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1. 发明授权

US07695787B2 Silica glass crucible 有权
标题翻译：二氧化硅玻璃坩埚
公开(公告)号：US07695787B2
公开(公告)日：2010-04-13
申请号：US10801683
申请日：2004-03-17
申请人： Yoshiyuki Tsuji , Toshio Tsujimoto
发明人： Yoshiyuki Tsuji , Toshio Tsujimoto
IPC分类号： B44C1/22 , C04B35/00 , F16L9/10 , F27B14/10
CPC分类号： C03C19/00 , B24C1/08 , C03C15/00 , C30B15/10 , Y10T117/1032 , Y10T117/108 , Y10T428/13 , Y10T428/131
摘要： To provide a silica glass crucible, wherein there are no problems of generating a sinking and buckling when said crucible is used for pulling up silicon single crystal at a high temperature. The silica glass crucible used for pulling up the silicon single crystal, wherein at least an outer surface of a wall part of the crucible is covered with fine grooves having a length of less than 200 μm, a width of less than 30 μm and a depth of from more than 3 μm to less than 30 μm. Preferably, said fine groves are formed by carrying out a sand-blast treatment and a hydrofluoric acid etching and exist on more than 10% of the outer surface of the crucible, and a sliding frictional coefficient of the outer surface of the crucible to a carbon at 1500 degree C. is more than 0.6.
摘要翻译：为了提供一种二氧化硅玻璃坩埚，其中当在高温下使用所述坩埚拉起硅单晶时，不存在产生下沉和翘曲的问题。用于提升硅单晶的二氧化硅玻璃坩埚，其中至少坩埚的壁部的外表面被细长的小于200μm，宽度小于30μm的细槽和深度大于3μm至小于30μm。优选地，通过进行喷砂处理和氢氟酸蚀刻而形成所述细小花纹，并且存在于坩埚的外表面的10％以上，坩埚的外表面的滑动摩擦系数为碳在1500摄氏度，大于0.6。

2. 发明申请

US20100192841A1 REINFORCING METHOD OF SILICA GLASS SUBSTANCE AND REINFORCED SILICA GLASS CRUCIBLE 审中-公开
标题翻译：二氧化硅玻璃物质和增强二氧化硅玻璃的增强方法
公开(公告)号：US20100192841A1
公开(公告)日：2010-08-05
申请号：US12759324
申请日：2010-04-13
申请人： Toshio TSUJIMOTO , Hiroya Ishizuka , Naotaka Fumoto
发明人： Toshio TSUJIMOTO , Hiroya Ishizuka , Naotaka Fumoto
IPC分类号： C30B15/10
CPC分类号： C30B35/002 , C03C17/004 , C03C17/005 , C03C17/02 , C03C17/04 , C03C2217/213 , C03C2218/11 , C03C2218/113 , C03C2218/17 , C30B15/10 , Y10T117/1032
摘要： A process reinforcing a silica glass substance, such as a silica glass crucible, is provided without intermixing an impurity. The process comprises forming a silica glass powder layer on a surface of the silica glass substance, and crystallizing said silica glass powder layer under high temperature. As for a silica glass crucible, the process for reinforcing the silica glass crucible and the reinforced silica glass crucible are provided, wherein the silica glass powder layer on the whole or a part of the surface of the crucible is formed and then, crystallized under a temperature at the melting of a silicon raw material being charged into said quartz glass crucible.
摘要翻译：提供加强二氧化硅玻璃物质如石英玻璃坩埚的方法，而不混合杂质。该方法包括在石英玻璃物质的表面上形成二氧化硅玻璃粉末层，并在高温下使所述二氧化硅玻璃粉末层结晶。对于石英玻璃坩埚，提供了用于增强石英玻璃坩埚和增强石英玻璃坩埚的方法，其中形成坩埚表面全部或一部分上的二氧化硅玻璃粉末层，然后在将硅原料熔化的温度加入到所述石英玻璃坩埚中。

3. 发明申请

US20070111151A1 SURFACE MODIFIED QUARTZ GLASS CRUCIBLE AND ITS MODIFICATION PROCESS 有权
标题翻译：表面改性石英玻璃可溶性及其改性方法
公开(公告)号：US20070111151A1
公开(公告)日：2007-05-17
申请号：US11621021
申请日：2007-01-08
申请人： Toshio Tsujimoto , Yoshiyuki Tsuji
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： F27B14/10 , C30B29/18
CPC分类号： C30B15/10 , C03C17/25 , C03C17/27 , Y10S117/90 , Y10T117/10 , Y10T117/1032 , Y10T117/1052
摘要： A surface modified quartz glass crucible and a process for modifying the crucible includes a layer of a metal oxide on the whole or a part of the inside and/or outside of the crucible, and baking it. At least an inside surface of the crucible is coated with a said metal oxide of magnesium, calcium, strontium or barium. The coated layer of the crucible does not abrade easily and provides a high dislocation free ratio of silicon single crystals pulled by using the crucible.
摘要翻译：表面改性石英玻璃坩埚和坩埚的改性方法包括在坩埚的内部和/或外部的整个或一部分上的金属氧化物层，并进行烘烤。至少坩埚的内表面涂有镁，钙，锶或钡的所述金属氧化物。坩埚的涂层不容易磨损，并且通过使用坩埚提供高的无位错硅单晶。

4. 发明授权

US07955511B2 Silica glass crucible 有权
标题翻译：二氧化硅玻璃坩埚
公开(公告)号：US07955511B2
公开(公告)日：2011-06-07
申请号：US12717390
申请日：2010-03-04
申请人： Yoshiyuki Tsuji , Toshio Tsujimoto
发明人： Yoshiyuki Tsuji , Toshio Tsujimoto
IPC分类号： B44C1/22 , C04B35/00 , F16L9/10 , F27B14/10
CPC分类号： C03C19/00 , B24C1/08 , C03C15/00 , C30B15/10 , Y10T117/1032 , Y10T117/108 , Y10T428/13 , Y10T428/131
摘要： A silica glass crucible used for pulling up silicon single crystal at a high temperature. The silica glass crucible may have at least an outer surface of a wall part of the crucible covered with fine grooves having a length of less than 200 μm, a width of less than 30 μm and a depth of from more than 3 μm to less than 30 μm. The fine groves may be formed by carrying out a sand-blast treatment and a hydrofluoric acid etching and may exist on more than 10% of the outer surface of the crucible, and a sliding frictional coefficient of the outer surface of the crucible to a carbon at 1500° C. is more than 0.6.
摘要翻译：用于在高温下拉高硅单晶的石英玻璃坩埚。二氧化硅玻璃坩埚可以至少具有坩埚的壁部的外表面，该细长的沟槽的长度小于200μm，宽度小于30μm，深度大于3μm至小于 30μm。可以通过进行喷砂处理和氢氟酸蚀刻来形成细小的花纹，并且可以存在于坩埚的外表面的10％以上，并且坩埚的外表面的滑动摩擦系数与碳在1500℃时大于0.6。

5. 发明申请

US20100154702A1 SURFACE MODIFIED QUARTZ GLASS CRUCIBLE, AND ITS MODIFICATION PROCESS 有权
标题翻译：表面改性的QUARTZ玻璃可溶性及其改性方法
公开(公告)号：US20100154702A1
公开(公告)日：2010-06-24
申请号：US12716605
申请日：2010-03-03
申请人： Toshio Tsujimoto , Yoshiyuki Tsuji
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B15/10 , B05D7/22 , B05D3/02
CPC分类号： C30B15/10 , C03C17/25 , C03C17/27 , Y10S117/90 , Y10T117/10 , Y10T117/1032 , Y10T117/1052
摘要： A surface modified quartz glass crucible and a process for modifying the crucible includes a layer of a metal oxide on the whole or a part of the inside and/or outside of the crucible, and baking it. At least an inside surface of the crucible is coated with a said metal oxide of magnesium, calcium, strontium or barium. The coated layer of the crucible does not abrade easily and provides a high dislocation free ratio of silicon single crystals pulled by using the crucible.
摘要翻译：表面改性石英玻璃坩埚和坩埚的改性方法包括在坩埚的内部和/或外部的整个或一部分上的金属氧化物层，并进行烘烤。至少坩埚的内表面涂有镁，钙，锶或钡的所述金属氧化物。坩埚的涂层不容易磨损，并且通过使用坩埚提供高的无位错硅单晶。

6. 发明申请

US20080078207A1 REINFORCING METHOD OF SILICA GLASS SUBSTANCE AND REINFORCED SILICA GLASS CRUCIBLE 审中-公开
标题翻译：二氧化硅玻璃物质和增强二氧化硅玻璃的增强方法
公开(公告)号：US20080078207A1
公开(公告)日：2008-04-03
申请号：US11864239
申请日：2007-09-28
申请人： Toshio Tsujimoto , Hiroya Ishizuka , Naotaka Fumoto
发明人： Toshio Tsujimoto , Hiroya Ishizuka , Naotaka Fumoto
IPC分类号： C03B8/00
CPC分类号： C30B35/002 , C03C17/004 , C03C17/005 , C03C17/02 , C03C17/04 , C03C2217/213 , C03C2218/11 , C03C2218/113 , C03C2218/17 , C30B15/10 , Y10T117/1032
摘要： A process reinforcing a silica glass substance, such as a silica glass crucible, is provided without intermixing an impurity. The process comprises forming a silica glass powder layer on a surface of the silica glass substance, and crystallizing said silica glass powder layer under high temperature. As for a silica glass crucible, the process for reinforcing the silica glass crucible and the reinforced silica glass crucible are provided, wherein the silica glass powder layer on the whole or a part of the surface of the crucible is formed and then, crystallized under a temperature at the melting of a silicon raw material being charged into said quartz glass crucible.
摘要翻译：提供加强二氧化硅玻璃物质如石英玻璃坩埚的方法，而不混合杂质。该方法包括在石英玻璃物质的表面上形成二氧化硅玻璃粉末层，并在高温下使所述二氧化硅玻璃粉末层结晶。对于石英玻璃坩埚，提供了用于增强石英玻璃坩埚和增强石英玻璃坩埚的方法，其中形成坩埚表面全部或一部分上的二氧化硅玻璃粉末层，然后在将硅原料熔化的温度加入到所述石英玻璃坩埚中。

7. 发明授权

US07776155B2 Surface modified quartz glass crucible and its modification process 有权
标题翻译：表面改性石英玻璃坩埚及其改性工艺
公开(公告)号：US07776155B2
公开(公告)日：2010-08-17
申请号：US11621021
申请日：2007-01-08
申请人： Toshio Tsujimoto , Yoshiyuki Tsuji
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B35/00
CPC分类号： C30B15/10 , C03C17/25 , C03C17/27 , Y10S117/90 , Y10T117/10 , Y10T117/1032 , Y10T117/1052
摘要： A surface modified quartz glass crucible and a process for modifying the crucible includes a layer of a metal oxide on the whole or a part of the inside and/or outside of the crucible, and baking it. At least an inside surface of the crucible is coated with a said metal oxide of magnesium, calcium, strontium or barium. The coated layer of the crucible does not abrade easily and provides a high dislocation free ratio of silicon single crystals pulled by using the crucible.
摘要翻译：表面改性石英玻璃坩埚和坩埚的改性方法包括在坩埚的内部和/或外部的整个或一部分上的金属氧化物层，并进行烘烤。至少坩埚的内表面涂有镁，钙，锶或钡的所述金属氧化物。坩埚的涂层不容易磨损，并且通过使用坩埚提供高的无位错硅单晶。

8. 发明授权

US07993454B2 Surface modified quartz glass crucible, and its modification process 有权
标题翻译：表面改性石英玻璃坩埚及其改性工艺
公开(公告)号：US07993454B2
公开(公告)日：2011-08-09
申请号：US12716605
申请日：2010-03-03
申请人： Toshio Tsujimoto , Yoshiyuki Tsuji
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B15/10
CPC分类号： C30B15/10 , C03C17/25 , C03C17/27 , Y10S117/90 , Y10T117/10 , Y10T117/1032 , Y10T117/1052
摘要： A surface modified quartz glass crucible and a process for modifying the crucible includes a layer of a metal oxide on the whole or a part of the inside and/or outside of the crucible, and baking it. At least an inside surface of the crucible is coated with a said metal oxide of magnesium, calcium, strontium or barium. The coated layer of the crucible does not abrade easily and provides a high dislocation free ratio of silicon single crystals pulled by using the crucible.
摘要翻译：表面改性石英玻璃坩埚和坩埚的改性方法包括在坩埚的内部和/或外部的整个或一部分上的金属氧化物层，并进行烘烤。至少坩埚的内表面涂有镁，钙，锶或钡的所述金属氧化物。坩埚的涂层不容易磨损，并且通过使用坩埚提供高的无位错硅单晶。

9. 发明申请

US20100154703A1 SILICA GLASS CRUCIBLE 有权
标题翻译：二氧化硅玻璃可溶
公开(公告)号：US20100154703A1
公开(公告)日：2010-06-24
申请号：US12717390
申请日：2010-03-04
申请人： Yoshiyuki TSUJI , Toshio Tsujimoto
发明人： Yoshiyuki TSUJI , Toshio Tsujimoto
IPC分类号： C30B15/10 , B44C1/22
CPC分类号： C03C19/00 , B24C1/08 , C03C15/00 , C30B15/10 , Y10T117/1032 , Y10T117/108 , Y10T428/13 , Y10T428/131
摘要： To provide a silica glass crucible, wherein there are no problems of generating a sinking and buckling when said crucible is used for pulling up silicon single crystal at a high temperature.The silica glass crucible used for pulling up the silicon single crystal, wherein at least an outer surface of a wall part of the crucible is covered with fine grooves having a length of less than 200 μm, a width of less than 30 μm and a depth of from more than 3 μm to less than 30 μm. Preferably, said fine groves are formed by carrying out a sand-blast treatment and a hydrofluoric acid etching and exist on more than 10% of the outer surface of the crucible, and a sliding frictional coefficient of the outer surface of the crucible to a carbon at 1500 degree C. is more than 0.6.
摘要翻译：为了提供一种二氧化硅玻璃坩埚，其中当在高温下使用所述坩埚拉起硅单晶时，不存在产生下沉和翘曲的问题。用于提升硅单晶的二氧化硅玻璃坩埚，其中至少坩埚的壁部的外表面被细长的小于200μm，宽度小于30μm的细槽和深度大于3μm至小于30μm。优选地，通过进行喷砂处理和氢氟酸蚀刻而形成所述细小花纹，并且存在于坩埚的外表面的10％以上，坩埚的外表面的滑动摩擦系数为碳在1500摄氏度，大于0.6。

10. 发明授权

US06712901B2 Surface modification process of quartz glass crucible 有权
标题翻译：石英玻璃坩埚表面改性工艺
公开(公告)号：US06712901B2
公开(公告)日：2004-03-30
申请号：US10162637
申请日：2002-06-06
申请人： Toshio Tsujimoto , Yoshiyuki Tsuji
发明人： Toshio Tsujimoto , Yoshiyuki Tsuji
IPC分类号： C30B1520
CPC分类号： C30B15/10 , C30B35/002 , Y10T117/10
摘要： A process for modifying the surface of a quartz glass crucible and a modified quartz glass crucible produced by the process, where the crucible has a transparent coated layer containing a crystallization accelerator on the surface. The process includes coating a mixed solution containing a metal salt and a partial hydrolyzate of alkoxysilane oligomer on the surface of the crucible and heating to obtain a quartz glass crucible having a transparent coated layer. The crystallization promoter contains a metal oxide or a metal carbonate dispersed in a silica matrix.
摘要翻译：用于改变石英玻璃坩埚的表面的方法和通过该方法制备的改性石英玻璃坩埚，其中坩埚在表面上具有含有结晶促进剂的透明涂层。该方法包括在坩埚的表面上涂覆含有金属盐和烷氧基硅烷低聚物的部分水解产物的混合溶液，并加热，得到具有透明涂层的石英玻璃坩埚。结晶促进剂含有分散在二氧化硅基质中的金属氧化物或金属碳酸盐。

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