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1. 发明授权

US08286293B2 Substrate cleaning device and substrate processing apparatus including the same 有权
标题翻译：基板清洗装置及其基板处理装置
公开(公告)号：US08286293B2
公开(公告)日：2012-10-16
申请号：US12179559
申请日：2008-07-24
申请人： Koji Nishiyama , Joichi Nishimura , Hiroshi Yoshii
发明人： Koji Nishiyama , Joichi Nishimura , Hiroshi Yoshii
IPC分类号： B08B1/04
CPC分类号： H01L21/67046
摘要： A cleaning processing unit includes a spin chuck for horizontally holding a substrate and rotating the substrate around the vertical axis passing through the center of the substrate. A bevel cleaner is disposed outside the spin chuck. The bevel cleaner includes a cleaning brush. The cleaning brush has a shape that is symmetric about its vertical axis, and has an upper bevel cleaning surface, an end surface cleaning surface, and a lower bevel cleaning surface. The end surface cleaning surface is a cylindrical surface having its axis in the vertical direction. The upper bevel cleaning surface extends out from and is inclined upward from the upper end of the end surface cleaning surface, and the lower bevel cleaning surface extends out from and is inclined downward from the lower end of the end surface cleaning surface.
摘要翻译：清洁处理单元包括用于水平地保持基板并使基板围绕穿过基板的中心的垂直轴旋转的旋转卡盘。斜面清洁器设置在旋转卡盘外部。斜面清洁器包括清洁刷。清洁刷具有关于其垂直轴线对称的形状，并且具有上斜面清洁表面，端面清洁表面和下斜面清洁表面。端面清洁表面是其轴线在垂直方向上的圆柱形表面。上斜面清洁表面从端表面清洁表面的上端延伸出并向上倾斜，并且下斜面清洁表面从端表面清洁表面的下端向外延伸并向下倾斜。

2. 发明申请

US20090027634A1 Bevel Inspection Apparatus For Substrate Processing 有权
标题翻译：用于基板加工的斜角检测装置
公开(公告)号：US20090027634A1
公开(公告)日：2009-01-29
申请号：US12179522
申请日：2008-07-24
申请人： Joichi Nishimura , Hiroshi Yoshii , Koji Nishiyama
发明人： Joichi Nishimura , Hiroshi Yoshii , Koji Nishiyama
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03F7/70925 , G03F7/70525 , G03F7/70533 , G03F7/7085 , G03F7/70916 , H01L21/67225 , H01L21/67253
摘要： A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. The interface block includes a bevel portion inspection unit. The bevel portion inspection unit inspects a bevel portion of a substrate to determine whether or not the bevel portion of the substrate is contaminated. The substrate whose bevel portion is determined to be contaminated and the substrate whose bevel portion is determined that it is not contaminated are respectively subjected to different types of processing.
摘要翻译：基板处理装置包括分度块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。界面块包括斜面部分检查单元。斜面部分检查单元检查基板的斜面部分以确定基板的斜面部分是否被污染。确定其斜面部分被污染的基板和其斜面部分被确定为未被污染的基板分别经受不同类型的加工。

3. 发明授权

US07641406B2 Bevel inspection apparatus for substrate processing 有权
标题翻译：用于基板加工的斜角检查装置
公开(公告)号：US07641406B2
公开(公告)日：2010-01-05
申请号：US12179522
申请日：2008-07-24
申请人： Joichi Nishimura , Hiroshi Yoshii , Koji Nishiyama
发明人： Joichi Nishimura , Hiroshi Yoshii , Koji Nishiyama
IPC分类号： G03D5/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70925 , G03F7/70525 , G03F7/70533 , G03F7/7085 , G03F7/70916 , H01L21/67225 , H01L21/67253
摘要： A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. The interface block includes a bevel portion inspection unit. The bevel portion inspection unit inspects a bevel portion of a substrate to determine whether or not the bevel portion of the substrate is contaminated. The substrate whose bevel portion is determined to be contaminated and the substrate whose bevel portion is determined that it is not contaminated are respectively subjected to different types of processing.
摘要翻译：基板处理装置包括分度块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。界面块包括斜面部分检查单元。斜面部分检查单元检查基板的斜面部分以确定基板的斜面部分是否被污染。确定其斜面部分被污染的基板和其斜面部分被确定为未被污染的基板分别经受不同类型的加工。

4. 发明申请

US20090025155A1 Substrate Cleaning Device And Substrate Processing Apparatus Including The Same 有权
标题翻译：基板清洗装置及其基板处理装置
公开(公告)号：US20090025155A1
公开(公告)日：2009-01-29
申请号：US12179559
申请日：2008-07-24
申请人： Koji Nishiyama , Joichi Nishimura , Hiroshi Yoshii
发明人： Koji Nishiyama , Joichi Nishimura , Hiroshi Yoshii
IPC分类号： A46B13/00
CPC分类号： H01L21/67046
摘要： A cleaning processing unit includes a spin chuck for horizontally holding a substrate and rotating the substrate around the vertical axis passing through the center of the substrate. A bevel cleaner is disposed outside the spin chuck. The bevel cleaner includes a cleaning brush. The cleaning brush has a shape that is symmetric about its vertical axis, and has an upper bevel cleaning surface, an end surface cleaning surface, and a lower bevel cleaning surface. The end surface cleaning surface is a cylindrical surface having its axis in the vertical direction. The upper bevel cleaning surface extends out from and is inclined upward from the upper end of the end surface cleaning surface, and the lower bevel cleaning surface extends out from and is inclined downward from the lower end of the end surface cleaning surface.
摘要翻译：清洁处理单元包括用于水平地保持基板并使基板围绕穿过基板的中心的垂直轴旋转的旋转卡盘。斜面清洁器设置在旋转卡盘外部。斜面清洁器包括清洁刷。清洁刷具有关于其垂直轴线对称的形状，并且具有上斜面清洁表面，端面清洁表面和下斜面清洁表面。端面清洁表面是其轴线在垂直方向上的圆柱形表面。上斜面清洁表面从端表面清洁表面的上端延伸出并向上倾斜，并且下斜面清洁表面从端表面清洁表面的下端向外延伸并向下倾斜。

5. 发明授权

US6060697A Substrate processing apparatus having regulated power consumption and method therefor 失效
标题翻译：具有稳定功耗的基板处理装置及其方法
公开(公告)号：US6060697A
公开(公告)日：2000-05-09
申请号：US39141
申请日：1998-03-13
申请人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
发明人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
IPC分类号： H01L21/02 , G05D23/19 , H02J3/00 , H02J13/00 , H05B1/02
CPC分类号： G05D23/1951
摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.
摘要翻译：基板处理装置降低开启时的瞬时最大功耗。多个处理单元的受电部分分别通过开关连接到导通开关的一端。导通开关的另一端通过断路器连接到外部电源。定时器值分别在定时器中设置。当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

6. 发明授权

US08746171B2 Substrate treating system 有权
标题翻译：底物处理系统
公开(公告)号：US08746171B2
公开(公告)日：2014-06-10
申请号：US12191603
申请日：2008-08-14
申请人： Joichi Nishimura
发明人： Joichi Nishimura
IPC分类号： B05C11/10 , B05C13/02 , G03D5/00
CPC分类号： H01L21/67178 , H01L21/67098 , H01L21/6715 , H01L21/67184 , H01L21/67253 , H01L21/67276
摘要： A substrate treating system includes a coating apparatus having a resist coating unit, an exposing apparatus having an exposing machine and a heat-treating unit, and a controller for controlling the resist coating unit, exposing machine and heat-treating unit. The controller coordinates schedules of treatment in the coating apparatus and exposing apparatus, such that the coating apparatus can operate efficiently despite an increase in the processing time of the exposing machine.
摘要翻译：基板处理系统包括具有抗蚀剂涂布单元的涂布设备，具有曝光机和热处理单元的曝光设备，以及用于控制抗蚀剂涂布单元，曝光机和热处理单元的控制器。控制器协调涂布设备和曝光设备中的处理时间表，使得涂布设备可以有效地操作，尽管曝光机的处理时间增加。

7. 发明授权

US06286525B1 Substrate cleaning apparatus and method 失效
标题翻译：基板清洗装置及方法
公开(公告)号：US06286525B1
公开(公告)日：2001-09-11
申请号：US09071683
申请日：1998-05-01
申请人： Joichi Nishimura , Akihiko Morita , Masami Ohtani
发明人： Joichi Nishimura , Akihiko Morita , Masami Ohtani
IPC分类号： B08B300
CPC分类号： H01L21/67051 , B08B1/04 , B08B3/00 , H01L21/67046 , Y10S134/902
摘要： A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.
摘要翻译：多个相同类型的清洁装置连接到一个支撑臂。清洁装置同时移动到由基板支撑和旋转机构支撑和纺出的基板的待清洁表面上。因此，相同类型的清洁装置共享清洁基板的整个表面的任务，从而提高清洁效率并缩短清洁时间。可以将不同类型的清洁装置连接到支撑臂上，以同时清洁基板的整个表面。在不同类型的清洁刷附接到支撑臂的情况下，清洁操作可以通过同时使用基板表面上不同区域的最佳硬度的清洁刷进行。

8. 发明授权

US06896466B2 Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US06896466B2
公开(公告)日：2005-05-24
申请号：US10096691
申请日：2002-03-12
申请人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
IPC分类号： B65G49/07 , B25J18/02 , B25J18/04 , H01L21/677 , H01L21/687
CPC分类号： B25J18/025 , B25J18/04 , H01L21/68707 , Y10S414/139
摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopially nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.
摘要翻译：基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。驱动机构（D 1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。当滑轮（47c）向上移动时，垂直运动件（42c）被带（L1）向上提升。类似的动作提升设置在垂直运动件（42,4a）顶部上的一对传送臂（31a，31b）。可嵌套多层结构的层数的增加排除了运输机器人（TR 1）在缩回位置的高度增加。基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR 1）以便运送装置。

9. 发明授权

US06688189B2 Robot 有权
标题翻译：机器人
公开(公告)号：US06688189B2
公开(公告)日：2004-02-10
申请号：US09837109
申请日：2001-04-18
申请人： Yasuhiko Hashimoto , Masami Ohtani , Joichi Nishimura
发明人： Yasuhiko Hashimoto , Masami Ohtani , Joichi Nishimura
IPC分类号： B25J1700
CPC分类号： B25J18/025 , F16M11/08 , F16M11/18 , F16M11/2014 , F16M11/28 , Y10S414/135 , Y10T74/18848 , Y10T74/20323
摘要： Provided is a robot comprising a telescopic-drive mechanism which does not contaminate works in a purified environment such as a clean room, is easy to handle, and requires no cover for covering the telescopic-drive mechanism. A robot comprises: an up-down axis in which a plurality of hollow axis sectional elements telescopically continue; and a telescopic-drive mechanism for driving the up-down axis to be vertically extended or retracted between an extended state in which a tip end of the up-down axis extends with respect to a base end thereof and a retracted state in which the tip end is moved close to the base end, wherein the telescopic-drive mechanism is integrated on one side of the up-down axis without being exposed from the up-down axis.
摘要翻译：本发明提供一种机器人，其包括不会在诸如洁净室的净化环境中污染工作的伸缩驱动机构，易于处理，并且不需要用于覆盖伸缩驱动机构的盖。机器人包括：上下轴线，多个中空轴线部分可伸缩地延伸在其中; 以及伸缩驱动机构，用于驱动上下轴线在上下轴线的前端相对于其基端部延伸的伸出状态和垂直延伸状态之间垂直延伸或缩回，在该状态下，端部移动靠近基端，其中伸缩驱动机构集成在上下轴线的一侧，而不会暴露于上下轴线。

10. 发明授权

US06371713B1 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US06371713B1
公开(公告)日：2002-04-16
申请号：US09143027
申请日：1998-08-28
申请人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
IPC分类号： B65G4907
CPC分类号： B25J18/025 , B25J18/04 , H01L21/68707 , Y10S414/139
摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopically nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.
摘要翻译：基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。驱动机构（D1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。当滑轮（47c）向上移动时，垂直运动构件（42c）被带（L1）向上提升。类似的动作提升了设置在垂直运动件（42a）的顶部上的一对传送臂（31a，31b）。可嵌套多层结构的层数的增加排除了运输机器人（TR1）处于缩回位置的高度增加。基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR1）以便运送装置。

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