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    • 1. 发明申请
    • Member for Plasma Display and Method for Producing the Same
    • 等离子显示器的成员及其生产方法
    • US20090218945A1
    • 2009-09-03
    • US12224503
    • 2007-02-19
    • Minori KamadaYoshiyuki TsujiAtsushi Kondo
    • Minori KamadaYoshiyuki TsujiAtsushi Kondo
    • H01J17/49H01J9/00
    • H01J11/12H01J11/36H01J2211/363
    • [PROBLEMS] To provide a member for plasma display having a lattice-like partition consisting of at least a main partition and an auxiliary partition formed on a substrate in which the height at the partition of the main partition is prevented from becoming smaller than the height at an intersection even when a high precision lattice-like partition where the width at the top of the main partition becomes 40 μm or less is provided, and the problem of erroneous emission of light from a cell is eliminated.[MEANS FOR SOLVING PROBLEMS] In a structure where the width at the top of the main partition is 40 μm or less and the main and auxiliary partitions are arranged in lattice, the height at the intersection of the main and auxiliary partitions is set to be 0-2μ smaller than the height at the main partition by setting the relation between the width (Wa) at the top of the main partition and the width (Wb) at the top of the auxiliary partition to satisfy 1.2≦(Wa/Wb).
    • 本发明提供一种等离子体显示器用构件,其具有格栅状分隔体,该格子状分隔体至少由形成在基板上的主隔板和辅助隔板构成,其中防止主隔板隔壁的高度变小 即使在主分区顶部的宽度为40μm以下的高精度格子状分隔物的情况下,也能够消除来自单元的光的错误发光的问题。 解决问题的手段在主隔板的顶部的宽度为40μm以下并且主区域和辅助隔壁布置成格子的结构中,主区域和辅助隔壁的交点处的高度被设定为 通过设置主分区顶部宽度(Wa)与辅助分区顶部宽度(Wb)之间的关系满足1.2 <=(Wa / Wb )。
    • 5. 发明授权
    • Packing-packaging apparatus
    • 包装包装设备
    • US08776481B2
    • 2014-07-15
    • US12920746
    • 2009-01-15
    • Fumio MiyaharaYoshiyuki TsujiTomohiro Takemoto
    • Fumio MiyaharaYoshiyuki TsujiTomohiro Takemoto
    • B65B1/06
    • B65B29/02B65B9/20B65B9/2056B65B29/04B65B37/12B65B39/001
    • A packing-packaging machine includes: sheet feeding means; a horizontal bonding unit for forming a bag body by forming horizontal bonding on a tubular body at predetermined intervals; and an object dispensing unit for dispensing an object to be packaged to the bag body during a repetition of the formation of the horizontal bonding. The object dispensing unit includes a shutter for opening and closing a falling path of a predetermined amount of the object into the bag body. The shutter is opened and closed such that the predetermined amount of the object and another predetermined amount of the object fall with a spacing therebetween, and that before the horizontal bonding is formed on the bag body packed with the predetermined amount of the object which has been dropped during opening-closing operation of the shutter, the other predetermined amount of the object for a next bag body starts falling.
    • 包装机包括:送纸装置; 水平接合单元,用于通过在管状体上以预定间隔形成水平结合来形成袋体; 以及物体分配单元,用于在重复形成水平粘合期间将待包装物体分配到袋体。 物体分配单元包括用于打开和关闭预定量的物体到袋体中的下落路径的挡板。 快门被打开和关闭,使得预定量的物体和另一个预定量的物体以其间隔开而下降,并且在水平接合之前形成在装有预定量的物体的袋体上 在快门的打开 - 关闭操作期间下降,另一个预定量的下一个袋体的物体开始下降。
    • 6. 发明申请
    • METHOD FOR PURIFICATION OF SILICA PARTICLES, PURIFIER, AND PURIFIED SILICA PARTICLES
    • 纯化二氧化硅颗粒,净化剂和纯化二氧化硅颗粒的方法
    • US20110165028A1
    • 2011-07-07
    • US13047433
    • 2011-03-14
    • Minoru KANDAYoshiyuki Tsuji
    • Minoru KANDAYoshiyuki Tsuji
    • B01J8/18B01J19/08
    • C01B33/18B01J8/1836B01J8/42B01J2208/00407B01J2208/00415B03C1/288B03C1/30B03C1/32B03C2201/16B03C2201/18C03C1/02
    • [Problems] To provide a treatment method having excellent purification effect, in which impurities having high ionicity in a silica powder can be removed in a short time, a apparatus thereof, and a purified silica powder.[Means for Solving the Problems] A purification method of a silica powder comprises: making a silica powder into a fluid state; contacting a purified gas to the silica powder in the fluid state at high temperature; and thereby removing impurity components of the silica powder. In the method, the silica powder in the fluid state is positioned in a magnetic field region. Further, the silica powder is contacted with the purified gas, while applying voltage to the silica powder by an electric field generated by moving of the silica powder. Preferably, the silica powder in a fluid state is positioned in the magnetic region of 10 gausses or more, and contacted with the purification gas at a temperature of 1000° C. or more.
    • [问题]提供一种具有优异的净化效果的处理方法,其中可以在短时间内除去二氧化硅粉末中的高离子性的杂质,其装置和纯化的二氧化硅粉末。 解决问题的方法二氧化硅粉末的净化方法包括:将二氧化硅粉末制成流体状态; 在高温下将纯化气体以流体状态与二氧化硅粉末接触; 从而除去二氧化硅粉末的杂质成分。 在该方法中,处于流体状态的二氧化硅粉末位于磁场区域中。 此外,二氧化硅粉末与纯化气体接触,同时通过二氧化硅粉末移动产生的电场向二氧化硅粉末施加电压。 优选地,处于流体状态的二氧化硅粉末位于10高斯或更高的磁性区域中,并且在1000℃以上的温度下与净化气体接触。
    • 7. 发明授权
    • Silica glass crucible
    • 二氧化硅玻璃坩埚
    • US07695787B2
    • 2010-04-13
    • US10801683
    • 2004-03-17
    • Yoshiyuki TsujiToshio Tsujimoto
    • Yoshiyuki TsujiToshio Tsujimoto
    • B44C1/22C04B35/00F16L9/10F27B14/10
    • C03C19/00B24C1/08C03C15/00C30B15/10Y10T117/1032Y10T117/108Y10T428/13Y10T428/131
    • To provide a silica glass crucible, wherein there are no problems of generating a sinking and buckling when said crucible is used for pulling up silicon single crystal at a high temperature. The silica glass crucible used for pulling up the silicon single crystal, wherein at least an outer surface of a wall part of the crucible is covered with fine grooves having a length of less than 200 μm, a width of less than 30 μm and a depth of from more than 3 μm to less than 30 μm. Preferably, said fine groves are formed by carrying out a sand-blast treatment and a hydrofluoric acid etching and exist on more than 10% of the outer surface of the crucible, and a sliding frictional coefficient of the outer surface of the crucible to a carbon at 1500 degree C. is more than 0.6.
    • 为了提供一种二氧化硅玻璃坩埚,其中当在高温下使用所述坩埚拉起硅单晶时,不存在产生下沉和翘曲的问题。 用于提升硅单晶的二氧化硅玻璃坩埚,其中至少坩埚的壁部的外表面被细长的小于200μm,宽度小于30μm的细槽和深度 大于3μm至小于30μm。 优选地,通过进行喷砂处理和氢氟酸蚀刻而形成所述细小花纹,并且存在于坩埚的外表面的10%以上,坩埚的外表面的滑动摩擦系数为碳 在1500摄氏度,大于0.6。