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1. 发明授权

US07087118B2 Coating film forming apparatus and coating unit 失效
标题翻译：涂膜成膜装置和涂装单元
公开(公告)号：US07087118B2
公开(公告)日：2006-08-08
申请号：US11080756
申请日：2005-03-16
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C11/10 , B05B12/12
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
摘要翻译：一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂各单位。在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

2. 发明授权

US06695922B2 Film forming unit 失效
标题翻译：成膜单元
公开(公告)号：US06695922B2
公开(公告)日：2004-02-24
申请号：US09734571
申请日：2000-12-13
申请人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
发明人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
IPC分类号： B05C1110
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/16 , G03F7/162 , H01L21/67109
摘要： The present invention is a film forming unit for applying a coating solution to a substrate to form a coating film on the substrate, which has a heating and/or cooling member brought into direct or indirect contact with said substrate for changing a temperature of at least a peripheral portion of the substrate. By changing the temperature of a perimeter portion of the substrate by means of it, a temperature of the coating solution applied on the substrate can be changed. Consequently, surface tension of the coating solution decreases or increases, and swelling of the coating solution occurring at the substrate perimeter portion and reduction in film thickness can be prevented. As a result, a coating film with a predetermined film thickness is formed also on the perimeter portion of the substrate, thus making it possible to enhance yield.
摘要翻译：本发明是一种成膜单元，其用于将涂布溶液涂布在基材上，以在基材上形成涂膜，该涂膜具有与所述基材直接或间接接触的加热和/或冷却部件，用于至少改变温度基板的周边部分。通过借助它改变衬底的周边部分的温度，可以改变施加在衬底上的涂布溶液的温度。因此，涂层溶液的表面张力降低或增加，并且可以防止在基材周边部分发生的涂布溶液的溶胀和膜厚度的降低。结果，也在基板的周边部分上形成具有预定膜厚的涂膜，从而可以提高成品率。

3. 发明授权

US06605153B2 Coating film forming apparatus 失效
标题翻译：涂膜成膜装置
公开(公告)号：US06605153B2
公开(公告)日：2003-08-12
申请号：US09735657
申请日：2000-12-14
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C1110
CPC分类号： H01L21/6715 , B05B12/20 , B05B13/041 , B05C5/0212 , B05C5/0216 , B05C5/0291 , B05C11/1039
摘要： An apparatus includes a holding portion for holding a substrate, a nozzle, provided to face the substrate held by the holding portion, for discharging a solution to the substrate, a driver for moving the nozzle along a surface of the substrate relatively with respect to the substrate while the solution is being discharged to the surface of the substrate from the nozzle, a mask unit covering a portion other than a film formation area of the substrate and including a mask member for catching the solution from the nozzle, and a cleaner provided in the mask unit. The coating solution can be supplied to the surface of the substrate in a way similar to a picture drawn with a single stroke of a brush. A cleaning unit for cleaning the mask member does not need to be provided separately, leading to the facilitation of cleaning and a reduction in space.
摘要翻译：一种装置，包括用于保持基板的保持部分，设置成面对由保持部分保持的基板的喷嘴，用于将溶液排出到基板;驱动器，用于相对于所述基板沿着基板的表面移动喷嘴基板，同时溶液从喷嘴排出到基板的表面;掩模单元，覆盖除了基板的成膜区域以外的部分，并且包括用于从喷嘴捕获溶液的掩模构件，以及设置在该基板中的清洁器面具单元。涂布溶液可以以类似于用笔刷的单次笔画绘制的图像的方式供应到基底的表面。用于清洁面罩构件的清洁单元不需要单独提供，从而促进清洁和减少空间。

4. 发明授权

US06537373B1 Method of forming film and apparatus thereof 失效
公开(公告)号：US06537373B1
公开(公告)日：2003-03-25
申请号：US09712179
申请日：2000-11-15
申请人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
发明人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
IPC分类号： B05C1102
CPC分类号： H01L21/6715 , B05D1/005 , G03F7/162
摘要： A method of forming a film of a coating solution on a substrate includes steps of moving a coating solution discharge member relative to a substrate while a coating solution is being discharged from the coating solution discharge member to the surface of the substrate, and changing a discharge direction of the coating solution to an outer peripheral portion of the substrate to make the amount of application to the outer peripheral portion smaller than that to other portions. This can reduce the amount of application to the outer peripheral portion of the substrate, thereby making it possible to restrain protuberance of the coating solution at the outer peripheral portion of the substrate caused by surface tension. Consequently, a coating film which is uniform also at the outer peripheral portion on the substrate is formed.

5. 发明申请

US20050100681A1 Substrate coating unit and substrate coating method 审中-公开
标题翻译：基材涂布单元和基材涂布方法
公开(公告)号：US20050100681A1
公开(公告)日：2005-05-12
申请号：US11013515
申请日：2004-12-17
申请人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
发明人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
IPC分类号： H01L21/027 , H01L21/00 , C23C28/00 , B05C5/00
CPC分类号： H01L21/6715
摘要： The present invention is a coating unit for applying a coating solution to a substrate which includes: a discharge nozzle for reciprocating in a predetermined direction above the substrate and discharging the coating solution to the substrate; a holder for holding the substrate and horizontally movable in one direction perpendicular to the predetermined direction; and a cover for covering an upper face of the substrate when the substrate is moved in the one direction to be more forward than the discharge nozzle as viewed from a plane, wherein a lower face of the cover is inclined such as to be higher on the discharge nozzle side. According to the present invention, the cover covering the upper face of the substrate restrains a solvent from evaporating from the coating solution applied on the substrate to secure flatness of a coating film.
摘要翻译：本发明是一种涂布单元，用于将涂布溶液涂布在基材上，该涂布单元包括：排出喷嘴，用于在基板上方沿预定方向往复运动并将涂布溶液排放到基板上; 用于保持基板并在垂直于预定方向的一个方向上可水平移动的保持器; 以及当从平面观察时，当基板沿着一个方向移动到比排出喷嘴更向前时，覆盖基板的上表面的盖，其中盖的下表面倾斜以在排出口侧。根据本发明，覆盖基板的上表面的盖子阻止溶剂从施加在基板上的涂布溶液蒸发，以确保涂膜的平坦度。

6. 发明授权

US06599366B1 Substrate processing unit and processing method 失效
标题翻译：基板加工单元及加工方法
公开(公告)号：US06599366B1
公开(公告)日：2003-07-29
申请号：US09711968
申请日：2000-11-15
申请人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
发明人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
IPC分类号： B05C1106
CPC分类号： H01L21/6715
摘要： The present invention includes a current plate which is arranged above a substrate in a chamber. A pressure inside the chamber is reduced by exhaust means and drying processing is performed on, for example, a coating solution on the substrate. On a peripheral portion of an underneath surface of the current plate, formed is a ring-shaped protrusion corresponding to a peripheral portion of the substrate. A protruding portion of a coating solution at the peripheral portion of the substrate is made flat by air current generated when the pressure is reduced, and consequently a coating film with a uniform film thickness as a whole is formed on the substrate.
摘要翻译：本发明包括一个布置在腔室中的衬底上方的电流板。通过排气装置降低室内的压力，并且例如对基板上的涂布溶液进行干燥处理。在当前板的下表面的周边部分上形成有与基板的周边部分对应的环形突起。通过在压力降低时产生的气流使基板周边部分的涂布液的突出部分变得平坦，因此在基板上形成整体上具有均匀膜厚的涂膜。

7. 发明授权

US06371667B1 Film forming method and film forming apparatus 有权
标题翻译：成膜方法和成膜装置
公开(公告)号：US06371667B1
公开(公告)日：2002-04-16
申请号：US09545003
申请日：2000-04-06
申请人： Takahiro Kitano , Masami Akimoto , Tomohide Minami , Masateru Morikawa
发明人： Takahiro Kitano , Masami Akimoto , Tomohide Minami , Masateru Morikawa
IPC分类号： G03D500
CPC分类号： G03D5/00
摘要： A resist solution discharge nozzle for discharging a resist solution to a wafer is moved at a constant speed along a radial direction of the wafer while the wafer is being rotated. During this movement, the amount of the resist solution to be discharged from the resist solution discharge nozzle is gradually decreased. The resist solution discharged to the wafer is applied to the front surface of the wafer drawing a spiral track, and coating amounts of the resist solution per unit area with respect to a central portion and a peripheral portion of the wafer can be made equal. Accordingly, waste of a processing solution supplied onto a substrate can be eliminated, and a uniform processing solution film can be formed on the substrate.
摘要翻译：用于将抗蚀剂溶液放电到晶片的抗蚀剂溶液排出喷嘴在晶片旋转的同时沿着晶片的径向以恒定的速度移动。在该运动中，从抗蚀剂溶液排出喷嘴排出的抗蚀剂溶液的量逐渐降低。将排出到晶片的抗蚀剂溶液施加到晶片的前表面，从而绘制螺旋轨道，并且可以使相对于晶片的中心部分和周边部分的每单位面积的抗蚀剂溶液的涂布量相等。因此，能够消除供给到基板上的处理液的浪费，能够在基板上形成均匀的处理液膜。

8. 发明授权

US06933015B2 Method of forming film 失效
标题翻译：成膜方法
公开(公告)号：US06933015B2
公开(公告)日：2005-08-23
申请号：US10361689
申请日：2003-02-11
申请人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
发明人： Takahiro Kitano , Shinji Kobayashi , Yukihiko Esaki , Masateru Morikawa
IPC分类号： B05B15/04 , B05C5/00 , B05C13/02 , B05D1/00 , B05D1/30 , G03F7/16 , H01L21/00 , H01L21/027 , B05D3/00
CPC分类号： H01L21/6715 , B05D1/005 , G03F7/162
摘要： A method of forming a film of a coating solution on a substrate includes steps of moving a coating solution discharge member relative to a substrate while a coating solution is being discharged from the coating solution discharge member to the surface of the substrate, and changing a discharge direction of the coating solution to an outer peripheral portion of the substrate to make the amount of application to the outer peripheral portion smaller than that to other portions. This can reduce the amount of application to the outer peripheral portion of the substrate, thereby making it possible to restrain protuberance of the coating solution at the outer peripheral portion of the substrate caused by surface tension. Consequently, a coating film which is uniform also at the outer peripheral portion on the substrate is formed.
摘要翻译：在基材上形成涂布液的膜的方法包括以下步骤：在将涂布液从涂布液排出部件排出到基板的表面的同时使涂布液排出部件相对于基板移动，并且改变排出涂布液的方向到基板的外周部分，以使得施加到外周部分的量比其它部分小。这可以减少施加到基板的外周部分的量，从而可以抑制由表面张力引起的基板的外周部分处的涂布液的突起。因此，形成在基板的外周部均匀的涂膜。

9. 发明授权

US06860945B2 Substrate coating unit and substrate coating method 失效
公开(公告)号：US06860945B2
公开(公告)日：2005-03-01
申请号：US10101707
申请日：2002-03-21
申请人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
发明人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
IPC分类号： H01L21/027 , H01L21/00 , B05B15/04 , B05B3/00 , B05C5/00
CPC分类号： H01L21/6715
摘要： The present invention is a coating unit for applying a coating solution to a substrate which includes: a discharge nozzle for reciprocating in a predetermined direction above the substrate and discharging the coating solution to the substrate; a holder for holding the substrate and horizontally movable in one direction perpendicular to the predetermined direction; and a cover for covering an upper face of the substrate when the substrate is moved in the one direction to be more forward than the discharge nozzle as viewed from a plane, wherein a lower face of the cover is inclined such as to be higher on the discharge nozzle side. According to the present invention, the cover covering the upper face of the substrate restrains a solvent from evaporating from the coating solution applied on the substrate to secure flatness of a coating film.

10. 发明授权

US06514344B2 Film forming unit 失效
标题翻译：成膜单元
公开(公告)号：US06514344B2
公开(公告)日：2003-02-04
申请号：US09735459
申请日：2000-12-14
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05B300
CPC分类号： H01L21/6715
摘要： The present invention is a film forming unit for forming a film on a substrate by supplying a coating solution on the substrate from a discharge nozzle, including moving means for moving the discharge nozzle, wherein the moving means comprises a supporting member for supporting the discharge nozzle, a moving member for moving the supporting member, a guide shaft passing through bearing portion which is formed in the supporting member, and an air supply mechanism for supplying air to a space between the bearing portion and the guide shaft. The discharge nozzle discharges the coating solution while moving along the guide shaft. On the substrate the coating solution is applied along the locus of the discharge nozzle movement. Since air is supplied to the space between the bearing portion and the guide shaft, the supporting member can be made to be in the state of floating relative the guide shaft. As a result, even if the discharge nozzle moves at high speed, the discharge of the coating solution is prevented from being disturbed so that the predetermined coating of the coating solution is performed precisely.
摘要翻译：本发明是一种用于在基板上形成膜的成膜单元，该装置包括：用于移动排放喷嘴的移动装置，该排出喷嘴由排放喷嘴提供在基板上，其中移动装置包括用于支撑排出喷嘴，用于移动支撑构件的移动构件，穿过形成在支撑构件中的轴承部分的引导轴和用于将空气供给到轴承部分和引导轴之间的空间的空气供应机构。排出喷嘴在沿着导向轴移动的同时排出涂布溶液。在基材上，涂布溶液沿排出喷嘴运动的轨迹施加。由于空气被供给到轴承部和引导轴之间的空间，所以支撑部件能够相对于引导轴处于浮动状态。结果，即使排出喷嘴高速移动，也可以防止涂布液的排出受到干扰，从而精确地进行涂布液的预定涂布。

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