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1. 发明授权

US5938884A Apparatus for chemical mechanical polishing 失效
标题翻译：化学机械抛光装置
公开(公告)号：US5938884A
公开(公告)日：1999-08-17
申请号：US900750
申请日：1997-07-25
申请人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
发明人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
IPC分类号： B24B7/24 , B24B37/04 , B24B37/10 , B24B37/30 , B24B37/32 , G05B19/18 , H01L21/304 , B24B37/00
CPC分类号： B24B37/105 , B24B37/042 , B24B37/30 , B24B37/32 , B24B7/241 , G05B19/182 , G05B2219/43142 , G05B2219/45058 , G05B2219/45232
摘要： A method and apparatus is disclosed for polishing the face of a semiconductor wafer. The wafer is held in position by a tooling head and is contacted by an abrasive pad. A table is provided on to which the abrasive pad is fixedly attached, both of which move in directions parallel to the face of the wafer being polished. A controller controls the motion of the table according to a predetermined polishing pattern and is capable of maintaining a constant velocity between the wafer and the abrasive pad. The tooling head includes a circular platen and a retention ring peripherally oriented about the outer edge of the platen which resists lateral forces on the wafer caused by engagement of the face of the wafer with the polishing surface. An adjustable coupling is mounted to the platen and the ring, and serves to adjustably position during polishing the height of the ring relative to the face of the wafer as well as to rigidly support during polishing the position of the retaining ring. A flexible disk is fixedly mounted between a support post and the platen and oriented substantially parallel to the face of the platen. The flexible disk is adapted to prevent rotation of the platen about the axis of the support post and to transmit forces between the platen and the post in directions parallel to the face of the platen.
摘要翻译：公开了一种用于抛光半导体晶片的表面的方法和装置。晶片通过工具头保持在适当位置并且被研磨垫接触。提供了一个桌子，研磨垫固定在该工作台上，两者都沿平行于待抛光晶片的表面的方向移动。控制器根据预定的抛光图案控制工作台的运动，并且能够在晶片和研磨垫之间保持恒定的速度。工具头包括圆形压板和围绕压板的外边缘周向定向的保持环，其抵抗由晶片的表面与抛光表面的接合引起的晶片上的横向力。可调联接件安装到压板和环上，并且用于在抛光环相对于晶片表面的高度期间可调节地定位，并且在抛光保持环的位置期间刚性地支撑。柔性盘固定地安装在支撑柱和压板之间并且基本上平行于压板的表面定向。柔性盘适于防止压板围绕支柱的轴线旋转并且在平行于压板的表面的方向上在压板和柱之间传递力。

2. 发明授权

US5908530A Apparatus for chemical mechanical polishing 失效
标题翻译：化学机械抛光装置
公开(公告)号：US5908530A
公开(公告)日：1999-06-01
申请号：US443956
申请日：1995-05-18
申请人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard De Geus , Lawrence L. Lee
发明人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard De Geus , Lawrence L. Lee
IPC分类号： B24B7/24 , B24B37/04 , B24B37/10 , B24B37/30 , B24B37/32 , G05B19/18 , H01L21/304 , B24B37/00
CPC分类号： B24B37/105 , B24B37/042 , B24B37/30 , B24B37/32 , B24B7/241 , G05B19/182 , G05B2219/43142 , G05B2219/45058 , G05B2219/45232
摘要： An apparatus for polishing wafers, preferably by chemical mechanical polishing. The apparatus includes a table defining a planar polishing surface adapted to contain a polishing medium and a wafer carrier assembly adapted to hold a wafer against the polishing surface. The wafer carrier assembly includes a wafer carrier and prevents rotation of the wafer carrier with respect to the polishing table even when the wafer carrier is moved in a circular or orbital path on the polishing surface. Polishing is carried out relative movement between the wafer carrier and the polishing surface in any direction within the plane of the polishing surface. The relative movement can be accomplished by moving the wafer carrier, the polishing table, or a combination of movements of the wafer carrier and polishing table.
摘要翻译：优选通过化学机械抛光抛光晶片的装置。该装置包括限定适于容纳抛光介质的平面抛光表面和适于将晶片保持在抛光表面上的晶片载体组件的工作台。晶片载体组件包括晶片载体并且防止晶片载体相对于抛光台旋转，即使当晶片载体在抛光表面上以圆形或轨道路径移动时。抛光在抛光表面的平面内的任何方向上进行晶片载体和抛光表面之间的相对移动。可以通过移动晶片载体，抛光台或晶片载体和抛光台的运动的组合来实现相对运动。

3. 发明授权

US5759918A Method for chemical mechanical polishing 失效
标题翻译：化学机械抛光方法
公开(公告)号：US5759918A
公开(公告)日：1998-06-02
申请号：US689741
申请日：1996-08-13
申请人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
发明人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
IPC分类号： B24B7/24 , B24B37/04 , B24B37/10 , B24B37/30 , B24B37/32 , G05B19/18 , H01L21/304 , B24B1/00
CPC分类号： B24B37/105 , B24B37/042 , B24B37/30 , B24B37/32 , B24B7/241 , G05B19/182 , G05B2219/43142 , G05B2219/45058 , G05B2219/45232
摘要： A method and apparatus is disclosed for polishing the face of a semiconductor wafer. The wafer is held in position by a tooling head and is contacted by an abrasive pad. A table is provided on to which the abrasive pad is fixedly attached, both of which move in directions parallel to the face of the wafer being polished. A controller controls the motion of the table according to a predetermined polishing pattern and is capable of maintaining a constant velocity between the wafer and the abrasive pad. The tooling head includes a circular platen and a retention ring peripherally oriented about the outer edge of the platen which resists lateral forces on the wafer caused by engagement of the face of the wafer with the polishing surface. An adjustable coupling is mounted to the platen and the ring, and serves to adjustably position during polishing the height of the ring relative to the face of the wafer as well as to rigidly support during polishing the position of the retaining ring. A flexible disk is fixedly mounted between a support post and the platen and oriented substantially parallel to the face of the platen. The flexible disk is adapted to prevent rotation of the platen about the axis of the support post and to transmit forces between the platen and the post in directions parallel to the face of the platen.
摘要翻译：公开了一种用于抛光半导体晶片的表面的方法和装置。晶片通过工具头保持在适当位置并且被研磨垫接触。提供了一个桌子，研磨垫固定在该工作台上，两者都沿平行于待抛光晶片的表面的方向移动。控制器根据预定的抛光图案控制工作台的运动，并且能够在晶片和研磨垫之间保持恒定的速度。工具头包括圆形压板和围绕压板的外边缘周向定向的保持环，其抵抗由晶片的表面与抛光表面的接合引起的晶片上的横向力。可调联接件安装到压板和环上，并且用于在抛光环相对于晶片表面的高度期间可调节地定位，并且在抛光保持环的位置期间刚性地支撑。柔性盘固定地安装在支撑柱和压板之间并且基本上平行于压板的表面定向。柔性盘适于防止压板围绕支柱的轴线旋转并且在平行于压板的表面的方向上在压板和柱之间传递力。

4. 发明授权

US06312319B1 Polishing media magazine for improved polishing 失效
标题翻译：抛光媒体杂志，以改善抛光
公开(公告)号：US06312319B1
公开(公告)日：2001-11-06
申请号：US09402596
申请日：2000-04-10
申请人： Timothy J. Donohue , Roger O. Williams , John A. Barber , Jon A. Hoshizaki , Lawrence Lee , Ching-Ling Meng , Phil R. Sommer
发明人： Timothy J. Donohue , Roger O. Williams , John A. Barber , Jon A. Hoshizaki , Lawrence Lee , Ching-Ling Meng , Phil R. Sommer
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B21/04 , B24B37/04 , B24B53/10
摘要： A polishing media magazine for improved polishing. The polishing media magazine may include a conditioning element for rapid, uniform conditioning and cleaning of the polishing media. The polishing media magazine may include polishing media having sections of raised elevation to contain the fluid and may include a polishing support platen having features adapted to urge the edges of the polishing media upwards. The polishing media may be roll fed from a supply roll across a support platen and onto a take-up roll.
摘要翻译：用于改进抛光的抛光介质盒。抛光介质盒可以包括用于对抛光介质进行快速，均匀调节和清洁的调节元件。抛光介质盒可以包括具有升高高度的部分的抛光介质以容纳流体，并且可以包括具有适于将抛光介质的边缘向上推动的特征的抛光支撑压板。抛光介质可以从供给辊穿过支撑压板卷到卷取辊上。

5. 发明授权

US5785324A Full surface texture collet system 失效
标题翻译：全表面纹理夹头系统
公开(公告)号：US5785324A
公开(公告)日：1998-07-28
申请号：US694438
申请日：1996-08-12
申请人： Roger O. Williams , Jon A. Hoshizaki , Kevin C. Hursh
发明人： Roger O. Williams , Jon A. Hoshizaki , Kevin C. Hursh
IPC分类号： G11B17/028 , B23B31/40
CPC分类号： G11B17/028 , G11B17/0281 , Y10T279/1008 , Y10T279/1083 , Y10T279/17521
摘要： A collet system for mounting, holding, and rotating a rigid disk is described, the collet system including a collet and an expander, the collet having a base portion and fingers longitudinally extending therefrom, the fingers forming a disk contact ring opposite the base. The disk contact ring is less than the thickness of the disk to allow for full surface texturization of the disk. The disk contact ring is not coplanar with any locus of expansion contact points between the collet fingers and the expander, and is sufficiently distant therefrom such that the outward force exerted on the inner disk surface is determined by a cantilever spring deflection experienced by the fingers. This ensures substantially uniform and repeatable outward forces on the inner surface of the disk regardless of minor surface variations along the locus of expansion contact points.
摘要翻译：描述了一种用于安装，保持和旋转刚性盘的夹头系统，夹头系统包括夹头和膨胀器，夹头具有基部和从其纵向延伸的指状物，指状物形成与基部相对的盘接触环。磁盘接触环小于磁盘的厚度，以允许磁盘的全表面纹理化。圆盘接触环与夹头和膨胀机之间的膨胀接触点的任何轨迹不共面，并且与其相距很远，使得施加在内盘表面上的向外的力由手指经历的悬臂弹簧偏转决定。这确保了盘的内表面上的基本均匀和可重复的向外力，而不管沿着膨胀接触点的轨迹的小的表面变化。

6. 发明授权

US5628676A Counter-balance for disk texturizing apparatus 失效
标题翻译：磁盘整理设备的平衡
公开(公告)号：US5628676A
公开(公告)日：1997-05-13
申请号：US397622
申请日：1995-03-02
申请人： Jon A. Hoshizaki
发明人： Jon A. Hoshizaki
IPC分类号： B24B21/00 , B24B41/06 , G11B5/84 , B24B7/00
CPC分类号： B24B41/061 , B24B21/004 , G11B5/84
摘要： An apparatus and method is disclosed for texturizing magnetic storage disks in which the vibration due to forces imparted by oscillating motion is greatly decreased. Typically, the oscillating motion is caused by an oscillating spindle assembly which is slidably mounted on a base. The disclosed apparatus and method utilizes a counter-balance slidably mounted to the base which is caused to move in an opposite direction to the oscillating assembly. The apparatus uses a mechanical linkage which includes a yoke attached to the oscillating assembly, and a pulley and cable arrangement, attached to the counter-balance.
摘要翻译：公开了一种用于纹理化磁存储盘的装置和方法，其中由于由振荡运动施加的力的振动大大降低。通常，摆动运动是由可滑动地安装在基座上的摆动主轴组件引起的。所公开的装置和方法利用可滑动地安装到基座的平衡平面，该基座沿与振动组件相反的方向移动。该装置使用机械联动装置，其包括附接到摆动组件的轭和连接到平衡平衡的滑轮和电缆装置。

7. 发明授权

US08602958B1 Methods and assemblies for collecting liquid by centrifugation 有权
标题翻译：通过离心收集液体的方法和组件
公开(公告)号：US08602958B1
公开(公告)日：2013-12-10
申请号：US12324655
申请日：2008-11-26
申请人： Patrick D. Kinney , Michele E. Wisniewski , Jon A. Hoshizaki , David M. Liu , Joon Mo Yang
发明人： Patrick D. Kinney , Michele E. Wisniewski , Jon A. Hoshizaki , David M. Liu , Joon Mo Yang
IPC分类号： B01D21/26
CPC分类号： B01L3/5025 , B01L2200/025 , B01L2200/0673 , B01L2300/0829 , B01L2400/0409
摘要： Assemblies for and methods of coupling a microtiter plate and receptacle for centrifugation of liquid from the microtiter plate to the receptacle are provided. In some embodiments, a coupling frame can be used. In other embodiments, the microtiter plate couples directly to the receptacle. In some embodiments, relative motion between the receptacle and the microtiter plate is limited in the x-y plane. In some embodiments, relative motion between the receptacle and the microtiter plate is limited in the x-z plane. In some embodiments, relative motion between the receptacle and the microtiter plate is limited in the y-z plane.
摘要翻译：提供了用于将微量滴定板和容器耦合的组件和方法，用于将液体从微量滴定板离心到容器。在一些实施例中，可以使用联接框架。在其他实施方案中，微量滴定板直接连接到容器。在一些实施例中，容器和微量滴定板之间的相对运动在x-y平面中受到限制。在一些实施例中，容器和微量滴定板之间的相对运动在x-z平面中受到限制。在一些实施例中，容器和微量滴定板之间的相对运动在y-z平面中受到限制。

8. 发明授权

US07423750B2 Configurations, systems, and methods for optical scanning with at least one first relative angular motion and at least one second angular motion or at least one linear motion 有权
标题翻译：用于具有至少一个第一相对角运动和至少一个第二角运动或至少一个直线运动的光学扫描的配置，系统和方法
公开(公告)号：US07423750B2
公开(公告)日：2008-09-09
申请号：US11265110
申请日：2005-11-03
申请人： Jon A. Hoshizaki , Howard Gregg King , Johannes P. Sluis , Steven J. Boege , Mark F. Oldham
发明人： Jon A. Hoshizaki , Howard Gregg King , Johannes P. Sluis , Steven J. Boege , Mark F. Oldham
IPC分类号： G01N21/64
CPC分类号： G01N21/645 , F21V29/54 , F21V29/677 , F21V29/763 , G01N21/6452 , G01N2021/6439 , G01N2201/062 , G01N2201/1211 , G05D23/1919 , G05D23/20
摘要： Methods and optical systems for scanning of a target sample, including methods and systems using a low mass scan head and methods and systems for conducting a scanned optically transduced assay where the scanning includes at least one first relative angular motion and at least one second angular motion or at least one linear motion. The present invention also relates to methods and systems for performing sample assays, and for producing and measuring optical responses and signatures.
摘要翻译：用于扫描靶样品的方法和光学系统，包括使用低质量扫描头的方法和系统，以及用于进行扫描的光学转导测定的方法和系统，其中扫描包括至少一个第一相对角运动和至少一个第二角运动或至少一个线性运动。本发明还涉及用于进行样品测定以及用于产生和测量光学响应和特征的方法和系统。

9. 发明授权

US07295316B2 Fluorescent detector with automatic changing filters 有权
标题翻译：荧光探测器，带自动更换滤光片
公开(公告)号：US07295316B2
公开(公告)日：2007-11-13
申请号：US10758667
申请日：2004-01-14
申请人： Steven J. Boege , Jon A. Hoshizaki , Mark F. Oldham , Liana Ilkova
发明人： Steven J. Boege , Jon A. Hoshizaki , Mark F. Oldham , Liana Ilkova
IPC分类号： G01N21/25
CPC分类号： G01N21/6452 , G01N21/253 , G01N2021/6439 , G01N2021/6471 , G01N2021/6476 , G01N2021/6478 , G01N2201/0245
摘要： A fluorometry device and method adapted to determine concentration of spectrally distinguishable species in a biological sample with a plurality of movable optical devices.
摘要翻译：一种荧光测定装置和方法，其适于用多个可移动光学装置确定生物样品中光谱可区分物质的浓度。

10. 发明申请

US20080316482A1 Optical scanning configurations, systems, and methods 有权
标题翻译：光学扫描配置，系统和方法
公开(公告)号：US20080316482A1
公开(公告)日：2008-12-25
申请号：US12222820
申请日：2008-08-18
申请人： Jon A. Hoshizaki , Howard Gregg King , Johannes P. Sluis , Steven J. Boege , Mark F. Oldham
发明人： Jon A. Hoshizaki , Howard Gregg King , Johannes P. Sluis , Steven J. Boege , Mark F. Oldham
IPC分类号： G01N21/64
CPC分类号： G01N21/645 , F21V29/54 , F21V29/677 , F21V29/763 , G01N21/6452 , G01N2021/6439 , G01N2201/062 , G01N2201/1211 , G05D23/1919 , G05D23/20
摘要： Methods and optical systems for scanning of a target sample, including methods and systems using a low mass scan head. The present invention also relates to methods and systems for performing sample assays, and for producing and measuring optical responses and signatures.
摘要翻译：用于扫描目标样品的方法和光学系统，包括使用低质量扫描头的方法和系统。本发明还涉及用于进行样品测定以及用于产生和测量光学响应和特征的方法和系统。

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