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    • 2. 发明授权
    • Device for applying layers of hard material by dusting
    • 用于通过除尘施加硬质材料层的装置
    • US06315877B1
    • 2001-11-13
    • US09485713
    • 2000-03-01
    • Klaus GoedickeFred Fietzke
    • Klaus GoedickeFred Fietzke
    • C23C1434
    • C23C14/352C23C14/505C23C14/541
    • A device for the sputter application of hard material coatings, including an exhaustible vacuum chamber, at least one sputtering source for depositing a coating material, a plurality of fixtures for supporting a plurality parts to be coated, the fixtures being mounted on planet gears which are movable via a planetary drive, a centrally disposed heating device, a reactive gas inlet, and a plurality of movable screens for covering the at least one sputtering source, the screens being arranged to surround the fixtures, wherein the heating device, the screens, and the planetary drive comprise an assembly which is removable from the vacuum chamber.
    • 用于溅射施加硬质材料涂层的装置,包括可抽真空的真空室,至少一个用于沉积涂层材料的溅射源,用于支撑待涂覆的多个部件的多个固定装置,固定装置安装在行星齿轮上 可通过行星驱动器,中央布置的加热装置,反应气体入口和用于覆盖至少一个溅射源的多个可移动屏幕移动,所述屏幕被布置成围绕固定装置,其中加热装置,屏幕和 行星驱动器包括可从真空室移除的组件。
    • 3. 发明授权
    • Plain bearing and method for the production thereof
    • 滑动轴承及其制造方法
    • US06263575B1
    • 2001-07-24
    • US09584515
    • 2000-05-31
    • Gerd AndlerJens-Peter HeinssKlaus GoedickeChristoph Metzner
    • Gerd AndlerJens-Peter HeinssKlaus GoedickeChristoph Metzner
    • B21D5310
    • F16C33/12C23C14/16C23C14/30C23C14/541F16C33/122F16C33/14F16C2204/20Y10S384/912Y10T29/49647Y10T29/49705
    • A plain bearing overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 &mgr;m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of Rz=3 to 7 &mgr;m. The method of producing such plain bearings is based on electron beam vapor deposition, wherein a backing member with a roughness of Rz23 2 &mgr;m is used and vapor deposition of the overlay is effected at a pressure
    • 与通过电镀和常规电子束气相沉积方法施加的覆盖层相比,其滑动轴承覆盖层(3)的性能显着地提高了耐磨性。 覆盖层(3)的表面包括圆形凸起部分(4)和凹陷部分(6),其中相对于水平截面(7),凸起部分(4)覆盖一定比例的表面积 30%至50%,基于滑动轴承的整个表面积,截面(7)处于由凸起部分(4)组成的表面积的总比例并且在垂直截面中获得的高度 等于由凹陷部分(6)组成的总相应比例。 圆形隆起部分在平面图中呈现3至8μm的直径D,其中在俯视图中不是圆形的凸起部分(4)和凹陷部分(6)的情况下,该值涉及最大直径 。 该表面的粗糙度Rz = 3〜7μm。 制造这种滑动轴承的方法是基于电子束气相沉积,其中使用粗糙度为Rz232μm的背衬构件,并且在压力<0.1Pa下进行覆盖层的气相沉积。
    • 4. 发明授权
    • Vacuum-coated compound body and process for its production
    • 真空镀膜复合体及其生产工艺
    • US5693417A
    • 1997-12-02
    • US445523
    • 1995-05-22
    • Klaus GoedickeGunter HotzschFred FietzkeOlaf ZywitzkiSiegfried SchillerJonathan ReschkeWolfgang Hempel
    • Klaus GoedickeGunter HotzschFred FietzkeOlaf ZywitzkiSiegfried SchillerJonathan ReschkeWolfgang Hempel
    • C23C14/00C23C14/08C23C8/00
    • C23C14/081C23C14/0036Y10T428/24975Y10T428/265
    • Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.
    • 真空涂层复合体及其生产工艺。 当以已知的方式涂覆时,这种复合体具有金属或合金的载体,即热,机械和化学不稳定的层,其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点,其中至少一层具有外层的材料为Al 2 O 3,最多在700℃下施加到金属或合金载体上,该层为 完全结晶并且由αAl 2 O 3相和可能具有(440)织构的γAl 2 O 3相组成,具有至少1Gpa的压缩应力和至少20Gpa的硬度,其中Al 2 O 3层通过反应磁控管沉积 溅射,其中磁控管是脉冲供电的,脉冲频率在20和100KHz之间,并且沉积速率为至少1nm / s,复合体用于切割处理,特别是作为钻头,铣刀,铰刀, 拉刀或锯片。