Shinji Dewaki
发明人： Masanori Matsukawa , Ryuta Kimata , Youhei Kuwabara , Kenji Dewaki , Shinji Dewaki
IPC分类号： C25F300
CPC分类号： H01M8/0228 , H01M8/0206 , H01M8/0258 , Y02P70/56
摘要： A method for producing a separator integrated with a gas flow channel of fuel cells efficiently at low costs without deteriorating processing accuracy and the like. A plane-facing electrode nozzle 30 is placed oppositely to the face to be processed, which is partially covered with a mask M, of base material B of a separator. While feeding electricity to the electrode nozzle 30 and the base material B of a separator, an electrolytic solution is injected and fed from the side of the electrode nozzle 30 to the face to be processed of the base material B from a direction that is almost perpendicular to the face. Thereby, the unmasked portion undergoes electrolytic etching with the electrolytic solution lying between the face to be processed and the electrode nozzle 30 to form recessed portions for making a gas flow channel.
摘要翻译：一种以低成本有效地生产与燃料电池的气体流路一体化的分离方法，而不会降低加工精度等。面对面的电极喷嘴30与分离器的基材B的与被处理面部分地被掩模M部分地覆盖的面相对设置。在向电极喷嘴30和分离器的基材B供电的同时，电解液从电极喷嘴30的一侧向几乎垂直的方向注入并供给到基材B的待加工面到脸上由此，通过电解液在被处理面与电极喷嘴30之间进行电解蚀刻，形成用于形成气体流路的凹部。

4. 发明授权

US06562249B2 Method utilizing a magnetic assembly during etching thin shadow masks 失效
公开(公告)号：US06562249B2
公开(公告)日：2003-05-13
申请号：US09902456
申请日：2001-07-10
申请人： Craig Clay Eshleman , Charles Michael Wetzel , Randall Eugene McCoy , Leo B. Kriksunov , Lance Benjamin , Derek Harris , Thomas R. Sage
发明人： Craig Clay Eshleman , Charles Michael Wetzel , Randall Eugene McCoy , Leo B. Kriksunov , Lance Benjamin , Derek Harris , Thomas R. Sage
IPC分类号： C25F300
CPC分类号： H01J9/142
摘要： In an improved method of etching apertures in a thin metal sheet to form a shadow mask for a color picture tube, the metal sheet has a first acid-resistant stencil on one major surface thereof and a second acid-resistant stencil on the other major surface thereof. At least one of the stencils has openings therein at locations of intended apertures. The improvement comprises the steps of magnetically holding the metal sheet with a flat magnetic assembly, and moving the magnetic assembly magnetically holding the metal sheet thereon through an etching chamber. The magnetic assembly includes a magnetic layer that is supported on an acid-resistant board.

5. 发明授权

US06203690B1 Process of reworking pin grid array chip carriers 失效
标题翻译：引脚网格阵列芯片载体的返工过程
公开(公告)号：US06203690B1
公开(公告)日：2001-03-20
申请号：US09163148
申请日：1998-09-29
申请人： Paul F. Findeis , John P. Gauci , Krystyna W. Semkow , Renee L. Weisman
发明人： Paul F. Findeis , John P. Gauci , Krystyna W. Semkow , Renee L. Weisman
IPC分类号： C25F300
CPC分类号： H01L23/49811 , C25F3/02 , H01L2924/0002 , H01L2924/09701 , H01L2924/00
摘要： A process for reworking of PGA chip carriers where one or more I/O pins is unplated. The process includes electrolytically etching the I/O pins which removes any corrosion product from the unplated I/O pins and removes the top gold layer from the remaining I/O pins. The etchant includes a metal-providing compound selected from the group consisting of a silver salt, copper cyanide, silver cyanide, gold cyanide or mixtures thereof, at a concentration in the range from about 2.7 to about 4.1 g/l as metal; potassium or sodium carbonate at a concentration in the range from about 10 to about 100 g/l; and potassium or sodium cyanide at a concentration in the range from about 29 to about 35 g/l.
摘要翻译：一种用于重新编码一个或多个I / O引脚未被放置的PGA芯片载体的过程。该过程包括对I / O引脚进行电解蚀刻，从而从未镀覆的I / O引脚中除去任何腐蚀产物，并从剩余的I / O引脚中除去顶部金层。蚀刻剂包括浓度为约2.7至约4.1g / l的金属的选自银盐，氰化铜，氰化银，氰化金或其混合物的金属提供化合物; 浓度在约10至约100g / l范围内的碳酸钾或碳酸钠; 和浓度在约29至约35g / l范围内的氰化钾或氰化钠。

6. 发明授权

US06764590B1 Automated machine control gap for conical fluid dynamic bearing ECM grooving 失效
标题翻译：锥形流体动力轴承ECM槽的自动机器控制间隙
公开(公告)号：US06764590B1
公开(公告)日：2004-07-20
申请号：US10080755
申请日：2002-02-22
申请人： Dustin Alan Cochran
发明人： Dustin Alan Cochran
IPC分类号： C25F300
CPC分类号： F16C17/105 , B23H3/00 , B23H3/10 , B23H7/18 , B23H9/00 , B23H2200/10 , F16C33/107
摘要： In one aspect of the invention, an apparatus for ECM grooving of a workpiece is provided. A portion of a conical workpiece is supported on a frame, with the cone opening facing a Z-axis. A slide electrode assembly is provided, including an electrode movable along the Z-axis and having, on a face aligned across a machining gap from the workpiece, a pattern of grooves to be defined on the workpiece; As an electrolyte is pumped into or through the machining gap at a constant static pressure, the electrode reacts to the pressure by moving toward or away from the workpiece to establish a certain gap width to create the necessary groove depth and definition. The force acting on the slide electrode assembly is the primary controlling factor for establishing the machining gap as the electrode and support move in response to the constant static pressure of pumped electrolyte.
摘要翻译：在本发明的一个方面，提供了一种用于工件的ECM切槽的装置。锥形工件的一部分被支撑在框架上，锥形开口面向Z轴。提供了一种滑动电极组件，包括可沿Z轴移动的电极，并且在与工件相对的加工间隙对准的面上具有要限定在工件上的凹槽图案; 由于电解液在恒定的静压下被泵入或通过加工间隙，电极通过朝着或远离工件移动来反应压力，以建立一定的间隙宽度以产生必要的凹槽深度和定义。作用在滑动电极组件上的力是当电极和支撑件响应于泵送电解质的恒定静压而移动时建立加工间隙的主要控制因素。

7. 发明授权

US06719892B2 Selective removal of brazing compound from joined assemblies 有权
标题翻译：从连接组件中选择性去除钎焊料
公开(公告)号：US06719892B2
公开(公告)日：2004-04-13
申请号：US09849068
申请日：2001-05-04
申请人： Mark Jaworowski , Michael A Kryzman
发明人： Mark Jaworowski , Michael A Kryzman
IPC分类号： C25F300
CPC分类号： C25F5/00 , B23K1/018 , B23K35/304 , B23K2101/001
摘要： A process for selective removal of a nickel alloy brazing composition from a nickel-base alloy component includes the steps of providing a brazed assembly including nickel-base alloy components joined by nickel alloy brazing composition; immersing the assembly in an electrolyte; and applying a potential across the electrolyte at a magnitude wherein the nickel-base alloy components are electrochemically passive and the nickel alloy brazing composition dissolves whereby the brazing composition is removed from the components.
摘要翻译：从镍基合金成分选择性地除去镍合金钎焊组合物的方法包括以下步骤：提供包括由镍合金钎焊组合物连接的镍基合金部件的钎焊组件; 将组件浸入电解液中; 并以一定的量施加电解质，其中镍基合金组分是电化学被动的，并且镍合金钎焊组合物溶解，从而组分除去钎焊组合物。

8. 发明授权

US06638414B2 Electrode design for electrochemical machining of grooves 有权
标题翻译：槽电化学加工电极设计
公开(公告)号：US06638414B2
公开(公告)日：2003-10-28
申请号：US09919746
申请日：2001-07-31
申请人： Donald J. MacLeod , Klaus D. Kloeppel , Wesley R. Clark , Roger A. Addy
发明人： Donald J. MacLeod , Klaus D. Kloeppel , Wesley R. Clark , Roger A. Addy
IPC分类号： C25F300
CPC分类号： B23H3/00 , B23H3/04 , B23H9/00 , B23H2200/10
摘要： Apparatus for defining patterns electrochemically on conductive materials by forming the patterns as conductive features of a tool, providing insulative properties about the conductive features so the patterns are defined; then providing an immersive medium including an etchant or plating material for defining the pattern on a workpiece, providing an electric direct current so that the immersive medium is concentrated at desired locations defined by the conductive features on the conductive materials; and etching the conductive materials by applying the electric current in a quantity and for an elapsed time to etch or plate patterns in or on the conductive materials.
摘要翻译：用于通过将图案形成工具的导电特征来在导电材料上电化学定义图案的装置，提供关于导电特征的绝缘性质，从而限定图案; 然后提供包括用于在工件上限定图案的蚀刻剂或电镀材料的沉浸式介质，提供电直流电流，使得沉浸式介质集中在由导电材料上的导电特征限定的期望位置; 并且通过施加电流量并经过一段时间来蚀刻导电材料以在导电材料中或导电材料上蚀刻或印版图案来蚀刻导电材料。

9. 发明授权

US06423207B1 Method and apparatus for etching 失效
标题翻译：蚀刻方法和设备
公开(公告)号：US06423207B1
公开(公告)日：2002-07-23
申请号：US09653945
申请日：2000-09-01
申请人： Babak Heidari , Lennart Olsson
发明人： Babak Heidari , Lennart Olsson
IPC分类号： C25F300
CPC分类号： C25F3/14 , H05K3/07
摘要： A method of making, by etching, depressions in selected portions of an etching surface of an electrically conductive etching material, the depressions forming an etching pattern, comprises the step of contacting the etching material with an etchant. A passivating layer is formed on the etching material which layer decreases or stops the etching capability of the etchant on the surface and which is dissolved in a chemical reaction when exposed to electromagnetic radiation. An electrode with electrically conductive electrode portions in selected portions of an electrode surface is provided, the electrode portions forming an electrode pattern corresponding to the etching pattern. The electrode is arranged in contact with the etchant and with the electrode portions facing the etching surface of the etching material, an electric voltage is applied between the electrode and the etching material, and the etching material is exposed to electromagnetic radiation essentially perpendicular to the etching surface.
摘要翻译：通过蚀刻导电蚀刻材料的蚀刻表面的选定部分中的凹陷，形成蚀刻图案的凹陷的方法包括使蚀刻材料与蚀刻剂接触的步骤。在蚀刻材料上形成钝化层，该层在暴露于电磁辐射时降低或停止表面上蚀刻剂的蚀刻能力并溶解在化学反应中。提供了在电极表面的选定部分中具有导电电极部分的电极，电极部分形成对应于蚀刻图案的电极图案。电极与蚀刻剂接触并且电极部分面向蚀刻材料的蚀刻表面，在电极和蚀刻材料之间施加电压，并且蚀刻材料暴露于基本垂直于蚀刻的电磁辐射表面。

10. 发明授权

US06267869B1 Electrode design for electrochemical machining of grooves 有权
公开(公告)号：US06267869B1
公开(公告)日：2001-07-31
申请号：US09326443
申请日：1999-06-04
申请人： Donald J. MacLeod , Klaus D. Kloeppel , Wesley R. Clark , Roger A. Addy
发明人： Donald J. MacLeod , Klaus D. Kloeppel , Wesley R. Clark , Roger A. Addy
IPC分类号： C25F300
CPC分类号： B23H3/00 , B23H3/04 , B23H9/00 , B23H2200/10
摘要： Apparatus for defining patterns electrochemically on conductive materials by forming the patterns as conductive features of a tool, providing insulative properties about the conductive features so the patterns are defined; then providing an immersive medium including an etchant or plating material for defining the pattern on a workpiece, providing an electric direct current so that the immersive medium is concentrated at desired locations defined by the conductive features on the conductive materials; and etching the conductive materials by applying the electric current in a quantity and for an elapsed time to etch or plate patterns in or on the conductive materials.

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