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    • 3. 发明授权
    • Field emission device
    • 场发射装置
    • US5847408A
    • 1998-12-08
    • US824016
    • 1997-03-21
    • Seigo KanemaruJunji Itoh
    • Seigo KanemaruJunji Itoh
    • H01J3/02H01L29/06
    • H01J3/022H01J2201/319
    • A field emission device of simple structure enables stabilization and control of field emission current. Emission current is controlled by a plurality of control voltage systems. An emitter having a sharp tip is fabricated by processing a p-type semiconductor substrate, and an n-type source region is provided on the p-type semiconductor substrate surface at a position that is laterally separated from the emitter. An electrode layer having an aperture facing the apex portion of the emitter is provided on an insulating layer, the electrode layer extending to above the n-type source region. Voltage applied to the electrode layer to apply an extractor field to the apex portion of the emitter and to induce inversion layers at the emitter surface and the surface of the p-type semiconductor substrate. The electrode layer is divided into a plurality of electrodes. An extraction voltage is applied to one of these electrodes closest to the emitter, another electrode is connected to an X selection line and another to a Y selection line, thereby controlling emission current.
    • 具有简单结构的场致发射器件可实现场发射电流的稳定和控制。 发射电流由多个控制电压系统控制。 通过处理p型半导体衬底制造具有尖锐尖端的发射极,并且在与发射极横向分离的位置处在p型半导体衬底表面上设置n型源极区。 具有面向发射极顶点的孔的电极层设置在绝缘层上,电极层延伸到n型源极区域的上方。 电压施加到电极层,以将提取器场施加到发射极的顶点,并在p型半导体衬底的发射极表面和表面处诱导反转层。 电极层被分成多个电极。 将提取电压施加到最靠近发射极的这些电极之一,另一个电极连接到X选择线,而另一个电极连接到Y选择线,从而控制发射电流。
    • 4. 发明授权
    • Cold electron emitting device and method of manufacturing same
    • 冷电子发射器件及其制造方法
    • US5780318A
    • 1998-07-14
    • US701866
    • 1996-08-23
    • Takayuki HiranoJunji ItohSeigo Kanemaru
    • Takayuki HiranoJunji ItohSeigo Kanemaru
    • H01J1/30H01J1/304H01J9/02H01L21/28H01L29/06
    • H01J1/3042H01J9/025
    • A cold electron emitting device has an emitter base portion, an emitter projection portion and a source region, each of which is an n-type semiconductor, formed on a p-type silicon substrate. A metal film which serves as an extraction electrode and a gate electrode of FET is formed via an insulating layer on the region of the substrate which includes the peripheral regions of the emitter base portion and source region. This cold electron emitting device can be manufactured as follows. First, a conical emitter having an emitter projection portion and emitter base portion and a source region are formed on a p-type semiconductor substrate. Next, an insulating layer and a metal film, which becomes an extraction electrode and a gate electrode of FET, is formed on the substrate which includes peripheral regions of the emitter base portion and source region. Then, an n-type impurity is doped in the emitter and the source region to form an n-type emitter and an n-type source region. In this manner, it is possible to manufacture a cold electron emitting device, which has an excellent work precision for the sharp tip of the emitter projection portion and an excellent uniform structure and can stably emit a current.
    • 冷电子发射器件具有形成在p型硅衬底上的发射极基极部分,发射极突出部分和源极区域,每个都是n型半导体。 用作引出电极的金属膜和FET的栅极通过绝缘层在基板的包含发射极基部和源极区的外围区域的区域上形成。 该冷电子发射器件可以如下制造。 首先,在p型半导体基板上形成具有发射极投射部和发射极基部以及源极区的锥形发射体。 接下来,在包括发射极基部和源极区的周边区域的基板上形成作为FET的引出电极和栅电极的绝缘层和金属膜。 然后,在发射极和源极区域中掺杂n型杂质以形成n型发射极和n型源极区。 以这种方式,可以制造对于发射极突起部分的尖锐尖端具有优异的加工精度并且具有优异的均匀结构并且可以稳定地发射电流的冷电子发射器件。
    • 7. 发明授权
    • Field emission type electron emitting device and method of producing the
same
    • 场致发射型电子发射器件及其制造方法
    • US5866438A
    • 1999-02-02
    • US59333
    • 1998-04-14
    • Junji ItohTakahiko UematsuYoichi RyokaiMasato NishizawaKazuo Matsuzaki
    • Junji ItohTakahiko UematsuYoichi RyokaiMasato NishizawaKazuo Matsuzaki
    • H01J1/30H01J1/304H01J3/02H01J9/02H01L21/00
    • H01J9/025H01J3/022
    • In a comb-like or wedge-like electron emitting device, an emitter or both an emitter and an anode electrode are processed from a single-crystal silicon thin film of an SOI wafer. The single-crystal silicon thin film in portions other than the processed portion is removed so that the silicon oxide layer is dug down further slightly. A gate electrode for applying an electric field in order to draw electrons out of the emitter is provided in the dug-down portion. When the end and side faces of the emitter are formed as (111) faces by anisotropic etching in the condition that the single-crystal silicon thin film is oriented to a (100) face, the emitter has a sharp edge at about 55.degree. with respect to the substrate. In a conical electron emitting device, the gate electrode is constituted by a single-crystal silicon thin film of an SOI wafer so that a pyramid surrounded by the (111) faces is formed on the single-crystal silicon substrate.
    • 在梳状或楔形电子发射器件中,从SOI晶片的单晶硅薄膜处理发射极或发射极和阳极两者。 去除处理部分以外的部分中的单晶硅薄膜,使得氧化硅层进一步略微下降。 用于施加电场以便将电子从发射极引出的栅电极设置在所述挖空部分中。 当在单晶硅薄膜取向为(100)面的条件下,通过各向异性蚀刻将发射极的端面和侧面形成为(111)面时,发射极具有约55°的尖锐边缘, 相对于底物。 在圆锥形电子发射器件中,栅极由SOI晶片的单晶硅薄膜构成,从而在单晶硅衬底上形成由(111)面包围的金字塔。
    • 10. 发明授权
    • Field emitter having source, channel, and drain layers
    • 具有源极,沟道和漏极层的场致发射体
    • US5710478A
    • 1998-01-20
    • US698260
    • 1996-08-14
    • Seigo KanemaruJunji Itoh
    • Seigo KanemaruJunji Itoh
    • H01J1/304H01J1/308H01J1/30H01J19/24
    • H01J3/022H01J1/3042H01J1/308H01J2201/319
    • A field emission device of simple structure enables stabilization and control of field emission current. A three-dimensional emitter formed on a base member incorporates therein a source layer on the side in contact with the base member, a drain layer on the side of the distal end including a tip and a channel region layer between the source layer and the drain layer. A gate is formed near the emitter. A strong electric field generated by applying a voltage to the gate causes cold electrons to be emitted from the emitter tip and the voltage applied to the gate also controls the conductivity of the channel region layer, whereby the field emission current emitted from the tip of the emitter is stabilized and controlled.
    • 具有简单结构的场致发射器件可实现场发射电流的稳定和控制。 形成在基底构件上的三维发射体在其中包括与基底构件接触的一侧的源极层,在远端侧的漏极层包括尖端和在源极层和漏极之间的沟道区域层 层。 在发射极附近形成栅极。 通过向栅极施加电压产生的强电场使得发射极尖端发出冷电子,并且施加到栅极的电压也控制沟道区域层的导电性,从而从 发射极稳定并受到控制。