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1. 发明授权

US6060697A Substrate processing apparatus having regulated power consumption and method therefor 失效
标题翻译：具有稳定功耗的基板处理装置及其方法
公开(公告)号：US6060697A
公开(公告)日：2000-05-09
申请号：US39141
申请日：1998-03-13
申请人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
发明人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
IPC分类号： H01L21/02 , G05D23/19 , H02J3/00 , H02J13/00 , H05B1/02
CPC分类号： G05D23/1951
摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.
摘要翻译：基板处理装置降低开启时的瞬时最大功耗。多个处理单元的受电部分分别通过开关连接到导通开关的一端。导通开关的另一端通过断路器连接到外部电源。定时器值分别在定时器中设置。当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

2. 发明授权

US06286525B1 Substrate cleaning apparatus and method 失效
标题翻译：基板清洗装置及方法
公开(公告)号：US06286525B1
公开(公告)日：2001-09-11
申请号：US09071683
申请日：1998-05-01
申请人： Joichi Nishimura , Akihiko Morita , Masami Ohtani
发明人： Joichi Nishimura , Akihiko Morita , Masami Ohtani
IPC分类号： B08B300
CPC分类号： H01L21/67051 , B08B1/04 , B08B3/00 , H01L21/67046 , Y10S134/902
摘要： A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.
摘要翻译：多个相同类型的清洁装置连接到一个支撑臂。清洁装置同时移动到由基板支撑和旋转机构支撑和纺出的基板的待清洁表面上。因此，相同类型的清洁装置共享清洁基板的整个表面的任务，从而提高清洁效率并缩短清洁时间。可以将不同类型的清洁装置连接到支撑臂上，以同时清洁基板的整个表面。在不同类型的清洁刷附接到支撑臂的情况下，清洁操作可以通过同时使用基板表面上不同区域的最佳硬度的清洁刷进行。

3. 发明授权

US6159291A Substrate treating apparatus 有权
标题翻译：底物处理装置
公开(公告)号：US6159291A
公开(公告)日：2000-12-12
申请号：US131558
申请日：1998-08-10
申请人： Akihiko Morita , Joichi Nishimura , Masami Ohtani
发明人： Akihiko Morita , Joichi Nishimura , Masami Ohtani
IPC分类号： B05B15/02 , B05B15/10 , B05C11/08 , B05B13/02
CPC分类号： B05B15/10 , B05C11/08 , B05B12/1472 , B05B15/02
摘要： A substrate treating apparatus for treating a substrate in a predetermined substrate treating region. Each holder arm is supported in a proximal end portion thereof by an arm support to be swingable about a pivotal axis. In time of substrate treatment, the arm support is raised by an air cylinder. With the ascent of the arm support, a cam follower attached to a proximal end of the holder arm is guided by a cam groove. The holder arm, while being raised, turns from a vertical standby posture to a horizontal posture for treating the substrate. As a result, a treating device attached to a distal end of the holder arm moves to a treating position. In the treating position, the treating device treats the substrate. The holder arms are maintained in the vertical standby posture when out of use in substrate treatment. Thus, the holder arms require a reduced standby space.
摘要翻译：一种用于处理预定基板处理区域中的基板的基板处理装置。每个保持臂通过臂支撑件在其近端部分中支撑以围绕枢转轴线摆动。在基板处理的时候，臂支撑件被气缸升高。随着臂支撑件的上升，附接到保持器臂的近端的凸轮从动件由凸轮槽引导。保持臂同时被升起，从垂直待机姿态变为水平姿势，用于处理基板。结果，附接到保持臂的远端的处理装置移动到处理位置。在处理位置，处理装置处理基板。当基板处理不用时，保持臂保持在垂直待机姿态。因此，支架臂需要减少的待机空间。

4. 发明授权

US6062852A Substrate heat-treating apparatus 失效
标题翻译：基板热处理装置
公开(公告)号：US6062852A
公开(公告)日：2000-05-16
申请号：US60422
申请日：1998-04-14
申请人： Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
发明人： Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
IPC分类号： H01L21/683 , F27D5/00 , H01L21/027 , H01L21/68
CPC分类号： H01L21/67109 , H01L21/67178 , H01L21/68728 , H01L21/68742
摘要： A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.
摘要翻译：基板热处理装置包括热处理板和延伸穿过热处理板以相对于其垂直移动的支撑销。支撑销在其下表面处支撑每个基板，使得基板的边缘处于比基板的中心区域更高的水平。当基板垂直移动时，这种结构便于空气流入和流出基板的下表面和热处理板的上表面之间的空间。

5. 发明授权

US06260562B1 Substrate cleaning apparatus and method 有权
标题翻译：基板清洗装置及方法
公开(公告)号：US06260562B1
公开(公告)日：2001-07-17
申请号：US09166593
申请日：1998-10-06
申请人： Kenya Morinishi , Masami Ohtani , Joichi Nishimura , Akihiko Morita
发明人： Kenya Morinishi , Masami Ohtani , Joichi Nishimura , Akihiko Morita
IPC分类号： B08B302
CPC分类号： H01L21/67051 , B05C11/08 , Y10S134/902
摘要： A substrate cleaning apparatus includes a spin support for supporting and spinning a substrate, a nozzle for discharging a cleaning liquid with a given cleaning condition from a discharge opening, a moving mechanism for moving the nozzle at least between center and edge of the substrate, a cleaning condition adjuster for adjusting the cleaning condition, and a controller for controlling the cleaning condition adjuster to vary the cleaning condition according to a cleaning liquid supply position movable over the substrate surface.
摘要翻译：基板清洗装置包括用于支撑和旋转基板的旋转支撑件，用于从排出口排出具有给定清洁条件的清洁液体的喷嘴，用于至少在基板的中心和边缘之间移动喷嘴的移动机构，清洁条件调节器，用于调节清洁状态;以及控制器，用于控制清洁状态调节器，以根据可移动到基板表面上的清洁液体供应位置来改变清洁状态。

6. 发明授权

US06051101A Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus 失效
标题翻译：基板处理装置，基板输送装置和基板输送装置
公开(公告)号：US06051101A
公开(公告)日：2000-04-18
申请号：US39824
申请日：1998-03-16
申请人： Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Takanori Kawamoto , Masaki Iwami , Joichi Nishimura , Akihiko Morita
发明人： Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Takanori Kawamoto , Masaki Iwami , Joichi Nishimura , Akihiko Morita
IPC分类号： B65G49/07 , H01L21/00 , H01L21/027 , H01L21/677 , B65H1/00
CPC分类号： H01L21/67161 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.
摘要翻译：单元布置部分包括在其最下部分的化学柜，而在基板上形成抗蚀剂膜的涂布单元和曝光后用于显影基板的显影单元布置在化学柜上方的设备的四个角上。此外，用于热处理基板的多级热处理单元布置在这些湿处理单元上方的设备的前部和后部。在作为基板处理单元的涂布单元之间的设备的前侧设置有用于供应诸如纯水的清洁液体并清洁基板的清洁单元。因此，提供了一种具有优异的维护可加工性的基板处理装置，并且处理单元的布置自由度高。

7. 发明授权

US06896466B2 Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US06896466B2
公开(公告)日：2005-05-24
申请号：US10096691
申请日：2002-03-12
申请人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
IPC分类号： B65G49/07 , B25J18/02 , B25J18/04 , H01L21/677 , H01L21/687
CPC分类号： B25J18/025 , B25J18/04 , H01L21/68707 , Y10S414/139
摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopially nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.
摘要翻译：基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。驱动机构（D 1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。当滑轮（47c）向上移动时，垂直运动件（42c）被带（L1）向上提升。类似的动作提升设置在垂直运动件（42,4a）顶部上的一对传送臂（31a，31b）。可嵌套多层结构的层数的增加排除了运输机器人（TR 1）在缩回位置的高度增加。基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR 1）以便运送装置。

8. 发明授权

US06688189B2 Robot 有权
标题翻译：机器人
公开(公告)号：US06688189B2
公开(公告)日：2004-02-10
申请号：US09837109
申请日：2001-04-18
申请人： Yasuhiko Hashimoto , Masami Ohtani , Joichi Nishimura
发明人： Yasuhiko Hashimoto , Masami Ohtani , Joichi Nishimura
IPC分类号： B25J1700
CPC分类号： B25J18/025 , F16M11/08 , F16M11/18 , F16M11/2014 , F16M11/28 , Y10S414/135 , Y10T74/18848 , Y10T74/20323
摘要： Provided is a robot comprising a telescopic-drive mechanism which does not contaminate works in a purified environment such as a clean room, is easy to handle, and requires no cover for covering the telescopic-drive mechanism. A robot comprises: an up-down axis in which a plurality of hollow axis sectional elements telescopically continue; and a telescopic-drive mechanism for driving the up-down axis to be vertically extended or retracted between an extended state in which a tip end of the up-down axis extends with respect to a base end thereof and a retracted state in which the tip end is moved close to the base end, wherein the telescopic-drive mechanism is integrated on one side of the up-down axis without being exposed from the up-down axis.
摘要翻译：本发明提供一种机器人，其包括不会在诸如洁净室的净化环境中污染工作的伸缩驱动机构，易于处理，并且不需要用于覆盖伸缩驱动机构的盖。机器人包括：上下轴线，多个中空轴线部分可伸缩地延伸在其中; 以及伸缩驱动机构，用于驱动上下轴线在上下轴线的前端相对于其基端部延伸的伸出状态和垂直延伸状态之间垂直延伸或缩回，在该状态下，端部移动靠近基端，其中伸缩驱动机构集成在上下轴线的一侧，而不会暴露于上下轴线。

9. 发明授权

US06371713B1 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US06371713B1
公开(公告)日：2002-04-16
申请号：US09143027
申请日：1998-08-28
申请人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
发明人： Joichi Nishimura , Masami Ohtani , Yasuhiko Hashimoto
IPC分类号： B65G4907
CPC分类号： B25J18/025 , B25J18/04 , H01L21/68707 , Y10S414/139
摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopically nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.
摘要翻译：基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。驱动机构（D1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。当滑轮（47c）向上移动时，垂直运动构件（42c）被带（L1）向上提升。类似的动作提升了设置在垂直运动件（42a）的顶部上的一对传送臂（31a，31b）。可嵌套多层结构的层数的增加排除了运输机器人（TR1）处于缩回位置的高度增加。基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR1）以便运送装置。

10. 发明授权

US6151744A Method of and apparatus for cleaning substrate 失效
标题翻译：清洗基材的方法和设备
公开(公告)号：US6151744A
公开(公告)日：2000-11-28
申请号：US839470
申请日：1997-04-14
申请人： Masami Ohtani , Masahide Ikeda , Mitsuhiro Fujita , Joichi Nishimura
发明人： Masami Ohtani , Masahide Ikeda , Mitsuhiro Fujita , Joichi Nishimura
IPC分类号： B08B1/04 , B08B3/12 , H01L21/00 , H01L21/304 , A46B13/02
CPC分类号： H01L21/67051 , H01L21/67046
摘要： A method of and apparatus for cleaning a substrate which require shorter processing time with high processing efficiency are disclosed. A cleaning brush pivots about a pivot axis between two positions. An ultrasonic cleaning nozzle pivots about a pivot axis between two positions. To perform a cleaning process, the cleaning brush and the ultrasonic cleaning nozzle are driven in accordance with a processing pattern previously produced by an operator. The processing pattern is produced so that the movement of the cleaning brush between two positions and the movement of the ultrasonic cleaning nozzle between two positions are not caused simultaneously. Any processing pattern desired by the operator may be produced if this requirement is satisfied. Execution of the cleaning process in accordance with the processing pattern allows cleaning of a substrate using the cleaning brush and the ultrasonic cleaning nozzle at the same time.
摘要翻译：公开了一种用于清洗需要较短处理时间并具有高处理效率的基板的方法和设备。清洁刷绕两个位置之间的枢转轴线枢转。超声波清洗喷嘴绕两个位置之间的枢转轴线枢转。为了执行清洁处理，清洁刷和超声波清洗喷嘴根据操作者先前生产的处理模式被驱动。产生处理图案，使得清洁刷在两个位置之间的移动和超声波清洗喷嘴在两个位置之间的运动不会同时产生。如果满足该要求，则可以产生操作者期望的任何处理模式。根据处理模式执行清洁处理允许使用清洁刷和超声波清洗喷嘴同时清洗基板。

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