专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5297910A Transportation-transfer device for an object of treatment 失效
标题翻译：用于治疗对象的运输转运装置
公开(公告)号：US5297910A
公开(公告)日：1994-03-29
申请号：US834819
申请日：1992-02-13
申请人： Kazutoshi Yoshioka , Kenji Yokomizo , Masami Akimoto , Yuji Yoshimoto
发明人： Kazutoshi Yoshioka , Kenji Yokomizo , Masami Akimoto , Yuji Yoshimoto
IPC分类号： H01L21/00 , H01L21/673 , H01L21/677 , B65H5/08
CPC分类号： H01L21/67173 , H01L21/67742 , H01L21/67754 , Y10S414/135 , Y10S414/137
摘要： A device for transporting and transferring objects of treatment arranged in a down flow to a plurality of treatment sections for treating the objects comprises a transportation section movable between the treatment sections, a first drive mechanism for moving the transportation section, a first arm movably attached to the transportation section and used for those objects of treatment which are adjusted to a predetermined temperature in the treatment sections, a second arm movably attached to the transportation section and used for the other objects of treatment than the ones adjusted in temperature, and a second drive mechanism for separately moving the first and second arms.
摘要翻译：一种用于输送和传送处理物体的装置，用于将处理物体输送到多个用于处理物体的处理部分的处理部分包括可在处理部分之间移动的传送部分，用于移动传送部分的第一驱动机构，可移动地附接到所述输送部用于在所述处理部中被调整为规定温度的所述处理对象物，所述第二臂可移动地安装于所述输送部并用于所述其他治疗对象，而不是温度调节对象的第二驱动用于分别移动第一和第二臂的机构。

2. 发明授权

US5460478A Method for processing wafer-shaped substrates 失效
标题翻译：晶圆基板的处理方法
公开(公告)号：US5460478A
公开(公告)日：1995-10-24
申请号：US403138
申请日：1995-03-13
申请人： Masami Akimoto , Kazutoshi Yoshioka , Naruaki Iida
发明人： Masami Akimoto , Kazutoshi Yoshioka , Naruaki Iida
IPC分类号： B65G1/00 , B65G1/07 , B65G49/07 , H01L21/677 , H01L21/683
CPC分类号： H01L21/67781 , H01L21/6838 , Y10S414/137 , Y10S414/141
摘要： An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provided between the carrier station and the processing section. The robot comprises a plate-shaped arm for transferring wafers between the carriers and the transfer tables, and two horseshoe-shaped forks for transferring wafers between the processing units and transfer tables. The robot is movable along a transfer path so as to make the arm and forks face the carriers, processing units and transfer tables.
摘要翻译：一种用于在晶片上涂覆和显影抗蚀剂的设备包括：载体站，设置有用于接收晶片和转印台的多个载体，具有多个处理单元的处理部分和设置在载体站和处理之间的传送机器人部分。机器人包括用于在载体和转印台之间传送晶片的板状臂，以及用于在处理单元和转印台之间转印晶片的两个马蹄形叉。机器人可以沿传送路径移动，以使臂和叉面向载体，处理单元和传送台。

3. 发明授权

US06268013B1 Coating a resist film, with pretesting for particle contamination 失效
标题翻译：涂覆抗蚀剂膜，进行预测试以进行颗粒污染
公开(公告)号：US06268013B1
公开(公告)日：2001-07-31
申请号：US09299573
申请日：1999-04-27
申请人： Masami Akimoto , Kazutoshi Yoshioka , Kazuo Sakamoto , Norio Semba
发明人： Masami Akimoto , Kazutoshi Yoshioka , Kazuo Sakamoto , Norio Semba
IPC分类号： B05D312
CPC分类号： B05C11/08
摘要： Disclosed herein is a method and an apparatus for applying a coating liquid to an object from a liquid-applying member at a first prescribed position, thereby forming a film on the object. Before the coating liquid at the first position, the coating liquid is applied at a second predetermined position. An impurity-detecting device detects the impurities contained in the coating liquid applied at the second position. A particle-counting device is provided, and a switching device is provided on a liquid-supplying pipe extending from a source of the coating liquid to the liquid-applying member. The switching device switches the supply of the coating liquid between the liquid-applying member and the impurity-detecting device. The impurities in the coating liquid can thereby monitored.
摘要翻译：本发明公开了一种在第一规定位置从液体施加部件向物体施加涂布液的方法和装置，从而在物体上形成膜。在第一位置的涂布液体之前，将涂布液施加在第二预定位置。杂质检测装置检测在第二位置施加的涂布液中所含的杂质。提供了粒子计数装置，并且在从涂布液的源向液体施加部件延伸的液体供给管上设置有开关装置。开关装置切换液体施加构件和杂质检测装置之间的涂布液的供给。从而可以监测涂布液中的杂质。

4. 发明授权

US5938847A Method and apparatus for coating a film on an object being processed 失效
标题翻译：用于在被加工物上涂覆薄膜的方法和装置
公开(公告)号：US5938847A
公开(公告)日：1999-08-17
申请号：US915737
申请日：1997-08-21
申请人： Masami Akimoto , Kazutoshi Yoshioka , Kazuo Sakamoto , Norio Semba
发明人： Masami Akimoto , Kazutoshi Yoshioka , Kazuo Sakamoto , Norio Semba
IPC分类号： B05C11/08 , G03G15/08 , G01V8/00
CPC分类号： B05C11/08
摘要： Disclosed herein is a method and an apparatus for applying a coating liquid to an object from a liquid-applying member at a first prescribed position, thereby forming a film on the object. Before the coating liquid at the first position, the coating liquid is applied at a second predetermined position. An impurity-detecting device detects the impurities contained in the coating liquid applied at the second position. A particle-counting device is provided, and a switching device is provided on a liquid-supplying pipe extending from a source of the coating liquid to the liquid-applying member. The switching device switches the supply of the coating liquid between the liquid-applying member and the impurity-detecting device. The impurities in the coating liquid can thereby monitored.
摘要翻译：本发明公开了一种在第一规定位置从液体施加部件向物体施加涂布液的方法和装置，从而在物体上形成膜。在第一位置的涂布液体之前，将涂布液施加在第二预定位置。杂质检测装置检测在第二位置施加的涂布液中所含的杂质。提供了粒子计数装置，并且在从涂布液的源向液体施加部件延伸的液体供给管上设置有开关装置。开关装置切换液体施加构件和杂质检测装置之间的涂布液的供给。从而可以监测涂布液中的杂质。

5. 发明授权

US5364222A Apparatus for processing wafer-shaped substrates 失效
标题翻译：用于处理晶片状基板的装置
公开(公告)号：US5364222A
公开(公告)日：1994-11-15
申请号：US14161
申请日：1993-02-05
申请人： Masami Akimoto , Kazutoshi Yoshioka , Naruaki Iida
发明人： Masami Akimoto , Kazutoshi Yoshioka , Naruaki Iida
IPC分类号： B65G1/00 , B65G1/07 , B65G49/07 , H01L21/677 , H01L21/683
CPC分类号： H01L21/67781 , H01L21/6838 , Y10S414/137 , Y10S414/141
摘要： An apparatus for coating and developing a resist on a wafer comprises a carrier station provided with a plurality of carriers for receiving wafers and transfer tables, a processing section having a plurality of processing units, and a transfer robot provided between the carrier station and the processing section. The robot comprises a plate-shaped arm for transferring wafers between the carriers and the transfer tables, and two horseshoe-shaped forks for transferring wafers between the processing units and transfer tables. The robot is movable along a transfer path so as to make the arm and forks face the carriers, processing units and transfer tables.
摘要翻译：一种用于在晶片上涂覆和显影抗蚀剂的设备包括：载体站，设置有用于接收晶片和转印台的多个载体，具有多个处理单元的处理部分和设置在载体站和处理之间的传送机器人部分。机器人包括用于在载体和转印台之间传送晶片的板状臂，以及用于在处理单元和转印台之间转印晶片的两个马蹄形叉。机器人可以沿传送路径移动，以使臂和叉面向载体，处理单元和传送台。

6. 发明授权

US07838801B2 Heating apparatus, heating method, coating apparatus, and storage medium 失效
标题翻译：加热装置，加热方法，涂布装置和存储介质
公开(公告)号：US07838801B2
公开(公告)日：2010-11-23
申请号：US11707061
申请日：2007-02-16
申请人： Osamu Hirakawa , Masami Akimoto , Shinichi Hayashi
发明人： Osamu Hirakawa , Masami Akimoto , Shinichi Hayashi
IPC分类号： H01L21/68 , B65G15/10 , B65H5/02 , F27B5/06 , F27B5/12
CPC分类号： H01L21/67109 , H01L21/67748 , Y10S198/952
摘要： A heating apparatus cooling a substrate heated by a hot plate at a cooling position adjacent to the hot plate, capable of achieving a smaller height and reducing an operation time in the apparatus, in which contamination of the substrate by particles or the like is less likely, and the like, are provided. The heating apparatus includes a hot plate for heating a wafer representing a substrate from below, in a heating chamber having a wafer load/unload port. In addition, a wire for transferring the wafer between a cooling position of the substrate adjacent to the load/unload port of the heating chamber (position above a cooling plate) and a position above the hot plate is provided and extends. The wafer is mounted on a gap forming member provided on the wire, and thereafter loaded into the heating chamber.
摘要翻译：一种加热装置，用于在与热板相邻的冷却位置处冷却由热板加热的基板，能够实现较小的高度，并且减少了由于颗粒等引起的基板污染的装置中的操作时间。，等等。加热装置包括用于在具有晶片装载/卸载端口的加热室中从下方加热表示基板的晶片的热板。此外，提供并延伸用于将晶片在与加热室的加载/卸载端口相邻的冷却位置（位于冷却板的上方）之间传送晶片的导线和热板上方的位置。将晶片安装在设置在线材上的间隙形成部件上，然后装入加热室。

7. 发明授权

US07245348B2 Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning 有权
标题翻译：涂层和显影系统以及具有防反射膜和辅助块的检测和清洁的涂层和显影方法
公开(公告)号：US07245348B2
公开(公告)日：2007-07-17
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/52
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.
摘要翻译：涂覆显影系统包括辅助块，抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗蚀剂膜下面的抗反射膜，以及抗反射膜，覆盖抗蚀剂膜空间。涂覆和显影系统可以应对形成防反射膜的情况或不形成抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块S2中层叠。在形成防反射膜的情况下选择性地使用TCT层，COT层和BCT层以及未形成任何抗反射膜的情况。涂层和显影系统由携带程序控制。

8. 发明申请

US20070056514A1 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US20070056514A1
公开(公告)日：2007-03-15
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： C23C16/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

9. 发明申请

US20070031145A1 Developing treatment apparatus and developing treatment method 有权
标题翻译：开发治疗仪器和开发治疗方法
公开(公告)号：US20070031145A1
公开(公告)日：2007-02-08
申请号：US11495732
申请日：2006-07-31
申请人： Takahiro Kitano , Masami Akimoto , Shuuichi Nishikido , Dai Kumagai
发明人： Takahiro Kitano , Masami Akimoto , Shuuichi Nishikido , Dai Kumagai
IPC分类号： G03D5/00
CPC分类号： G03D5/04 , G03F7/30 , G03F7/3021 , H01L21/6715 , H01L21/67748 , Y10S134/902
摘要： In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate. According to the present invention, since the substrate is carried with its outside surface being grasped, spread of contamination can be prevented to restrain generation of particles in the treatment container.
摘要翻译：在本发明中，在处理容器中并排设置有将基板从处理容器的外部转移到基板转移单元和进行基板的显影的显影处理单元，并且提供了一种承载机构，其承载基板，同时从基板转印单元和显影处理单元之间的两侧抓住基板的外表面。用于将显影液供给到基板上的显影液供给喷嘴和用于将气体吹送到基板的气体吹出喷嘴设置在基板转印单元和显影处理单元之间以及载置基板的滑架路径上方，并且在显影处理单元中设置清洁液供给喷嘴，用于将清洗液供给到基板上。根据本发明，由于基板的外表面被抓住，因此可以防止污染物的扩散，从而抑制处理容器中的颗粒的产生。

10. 发明授权

US07087118B2 Coating film forming apparatus and coating unit 失效
标题翻译：涂膜成膜装置和涂装单元
公开(公告)号：US07087118B2
公开(公告)日：2006-08-08
申请号：US11080756
申请日：2005-03-16
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C11/10 , B05B12/12
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
摘要翻译：一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂各单位。在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式