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1. 发明授权

US5693417A Vacuum-coated compound body and process for its production 失效
标题翻译：真空镀膜复合体及其生产工艺
公开(公告)号：US5693417A
公开(公告)日：1997-12-02
申请号：US445523
申请日：1995-05-22
申请人： Klaus Goedicke , Gunter Hotzsch , Fred Fietzke , Olaf Zywitzki , Siegfried Schiller , Jonathan Reschke , Wolfgang Hempel
发明人： Klaus Goedicke , Gunter Hotzsch , Fred Fietzke , Olaf Zywitzki , Siegfried Schiller , Jonathan Reschke , Wolfgang Hempel
IPC分类号： C23C14/00 , C23C14/08 , C23C8/00
CPC分类号： C23C14/081 , C23C14/0036 , Y10T428/24975 , Y10T428/265
摘要： Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.
摘要翻译：真空涂层复合体及其生产工艺。当以已知的方式涂覆时，这种复合体具有金属或合金的载体，即热，机械和化学不稳定的层，其表面显示出裂纹并且是部分多孔的。通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有外层的材料为Al 2 O 3，最多在700℃下施加到金属或合金载体上，该层为完全结晶并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1Gpa的压缩应力和至少20Gpa的硬度，其中Al 2 O 3层通过反应磁控管沉积溅射，其中磁控管是脉冲供电的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，复合体用于切割处理，特别是作为钻头，铣刀，铰刀，拉刀或锯片。

2. 发明授权

US5698314A Compound body of vacuum-coated sintered material and process for its production 失效
标题翻译：真空包覆烧结材料的复合体及其生产工艺
公开(公告)号：US5698314A
公开(公告)日：1997-12-16
申请号：US445521
申请日：1995-05-22
申请人： Klaus Goedicke , Gunter Hotzsch , Fred Fietzke , Olaf Zywitzki , Siegfried Schiller , Jonathan Reschke , Wolfgang Hempel
发明人： Klaus Goedicke , Gunter Hotzsch , Fred Fietzke , Olaf Zywitzki , Siegfried Schiller , Jonathan Reschke , Wolfgang Hempel
IPC分类号： C04B35/622 , C04B41/50 , C04B41/52 , C04B41/87 , C04B41/89 , C23C14/00 , C23C14/08
CPC分类号： C04B41/87 , C04B35/62222 , C04B41/5031 , C04B41/52 , C04B41/89 , C23C14/0036 , C23C14/081 , Y10T428/2916
摘要： Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.
摘要翻译：真空涂覆烧结材料的复合体及其制造方法。这种复合体以已知的方式涂覆时，具有涂覆有热，机械和化学不稳定的层的烧结材料的载体，其表面显示出裂纹并且是部分多孔的。通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有Al 2 O 3外层的材料最多在800℃下施加到烧结材料的载体上，该层是完全结晶的，并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1GPa的压缩应力和至少20GPa的硬度，Al 2 O 3层通过反应性沉积磁控管溅射，其中磁控管是脉冲驱动的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，所得到的复合体用于切割处理，特别是作为硬质合金刀片。

3. 发明授权

US6083356A Method and device for pre-treatment of substrates 失效
标题翻译：用于预处理底物的方法和装置
公开(公告)号：US6083356A
公开(公告)日：2000-07-04
申请号：US91099
申请日：1998-09-14
申请人： Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
发明人： Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
IPC分类号： C23C14/02 , H01J37/32 , B01J19/08
CPC分类号： H01J37/32018 , C23C14/022 , H01J37/34 , H01J2237/3322
摘要： Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.
摘要翻译： PCT No.PCT / EP96 / 05032 Sec。 371日期：1998年9月14日 102（e）1998年9月14日PCT PCT 1996年11月15日PCT公布。公开号WO97 / 22988 PCT 日期1997年6月26日用于在真空中通过辉光放电在真空中预处理衬底表面以用于在真空中进行随后的涂覆过程的工艺和设备。该方法包括保持待预处理的基板和反电极之间的低压辉光放电，其中反电极由真空涂覆工艺中要沉积的涂层的至少一部分组成。该方法还包括周期性地交替使衬底的极性作为阴极或作为低压辉光放电的阳极，以及分别控制两极性的脉冲长度和放电电压中的至少一个。极性的交替频率设定在1Hz〜1000kHz的范围内。该装置包括可抽空的真空室，定位成保持待预处理的基板的基板保持器，至少一个对电极和耦合到待预处理的基板的交流电压发生器，电极。基板和对电极以无电势的方式安装。

4. 发明授权

US5846608A Process for ion-supported vacuum coating 失效
标题翻译：离子支持真空镀膜工艺
公开(公告)号：US5846608A
公开(公告)日：1998-12-08
申请号：US722024
申请日：1996-10-11
申请人： Manfred Neumann , Klaus Goedicke , Siegfried Schiller , Jonathan Reschke , Henry Morgner , Falk Milde , Fred Fietzke
发明人： Manfred Neumann , Klaus Goedicke , Siegfried Schiller , Jonathan Reschke , Henry Morgner , Falk Milde , Fred Fietzke
IPC分类号： H05H1/32 , C23C14/32 , C23C14/56 , H01J37/32 , H05H1/46 , C23C14/08
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/562 , H01J37/32706
摘要： A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.
摘要翻译： PCT No.PCT / DE95 / 00476 Sec。 371日期：1996年10月11日 102（e）日期1996年10月11日PCT提交1995年4月7日PCT公布。公开号WO95 / 28508 日期：1995年10月26日一种用于离子支持真空涂层的装置。该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面，导电和电绝缘基板的高速涂布。基底主要是带状，特别是宽度超过一米的塑料片。根据本发明，在本来已知的用于真空涂覆的装置中，将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底，直接设置在其后面的电极，例如，冷却辊相对于等离子体或几乎处于等离子体电位的电极。脉冲的形式，电压和持续时间适用于涂层任务和材料。该方法特别用于沉积磨损保护，防腐蚀和阻隔涂层。用户是包装行业等。

5. 发明授权

US06340416B1 Process and system for operating magnetron discharges 有权
标题翻译：用于操作磁控管放电的过程和系统
公开(公告)号：US06340416B1
公开(公告)日：2002-01-22
申请号：US09341998
申请日：1999-07-22
申请人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
发明人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
IPC分类号： C23C1434
CPC分类号： H01J37/34
摘要： Magnetron discharges are pulse-operated to avoid the so-called “arcing”. In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power and prevent arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals. The energy supply effectiveness is thus improved. This process and system enable the production of layers having the most different properties, for example for the glass, packaging, electronic, and machine construction industries.
摘要翻译：磁控管放电是脉冲操作的，以避免所谓的“电弧”。在由交流馈电磁控管放电的磁控管的情况下，由于所需的电气部件的承载能力，该过程被限制在能量供应的次要功率。当磁控管放电由直流供电时，由于层在阳极表面上的沉积，它们的有效性降低。新的过程应该能够实现高供电和防止电弧。在具有至少两个磁控管电极的磁控管放电中，以至少一个磁控管电极为阴极或阳极并且提供所述极性的直流电脉冲数n1的方式提供能量。然后至少一个磁控管电极的极被反转，并且提供这个极性的直流电的数量n2。以这种方式进行该过程，直流脉冲的频率高于极性反转的频率。从而提高能源供应效率。该方法和系统能够生产具有最不同性质的层，例如用于玻璃，包装，电子和机械制造业。

6. 发明授权

US5614273A Process and apparatus for plasma-activated electron beam vaporization 失效
标题翻译：等离子体激活电子束蒸发的方法和装置
公开(公告)号：US5614273A
公开(公告)日：1997-03-25
申请号：US639620
申请日：1996-04-29
申请人： Klaus Goedicke , Bert Scheffel , Jonathan Reschke , Siegfried Schiller , Volker Kirchhoff , Torsten Werner
发明人： Klaus Goedicke , Bert Scheffel , Jonathan Reschke , Siegfried Schiller , Volker Kirchhoff , Torsten Werner
IPC分类号： C23C14/24 , C23C14/30 , C23C14/56 , H01J37/305 , H05H1/24
CPC分类号： C23C14/562 , C23C14/24 , C23C14/30 , H01J37/3053
摘要： A process and apparatus for plasma-activated electron beam vaporization isrovided. The vaporizing material from at least two vaporizer crucibles is vaporized with electron beams. An electric voltage is applied to the vaporizer crucibles in such a way that the vapor-emitting areas serve as electrodes of an electric discharge. The vaporizing material acts as a cathode or anode. The process and apparatus are preferably intended for the reactive coating of large surfaces and for the reactive coating of components, tools and strip steel.
摘要翻译：提供了一种用于等离子体激活的电子束蒸发的方法和装置。来自至少两个蒸发器坩埚的气化材料用电子束蒸发。以蒸发器坩埚的方式施加电压使得蒸汽发射区域用作放电电极。蒸发材料充当阴极或阳极。该方法和装置优选用于大表面的反应性涂层和组件，工具和带钢的反应性涂层。

7. 发明授权

US5470388A Device for the vacuum coating of mass produced products 失效
标题翻译：大量生产产品的真空镀膜装置
公开(公告)号：US5470388A
公开(公告)日：1995-11-28
申请号：US307663
申请日：1994-11-23
申请人： Klaus Goedicke , Christoph Metzner , Joerg Schmidt , Ullrich Heisig , Siegfried Schiller , Jonathan Reschke
发明人： Klaus Goedicke , Christoph Metzner , Joerg Schmidt , Ullrich Heisig , Siegfried Schiller , Jonathan Reschke
IPC分类号： C23C14/50 , C23C14/22 , C23C16/50 , C23C14/00
CPC分类号： C23C14/223 , C23C14/22
摘要： Device for the vacuum coating of mass produced products. By means of the ice small parts, such as screws and bolts, as mass produced products are highly productively coated by vacuum deposition or sputtering, also under plasma action. In a container is located a drum rotatable at high speed about its horizontal axis and in which the parts to be coated are fixed to the inner wall by centrifugal force. The surface of the inner wall is geometrically constructed such that the parts to be coated are reliably held and moved with it. The coating devices are located in the drum. A stripping device, whose spacing with respect to the inner wall is adjustable at programmable time intervals, is located in the drum and has an abutment surface directed opposite to the rotation direction.
摘要翻译： PCT No.PCT / DE93 / 00201 Sec。 371日期1994年11月23日 102（e）日期1994年11月23日PCT 1993年3月3日PCT公布。出版物WO93 / 19217 日期1993年9月30日。批量生产产品的真空镀膜设备。通过设备的小部件，例如螺钉和螺栓，通过真空沉积或溅射也可以在等离子体作用下大量生产大量生产的产品。在容器中设置有以其高度绕其水平轴线可高速旋转的滚筒，其中待涂覆的部件通过离心力固定在内壁上。内壁的表面是几何构造的，使得待涂覆的部件被可靠地保持和移动。涂层装置位于滚筒中。相对于内壁的间隔可以以可编程的时间间隔调节的剥离装置位于滚筒中并且具有与旋转方向相反的抵接表面。

8. 发明授权

US06005218A Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas 失效
标题翻译：将双极脉冲形式的能量馈入低压等离子体的过程和电路
公开(公告)号：US06005218A
公开(公告)日：1999-12-21
申请号：US836030
申请日：1997-08-11
申请人： Hendrik Walde , Jonathan Reschke , Klaus Goedicke , Torsten Winkler , Volker Kirchhoff , Peter Frach
发明人： Hendrik Walde , Jonathan Reschke , Klaus Goedicke , Torsten Winkler , Volker Kirchhoff , Peter Frach
IPC分类号： H01J37/32 , H05H1/46 , B23K10/00
CPC分类号： H01J37/32018 , H01J37/32027 , H01J37/32064 , H05H1/46
摘要： A process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas is provided. Within an average time period, a power which is to be as high as possible is to be fed into the low pressure discharge. In each polarization, the same power is to be fed although the impedance differs considerably. In a system for plasma and surface treatment techniques having at least two electrodes and one power supply, the outputs of at least two potential-free direct current supplies are switched such that an output of one direct current supply is conductively connected with an output of the same polarity of the other direct current supply. By means of a switch which is connected with each feed line to the electrodes and whose other outputs are led in a combined manner to the other outputs of the direct current source, these switches are operated via a timing generator in synchronism with the pole changing frequency. The switches are opened up in the event of the occurrence of an arcing. The process is used for the bipolar pulse sputtering for depositing electrically insulating layers on workpieces. Preferably, such layers are used for a mechanical protection, protection against wear and the improvement of sliding characteristics.
摘要翻译： PCT No.PCT / DE95 / 01473 Sec。 371日期1997年8月11日 102（e）日期1997年8月11日PCT 1995年10月19日PCT PCT。 WO96 / 13964 PCT出版物日期：1996年5月9日提供了将能量双极脉冲馈入低压等离子体的工艺和电路。在平均时间段内，要将尽可能高的功率送入低压放电。在每个极化中，尽管阻抗明显不同，但仍要输入相同的功率。在具有至少两个电极和一个电源的等离子体和表面处理技术的系统中，切换至少两个无电势直流电源的输出，使得一个直流电源的输出与相同极性的另一个直流电源。通过与每个馈电线连接到电极并且其另外的输出以直流电源的其他输出的方式被引导的开关，这些开关通过与极点变化频率同步的定时发生器来操作。发生电弧时，开关被打开。该工艺用于双极脉冲溅射，用于在工件上沉积电绝缘层。优选地，这些层用于机械保护，防止磨损和改善滑动特性。

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