专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US12125665B2 Ion implantation system 有权
公开(公告)号：US12125665B2
公开(公告)日：2024-10-22
申请号：US17742608
申请日：2022-05-12
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
发明人： Kai-Yun Yang , Chen Chi Wu , Ching I Li , Min-Chang Ching , Hung-Ta Huang
IPC分类号： H01J37/08 , H01J37/317 , H01J37/32 , H01L21/265
CPC分类号： H01J37/08 , H01J37/3171 , H01J37/32064 , H01L21/26513
摘要： A plasma flood gun includes a filament to emit first electrons based on a first filament current induced in the filament to heat the filament to a first temperature at a first time. The first electrons interact with an inert gas in an arc plasma chamber to generate a first plasma. A filament resistance meter measures a first filament resistance of the filament, in-situ, during generation of the first plasma. A filament current source adjusts, based on the first filament resistance, the first filament current induced in the filament at the first time to a second filament current induced in the filament at a second time to generate a second plasma in the arc plasma chamber at the second time.

2. 发明授权

US09558917B2 Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages 有权
标题翻译：可调节的无耗电升压缓冲网络，用于实现大的升压电压
公开(公告)号：US09558917B2
公开(公告)日：2017-01-31
申请号：US15222597
申请日：2016-07-28
申请人： Advanced Energy Industries, Inc.
发明人： Kenneth W. Finley , Hendrik Walde
IPC分类号： H01J37/32 , H01J37/34
CPC分类号： H01J37/32064 , H01J37/32027 , H01J37/32055 , H01J37/34 , H05H1/46 , H05H1/48 , H05H2001/4682
摘要： This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.
摘要翻译：本公开描述了一种非耗散缓冲电路，其被配置为在负载的阻抗快速上升之后升高施加到负载的电压。因此，由于负载阻抗上升而导致负载的功率递减降低后，电压提升可以引起更快速的电流斜坡。特别地，缓冲器可以包括单向开关，电压倍增器和限流器的组合。在某些情况下，这些组件可分别是二极管，倍压器和电感。

3. 发明授权

US09263241B2 Current threshold response mode for arc management 有权
标题翻译：电弧管理的当前阈值响应模式
公开(公告)号：US09263241B2
公开(公告)日：2016-02-16
申请号：US13104762
申请日：2011-05-10
申请人： Skip B. Larson , Kenneth E. Nauman
发明人： Skip B. Larson , Kenneth E. Nauman
IPC分类号： C23C16/00 , H01J37/32
CPC分类号： H01J37/32944 , H01J37/32064 , H01J37/3299
摘要： This disclosure describes systems, methods, and apparatuses for extinguishing electrical arcs in a plasma processing chamber. Once an arc is detected, the steady state voltage provided to the plasma processing chamber can be reduced, and the current being provided to the chamber decays below a steady state value as the arc is extinguished. When the current falls to or below a current threshold, the voltage can be ramped back up bringing the voltage and current back to steady state values. This technique enables power to return to a steady state level faster than traditional arc mitigation techniques.
摘要翻译：本公开描述了用于在等离子体处理室中熄灭电弧的系统，方法和装置。一旦检测到电弧，可以减小提供给等离子体处理室的稳态电压，并且当电弧熄灭时，提供给室的电流衰减到低于稳态值。当电流下降到或低于电流阈值时，可以将电压反斜坡，使电压和电流恢复到稳定状态值。这种技术使电源能够比传统的电弧缓解技术更快地恢复到稳定状态。

4. 发明申请

US20140224768A1 METHOD FOR REMOVING HARD CARBON LAYERS 有权
标题翻译：去除硬碳层的方法
公开(公告)号：US20140224768A1
公开(公告)日：2014-08-14
申请号：US14124394
申请日：2012-05-31
申请人： Jürgen Ramm , Beno Widrig
发明人： Jürgen Ramm , Beno Widrig
IPC分类号： H01J37/32
CPC分类号： H01J37/32064 , C23C16/0245 , H01J2237/3341 , H01L21/02376 , H01L21/31116 , H01L21/31122 , H01L29/66015
摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.
摘要翻译：本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

5. 发明授权

US08786263B2 Reducing stored electrical energy in a lead inductance 有权
标题翻译：降低引线电感中存储的电能
公开(公告)号：US08786263B2
公开(公告)日：2014-07-22
申请号：US12617181
申请日：2009-11-12
申请人： Pawel Ozimek , Rafal Bugyi , Robert Dziuba , Andrzej Klimczak , Marcin Zelechowski
发明人： Pawel Ozimek , Rafal Bugyi , Robert Dziuba , Andrzej Klimczak , Marcin Zelechowski
IPC分类号： G05F1/00 , H01J37/32 , H01M10/44 , H01M10/42 , H05H1/36
CPC分类号： H01J37/32064 , H01J37/32091 , H01J37/32174 , H01M10/42 , H01M10/425 , H01M10/4264 , H01M10/44 , H05H1/36 , Y02E60/12
摘要： According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.
摘要翻译：根据本发明的第一方面，通过等离子体处理电源电路来实现减少存储在负载中的电能或用于连接电源与负载的一个或多个引线中的电能，该等离子体处理电源电路包括与至少一个导线用于启用/中断负载电源; 第一电气非线性装置; 与第一电气非线性装置串联布置的能量存储装置; 以及与所述能量存储装置可操作地连接的预充电电路，所述预充电电路被配置为在能量到所述负载的电力的同时将所述能量存储装置充电到预定的能量水平。

6. 发明申请

US20130134890A1 Arc Extinction Arrangement and Method for Extinguishing Arcs 有权
标题翻译：电弧灭火布置及灭弧方法
公开(公告)号：US20130134890A1
公开(公告)日：2013-05-30
申请号：US13744638
申请日：2013-01-18
申请人： HUETTINGER ELEKTRONIK GMBH + CO. KG
发明人： Ulrich Richter
IPC分类号： H01J37/32
CPC分类号： H01J37/32064 , H01J37/32018 , H01J37/32045 , H01J37/32935
摘要： In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store.
摘要翻译：在将气体放电室供电的气体放电室中的电弧熄灭的方法中，在第一方向的电流和第二反方向的电流中，产生气体放电当识别出电弧时，中断对气体放电室的供电，并且向气体放电室和/或气体放电室供电的剩余能量被供应到能量存储器。

7. 发明申请

US20100213903A1 REDUCING STORED ELECTRICAL ENERGY IN A LEAD INDUCTANCE 有权
标题翻译：降低铅电感中的存储电能
公开(公告)号：US20100213903A1
公开(公告)日：2010-08-26
申请号：US12617181
申请日：2009-11-12
申请人： Pawel Ozimek , Rafal Bugyi , Robert Dziuba , Andrzej Klimczak , Marcin Zelechowski
发明人： Pawel Ozimek , Rafal Bugyi , Robert Dziuba , Andrzej Klimczak , Marcin Zelechowski
IPC分类号： H02J7/00
CPC分类号： H01J37/32064 , H01J37/32091 , H01J37/32174 , H01M10/42 , H01M10/425 , H01M10/4264 , H01M10/44 , H05H1/36 , Y02E60/12
摘要： According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.
摘要翻译：根据本发明的第一方面，通过等离子体处理电源电路来实现减少存储在负载中的电能或用于连接电源与负载的一个或多个引线中的电能，该等离子体处理电源电路包括与至少一个导线用于启用/中断负载电源; 第一电气非线性装置; 与第一电气非线性装置串联布置的能量存储装置; 以及与所述能量存储装置可操作地连接的预充电电路，所述预充电电路被配置为在能量到所述负载的电力的同时将所述能量存储装置充电到预定的能量水平。

8. 发明申请

US20100141221A1 DELIVERED ENERGY COMPENSATION DURING PLASMA PROCESSING 有权
标题翻译：在等离子体加工过程中提供能源补偿
公开(公告)号：US20100141221A1
公开(公告)日：2010-06-10
申请号：US12328831
申请日：2008-12-05
申请人： Milan Ilic , Darren File
发明人： Milan Ilic , Darren File
IPC分类号： G05F1/10
CPC分类号： H01J37/3299 , H01J37/32064 , H01J37/32935 , H01J37/32944
摘要： An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.
摘要翻译：一种用于控制对等离子体室供电的电力的应用的装置和方法。在采样间隔期间，检测器检测从功率级到等离子体室的实际功率。比较模块将采样间隔期间的实际功率输出与采样间隔期间的当前功率设置进行比较，并生成补偿值。调整模块利用补偿值更新功率级的当前功率设置，以提供功率级的新功率设置，以在沉积过程中控制从功率级到等离子体室的功率，由此在沉积过程中发生功率损耗在沉积过程中得到补偿。如果沉积过程具有固定的时间段，则可以使用补偿方法和装置来补偿沉积过程中的能量损失，而不会延长沉积过程的持续时间。

9. 发明申请

US20080286496A1 Method for depositing electrically insulating layers 有权
标题翻译：沉积电绝缘层的方法
公开(公告)号：US20080286496A1
公开(公告)日：2008-11-20
申请号：US11937071
申请日：2007-11-08
申请人： Jurgen Ramm , Christian Wohlrab
发明人： Jurgen Ramm , Christian Wohlrab
IPC分类号： H01T14/00
CPC分类号： C23C14/325 , C23C14/0021 , C23C14/08 , C23C14/081 , H01J37/32055 , H01J37/32064
摘要： The invention relates to a method for operating an arc source, whereby an electric spark discharge is ignited and run on the surface of a target and the spark discharge is simultaneously fed a direct current with an associated constant voltage DV as well as a pulsed current generated by a periodically applied voltage signal. The voltage at the arc source is boosted over several microseconds and the shape of the voltage signal is in essence arbitrarily selectable.
摘要翻译：本发明涉及一种用于操作电弧源的方法，由此在目标表面上点燃和运行电火花放电并且火花放电同时馈送有相关联的恒定电压DV的直流电流以及产生的脉冲电流通过周期性施加的电压信号。电弧源处的电压升高几个微秒，电压信号的形状本质上可任意选择。

10. 发明申请

US20070144901A1 Pulsed cathodic arc plasma 审中-公开
标题翻译：脉冲阴极电弧等离子体
公开(公告)号：US20070144901A1
公开(公告)日：2007-06-28
申请号：US10598217
申请日：2005-03-15
申请人： Terje Skotheim , Uladzimir Sheleh , Grigory Kirpilenko
发明人： Terje Skotheim , Uladzimir Sheleh , Grigory Kirpilenko
IPC分类号： C23C14/00
CPC分类号： C23C14/221 , C23C14/0605 , C23C14/325 , C23C14/358 , H01J37/32055 , H01J37/32064 , H01J37/32614 , H01J37/3266 , H01J37/3405 , H01J2237/3142
摘要： The present invention provides a pulsed plasma arc source capable of applying diamond-like carbon coatings, other hard wear resistant coatings or metal coatings to a substrate. The pulsed plasma arc source is based on the use of a magnetron sputtering system for initiation of the pulsed arc discharge. The pulsed plasma arc source can be scale up to coat large substrates.
摘要翻译：本发明提供一种脉冲等离子体电弧源，其能够将金刚石状碳涂层，其它硬质耐磨涂层或金属涂层施加到基底上。脉冲等离子体电弧源基于使用磁控溅射系统来启动脉冲电弧放电。脉冲等离子体电弧源可以放大以覆盖大的衬底。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式