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1. 发明授权

US06340416B1 Process and system for operating magnetron discharges 有权
标题翻译：用于操作磁控管放电的过程和系统
公开(公告)号：US06340416B1
公开(公告)日：2002-01-22
申请号：US09341998
申请日：1999-07-22
申请人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
发明人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
IPC分类号： C23C1434
CPC分类号： H01J37/34
摘要： Magnetron discharges are pulse-operated to avoid the so-called “arcing”. In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power and prevent arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals. The energy supply effectiveness is thus improved. This process and system enable the production of layers having the most different properties, for example for the glass, packaging, electronic, and machine construction industries.
摘要翻译：磁控管放电是脉冲操作的，以避免所谓的“电弧”。在由交流馈电磁控管放电的磁控管的情况下，由于所需的电气部件的承载能力，该过程被限制在能量供应的次要功率。当磁控管放电由直流供电时，由于层在阳极表面上的沉积，它们的有效性降低。新的过程应该能够实现高供电和防止电弧。在具有至少两个磁控管电极的磁控管放电中，以至少一个磁控管电极为阴极或阳极并且提供所述极性的直流电脉冲数n1的方式提供能量。然后至少一个磁控管电极的极被反转，并且提供这个极性的直流电的数量n2。以这种方式进行该过程，直流脉冲的频率高于极性反转的频率。从而提高能源供应效率。该方法和系统能够生产具有最不同性质的层，例如用于玻璃，包装，电子和机械制造业。

2. 发明授权

US06210726B1 PVD Al2O3 coated cutting tool 有权
标题翻译： PVD Al2O3涂层切割工具
公开(公告)号：US06210726B1
公开(公告)日：2001-04-03
申请号：US09187006
申请日：1998-11-06
申请人： Siegfried Schiller , Klaus Goedicke , Fred Fietzke , Olaf Zywitzki , Mats Sjöstrand , Björn Ljungberg , Tomas Hilding , Viveka Alfredsson
发明人： Siegfried Schiller , Klaus Goedicke , Fred Fietzke , Olaf Zywitzki , Mats Sjöstrand , Björn Ljungberg , Tomas Hilding , Viveka Alfredsson
IPC分类号： B32B702
CPC分类号： C23C14/081 , C23C14/352 , Y10T407/27 , Y10T428/24975 , Y10T428/25 , Y10T428/252 , Y10T428/265
摘要： The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of a refractory compound of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grain size of less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C., preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu&kgr;&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [(440)]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.
摘要翻译：本发明描述了一种用于金属加工的涂层切割工具。该涂层由一层或多层难熔化合物形成，其中至少一层细粒结晶的γ相氧化铝Al 2 O 3具有小于0.1μm的粒度。在二氧化硅脉冲DMS技术（双重磁控管溅射）中，在450℃至700℃，优选550℃至650℃的范围内的衬底温度下沉积Al 2 O 3层，具体取决于待涂层的工具体。通过X射线衍射鉴定γ相氧化铝。当使用Cukappaalpha辐射时，在2θ角45.8°和66.8°处发生的（400）和（440）平面的反射识别γ相Al 2 O 3。氧化铝层在[（440）]方向上也非常强烈地纹理化。 Al2O3层实际上没有裂纹和卤素杂质。此外，Al2O3层使刀具的切削刃具有非常光滑的表面光洁度。

3. 发明授权

US6083356A Method and device for pre-treatment of substrates 失效
标题翻译：用于预处理底物的方法和装置
公开(公告)号：US6083356A
公开(公告)日：2000-07-04
申请号：US91099
申请日：1998-09-14
申请人： Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
发明人： Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
IPC分类号： C23C14/02 , H01J37/32 , B01J19/08
CPC分类号： H01J37/32018 , C23C14/022 , H01J37/34 , H01J2237/3322
摘要： Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.
摘要翻译： PCT No.PCT / EP96 / 05032 Sec。 371日期：1998年9月14日 102（e）1998年9月14日PCT PCT 1996年11月15日PCT公布。公开号WO97 / 22988 PCT 日期1997年6月26日用于在真空中通过辉光放电在真空中预处理衬底表面以用于在真空中进行随后的涂覆过程的工艺和设备。该方法包括保持待预处理的基板和反电极之间的低压辉光放电，其中反电极由真空涂覆工艺中要沉积的涂层的至少一部分组成。该方法还包括周期性地交替使衬底的极性作为阴极或作为低压辉光放电的阳极，以及分别控制两极性的脉冲长度和放电电压中的至少一个。极性的交替频率设定在1Hz〜1000kHz的范围内。该装置包括可抽空的真空室，定位成保持待预处理的基板的基板保持器，至少一个对电极和耦合到待预处理的基板的交流电压发生器，电极。基板和对电极以无电势的方式安装。

4. 发明授权

US5846608A Process for ion-supported vacuum coating 失效
标题翻译：离子支持真空镀膜工艺
公开(公告)号：US5846608A
公开(公告)日：1998-12-08
申请号：US722024
申请日：1996-10-11
申请人： Manfred Neumann , Klaus Goedicke , Siegfried Schiller , Jonathan Reschke , Henry Morgner , Falk Milde , Fred Fietzke
发明人： Manfred Neumann , Klaus Goedicke , Siegfried Schiller , Jonathan Reschke , Henry Morgner , Falk Milde , Fred Fietzke
IPC分类号： H05H1/32 , C23C14/32 , C23C14/56 , H01J37/32 , H05H1/46 , C23C14/08
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/562 , H01J37/32706
摘要： A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.
摘要翻译： PCT No.PCT / DE95 / 00476 Sec。 371日期：1996年10月11日 102（e）日期1996年10月11日PCT提交1995年4月7日PCT公布。公开号WO95 / 28508 日期：1995年10月26日一种用于离子支持真空涂层的装置。该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面，导电和电绝缘基板的高速涂布。基底主要是带状，特别是宽度超过一米的塑料片。根据本发明，在本来已知的用于真空涂覆的装置中，将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底，直接设置在其后面的电极，例如，冷却辊相对于等离子体或几乎处于等离子体电位的电极。脉冲的形式，电压和持续时间适用于涂层任务和材料。该方法特别用于沉积磨损保护，防腐蚀和阻隔涂层。用户是包装行业等。

5. 发明申请

US20050196548A1 Component protected against corrosion and method for the production thereof and device for carrying out the method 审中-公开
标题翻译：防腐蚀部件和其制造方法以及执行该方法的装置
公开(公告)号：US20050196548A1
公开(公告)日：2005-09-08
申请号：US11064964
申请日：2005-02-25
申请人： Klaus Goedicke , Fred Fietzke , Steffen Straach , Volker Kirchhoff , Klaus-Dieter Hofmann , Frank Hollstein
发明人： Klaus Goedicke , Fred Fietzke , Steffen Straach , Volker Kirchhoff , Klaus-Dieter Hofmann , Frank Hollstein
IPC分类号： F16B35/00 , C23C14/14 , C23C14/16 , C23C14/22 , C23C14/24 , C23C14/32 , C23C14/50 , C23C16/00 , C23C28/00 , H01L21/302 , H05H1/24
CPC分类号： C23C14/16 , C23C14/32 , C23C14/505 , C23C28/321 , C23C28/322 , C23C28/345
摘要： Component having corrosion protection and including a base body made of one of a steel material and a light metal material. A corrosion-inhibiting surface layer that is a dense, fine-grained, largely pore-free structure formed by plasma-based vapor deposition. The surface layer having an average thickness of between 1 μm and 50 μm and being at least one layer of at least one of aluminum, an aluminum alloy, and an aluminum compound. This Abstract is not intended to define the invention disclosed in the specification, nor intended to limit the scope of the invention in any way.
摘要翻译：具有腐蚀保护的部件，包括由钢材和轻金属材料之一制成的基体。由等离子体气相沉积形成的致密，细粒度，大部分无孔结构的腐蚀抑制表面层。所述表面层的平均厚度在1μm和50μm之间，并且是铝，铝合金和铝化合物中的至少一个的至少一个层。本摘要不旨在限定说明书中公开的发明，也不旨在以任何方式限制本发明的范围。

6. 发明授权

US06315877B1 Device for applying layers of hard material by dusting 有权
标题翻译：用于通过除尘施加硬质材料层的装置
公开(公告)号：US06315877B1
公开(公告)日：2001-11-13
申请号：US09485713
申请日：2000-03-01
申请人： Klaus Goedicke , Fred Fietzke
发明人： Klaus Goedicke , Fred Fietzke
IPC分类号： C23C1434
CPC分类号： C23C14/352 , C23C14/505 , C23C14/541
摘要： A device for the sputter application of hard material coatings, including an exhaustible vacuum chamber, at least one sputtering source for depositing a coating material, a plurality of fixtures for supporting a plurality parts to be coated, the fixtures being mounted on planet gears which are movable via a planetary drive, a centrally disposed heating device, a reactive gas inlet, and a plurality of movable screens for covering the at least one sputtering source, the screens being arranged to surround the fixtures, wherein the heating device, the screens, and the planetary drive comprise an assembly which is removable from the vacuum chamber.
摘要翻译：用于溅射施加硬质材料涂层的装置，包括可抽真空的真空室，至少一个用于沉积涂层材料的溅射源，用于支撑待涂覆的多个部件的多个固定装置，固定装置安装在行星齿轮上可通过行星驱动器，中央布置的加热装置，反应气体入口和用于覆盖至少一个溅射源的多个可移动屏幕移动，所述屏幕被布置成围绕固定装置，其中加热装置，屏幕和行星驱动器包括可从真空室移除的组件。

7. 发明授权

US5693417A Vacuum-coated compound body and process for its production 失效
标题翻译：真空镀膜复合体及其生产工艺
公开(公告)号：US5693417A
公开(公告)日：1997-12-02
申请号：US445523
申请日：1995-05-22
申请人： Klaus Goedicke , Gunter Hotzsch , Fred Fietzke , Olaf Zywitzki , Siegfried Schiller , Jonathan Reschke , Wolfgang Hempel
发明人： Klaus Goedicke , Gunter Hotzsch , Fred Fietzke , Olaf Zywitzki , Siegfried Schiller , Jonathan Reschke , Wolfgang Hempel
IPC分类号： C23C14/00 , C23C14/08 , C23C8/00
CPC分类号： C23C14/081 , C23C14/0036 , Y10T428/24975 , Y10T428/265
摘要： Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.
摘要翻译：真空涂层复合体及其生产工艺。当以已知的方式涂覆时，这种复合体具有金属或合金的载体，即热，机械和化学不稳定的层，其表面显示出裂纹并且是部分多孔的。通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有外层的材料为Al 2 O 3，最多在700℃下施加到金属或合金载体上，该层为完全结晶并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1Gpa的压缩应力和至少20Gpa的硬度，其中Al 2 O 3层通过反应磁控管沉积溅射，其中磁控管是脉冲供电的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，复合体用于切割处理，特别是作为钻头，铣刀，铰刀，拉刀或锯片。

8. 发明授权

US06620299B1 Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof 失效
标题翻译：用于通过双极脉冲磁控溅射法涂覆基板的方法和装置及其用途
公开(公告)号：US06620299B1
公开(公告)日：2003-09-16
申请号：US09868636
申请日：2001-06-27
申请人： Fred Fietzke , Klaus Goedicke , Siegfried Schiller
发明人： Fred Fietzke , Klaus Goedicke , Siegfried Schiller
IPC分类号： C23C1434
CPC分类号： C23C14/352 , H01J37/3405
摘要： Process and device for coating substrates utilizing bipolar pulsed magnetron sputtering in the frequency range between 10 and 100 kHz, wherein the device includes at least three magnetron sources. Each of the at least three magnetron sources includes a target. At least two of the targets are connected to a potential-free bipolar power supply device. The at least three targets are arranged relative to the substrates in such a way that the substrates are located at least partially inside a discharge current during a coating of the substrates. A switching device is adapted to connect the targets to the bipolar power supply device. A technological predetermined program is used for controlling the switching device. The switching device connects at least two of the targets at a time to the bipolar power supply device according to the technologically predetermined program.
摘要翻译：在10至100kHz的频率范围内使用双极性脉冲磁控溅射涂覆基底的方法和装置，其中该装置包括至少三个磁控管源。至少三个磁控管源中的每一个包括目标。至少两个目标连接到无电压双极电源装置。至少三个目标相对于基板被布置成使得在基板的涂覆期间基板至少部分地位于放电电流的内部。开关装置适于将目标连接到双极电源装置。技术预定程序用于控制切换装置。开关装置根据技术上预定的程序一次将至少两个目标物连接到双极电源装置。

9. 发明授权

US06554971B2 PVD coated cutting tool and method of its production 有权
公开(公告)号：US06554971B2
公开(公告)日：2003-04-29
申请号：US09987123
申请日：2001-11-13
申请人： Olaf Zywitzki , Klaus Goedicke , Fred Fietzke , Siegfried Schiller , Torbjörn Selinder , Mats Ahlgren
发明人： Olaf Zywitzki , Klaus Goedicke , Fred Fietzke , Siegfried Schiller , Torbjörn Selinder , Mats Ahlgren
IPC分类号： C23C1434
CPC分类号： C04B41/009 , C04B41/5046 , C04B41/52 , C04B41/87 , C04B41/89 , C23C14/08 , C23C14/081 , C23C28/044 , C23C28/42 , C23C30/005 , C04B41/4529 , C04B41/5061 , C04B41/5068 , C04B35/00 , C04B35/583
摘要： The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me)xAl2O3+x where Me is a second metal and 0

10. 发明授权

US6068890A Method for gloss coating articles 失效
标题翻译：光泽涂层制品的方法
公开(公告)号：US6068890A
公开(公告)日：2000-05-30
申请号：US903746
申请日：1997-07-31
申请人： Fritz Kaumle , Reinhold Separautzki , Klaus Goedicke , Fred Fietzke
发明人： Fritz Kaumle , Reinhold Separautzki , Klaus Goedicke , Fred Fietzke
IPC分类号： B60B3/00 , B05D5/06 , B05D7/14 , B32B15/08 , C23C14/02 , C23C14/34 , C23C14/35 , C23C28/00
CPC分类号： C23C28/32 , B05D5/068 , C23C28/00 , C23C28/345 , Y10S428/923 , Y10S428/925 , Y10S428/926 , Y10S428/936 , Y10S428/938 , Y10T428/12007 , Y10T428/12028 , Y10T428/12986 , Y10T428/26
摘要： The invention relates to a method for gloss coating articles or a portion of an article's surface and articles produced from this method. A corrosion-inhibiting polishing base coat is applied in a known fashion, after which a high-gloss layer produced by atomization, preferably magnetron atomization, is applied. Then, a transparent, wear-resistant top coat layer is applied in a known fashion. The articles can also be pretreated, if desired, and given a protective or other layers. By using this method, parts for vehicles, especially vehicle wheels, can be produced in a great variety of colors and with improved qualities.
摘要翻译：本发明涉及一种用于光泽涂布制品或一部分制品表面的方法以及由该方法生产的制品。以已知的方式施加防腐蚀抛光底涂层，之后施加通过雾化产生的高光泽层，优选磁控管雾化。然后，以已知的方式施加透明耐磨面漆层。如果需要，也可以对制品进行预处理，并给予保护层或其它层。通过使用这种方法，可以以各种各样的颜色和改进的品质生产用于车辆，特别是车轮的部件。

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