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1. 发明授权

US08985880B2 Coating and developing apparatus and method 有权
标题翻译：涂装与显影装置及方法
公开(公告)号：US08985880B2
公开(公告)日：2015-03-24
申请号：US13177997
申请日：2011-07-07
申请人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida , Hiroshi Tomita , Makoto Hayakawa , Tatsuhei Yoshida
发明人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida , Hiroshi Tomita , Makoto Hayakawa , Tatsuhei Yoshida
IPC分类号： G03D5/00 , G03B27/32 , H01L21/67
CPC分类号： G03F7/16 , H01L21/6715
摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
摘要翻译：在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。该装置具有至少两个适于异常的操作模式M1和M2。在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

2. 发明授权

US08817225B2 Coating and developing apparatus and method, and storage medium 有权
标题翻译：涂装和显影装置和方法以及存储介质
公开(公告)号：US08817225B2
公开(公告)日：2014-08-26
申请号：US13182572
申请日：2011-07-14
申请人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
发明人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
IPC分类号： G03B27/32 , G03D5/00 , B05C11/02
CPC分类号： H01L21/67178 , G03F7/16 , G03F7/162 , G03F7/30 , G03F7/3021 , H01L21/67184 , H01L21/67225 , H01L21/6723
摘要： In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.
摘要翻译：在一个实施例中，涂覆和显影装置设置有转移单元，其设置在一堆早期处理单元块和一堆后期处理单元块之间，用于在横向相邻单元块的传送机构之间传送基板以及用于在转印单元之间输送基板的可垂直移动的辅助转印机构。一堆第一显影单元块堆叠在早期处理单元块的堆叠上，并且第二显影单元块的堆叠堆叠在后级处理单元块的堆叠上。

3. 发明申请

US20120063765A1 COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM 有权
标题翻译：涂料和开发设备，涂料和开发方法和非交联不稳定介质
公开(公告)号：US20120063765A1
公开(公告)日：2012-03-15
申请号：US13225985
申请日：2011-09-06
申请人： Shinichi HAYASHI , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi HAYASHI , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , G03F7/162 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.
摘要翻译：一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块单位块组。液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于发展。第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

4. 发明申请

US20120057861A1 COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备和方法以及储存介质
公开(公告)号：US20120057861A1
公开(公告)日：2012-03-08
申请号：US13219955
申请日：2011-08-29
申请人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
发明人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
IPC分类号： G03D5/04
CPC分类号： H01L21/6715 , G03F7/16 , G03F7/3021 , H01L21/67178 , H01L21/67184
摘要： In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof.
摘要翻译：在一个实施例中，涂覆和显影装置设置有处理块，其包括设置在承载块侧的液体处理块和设置在界面块侧上的加热处理块。液体处理块包括第一单元块，第二单元块以及覆盖在第一单元块和第二单元块的堆叠之下或下面的一个或多个显影单元块。第一单元块包括设置在其输送通道两侧的防反射膜形成模块和抗蚀剂膜形成模块。第二单元块包括设置在其输送通道两侧的上成膜模块和硬化模块。

5. 发明授权

US07955011B2 Coating and developing apparatus, substrate processing method, and storage medium 有权
标题翻译：涂布显影装置，基板处理方法和存储介质
公开(公告)号：US07955011B2
公开(公告)日：2011-06-07
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间，转印单元，用于在这些转印单元之间转印衬底。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

6. 发明申请

US20110032494A1 APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT 有权
标题翻译：装置和应用与开发方法
公开(公告)号：US20110032494A1
公开(公告)日：2011-02-10
申请号：US12909191
申请日：2010-10-21
申请人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： G03B27/32
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
摘要翻译：层叠用于涂膜成膜的块和显影处理用块。针对载体块侧的每个处理块提供了用于在块中使用的运输单元实现基板输送的输送阶段，以构成货架式输送阶段组。提供垂直运输单元以在输送台组中的输送台之间输送基底。衬底检查单元设置在承载块的上空空间。基板由垂直运输单元直接输送到基板检查单元，或通过输送台组中的输送台输入。基板检查单元可以设置在输送台组中。

7. 发明授权

US07736498B2 Solution treatment apparatus and solution treatment method 有权
标题翻译：溶液处理装置和溶液处理方法
公开(公告)号：US07736498B2
公开(公告)日：2010-06-15
申请号：US12434919
申请日：2009-05-04
申请人： Nobuaki Matsuoka , Tsunenaga Nakashima , Shinichi Hayashi , Akira Oozono
发明人： Nobuaki Matsuoka , Tsunenaga Nakashima , Shinichi Hayashi , Akira Oozono
IPC分类号： H01L21/20
CPC分类号： H01L21/67178 , H01L21/6715 , H01L21/67253
摘要： In the present invention, a plurality of exhaust paths connected to a plurality of cup bodies surrounding substrate holding portions respectively are joined together for common use, and the openings of exhaust rate adjustment sections provided on the exhaust paths are adjusted with reference to data in which combinations of the numbers of rotations of the substrate holding portions are associated with combinations of set exhaust rates of the exhaust paths when solution treatment is performed by rotating the substrate by the substrate holding portion. According to the present invention, the cup body can be exhausted at an intended exhaust rate at all times independently of the state where the substrate in which cup body is subjected to which process.
摘要翻译：在本发明中，将分别连接在基板保持部周围的多个杯体的多个排气通路连接在一起，共同使用，并且参照其中的数据来调整设置在排气路径上的排气速率调节部分的开口当通过基板保持部旋转基板进行固溶处理时，基板保持部的旋转数的组合与排气路径的设定排气速度的组合相关联。根据本发明，杯体可以一直以预定的排气速度排出，而与杯体受到哪个处理的基板的状态无关。

8. 发明授权

US07661894B2 Coating and developing apparatus, and coating and developing method 有权
标题翻译：涂层和显影装置，以及涂层和显影方法
公开(公告)号：US07661894B2
公开(公告)日：2010-02-16
申请号：US11523015
申请日：2006-09-19
申请人： Nobuaki Matsuoka , Mitsuhiro Tanoue , Shinji Okada
发明人： Nobuaki Matsuoka , Mitsuhiro Tanoue , Shinji Okada
IPC分类号： G03D5/00 , G03B27/32 , B05C11/02 , B05C13/02
CPC分类号： H01L21/67178 , H01L21/67184 , H01L21/67201 , H01L21/67745
摘要： A processing block S2 includes unit blocks, a BCT layer B3, COT layer B4 and TCT layer B5, for forming coating films, and further includes DEV layers B1, B2 layered with the unit blocks B3, B4, B5 and used as unit blocks for a developing process. Beside the unit blocks B1 to B5, a group G of transfer sections comprising transfer sections adapted to transfer each wafer W with each main arm A1 to A5 of the unit block B1 to B5 and hydrophobicity rendering units adapted to provide a hydrophobicity rendering process to the wafer W is provided. The wafer W is transferred by a transfer arm D between the transfer sections and the hydrophobicity rendering units. In this case, since it is not necessary to transfer the wafer W to the hydrophobicity rendering unit by using, for example, a main arm A4 of a COT layer B4, the load on the arm A4 can be reduced, thereby enhancing the carrying throughput.
摘要翻译：处理块S2包括用于形成涂膜的单元块，BCT层B3，COT层B4和TCT层B5，并且还包括与单元块B3，B4，B5分层的DEV层B1，B2，并用作单元块一个发展过程。除了单元块B1至B5之外，传送部分组G包括适于将单元块B1至B5的每个主臂A1至A5传送每个晶片W的转移部分和适用于向单元块B1至B5提供疏水性渲染处理的疏水性渲染单元提供晶片W。晶片W在转印部分和疏水性渲染单元之间由转印臂D转印。在这种情况下，由于不需要使用例如COT层B4的主臂A4将晶片W转移到疏水性呈现单元，所以能够降低臂A4上的负荷，从而提高承载量。

9. 发明授权

US07591601B2 Coater/developer, coating/developing method, and storage medium 失效
标题翻译：涂布机/显影剂，涂布/显影方法和存储介质
公开(公告)号：US07591601B2
公开(公告)日：2009-09-22
申请号：US12107496
申请日：2008-04-22
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03B27/32 , G03F7/00
CPC分类号： G03B27/32 , G03F7/162 , G03F7/3021
摘要： A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that the rotational axles thereof are parallel to each other; a conveyance path member engaged with and extended between the rotary bodies so as to move along an orbit, the conveyance path member forming a part of the conveyance path of the substrate placed on the conveyance path member; a first transfer part provided at the upstream end of the conveyance path; a second transfer part provided at the downstream end of the conveyance path; and a heating part provided between the upstream end and the downstream end of the conveyance path and configured to heat the substrate.
摘要翻译：公开了一种涂布机/显影剂，其包括具有一对旋转体的加热模块，所述一对旋转体构造成围绕各自的水平轴旋转，所述旋转体在沿着基板的传送路径的方向上彼此间隔开，使得其旋转轴彼此平行; 输送路径构件，其与所述旋转体接合并在所述旋转体之间延伸以沿着轨道移动，所述输送路径构件形成放置在所述输送路径构件上的所述基板的输送路径的一部分; 设置在所述输送路径的上游端的第一转印部; 设置在所述输送路径的下游端的第二输送部; 以及加热部，其设置在所述输送路径的上游端和下游端之间，并且构造成加热所述基板。

10. 发明申请

US20080241402A1 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和开发方法和储存介质
公开(公告)号：US20080241402A1
公开(公告)日：2008-10-02
申请号：US12057846
申请日：2008-03-28
申请人： Nobuaki MATSUOKA , Takahiro HASHIMOTO , Katsuhiro TSUCHIYA , Shinichi HAYASHI , Yasushi HAYASHIDA
发明人： Nobuaki MATSUOKA , Takahiro HASHIMOTO , Katsuhiro TSUCHIYA , Shinichi HAYASHI , Yasushi HAYASHIDA
IPC分类号： B05D3/00 , B05C13/00 , B05C11/00
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing system includes processing blocks S2 to S4 of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing b locks are arranged longitudinally between a carrier block S1 and an interface block S6. The number of processing blocks like the processing blocks S2 to S4 arranged between the carrier block S1 and the interface block S6 is adjusted to adjust the throughput of the coating and developing system. thus a coating and developing system capable of achieving a desired throughput can be easily designed and manufactured.
摘要翻译：涂覆和显影系统包括具有相同构造的处理块S 2至S 4，每个构造通过堆叠多个单元块，包括成膜单元块和显影单元块。处理b锁被纵向布置在承载块S1和接口块S6之间。布置在载体块S1和接口块S6之间的处理块S 2至S 4的处理块的数量被调整以调节涂覆和显影系统的生产量。因此可以容易地设计和制造能够实现所需生产量的涂层和显影系统。

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