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1. 发明申请

US20140043881A1 POWER CONVERTER WITH PREEMPTIVE PROTECTION 有权
标题翻译：功率转换器具有预防性保护
公开(公告)号：US20140043881A1
公开(公告)日：2014-02-13
申请号：US13758092
申请日：2013-02-04
申请人： Hendrik Walde , Daryl Frost
发明人： Hendrik Walde , Daryl Frost
IPC分类号： H02M7/539
CPC分类号： H02M7/539 , H02M1/32 , H02M7/53871 , Y02B70/1441
摘要： Among many embodiments, a power conversion apparatus and a method for converting power are disclosed. The power conversion apparatus may include switching components configured to create an alternating current; a preemptive detector arranged and configured to provide, in advance of the alternating current reaching a zero-crossing, a control signal responsive to the alternating electrical current approaching the zero-crossing; and a controller configured, at least in part, to change a state of the switching components before the zero crossing, in response to the control signal.
摘要翻译：在许多实施例中，公开了一种功率转换装置和用于转换功率的方法。功率转换装置可以包括被配置为产生交流电的开关部件; 预先检测器，被布置和配置为在交流电到达零交叉之前提供响应于接近过零点的交流电流的控制信号; 以及控制器，其至少部分地被配置为响应于所述控制信号而在过零之前改变所述开关组件的状态。

2. 发明授权

US08391025B2 Preemptive protection for a power convertor 有权
标题翻译：功率转换器的抢占式保护
公开(公告)号：US08391025B2
公开(公告)日：2013-03-05
申请号：US12647466
申请日：2009-12-26
申请人： Hendrik Walde , Daryl Frost
发明人： Hendrik Walde , Daryl Frost
IPC分类号： H02M7/53
CPC分类号： H02M7/539 , H02M1/32 , H02M7/53871 , Y02B70/1441
摘要： Among many embodiments, a power conversion apparatus and a method for converting power are disclosed. The power conversion apparatus may include switching components configured to create an alternating current; a preemptive detector arranged and configured to provide, in advance of the alternating current reaching a zero-crossing, a control signal responsive to the alternating electrical current approaching the zero-crossing; and a controller configured, at least in part, to change a state of the switching components before the zero crossing, in response to the control signal.
摘要翻译：在许多实施例中，公开了一种功率转换装置和用于转换功率的方法。功率转换装置可以包括被配置为产生交流电的开关部件; 预先检测器，被布置和配置为在交流电到达零交叉之前提供响应于接近过零点的交流电流的控制信号; 以及控制器，其至少部分地被配置为响应于所述控制信号而在过零之前改变所述开关组件的状态。

3. 发明申请

US20100026186A1 POWER SUPPLY IGNITION SYSTEM AND METHOD 有权
标题翻译：电源点火系统及方法
公开(公告)号：US20100026186A1
公开(公告)日：2010-02-04
申请号：US12424138
申请日：2009-04-15
申请人： Morgan Forrest , Daryl Frost , Frank Heine , Doug Pelleymounter , Hendrik Walde
发明人： Morgan Forrest , Daryl Frost , Frank Heine , Doug Pelleymounter , Hendrik Walde
IPC分类号： H05B31/26
CPC分类号： H01J37/3299 , H01J37/32045 , H01J37/32174 , H01J37/32935 , H01J37/32944
摘要： One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level.
摘要翻译：一个实施例包括具有等离子体室，发生器，反馈部件和控制器的等离子体处理系统。反馈分量适于接收至少一个具有取决于从发生器提供给腔室的功率信号的电平的第一信号。反馈输出适于向控制器发射第二信号，其适于向发电机提供第三信号。第三信号被配置为控制发电机为特定处理应用的功率电平提供功率信号。功率发生器由控制器进一步控制，以减少和去除等离子体处理室的功率，随后增加电压电平直到功率电平达到阈值水平。进一步控制发电机以随后调制电压，直到电压恢复到第一电压电平。

4. 发明申请

US20120043890A1 PROACTIVE ARC MANAGEMENT OF A PLASMA LOAD 有权
标题翻译：等离子体负载的主动弧管理
公开(公告)号：US20120043890A1
公开(公告)日：2012-02-23
申请号：US12859998
申请日：2010-08-20
申请人： Skip B. Larson , Kenneth E. Nauman , Hendrik Walde , R. Mike McDonald
发明人： Skip B. Larson , Kenneth E. Nauman , Hendrik Walde , R. Mike McDonald
IPC分类号： H05H1/24
CPC分类号： H05H1/46 , H05H2001/4682
摘要： Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling requests in a sampling interval. The number of proactive arc handling requests in a sampling interval is a function of a proactive arc management count that in turn is a function of actual number of arcs in a preceding sampling interval. Accordingly during a present sampling interval proactive arc management executes arc handling for actual arcs in the present sampling interval and for each count in a proactive arc management count updated as a function of the number of arcs in the immediately preceding sampling interval.
摘要翻译：公开了主动弧管理系统和方法。在许多实现中，主动电弧管理是通过响应于在等离子体负载中发生的实际电弧并且响应于采样间隔中的主动电弧处理请求执行电弧处理程序而实现的。采样间隔中的主动弧处理请求的数量是主动弧管理计数的函数，而主动弧管理计数又是先前采样间隔中实际弧数的函数。因此，在当前采样间隔期间，主动弧管理对当前采样间隔中的实际弧执行弧处理，并且以在紧接在前的采样间隔内的弧数的函数更新的主动弧管理计数中的每个计数。

5. 发明申请

US20100149843A1 PREEMPTIVE PROTECTION FOR A POWER CONVERTOR 有权
标题翻译：功率转换器的保护措施
公开(公告)号：US20100149843A1
公开(公告)日：2010-06-17
申请号：US12647466
申请日：2009-12-26
申请人： Hendrik Walde , Daryl Frost
发明人： Hendrik Walde , Daryl Frost
IPC分类号： H02M7/48
CPC分类号： H02M7/539 , H02M1/32 , H02M7/53871 , Y02B70/1441
摘要： Among many embodiments, a power conversion apparatus and a method for converting power are disclosed. The power conversion apparatus may include switching components configured to create an alternating current; a preemptive detector arranged and configured to provide, in advance of the alternating current reaching a zero-crossing, a control signal responsive to the alternating electrical current approaching the zero-crossing; and a controller configured, at least in part, to change a state of the switching components before the zero crossing, in response to the control signal.
摘要翻译：在许多实施例中，公开了一种功率转换装置和用于转换功率的方法。功率转换装置可以包括被配置为产生交流电的开关部件; 预先检测器，被布置和配置为在交流电到达零交叉之前提供响应于接近过零点的交流电流的控制信号; 以及控制器，其至少部分地被配置为响应于所述控制信号而在过零之前改变所述开关组件的状态。

6. 发明申请

US20050034811A1 Sensor array for measuring plasma characteristics in plasma processing enviroments 有权
标题翻译：用于测量等离子体处理环境中的等离子体特性的传感器阵列
公开(公告)号：US20050034811A1
公开(公告)日：2005-02-17
申请号：US10640892
申请日：2003-08-14
申请人： Leonard Mahoney , Carl Almgren , Gregory Roche , William Saylor , William Sproul , Hendrik Walde
发明人： Leonard Mahoney , Carl Almgren , Gregory Roche , William Saylor , William Sproul , Hendrik Walde
IPC分类号： C23C16/00 , C23F1/00 , G01K11/00 , G01N27/60 , G01R27/26 , G01R27/28 , H01J20060101 , H01J37/32 , H01L21/00 , H01L21/302 , H01L21/306 , H01L21/461 , H05H1/00
CPC分类号： H01J37/32935 , H01J37/32954
摘要： A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.
摘要翻译：等离子体处理系统设置有用于等离子体性质的原位测量的诊断装置。诊断装置通常包括设置在等离子体处理室内的非侵入式传感器阵列，用于刺激传感器的电路，以及用于记录和传送用于监测或控制等离子体处理的传感器测量的装置。在一种形式中，传感器是动态脉冲双浮动Langmuir探头，其测量接近加工系统内的等离子体边界或边界的入射带电粒子电流和电子温度。等离子体测量可以用于监视处理等离子体的状态或者提供给用于控制等离子体处理的过程系统控制器。

7. 发明授权

US6132563A Reactive sputtering process 失效
标题翻译：反应溅射工艺
公开(公告)号：US6132563A
公开(公告)日：2000-10-17
申请号：US894645
申请日：1997-09-30
申请人： Peter Frach , Hendrik Walde , Christian Gottfried , Klaus Goedicke
发明人： Peter Frach , Hendrik Walde , Christian Gottfried , Klaus Goedicke
IPC分类号： C23C14/00 , C23C14/35 , C23C14/54 , H01J37/34 , C23C14/34
CPC分类号： H01J37/3405 , C23C14/0042 , C23C14/352 , C23C14/54
摘要： In magnetron-type reactive sputtering the properties of the deposited layer are to remain constant throughout the entire use of a target, independey of the state of erosion, even after an exchange of targets. The method is also to be applicable for magnetron sputtering sources having a target consisting of several components with different partial discharge powers.Before sputtering of the substrates, the magnetic field strength associated with each partial target is set without reactive gas. Thereafter, a predetermined set of values of characteristic parameters is set by control of the reactive gas flow. During the subsequent sputtering the set of values predetermined for each partial target is kept constant by the controllable reactive gas flow. The first two steps are repeated at certain intervals in dependence of time the targets are used.Optical coatings or corrosion protection coatings may be fabricated by reactive sputtering in accordance with this method.
摘要翻译： PCT No.PCT / DE96 / 00121 Sec。 371日期：1997年9月30日 102（e）1997年9月30日PCT PCT 1996年1月23日PCT公布。公开号WO96 / 26302 PCT。日期1996年8月29日在磁控管型反应溅射中，即使在目标交换之后，沉积层的性质也将在目标的整个使用过程中保持不变，独立于侵蚀状态。该方法也适用于具有由具有不同局部放电功率的多个部件组成的靶的磁控溅射源。在溅射基板之前，与每个部分目标相关的磁场强度设定为没有反应气体。此后，通过控制反应气流来设定特定参数值的预定值。在随后的溅射期间，通过可控的反应气流保持对于每个部分目标预定的一组值。根据使用目标的时间，以特定的间隔重复前两个步骤。可以根据该方法通过反应溅射制造光学涂层或防腐蚀涂层。

8. 发明授权

US08552665B2 Proactive arc management of a plasma load 有权
标题翻译：主动电弧管理等离子体负载
公开(公告)号：US08552665B2
公开(公告)日：2013-10-08
申请号：US12859998
申请日：2010-08-20
申请人： Skip B. Larson , Kenneth E. Nauman, Jr. , Hendrik Walde , R. Mike McDonald
发明人： Skip B. Larson , Kenneth E. Nauman, Jr. , Hendrik Walde , R. Mike McDonald
IPC分类号： G05F1/00
CPC分类号： H05H1/46 , H05H2001/4682
摘要： Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling requests in a sampling interval. The number of proactive arc handling requests in a sampling interval is a function of a proactive arc management count that in turn is a function of actual number of arcs in a preceding sampling interval. Accordingly during a present sampling interval proactive arc management executes arc handling for actual arcs in the present sampling interval and for each count in a proactive arc management count updated as a function of the number of arcs in the immediately preceding sampling interval.
摘要翻译：公开了主动弧管理系统和方法。在许多实现中，主动电弧管理是通过响应于在等离子体负载中发生的实际电弧并且响应于采样间隔中的主动电弧处理请求执行电弧处理程序而实现的。采样间隔中的主动弧处理请求的数量是主动弧管理计数的函数，而主动弧管理计数又是先前采样间隔中实际弧数的函数。因此，在当前采样间隔期间，主动弧管理对当前采样间隔中的实际弧执行弧处理，并且以在紧接在前的采样间隔内的弧数的函数更新的主动弧管理计数中的每个计数。

9. 发明授权

US08044594B2 Power supply ignition system and method 有权
标题翻译：电源点火系统及方法
公开(公告)号：US08044594B2
公开(公告)日：2011-10-25
申请号：US12424138
申请日：2009-04-15
申请人： Forrest Morgan , Daryl Frost , Frank Heine , Doug Pelleymounter , Hendrik Walde
发明人： Forrest Morgan , Daryl Frost , Frank Heine , Doug Pelleymounter , Hendrik Walde
IPC分类号： H01J7/24
CPC分类号： H01J37/3299 , H01J37/32045 , H01J37/32174 , H01J37/32935 , H01J37/32944
摘要： One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level.
摘要翻译：一个实施例包括具有等离子体室，发生器，反馈部件和控制器的等离子体处理系统。反馈分量适于接收至少一个具有取决于从发生器提供给腔室的功率信号的电平的第一信号。反馈输出适于向控制器发射第二信号，其适于向发电机提供第三信号。第三信号被配置为控制发电机为特定处理应用的功率电平提供功率信号。功率发生器由控制器进一步控制，以减少和去除等离子体处理室的功率，随后增加电压电平直到功率电平达到阈值水平。进一步控制发电机以随后调制电压，直到电压恢复到第一电压电平。

10. 发明申请

US20050151544A1 Sensor array for measuring plasma characteristics in plasma processing environments 有权
公开(公告)号：US20050151544A1
公开(公告)日：2005-07-14
申请号：US11066520
申请日：2005-02-25
申请人： Leonard Mahoney , Carl Almgren , Gregory Roche , William Saylor , William Sproul , Hendrik Walde
发明人： Leonard Mahoney , Carl Almgren , Gregory Roche , William Saylor , William Sproul , Hendrik Walde
IPC分类号： C23C16/00 , C23F1/00 , G01K11/00 , G01N27/60 , G01R27/26 , G01R27/28 , H01J20060101 , H01J37/32 , H01L21/00 , H01L21/302 , H01L21/306 , H01L21/461 , H05H1/00
CPC分类号： H01J37/32935 , H01J37/32954
摘要： A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

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