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1. 发明授权

US09190311B2 Liquid arm cleaning unit for substrate processing apparatus 有权
标题翻译：用于基板处理设备的液体臂清洁单元
公开(公告)号：US09190311B2
公开(公告)日：2015-11-17
申请号：US13351653
申请日：2012-01-17
申请人： Jiro Higashijima , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
发明人： Jiro Higashijima , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
IPC分类号： H01L21/687 , B08B3/04 , H01L21/67
CPC分类号： H01L21/68728 , B08B3/04 , B08B3/041 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68742
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

2. 发明授权

US08607807B2 Liquid treatment apparatus and method 有权
标题翻译：液体处理装置及方法
公开(公告)号：US08607807B2
公开(公告)日：2013-12-17
申请号：US13355844
申请日：2012-01-23
申请人： Jiro Higashijima , Norihiro Itoh
发明人： Jiro Higashijima , Norihiro Itoh
IPC分类号： B08B3/08 , B08B3/02 , B08B5/00
CPC分类号： H01L21/6708 , H01L21/67051 , H01L21/68728
摘要： A liquid treatment method including: retaining a substrate with a treatment target surface being set as a lower surface, and rotating the substrate; supplying DIW (deionized water) to the lower surface of the substrate, thereby performing a rinsing process to the substrate; and thereafter supplying a mist containing IPA (isopropyl alcohol) and N2 gas, thereby substituting the IPA for the DIW. The supplying of the mist is performed using a nozzle positioned below the substrate, the nozzle comprising a plurality of ejection ports which are arrayed between a position opposing a central portion of the substrate and a position opposing a peripheral portion of the substrate.
摘要翻译：一种液体处理方法，包括：将处理对象表面设置为下表面并使所述基板旋转的基板; 向基材的下表面供给DIW（去离子水），从而对基材进行漂洗处理; 然后提供含有IPA（异丙醇）和N 2气体的雾，从而将IPA代替DIW。使用位于基板下方的喷嘴进行雾的供给，喷嘴包括排列在与基板的中心部分相对的位置与与基板的周边部分相对的位置之间的多个喷射口。

3. 发明授权

US09396975B2 Liquid treatment apparatus and method 有权
标题翻译：液体处理装置及方法
公开(公告)号：US09396975B2
公开(公告)日：2016-07-19
申请号：US13355877
申请日：2012-01-23
申请人： Jiro Higashijima , Norihiro Itoh
发明人： Jiro Higashijima , Norihiro Itoh
IPC分类号： B08B3/00 , H01L21/67 , H01L21/687
CPC分类号： H01L21/67051 , H01L21/68707 , H01L21/68728 , H01L21/68785 , H01L21/68792
摘要： A liquid treatment apparatus includes a substrate retaining unit, a rotational driving unit configured to rotate the substrate retaining unit; and a nozzle disposed below a lower surface of the substrate, the nozzle having first ejection ports provided to eject a chemical liquid and second ejection ports provided to eject a rinsing fluid towards the lower surface of the substrate. The nozzle comprises a first portion and a second portion each extending from a position opposing to a peripheral portion of the substrate towards a position opposing to a central portion of the substrate. At least part of the first ejection ports are arranged in the first portion. At least part of the second ejection ports are arranged in the second portion. The first portion and the second portion are arranged to form a V-shaped figure.
摘要翻译：液体处理装置包括基板保持单元，旋转驱动单元，其构造成使基板保持单元旋转; 以及设置在所述基板的下表面下方的喷嘴，所述喷嘴具有设置成喷射化学液体的第一喷射口和设置成朝向所述基板的下表面喷射冲洗流体的第二喷射口。喷嘴包括第一部分和第二部分，每个从与基板的周边部分相对的位置朝向与基板的中心部分相对的位置延伸。第一喷射口的至少一部分布置在第一部分中。第二喷射口的至少一部分布置在第二部分中。第一部分和第二部分被布置成形成V形图形。

4. 发明授权

US08246759B2 Substrate processing apparatus, substrate processing method, and program storage medium 有权
标题翻译：基板处理装置，基板处理方法和程序存储介质
公开(公告)号：US08246759B2
公开(公告)日：2012-08-21
申请号：US12474336
申请日：2009-05-29
申请人： Norihiro Itoh , Jiro Higashijima
发明人： Norihiro Itoh , Jiro Higashijima
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , B05D1/002 , B05D3/0486 , H01L21/68728 , H01L21/68742 , H01L21/68792
摘要： There is provided a substrate processing apparatus capable of stably holding a substrate and properly processing the substrate. The substrate processing apparatus is an apparatus that processes a substrate while rotating the substrate, with a place surface of the substrate being oriented in a horizontal direction. The substrate processing apparatus comprises a table including a rotatable base plate having a plurality of projecting members projected outward, and a rotation driving mechanism that rotates the base plate. The table can rotatably hold the substrate such that the projecting members contact the substrate from below with a gap formed between the substrate and the table. The substrate processing apparatus further comprises a pressure adjusting apparatus including a suction duct line having one end thereof being opened to the gap, and a suction mechanism connected to the other end of the suction duct line.
摘要翻译：提供了能够稳定地保持基板并适当地处理基板的基板处理装置。基板处理装置是在基板旋转的同时处理基板的装置，其中基板的位置表面沿水平方向取向。基板处理装置包括具有向外突出的多个突出部件的旋转基板的台面和使基板旋转的旋转驱动机构。工作台可旋转地保持基板，使得突出构件从下方接触基板和形成在基板和台之间的间隙。基板处理装置还包括压力调节装置，该压力调节装置具有其一端与间隙开口的吸入管路线路，以及与吸入管路线路的另一端连接的吸引机构。

5. 发明授权

US09048269B2 Substrate liquid treatment apparatus with lift pin plate 有权
标题翻译：带升降针板的基板液体处理装置
公开(公告)号：US09048269B2
公开(公告)日：2015-06-02
申请号：US13337533
申请日：2011-12-27
申请人： Jiro Higashijima , Nobuhiro Ogata , Satoshi Kaneko , Shuichi Nagamine , Yoshihiro Kai
发明人： Jiro Higashijima , Nobuhiro Ogata , Satoshi Kaneko , Shuichi Nagamine , Yoshihiro Kai
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/6708 , H01L21/67051 , H01L21/68728
摘要： Disclosed is a liquid treatment apparatus for processing a lower surface of the substrate. The apparatus includes a first nozzle disposed below a lower surface of the substrate retained by the substrate retaining unit to eject a treatment liquid towards the lower surface of the substrate, the first nozzle having a plurality of first ejection ports, which are arrayed from a position opposing a central portion of the substrate retained by the substrate retaining unit to a position opposing a peripheral portion of the substrate retained by the substrate retaining unit. An ejecting direction of the treatment liquid ejected from the first ejection port is inclined towards a rotation direction of the substrate rotated by the rotational driving unit.
摘要翻译：公开了一种用于处理基板的下表面的液体处理装置。该设备包括设置在基板保持单元保持的基板的下表面下方的第一喷嘴，以朝向基板的下表面喷射处理液体，第一喷嘴具有多个第一喷射口，其从位置将由基板保持单元保持的基板的中心部分相对于与由基板保持单元保持的基板的周边部分相对的位置。从第一喷射口喷出的处理液的排出方向朝着由旋转驱动单元旋转的基板的旋转方向倾斜。

6. 发明申请

US20100083986A1 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM 有权
标题翻译：液体加工设备，液体加工方法和储存介质
公开(公告)号：US20100083986A1
公开(公告)日：2010-04-08
申请号：US12596882
申请日：2008-12-12
申请人： Yuji Kamikawa , Norihiro Ito , Jiro Higashijima
发明人： Yuji Kamikawa , Norihiro Ito , Jiro Higashijima
IPC分类号： B08B3/08 , B08B13/00 , B08B7/00
CPC分类号： H01L21/68742 , H01L21/67051 , H01L21/68792
摘要： A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated.
摘要翻译：一种液体处理装置，包括：中空的保持板，其构造成保持待加工物体; 固定地连接到所述保持板的中空外旋转轴; 构造成旋转所述外旋转轴的旋转驱动部; 以及设置在所述保持板的中空空间中的提升销板，并且具有构造成支撑待处理物体的升降销。在升降销板内部，延长了构造成供给清洗液的清洗液供给部。连接到升降销板的是提升构件，其构造成将升降销板定位在上部位置和下部位置。当位于下部位置时，提升销板受到用于旋转外部旋转轴的旋转驱动部的力，使得升降销板旋转。

7. 发明授权

US08944081B2 Liquid processing apparatus and liquid processing method 有权
标题翻译：液体处理装置和液体处理方法
公开(公告)号：US08944081B2
公开(公告)日：2015-02-03
申请号：US13356236
申请日：2012-01-23
申请人： Jiro Higashijima
发明人： Jiro Higashijima
IPC分类号： B08B3/04 , H01L21/687 , H01L21/67
CPC分类号： H01L21/68742 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68728 , Y10S134/902
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a cup. The liquid processing apparatus includes: a processing chamber in which a substrate holding unit holding a substrate and a cup placed around the substrate holding unit are installed; a nozzle for supplying a processing liquid to the substrate held by the substrate holding unit; and a cup cleaning unit cleaning the cup by supplying a cleaning liquid to the upper part of the cup. A concave portion is formed in the upper part of the cup and the cup cleaning units supply the cleaning liquid to the concave portion in the upper part of the cup.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基底由于附着于杯子的污染而被污染。液体处理装置包括：处理室，其中安装有保持基板的基板保持单元和放置在基板保持单元周围的杯子; 用于向由所述基板保持单元保持的所述基板供给处理液的喷嘴; 以及杯子清洁单元，通过向杯子的上部提供清洁液体来清洁杯子。在杯的上部形成凹部，杯清洁单元将清洁液供给到杯的上部的凹部。

8. 发明授权

US08696863B2 Liquid processing apparatus and liquid processing method 有权
标题翻译：液体处理装置和液体处理方法
公开(公告)号：US08696863B2
公开(公告)日：2014-04-15
申请号：US12703868
申请日：2010-02-11
申请人： Jiro Higashijima , Hiromitsu Namba
发明人： Jiro Higashijima , Hiromitsu Namba
IPC分类号： B08B3/08 , B08B3/04
CPC分类号： H01L21/67051 , H01L21/67034 , H01L21/6708
摘要： A liquid processing apparatus supplies a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally, with a back surface of the substrate facing downward. The liquid processing apparatus prevents droplets from remaining on the member. The liquid processing apparatus includes a nozzle member irrotationally provided below the substrate. The nozzle member includes a processing-liquid discharge nozzle to discharge the processing liquid and a gas discharge nozzle to discharge drying gas on a top surface of the nozzle member. The processing-liquid discharge nozzle includes a processing-liquid discharge port to discharge the processing liquid toward the substrate. The gas discharge nozzle includes a first gas discharge port to discharge the drying gas toward the substrate, and a plurality of second gas discharge ports to discharge the drying gas in a radial direction along the top surface of the nozzle member.
摘要翻译：液体处理装置在基板沿水平方向旋转时将形成在非旋转构件上的喷嘴的处理液供给到基板，使基板的背面朝下。液体处理装置防止液滴残留在构件上。液体处理装置包括不旋转地设置在基板下方的喷嘴构件。喷嘴构件包括用于排出处理液的处理液排出喷嘴和用于在喷嘴构件的顶表面上排出干燥气体的气体排出喷嘴。处理液排出喷嘴包括将处理液朝向基板排出的处理液排出口。气体排出喷嘴包括用于将干燥气体朝向基板排出的第一气体排出口和多个第二气体排出口，以沿着喷嘴构件的顶表面沿径向排出干燥气体。

9. 发明授权

US08590547B2 Liquid processing apparatus 有权
标题翻译：液体处理设备
公开(公告)号：US08590547B2
公开(公告)日：2013-11-26
申请号：US12506506
申请日：2009-07-21
申请人： Jiro Higashijima , Hiromitsu Namba
发明人： Jiro Higashijima , Hiromitsu Namba
IPC分类号： B08B3/10
CPC分类号： H01L21/6708
摘要： A liquid processing apparatus processes a lower surface and a side surface of an object to be processed W. The liquid processing apparatus includes: a process-liquid supply mechanism configured to supply a process liquid to the object to be processed; a drain mechanism configured to drain the process liquid having processed the object to be processed W; a rotational cup disposed circumferentially outward the object to be processed W, the rotational cup being configured to guide the process liquid having processed the object to be processed W to the drain mechanism; and a driving part configured to rotate the rotational cup. The rotational cup is provided with a support part that projects circumferentially inward so as to support a circumferential part of the object to be processed W.
摘要翻译：液体处理装置处理待处理物体W的下表面和侧面。液体处理装置包括：处理液供给机构，被配置为向待处理物体供给处理液; 排出机构，被配置为排出已处理被处理物W的处理液; 旋转杯，其设置成将处理过的物体W的处理液引导到排出机构;旋转杯，以及构造成旋转旋转杯的驱动部。旋转杯设置有支撑部分，该支撑部分周向地突出以支撑待处理物体W的周向部分。

10. 发明授权

US08398817B2 Chemical-liquid processing apparatus and chemical-liquid processing method 有权
标题翻译：化工液处理装置及化学液处理方法
公开(公告)号：US08398817B2
公开(公告)日：2013-03-19
申请号：US12690968
申请日：2010-01-21
申请人： Hiromitsu Namba , Jiro Higashijima
发明人： Hiromitsu Namba , Jiro Higashijima
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01L21/6708 , H01L21/0209 , H01L21/31111 , H01L21/32134
摘要： Disclosed is a substrate processing apparatus to improve the etching uniformity when a back surface of a substrate is etched with a high-temperature chemical liquid. The chemical-liquid processing apparatus removes a film formed on a substrate by etching with a high-temperature chemical liquid. The apparatus includes a substrate holding mechanism to hold the substrate horizontally in a state where a back surface of the substrate faces downward, a rotating mechanism to rotate the substrate holding mechanism by a hollow rotating shaft extending vertically, a chemical-liquid discharge nozzle to supply the high-temperature chemical liquid to the back surface of the substrate by discharging the high-temperature chemical liquid upwardly, and a chemical-liquid supply mechanism to supply the chemical liquid to the chemical-liquid discharge nozzle. The chemical-liquid discharge nozzle includes a plurality of outlets discharging the high-temperature chemical liquid to a plurality of contacting places on the back surface of the substrate in different distances from the center of the back surface of the substrate, other than the center of the back surface of the substrate.
摘要翻译：公开了一种在用高温化学液体蚀刻衬底的背面时提高蚀刻均匀性的衬底处理设备。化学液处理装置通过用高温化学液体蚀刻除去形成在基板上的膜。该装置包括：基板保持机构，其在基板的背面朝下的状态下水平地保持基板;旋转机构，通过垂直延伸的中空旋转轴使基板保持机构旋转;药液排出喷嘴，通过向上排出高温化学液体而将高温化学液体排出到基板的背面，以及将药液供给到药液排出喷嘴的药液供给机构。药液排出喷嘴包括多个出口，将高温化学液体排出到与基板的背面的中心不同的距离处的基板的背面上的多个接触位置，除了中心衬底的背面。

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