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1. 发明申请

US20100018557A1 LIQUID PROCESSING APPARATUS 有权
标题翻译：液体加工设备
公开(公告)号：US20100018557A1
公开(公告)日：2010-01-28
申请号：US12506506
申请日：2009-07-21
申请人： Jiro Higashijima , Hiromitsu Namba
发明人： Jiro Higashijima , Hiromitsu Namba
IPC分类号： B08B3/10
CPC分类号： H01L21/6708
摘要： A liquid processing apparatus processes a lower surface and a side surface of an object to be processed W. The liquid processing apparatus includes: a process-liquid supply mechanism 37 and 29 configured to supply a process liquid to the object to be processed; a drain mechanism 20 and 21 configured to drain the process liquid having processed the object to be processed W; a rotational cup 10 disposed circumferentially outward the object to be processed W, the rotational cup 10 being configured to guide the process liquid having processed the object to be processed W to the drain mechanism 20 and 21; and a driving part 60 configured to rotate the rotational cup 10. The rotational cup 10 is provided with a support part 15 that projects circumferentially inward so as to support a circumferential part of the object to be processed W.
摘要翻译：液体处理装置处理待处理物体W的下表面和侧表面。液体处理装置包括：处理液供给机构37和29，被配置为向待处理物体供给处理液; 排出机构20,21构成为对被处理物W进行处理的液体的排出; 旋转杯10，被配置为将处理过的被处理物W的处理液引导到排出机构20和21;旋转杯10，以及构造成使旋转杯10旋转的驱动部60.旋转杯10设置有支撑部15，支撑部15周向地突出以支撑被处理物体W的周向部分。

2. 发明授权

US08696863B2 Liquid processing apparatus and liquid processing method 有权
标题翻译：液体处理装置和液体处理方法
公开(公告)号：US08696863B2
公开(公告)日：2014-04-15
申请号：US12703868
申请日：2010-02-11
申请人： Jiro Higashijima , Hiromitsu Namba
发明人： Jiro Higashijima , Hiromitsu Namba
IPC分类号： B08B3/08 , B08B3/04
CPC分类号： H01L21/67051 , H01L21/67034 , H01L21/6708
摘要： A liquid processing apparatus supplies a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally, with a back surface of the substrate facing downward. The liquid processing apparatus prevents droplets from remaining on the member. The liquid processing apparatus includes a nozzle member irrotationally provided below the substrate. The nozzle member includes a processing-liquid discharge nozzle to discharge the processing liquid and a gas discharge nozzle to discharge drying gas on a top surface of the nozzle member. The processing-liquid discharge nozzle includes a processing-liquid discharge port to discharge the processing liquid toward the substrate. The gas discharge nozzle includes a first gas discharge port to discharge the drying gas toward the substrate, and a plurality of second gas discharge ports to discharge the drying gas in a radial direction along the top surface of the nozzle member.
摘要翻译：液体处理装置在基板沿水平方向旋转时将形成在非旋转构件上的喷嘴的处理液供给到基板，使基板的背面朝下。液体处理装置防止液滴残留在构件上。液体处理装置包括不旋转地设置在基板下方的喷嘴构件。喷嘴构件包括用于排出处理液的处理液排出喷嘴和用于在喷嘴构件的顶表面上排出干燥气体的气体排出喷嘴。处理液排出喷嘴包括将处理液朝向基板排出的处理液排出口。气体排出喷嘴包括用于将干燥气体朝向基板排出的第一气体排出口和多个第二气体排出口，以沿着喷嘴构件的顶表面沿径向排出干燥气体。

3. 发明授权

US08590547B2 Liquid processing apparatus 有权
标题翻译：液体处理设备
公开(公告)号：US08590547B2
公开(公告)日：2013-11-26
申请号：US12506506
申请日：2009-07-21
申请人： Jiro Higashijima , Hiromitsu Namba
发明人： Jiro Higashijima , Hiromitsu Namba
IPC分类号： B08B3/10
CPC分类号： H01L21/6708
摘要： A liquid processing apparatus processes a lower surface and a side surface of an object to be processed W. The liquid processing apparatus includes: a process-liquid supply mechanism configured to supply a process liquid to the object to be processed; a drain mechanism configured to drain the process liquid having processed the object to be processed W; a rotational cup disposed circumferentially outward the object to be processed W, the rotational cup being configured to guide the process liquid having processed the object to be processed W to the drain mechanism; and a driving part configured to rotate the rotational cup. The rotational cup is provided with a support part that projects circumferentially inward so as to support a circumferential part of the object to be processed W.
摘要翻译：液体处理装置处理待处理物体W的下表面和侧面。液体处理装置包括：处理液供给机构，被配置为向待处理物体供给处理液; 排出机构，被配置为排出已处理被处理物W的处理液; 旋转杯，其设置成将处理过的物体W的处理液引导到排出机构;旋转杯，以及构造成旋转旋转杯的驱动部。旋转杯设置有支撑部分，该支撑部分周向地突出以支撑待处理物体W的周向部分。

4. 发明授权

US08398817B2 Chemical-liquid processing apparatus and chemical-liquid processing method 有权
标题翻译：化工液处理装置及化学液处理方法
公开(公告)号：US08398817B2
公开(公告)日：2013-03-19
申请号：US12690968
申请日：2010-01-21
申请人： Hiromitsu Namba , Jiro Higashijima
发明人： Hiromitsu Namba , Jiro Higashijima
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01L21/6708 , H01L21/0209 , H01L21/31111 , H01L21/32134
摘要： Disclosed is a substrate processing apparatus to improve the etching uniformity when a back surface of a substrate is etched with a high-temperature chemical liquid. The chemical-liquid processing apparatus removes a film formed on a substrate by etching with a high-temperature chemical liquid. The apparatus includes a substrate holding mechanism to hold the substrate horizontally in a state where a back surface of the substrate faces downward, a rotating mechanism to rotate the substrate holding mechanism by a hollow rotating shaft extending vertically, a chemical-liquid discharge nozzle to supply the high-temperature chemical liquid to the back surface of the substrate by discharging the high-temperature chemical liquid upwardly, and a chemical-liquid supply mechanism to supply the chemical liquid to the chemical-liquid discharge nozzle. The chemical-liquid discharge nozzle includes a plurality of outlets discharging the high-temperature chemical liquid to a plurality of contacting places on the back surface of the substrate in different distances from the center of the back surface of the substrate, other than the center of the back surface of the substrate.
摘要翻译：公开了一种在用高温化学液体蚀刻衬底的背面时提高蚀刻均匀性的衬底处理设备。化学液处理装置通过用高温化学液体蚀刻除去形成在基板上的膜。该装置包括：基板保持机构，其在基板的背面朝下的状态下水平地保持基板;旋转机构，通过垂直延伸的中空旋转轴使基板保持机构旋转;药液排出喷嘴，通过向上排出高温化学液体而将高温化学液体排出到基板的背面，以及将药液供给到药液排出喷嘴的药液供给机构。药液排出喷嘴包括多个出口，将高温化学液体排出到与基板的背面的中心不同的距离处的基板的背面上的多个接触位置，除了中心衬底的背面。

5. 发明授权

US08567339B2 Liquid processing apparatus 有权
标题翻译：液体处理设备
公开(公告)号：US08567339B2
公开(公告)日：2013-10-29
申请号：US12818505
申请日：2010-06-18
申请人： Jiro Higashijima , Hiromitsu Namba
发明人： Jiro Higashijima , Hiromitsu Namba
IPC分类号： B05C5/02
CPC分类号： H01L21/6708
摘要： There is provided a liquid processing apparatus capable of preventing an atmospheric air of a lower surface side of a substrate, to which a processing liquid is supplied, from circulating and being introduced into an upper surface side of the substrate, to which the processing liquid is not supplied, and capable of decreasing a fuzzy gas consumption supplied to separate the atmospheres between the lower and upper surface sides from each other. An upper plate 5 is disposed at an opposite side to the upper surface of the substrate maintained horizontally and a gas supplier 53, 531 supplies a pressurized gas into a space formed between the upper plate and the substrate. Also, due to a negative pressure built in a space formed between the upper plate and the substrate, an atmospheric gas outside the space is introduced into the space via a gas inlet port.
摘要翻译：提供了一种液体处理装置，其能够防止供给处理液的基板的下表面侧的大气通过循环并被引入到基板的上表面侧，处理液为不提供，并且能够降低供应的模糊气体消耗量以将下表面和上表面之间的气氛彼此分离。上板5设置在与水平保持的基板的上表面相反的一侧，气体供给器53,531将加压气体供给到形成在上板和基板之间的空间中。此外，由于内置在上板和基板之间的空间中的负压，空间外的大气气体经由气体入口被引入到空间中。

6. 发明申请

US20120067846A1 Liquid Processing Method, Recording Medium Having Recorded Program for Executing Liquid Processing Method Therein and Liquid Processing Apparatus 有权
标题翻译：液体处理方法，具有用于执行液体处理方法的记录程序的记录介质和液体处理装置
公开(公告)号：US20120067846A1
公开(公告)日：2012-03-22
申请号：US13223543
申请日：2011-09-01
申请人： Tsuyoshi Mizuno , Hiromitsu Namba , Yuichiro Morozumi , Shingo Hishiya , Katsushige Harada , Fumiaki Hayase
发明人： Tsuyoshi Mizuno , Hiromitsu Namba , Yuichiro Morozumi , Shingo Hishiya , Katsushige Harada , Fumiaki Hayase
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： C23F1/08 , H01L21/02087 , H01L21/0209 , H01L21/6708 , H01L21/68785 , H01L21/68792
摘要： Disclosed is a method for processing a substrate including a first process and a second process. The first process comprises supporting the substrate formed with a titanium-containing film on its front surface and rear surface by a support unit which is rotatably installed; rotating the substrate along with the support unit; and supplying a first processing liquid containing hydrofluoric acid to the rear surface of the substrate thereby processing the rear surface of the substrate with the first processing liquid. The second process comprises supplying a second processing liquid containing ammonia hydrogen peroxide mixture to the rear surface of the substrate after the first process is completed, thereby processing the rear surface of the substrate with the second processing liquid.
摘要翻译：公开了一种用于处理包括第一工艺和第二工艺的衬底的方法。第一种方法包括通过可旋转地安装的支撑单元在其前表面和后表面上支撑由含钛膜形成的基板; 与支撑单元一起旋转基板; 并将含有氢氟酸的第一处理液体供给到所述基板的后表面，由此用所述第一处理液处理所述基板的后表面。第二种方法包括在第一工艺完成之后，将含有氨过氧化氢混合物的第二处理液体供应到衬底的后表面，由此用第二处理液处理衬底的后表面。

7. 发明授权

US08815112B2 Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus 有权
标题翻译：液体处理方法，具有用于执行液体处理方法的记录程序的记录介质和液体处理装置
公开(公告)号：US08815112B2
公开(公告)日：2014-08-26
申请号：US13223543
申请日：2011-09-01
申请人： Tsuyoshi Mizuno , Hiromitsu Namba , Yuichiro Morozumi , Shingo Hishiya , Katsushige Harada , Fumiaki Hayase
发明人： Tsuyoshi Mizuno , Hiromitsu Namba , Yuichiro Morozumi , Shingo Hishiya , Katsushige Harada , Fumiaki Hayase
IPC分类号： C25F3/00 , C23F1/08 , H01L21/67 , H01L21/02 , H01L21/687
CPC分类号： C23F1/08 , H01L21/02087 , H01L21/0209 , H01L21/6708 , H01L21/68785 , H01L21/68792
摘要： Disclosed is a method for processing a substrate including a first process and a second process. The first process comprises supporting the substrate formed with a titanium-containing film on its front surface and rear surface by a support unit which is rotatably installed; rotating the substrate along with the support unit; and supplying a first processing liquid containing hydrofluoric acid to the rear surface of the substrate thereby processing the rear surface of the substrate with the first processing liquid. The second process comprises supplying a second processing liquid containing ammonia hydrogen peroxide mixture to the rear surface of the substrate after the first process is completed, thereby processing the rear surface of the substrate with the second processing liquid.
摘要翻译：公开了一种用于处理包括第一工艺和第二工艺的衬底的方法。第一种方法包括通过可旋转地安装的支撑单元在其前表面和后表面上支撑由含钛膜形成的基板; 与支撑单元一起旋转基板; 并将含有氢氟酸的第一处理液体供给到所述基板的后表面，由此用所述第一处理液处理所述基板的后表面。第二种方法包括在第一工艺完成之后，将含有氨过氧化氢混合物的第二处理液体供应到衬底的后表面，由此用第二处理液处理衬底的后表面。

8. 发明申请

US20110308554A1 Liquid Processing Apparatus, Liquid Processing Method, and Storage Medium Having Computer Program Recorded Therein 有权
标题翻译：液体处理设备，液体处理方法和存储计算机程序的存储介质
公开(公告)号：US20110308554A1
公开(公告)日：2011-12-22
申请号：US13158651
申请日：2011-06-13
申请人： Hiromitsu Namba
发明人： Hiromitsu Namba
IPC分类号： B08B3/00
CPC分类号： H01L21/6708 , H01L21/67051
摘要： Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.
摘要翻译：本发明提供一种液体处理装置，其中目标基板水平地保持在基板保持单元上并围绕垂直轴旋转，并且化学品从化学品供应单元供应到正在旋转的目标基板的底表面。特别地，液体处理装置执行第一步骤，其中在以第一转速旋转目标基板的同时将化学品供应到目标基板，其中化学品的供应停止并且化学品被甩出的第二步骤通过以比第一旋转速度高的第二旋转速度旋转目标基板，以及第三步骤，其中在以等于或低于第一旋转的第三旋转速度旋转目标基板的同时将冲洗液体供给到目标基板速度。

9. 发明申请

US20110062114A1 SUBSTRATE LIQUID-PROCESSING METHOD, SUBSTRATE LIQUID-PROCESSING APPARATUS, AND STORAGE MEDIUM 审中-公开
标题翻译：基板液体处理方法，基板液体处理装置和储存介质
公开(公告)号：US20110062114A1
公开(公告)日：2011-03-17
申请号：US12877272
申请日：2010-09-08
申请人： Tsuyoshi MIZUNO , Hiromitsu Namba
发明人： Tsuyoshi MIZUNO , Hiromitsu Namba
IPC分类号： C23F1/24 , C23F1/08
CPC分类号： H01L21/6708 , H01L21/02087 , H01L21/32134
摘要： First, hydrofluoric acid is supplied to the circumferential edge of a substrate W while the substrate W provided with a polysilicon film is rotated, to remove a natural oxide film provided along the circumferential edge of the substrate W by etching so as to expose the polysilicon film. Next, hydrofluoric-nitric acid is supplied to the circumferential edge of the substrate W while the substrate W from which the polysilicon film is exposed is rotated, to remove the polysilicon film by etching. Such operation is performed by controlling a rotational driving unit 20, a hydrofluoric acid supplying unit 54, and a hydrofluoric-nitric acid supplying unit 52 by a control unit 50 of a substrate liquid-processing apparatus 1.
摘要翻译：首先，在设置有多晶硅膜的基板W旋转的同时，将氢氟酸供给到基板W的周缘，通过蚀刻除去沿着基板W的周缘设置的自然氧化膜，从而露出多晶硅膜。接着，在露出多晶硅膜的基板W旋转的同时，向基板W的周缘部供给氢氟酸，通过蚀刻除去多晶硅膜。通过基板液体处理装置1的控制单元50控制旋转驱动单元20，氢氟酸供应单元54和氢氟酸 - 硝酸供应单元52进行这种操作。

10. 发明授权

US08529707B2 Liquid processing apparatus, liquid processing method, and storage medium having computer program recorded therein 有权
标题翻译：液体处理装置，液体处理方法以及记录有计算机程序的存储介质
公开(公告)号：US08529707B2
公开(公告)日：2013-09-10
申请号：US13158651
申请日：2011-06-13
申请人： Hiromitsu Namba
发明人： Hiromitsu Namba
IPC分类号： B08B3/04
CPC分类号： H01L21/6708 , H01L21/67051
摘要： Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.
摘要翻译：本发明提供一种液体处理装置，其中目标基板水平地保持在基板保持单元上并围绕垂直轴旋转，并且化学品从化学品供应单元供应到正在旋转的目标基板的底表面。特别地，液体处理装置执行第一步骤，其中在以第一转速旋转目标基板的同时将化学品供应到目标基板，其中化学品的供应停止并且化学品被甩出的第二步骤通过以比第一旋转速度高的第二旋转速度旋转目标基板，以及第三步骤，其中在以等于或低于第一旋转的第三旋转速度旋转目标基板的同时将冲洗液体供给到目标基板速度。

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