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1. 发明授权

US5759918A Method for chemical mechanical polishing 失效
标题翻译：化学机械抛光方法
公开(公告)号：US5759918A
公开(公告)日：1998-06-02
申请号：US689741
申请日：1996-08-13
申请人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
发明人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
IPC分类号： B24B7/24 , B24B37/04 , B24B37/10 , B24B37/30 , B24B37/32 , G05B19/18 , H01L21/304 , B24B1/00
CPC分类号： B24B37/105 , B24B37/042 , B24B37/30 , B24B37/32 , B24B7/241 , G05B19/182 , G05B2219/43142 , G05B2219/45058 , G05B2219/45232
摘要： A method and apparatus is disclosed for polishing the face of a semiconductor wafer. The wafer is held in position by a tooling head and is contacted by an abrasive pad. A table is provided on to which the abrasive pad is fixedly attached, both of which move in directions parallel to the face of the wafer being polished. A controller controls the motion of the table according to a predetermined polishing pattern and is capable of maintaining a constant velocity between the wafer and the abrasive pad. The tooling head includes a circular platen and a retention ring peripherally oriented about the outer edge of the platen which resists lateral forces on the wafer caused by engagement of the face of the wafer with the polishing surface. An adjustable coupling is mounted to the platen and the ring, and serves to adjustably position during polishing the height of the ring relative to the face of the wafer as well as to rigidly support during polishing the position of the retaining ring. A flexible disk is fixedly mounted between a support post and the platen and oriented substantially parallel to the face of the platen. The flexible disk is adapted to prevent rotation of the platen about the axis of the support post and to transmit forces between the platen and the post in directions parallel to the face of the platen.
摘要翻译：公开了一种用于抛光半导体晶片的表面的方法和装置。晶片通过工具头保持在适当位置并且被研磨垫接触。提供了一个桌子，研磨垫固定在该工作台上，两者都沿平行于待抛光晶片的表面的方向移动。控制器根据预定的抛光图案控制工作台的运动，并且能够在晶片和研磨垫之间保持恒定的速度。工具头包括圆形压板和围绕压板的外边缘周向定向的保持环，其抵抗由晶片的表面与抛光表面的接合引起的晶片上的横向力。可调联接件安装到压板和环上，并且用于在抛光环相对于晶片表面的高度期间可调节地定位，并且在抛光保持环的位置期间刚性地支撑。柔性盘固定地安装在支撑柱和压板之间并且基本上平行于压板的表面定向。柔性盘适于防止压板围绕支柱的轴线旋转并且在平行于压板的表面的方向上在压板和柱之间传递力。

2. 发明授权

US5938884A Apparatus for chemical mechanical polishing 失效
标题翻译：化学机械抛光装置
公开(公告)号：US5938884A
公开(公告)日：1999-08-17
申请号：US900750
申请日：1997-07-25
申请人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
发明人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard de Geus , Lawrence L. Lee
IPC分类号： B24B7/24 , B24B37/04 , B24B37/10 , B24B37/30 , B24B37/32 , G05B19/18 , H01L21/304 , B24B37/00
CPC分类号： B24B37/105 , B24B37/042 , B24B37/30 , B24B37/32 , B24B7/241 , G05B19/182 , G05B2219/43142 , G05B2219/45058 , G05B2219/45232
摘要： A method and apparatus is disclosed for polishing the face of a semiconductor wafer. The wafer is held in position by a tooling head and is contacted by an abrasive pad. A table is provided on to which the abrasive pad is fixedly attached, both of which move in directions parallel to the face of the wafer being polished. A controller controls the motion of the table according to a predetermined polishing pattern and is capable of maintaining a constant velocity between the wafer and the abrasive pad. The tooling head includes a circular platen and a retention ring peripherally oriented about the outer edge of the platen which resists lateral forces on the wafer caused by engagement of the face of the wafer with the polishing surface. An adjustable coupling is mounted to the platen and the ring, and serves to adjustably position during polishing the height of the ring relative to the face of the wafer as well as to rigidly support during polishing the position of the retaining ring. A flexible disk is fixedly mounted between a support post and the platen and oriented substantially parallel to the face of the platen. The flexible disk is adapted to prevent rotation of the platen about the axis of the support post and to transmit forces between the platen and the post in directions parallel to the face of the platen.
摘要翻译：公开了一种用于抛光半导体晶片的表面的方法和装置。晶片通过工具头保持在适当位置并且被研磨垫接触。提供了一个桌子，研磨垫固定在该工作台上，两者都沿平行于待抛光晶片的表面的方向移动。控制器根据预定的抛光图案控制工作台的运动，并且能够在晶片和研磨垫之间保持恒定的速度。工具头包括圆形压板和围绕压板的外边缘周向定向的保持环，其抵抗由晶片的表面与抛光表面的接合引起的晶片上的横向力。可调联接件安装到压板和环上，并且用于在抛光环相对于晶片表面的高度期间可调节地定位，并且在抛光保持环的位置期间刚性地支撑。柔性盘固定地安装在支撑柱和压板之间并且基本上平行于压板的表面定向。柔性盘适于防止压板围绕支柱的轴线旋转并且在平行于压板的表面的方向上在压板和柱之间传递力。

3. 发明授权

US5908530A Apparatus for chemical mechanical polishing 失效
标题翻译：化学机械抛光装置
公开(公告)号：US5908530A
公开(公告)日：1999-06-01
申请号：US443956
申请日：1995-05-18
申请人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard De Geus , Lawrence L. Lee
发明人： Jon A. Hoshizaki , Roger O. Williams , James D. Buhler , Charles A. Reichel , William K. Hollywood , Richard De Geus , Lawrence L. Lee
IPC分类号： B24B7/24 , B24B37/04 , B24B37/10 , B24B37/30 , B24B37/32 , G05B19/18 , H01L21/304 , B24B37/00
CPC分类号： B24B37/105 , B24B37/042 , B24B37/30 , B24B37/32 , B24B7/241 , G05B19/182 , G05B2219/43142 , G05B2219/45058 , G05B2219/45232
摘要： An apparatus for polishing wafers, preferably by chemical mechanical polishing. The apparatus includes a table defining a planar polishing surface adapted to contain a polishing medium and a wafer carrier assembly adapted to hold a wafer against the polishing surface. The wafer carrier assembly includes a wafer carrier and prevents rotation of the wafer carrier with respect to the polishing table even when the wafer carrier is moved in a circular or orbital path on the polishing surface. Polishing is carried out relative movement between the wafer carrier and the polishing surface in any direction within the plane of the polishing surface. The relative movement can be accomplished by moving the wafer carrier, the polishing table, or a combination of movements of the wafer carrier and polishing table.
摘要翻译：优选通过化学机械抛光抛光晶片的装置。该装置包括限定适于容纳抛光介质的平面抛光表面和适于将晶片保持在抛光表面上的晶片载体组件的工作台。晶片载体组件包括晶片载体并且防止晶片载体相对于抛光台旋转，即使当晶片载体在抛光表面上以圆形或轨道路径移动时。抛光在抛光表面的平面内的任何方向上进行晶片载体和抛光表面之间的相对移动。可以通过移动晶片载体，抛光台或晶片载体和抛光台的运动的组合来实现相对运动。

4. 发明授权

US06312319B1 Polishing media magazine for improved polishing 失效
标题翻译：抛光媒体杂志，以改善抛光
公开(公告)号：US06312319B1
公开(公告)日：2001-11-06
申请号：US09402596
申请日：2000-04-10
申请人： Timothy J. Donohue , Roger O. Williams , John A. Barber , Jon A. Hoshizaki , Lawrence Lee , Ching-Ling Meng , Phil R. Sommer
发明人： Timothy J. Donohue , Roger O. Williams , John A. Barber , Jon A. Hoshizaki , Lawrence Lee , Ching-Ling Meng , Phil R. Sommer
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B21/04 , B24B37/04 , B24B53/10
摘要： A polishing media magazine for improved polishing. The polishing media magazine may include a conditioning element for rapid, uniform conditioning and cleaning of the polishing media. The polishing media magazine may include polishing media having sections of raised elevation to contain the fluid and may include a polishing support platen having features adapted to urge the edges of the polishing media upwards. The polishing media may be roll fed from a supply roll across a support platen and onto a take-up roll.
摘要翻译：用于改进抛光的抛光介质盒。抛光介质盒可以包括用于对抛光介质进行快速，均匀调节和清洁的调节元件。抛光介质盒可以包括具有升高高度的部分的抛光介质以容纳流体，并且可以包括具有适于将抛光介质的边缘向上推动的特征的抛光支撑压板。抛光介质可以从供给辊穿过支撑压板卷到卷取辊上。

5. 发明授权

US5785324A Full surface texture collet system 失效
标题翻译：全表面纹理夹头系统
公开(公告)号：US5785324A
公开(公告)日：1998-07-28
申请号：US694438
申请日：1996-08-12
申请人： Roger O. Williams , Jon A. Hoshizaki , Kevin C. Hursh
发明人： Roger O. Williams , Jon A. Hoshizaki , Kevin C. Hursh
IPC分类号： G11B17/028 , B23B31/40
CPC分类号： G11B17/028 , G11B17/0281 , Y10T279/1008 , Y10T279/1083 , Y10T279/17521
摘要： A collet system for mounting, holding, and rotating a rigid disk is described, the collet system including a collet and an expander, the collet having a base portion and fingers longitudinally extending therefrom, the fingers forming a disk contact ring opposite the base. The disk contact ring is less than the thickness of the disk to allow for full surface texturization of the disk. The disk contact ring is not coplanar with any locus of expansion contact points between the collet fingers and the expander, and is sufficiently distant therefrom such that the outward force exerted on the inner disk surface is determined by a cantilever spring deflection experienced by the fingers. This ensures substantially uniform and repeatable outward forces on the inner surface of the disk regardless of minor surface variations along the locus of expansion contact points.
摘要翻译：描述了一种用于安装，保持和旋转刚性盘的夹头系统，夹头系统包括夹头和膨胀器，夹头具有基部和从其纵向延伸的指状物，指状物形成与基部相对的盘接触环。磁盘接触环小于磁盘的厚度，以允许磁盘的全表面纹理化。圆盘接触环与夹头和膨胀机之间的膨胀接触点的任何轨迹不共面，并且与其相距很远，使得施加在内盘表面上的向外的力由手指经历的悬臂弹簧偏转决定。这确保了盘的内表面上的基本均匀和可重复的向外力，而不管沿着膨胀接触点的轨迹的小的表面变化。

6. 发明申请

US20100249995A1 Method and Apparatus for Online Procurement of Chemical Screening Assays 审中-公开
标题翻译：化学筛选试验在线采购方法与装置
公开(公告)号：US20100249995A1
公开(公告)日：2010-09-30
申请号：US12416079
申请日：2009-03-31
申请人： Roger O. Williams , Ronald D. Jones , Charles A. Reichel , Gregory B. Stephens , Michael J. Forbush
发明人： Roger O. Williams , Ronald D. Jones , Charles A. Reichel , Gregory B. Stephens , Michael J. Forbush
IPC分类号： G06F17/00 , G06Q30/00 , G06Q50/00
CPC分类号： G06Q30/0603 , G06Q30/0601
摘要： A method and apparatus for ordering a preloaded chemical assay plate. The method comprises the steps accessing an Internet based order entry site; viewing a list of target chemical compounds; creating an order on the order entry site that lists the desired target compounds for the assay; specifying one or more well plate parameters, such as the number of wells in a well plate that will be used to hold the target compounds; specifying one or more assay parameters in the order, such as specifying the final test volume and concentration of the target compounds in the wells; and placing the order from the order entry site. The apparatus comprises a server for accepting the customer order transmitted over the Internet; a storage means for electronically storing the list of target compounds; process control means for generating a work order that contains instructions for retrieving one or more working plates that contain the chemical compounds specified in the customer order; and assay printing means for acoustically dispensing the chemical compounds onto the assay substrate.
摘要翻译：一种用于订购预加载的化学测定板的方法和装置。该方法包括访问基于因特网的订单输入站点的步骤; 查看目标化合物列表; 在订单输入站点上创建列出所需测试化合物的订单; 指定一个或多个孔板参数，例如将用于保持目标化合物的孔板中的孔的数量; 指定一个或多个测定参数，例如指定孔中的目标化合物的最终测试体积和浓度; 并从订单输入站点下订单。该装置包括用于接受通过因特网传送的客户订单的服务器; 用于电子存储目标化合物列表的存储装置; 用于生成包含用于检索包含客户订单中指定的化学化合物的一个或多个工作板的指令的工作订单的过程控制装置; 以及用于将化学化合物声学分配到测定基底上的测定印刷装置。

7. 发明授权

US07232549B2 Apparatus for controlling the free surface of a liquid in a well plate 有权
标题翻译：用于控制井板中的液体的自由表面的装置
公开(公告)号：US07232549B2
公开(公告)日：2007-06-19
申请号：US11186150
申请日：2005-07-20
申请人： Roger O. Williams , Humphrey W. Chow , Charles A. Reichel
发明人： Roger O. Williams , Humphrey W. Chow , Charles A. Reichel
IPC分类号： B01L3/02
CPC分类号： B01L3/50853 , B01L3/5085 , B01L2200/0642 , B01L2200/14 , B01L2300/047 , B01L2300/0838 , B01L2400/0406 , B41J2/14008 , G01N2035/1041
摘要： Devices useful in liquid transfer applications and in particular, devices for controlling the free surface of a source liquid in acoustic liquid ejection systems are disclosed. The devices advantageously maintain a source liquid to be transferred at a constant height and reduce disturbances formed in the liquid due to droplet ejection. In one variation, a well plate includes a plurality of wells each having a capillary. Source liquid in a well moves up the capillary due to capillary action and arrives at a certain height. The height arrived at remains constant despite the source liquid depleting from the well during the ejection process. The capillary can be separately joined or integral with the well plate. An acoustic wave emitter positioned adjacent to the well plate emits a focused acoustic beam that causes at least some of the liquid in the capillary to be ejected.
摘要翻译：公开了可用于液体转移应用的装置，特别是用于控制声学液体喷射系统中源液体的自由表面的装置。这些装置有利地将待传输的源液体保持在恒定的高度并且减少由于液滴喷射而在液体中形成的干扰。在一个变型中，孔板包括多个具有毛细管的孔。井中的源液体由于毛细作用而向上移动毛细管并达到一定的高度。尽管在喷射过程中源的液体从井中耗尽，达到的高度保持恒定。毛细管可以单独接合或与孔板一体。邻近孔板定位的声波发射器发射聚焦的声束，其使得毛细管中的至少一些液体被喷出。

8. 发明授权

US6110025A Containment ring for substrate carrier apparatus 失效
标题翻译：用于衬底载体装置的容纳环
公开(公告)号：US6110025A
公开(公告)日：2000-08-29
申请号：US853103
申请日：1997-05-07
申请人： Roger O. Williams , James D. Buhler
发明人： Roger O. Williams , James D. Buhler
IPC分类号： B24B37/32 , B24B49/16 , B24B5/00 , B24B29/00
CPC分类号： B24B37/32 , B24B49/16
摘要： This invention involves a containment ring that may be used in conjunction with a substrate carrier used for polishing a substrate to give the substrate a smooth and planar surface. The containment ring is generally constructed such that it tilts independently of the substrate carrier platen that supports the substrate during polishing. The containment ring is constructed with a surface that supports a small perimeter portion of the back side of the substrate during polishing and has an enclosed area sufficient to allow the substrate to precess.
摘要翻译：本发明涉及一种容纳环，其可以与用于抛光基底的基底载体结合使用，以给予基底平滑且平坦的表面。密封环通常构造成使得其在抛光期间独立于支撑衬底的衬底载体压板倾斜。容纳环被构造成具有在抛光期间支撑衬底的背侧的小周边部分的表面，并具有足以允许衬底进入的封闭区域。

9. 发明授权

US07118048B2 Apparatus and method for droplet steering 有权
公开(公告)号：US07118048B2
公开(公告)日：2006-10-10
申请号：US11231579
申请日：2005-09-21
申请人： Roger O. Williams , Michael R. Van Tuyl , Michael J. Forbush
发明人： Roger O. Williams , Michael R. Van Tuyl , Michael J. Forbush
IPC分类号： B05B1/28
CPC分类号： B41J2/14008
摘要： An apparatus and method for droplet steering is disclosed herein. A throated structure having a nozzle defines a converging throat with an inlet and an outlet and a vectored fluid stream directed therethrough. The fluid stream is driven through the system via a vacuum pump. As the fluid approaches the outlet, its velocity increases and is drawn away from the nozzle through a connecting channel. As a droplet is ejected from a liquid therebelow, it will have a first trajectory until it is introduced to the high velocity fluid stream at the perimeter of the interior walls of the nozzle. The fluid accordingly steers the momentum of the droplet such that it obtains a second or corrected trajectory. Alternative variations include an electrically chargeable member, e.g., a pin, positionable to be in apposition to the outlet and capillary tubes for controlling the ejection surface of the pool of source fluid.

10. 发明授权

US5333084A Electronically alignable flexible disk drive 失效
标题翻译：电子可对准的软盘驱动器
公开(公告)号：US5333084A
公开(公告)日：1994-07-26
申请号：US611962
申请日：1990-07-13
申请人： Gregory M. Galloway , Titus E. Davis , Roger O. Williams
发明人： Gregory M. Galloway , Titus E. Davis , Roger O. Williams
IPC分类号： G11B5/02 , G11B5/035 , G11B5/55 , G11B5/56 , G11B20/18 , G11B27/36 , G11B5/596
CPC分类号： G11B5/02 , G11B20/1816 , G11B27/36 , G11B5/035 , G11B5/5534 , G11B5/56
摘要： A disk drive in which the radial alignment, track zero alignment, index to data timing, write current, asymmetry and threshold dropout can be electronically adjusted. A plurality of programs stored in random access memory run a plurality of adjustment procedures used to control the electronic adjustment functions of the disk drive. An alignment disk read by the disk drive provides alignment data for the radial, track zero and index to data alignment procedures. A microstepper circuit in the disk drive allows the read/write heads to be moved in discrete steps of approximately 1/126 of the track pitch for electronically adjusting the radial and track zero parameters. The index to data alignment is set by generating and storing an artifical index offset value. The write current and asymmetry adjustment procedures utilize digital to analog convertors (DACS) to vary the voltage supplied to the read/write heads. The threshold dropout procedure utilizes a DAC to control the output of a pulse detector.
摘要翻译：其中可以电子地调整径向对准，轨迹零对准，数据定时索引，写入电流，不对称和阈值丢失的磁盘驱动器。存储在随机存取存储器中的多个程序运行用于控制磁盘驱动器的电子调整功能的多个调整程序。由磁盘驱动器读取的对准磁盘提供径向，磁道零和索引到数据对齐过程的对齐数据。磁盘驱动器中的微步进电路允许以大约1/126的磁道间距的离散步长移动读/写磁头，用于电子调节径向和磁道零参数。通过生成和存储人为索引偏移值来设置数据对齐索引。写入电流和不对称调整程序利用数模转换器（DACS）来改变提供给读/写头的电压。阈值压差过程利用DAC来控制脉冲检测器的输出。

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