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1. 发明授权

US06896466B2 Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US06896466B2
公开(公告)日：2005-05-24
申请号：US10096691
申请日：2002-03-12
申请人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
IPC分类号： B65G49/07 , B25J18/02 , B25J18/04 , H01L21/677 , H01L21/687
CPC分类号： B25J18/025 , B25J18/04 , H01L21/68707 , Y10S414/139
摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopially nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.
摘要翻译：基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。驱动机构（D 1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。当滑轮（47c）向上移动时，垂直运动件（42c）被带（L1）向上提升。类似的动作提升设置在垂直运动件（42,4a）顶部上的一对传送臂（31a，31b）。可嵌套多层结构的层数的增加排除了运输机器人（TR 1）在缩回位置的高度增加。基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR 1）以便运送装置。

2. 发明授权

US06688189B2 Robot 有权
标题翻译：机器人
公开(公告)号：US06688189B2
公开(公告)日：2004-02-10
申请号：US09837109
申请日：2001-04-18
申请人： Yasuhiko Hashimoto , Masami Ohtani , Joichi Nishimura
发明人： Yasuhiko Hashimoto , Masami Ohtani , Joichi Nishimura
IPC分类号： B25J1700
CPC分类号： B25J18/025 , F16M11/08 , F16M11/18 , F16M11/2014 , F16M11/28 , Y10S414/135 , Y10T74/18848 , Y10T74/20323
摘要： Provided is a robot comprising a telescopic-drive mechanism which does not contaminate works in a purified environment such as a clean room, is easy to handle, and requires no cover for covering the telescopic-drive mechanism. A robot comprises: an up-down axis in which a plurality of hollow axis sectional elements telescopically continue; and a telescopic-drive mechanism for driving the up-down axis to be vertically extended or retracted between an extended state in which a tip end of the up-down axis extends with respect to a base end thereof and a retracted state in which the tip end is moved close to the base end, wherein the telescopic-drive mechanism is integrated on one side of the up-down axis without being exposed from the up-down axis.
摘要翻译：本发明提供一种机器人，其包括不会在诸如洁净室的净化环境中污染工作的伸缩驱动机构，易于处理，并且不需要用于覆盖伸缩驱动机构的盖。机器人包括：上下轴线，多个中空轴线部分可伸缩地延伸在其中; 以及伸缩驱动机构，用于驱动上下轴线在上下轴线的前端相对于其基端部延伸的伸出状态和垂直延伸状态之间垂直延伸或缩回，在该状态下，端部移动靠近基端，其中伸缩驱动机构集成在上下轴线的一侧，而不会暴露于上下轴线。

3. 发明授权

US06371713B1 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US06371713B1
公开(公告)日：2002-04-16
申请号：US09143027
申请日：1998-08-28
申请人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
IPC分类号： B65G4907
CPC分类号： B25J18/025 , B25J18/04 , H01L21/68707 , Y10S414/139
摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopically nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.
摘要翻译：基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。驱动机构（D1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。当滑轮（47c）向上移动时，垂直运动构件（42c）被带（L1）向上提升。类似的动作提升了设置在垂直运动件（42a）的顶部上的一对传送臂（31a，31b）。可嵌套多层结构的层数的增加排除了运输机器人（TR1）处于缩回位置的高度增加。基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR1）以便运送装置。

4. 发明授权

US6159291A Substrate treating apparatus 有权
标题翻译：底物处理装置
公开(公告)号：US6159291A
公开(公告)日：2000-12-12
申请号：US131558
申请日：1998-08-10
申请人： Akihiko Morita , Joichi Nishimura , Masami Ohtani
发明人： Akihiko Morita , Joichi Nishimura , Masami Ohtani
IPC分类号： B05B15/02 , B05B15/10 , B05C11/08 , B05B13/02
CPC分类号： B05B15/10 , B05C11/08 , B05B12/1472 , B05B15/02
摘要： A substrate treating apparatus for treating a substrate in a predetermined substrate treating region. Each holder arm is supported in a proximal end portion thereof by an arm support to be swingable about a pivotal axis. In time of substrate treatment, the arm support is raised by an air cylinder. With the ascent of the arm support, a cam follower attached to a proximal end of the holder arm is guided by a cam groove. The holder arm, while being raised, turns from a vertical standby posture to a horizontal posture for treating the substrate. As a result, a treating device attached to a distal end of the holder arm moves to a treating position. In the treating position, the treating device treats the substrate. The holder arms are maintained in the vertical standby posture when out of use in substrate treatment. Thus, the holder arms require a reduced standby space.
摘要翻译：一种用于处理预定基板处理区域中的基板的基板处理装置。每个保持臂通过臂支撑件在其近端部分中支撑以围绕枢转轴线摆动。在基板处理的时候，臂支撑件被气缸升高。随着臂支撑件的上升，附接到保持器臂的近端的凸轮从动件由凸轮槽引导。保持臂同时被升起，从垂直待机姿态变为水平姿势，用于处理基板。结果，附接到保持臂的远端的处理装置移动到处理位置。在处理位置，处理装置处理基板。当基板处理不用时，保持臂保持在垂直待机姿态。因此，支架臂需要减少的待机空间。

5. 发明授权

US6151744A Method of and apparatus for cleaning substrate 失效
标题翻译：清洗基材的方法和设备
公开(公告)号：US6151744A
公开(公告)日：2000-11-28
申请号：US839470
申请日：1997-04-14
申请人： Masami Ohtani , Masahide Ikeda , Mitsuhiro Fujita , Joichi Nishimura
发明人： Masami Ohtani , Masahide Ikeda , Mitsuhiro Fujita , Joichi Nishimura
IPC分类号： B08B1/04 , B08B3/12 , H01L21/00 , H01L21/304 , A46B13/02
CPC分类号： H01L21/67051 , H01L21/67046
摘要： A method of and apparatus for cleaning a substrate which require shorter processing time with high processing efficiency are disclosed. A cleaning brush pivots about a pivot axis between two positions. An ultrasonic cleaning nozzle pivots about a pivot axis between two positions. To perform a cleaning process, the cleaning brush and the ultrasonic cleaning nozzle are driven in accordance with a processing pattern previously produced by an operator. The processing pattern is produced so that the movement of the cleaning brush between two positions and the movement of the ultrasonic cleaning nozzle between two positions are not caused simultaneously. Any processing pattern desired by the operator may be produced if this requirement is satisfied. Execution of the cleaning process in accordance with the processing pattern allows cleaning of a substrate using the cleaning brush and the ultrasonic cleaning nozzle at the same time.
摘要翻译：公开了一种用于清洗需要较短处理时间并具有高处理效率的基板的方法和设备。清洁刷绕两个位置之间的枢转轴线枢转。超声波清洗喷嘴绕两个位置之间的枢转轴线枢转。为了执行清洁处理，清洁刷和超声波清洗喷嘴根据操作者先前生产的处理模式被驱动。产生处理图案，使得清洁刷在两个位置之间的移动和超声波清洗喷嘴在两个位置之间的运动不会同时产生。如果满足该要求，则可以产生操作者期望的任何处理模式。根据处理模式执行清洁处理允许使用清洁刷和超声波清洗喷嘴同时清洗基板。

6. 发明授权

US5860178A Substrate spin cleaning apparatus 失效
标题翻译：基材旋转清洗装置
公开(公告)号：US5860178A
公开(公告)日：1999-01-19
申请号：US625644
申请日：1996-03-29
申请人： Joichi Nishimura , Tadashi Sasaki
发明人： Joichi Nishimura , Tadashi Sasaki
IPC分类号： B08B1/00 , B08B1/04 , H01L21/00 , H01L21/304 , A46B13/04
CPC分类号： H01L21/67253 , B08B1/04 , H01L21/67046 , H01L21/67092
摘要： A substrate supporting device has a turntable mounted on a rotary shaft for supporting a substrate and spinning the substrate about a vertical axis. The turntable is replaceable by a load measuring device including a load meter mounted on a support bracket having a tube attachable to the rotary shaft. The load meter receives a cleaning brush to measure a pressing load applied therefrom. The load meter has a pressure sensor with an upper surface thereof at an equal level to the surface of the substrate to be placed on the substrate supporting device. Thus, a pressure to be applied to the substrate is measured in the same position as where the substrate is actually treated.
摘要翻译：基板支撑装置具有安装在旋转轴上的转盘，用于支撑基板并绕垂直轴旋转基板。转台可由负载测量装置更换，该装载测量装置包括安装在具有可连接到旋转轴的管的支撑支架上的负载表。负载表接收清洁刷以测量从其施加的按压负载。负载表具有压力传感器，其上表面与待放置在基板支撑装置上的基板的表面相等。因此，在与实际处理基板的位置相同的位置测量施加于基板的压力。

7. 发明授权

US07641406B2 Bevel inspection apparatus for substrate processing 有权
标题翻译：用于基板加工的斜角检查装置
公开(公告)号：US07641406B2
公开(公告)日：2010-01-05
申请号：US12179522
申请日：2008-07-24
申请人： Joichi Nishimura , Hiroshi Yoshii , Koji Nishiyama
发明人： Joichi Nishimura , Hiroshi Yoshii , Koji Nishiyama
IPC分类号： G03D5/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70925 , G03F7/70525 , G03F7/70533 , G03F7/7085 , G03F7/70916 , H01L21/67225 , H01L21/67253
摘要： A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. The interface block includes a bevel portion inspection unit. The bevel portion inspection unit inspects a bevel portion of a substrate to determine whether or not the bevel portion of the substrate is contaminated. The substrate whose bevel portion is determined to be contaminated and the substrate whose bevel portion is determined that it is not contaminated are respectively subjected to different types of processing.
摘要翻译：基板处理装置包括分度块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。界面块包括斜面部分检查单元。斜面部分检查单元检查基板的斜面部分以确定基板的斜面部分是否被污染。确定其斜面部分被污染的基板和其斜面部分被确定为未被污染的基板分别经受不同类型的加工。

8. 发明申请

US20090044747A1 SUBSTRATE TREATING SYSTEM 有权
标题翻译：基板处理系统
公开(公告)号：US20090044747A1
公开(公告)日：2009-02-19
申请号：US12191603
申请日：2008-08-14
申请人： Joichi Nishimura
发明人： Joichi Nishimura
IPC分类号： B05C11/00
CPC分类号： H01L21/67178 , H01L21/67098 , H01L21/6715 , H01L21/67184 , H01L21/67253 , H01L21/67276
摘要： A substrate treating system includes a coating apparatus having a resist coating unit, an exposing apparatus having an exposing machine and a heat-treating unit, and a controller for controlling the resist coating unit, exposing machine and heat-treating unit. The controller coordinates schedules of treatment in the coating apparatus and exposing apparatus, such that the coating apparatus can operate efficiently despite an increase in the processing time of the exposing machine.
摘要翻译：基板处理系统包括具有抗蚀剂涂布单元的涂布设备，具有曝光机和热处理单元的曝光设备，以及用于控制抗蚀剂涂布单元，曝光机和热处理单元的控制器。控制器协调涂布设备和曝光设备中的处理时间表，使得涂布设备可以有效地操作，尽管曝光机的处理时间增加。

9. 发明授权

US07231273B2 Substrate processing apparatus and method including obstacle detection 有权
标题翻译：基板处理装置及方法，包括障碍物检测
公开(公告)号：US07231273B2
公开(公告)日：2007-06-12
申请号：US11005578
申请日：2004-12-06
申请人： Joichi Nishimura , Masami Otani
发明人： Joichi Nishimura , Masami Otani
IPC分类号： G06F19/00 , H01L21/00 , H01L21/68
CPC分类号： H01L21/67748 , H01L21/67259 , H01L21/681 , H01L21/68707 , Y10S414/135
摘要： A camera is fixed to a camera fixture extending forward and upward from a rear end of an arm mechanism. The camera picks up the direction of extension of the arm mechanism when the substrate is carried in and out. If a normal still image in a hot plate unit previously recorded and a still image picked up by the camera coincide with each other, a substrate transport robot TR carries in and out the substrate.
摘要翻译：相机固定到从臂机构的后端向前和向上延伸的照相机固定装置。当基板进出时，相机拾取臂机构的延伸方向。如果先前记录的热板单元中的正常静止图像和由照相机拾取的静止图像彼此重合，则基板传送机器人TR进入和移出基板。

10. 发明授权

US06790286B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US06790286B2
公开(公告)日：2004-09-14
申请号：US10047818
申请日：2002-01-15
申请人： Joichi Nishimura , Masami Ohtani , Kenji Hashinoki , Masayoshi Shiga , Koji Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Kenji Hashinoki , Masayoshi Shiga , Koji Hashimoto
IPC分类号： B05C1100
CPC分类号： H01L21/67178 , H01L21/67766 , Y10S414/135 , Y10S414/137
摘要： Substrate processing parts are stacked and arranged in a multistage manner around a transport robot arranged at the center of a processing area. Rotary application units are arranged on a second layer through an indexer and the transport robot. Rotary developing units are stacked above the rotary application units respectively on a fourth layer located above the second layer. Multistage thermal processing units and an edge exposure unit are horizontally arranged in line above the indexer. In place of the processing units, inspection units performing a macro defect inspection and pattern line width measurement may be arranged in the upside region of the indexer space.
摘要翻译：衬底处理部件以布置在处理区域的中心的运输机器人的方式堆叠并布置成多级。旋转应用单元通过分度器和输送机器人布置在第二层上。旋转显影单元分别堆叠在位于第二层上方的第四层上的旋转施加单元上方。多级热处理单元和边缘曝光单元在分度器上方水平排列。代替处理单元，执行宏缺陷检查和图案线宽度测量的检查单元可以布置在分度器空间的上侧区域中。

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