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1. 发明授权

US09190311B2 Liquid arm cleaning unit for substrate processing apparatus 有权
标题翻译：用于基板处理设备的液体臂清洁单元
公开(公告)号：US09190311B2
公开(公告)日：2015-11-17
申请号：US13351653
申请日：2012-01-17
申请人： Jiro Higashijima , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
发明人： Jiro Higashijima , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
IPC分类号： H01L21/687 , B08B3/04 , H01L21/67
CPC分类号： H01L21/68728 , B08B3/04 , B08B3/041 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68742
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

2. 发明申请

US20120180828A1 Liquid Processing Apparatus and Liquid Processing Method 有权
标题翻译：液体处理设备和液体处理方法
公开(公告)号：US20120180828A1
公开(公告)日：2012-07-19
申请号：US13351653
申请日：2012-01-17
申请人： Jiro HIGASHIJIMA , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
发明人： Jiro HIGASHIJIMA , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
IPC分类号： B08B3/00
CPC分类号： H01L21/68728 , B08B3/04 , B08B3/041 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68742
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

3. 发明申请

US20130180659A1 LIQUID TREATMENT APPARATUS 有权
标题翻译：液体处理装置
公开(公告)号：US20130180659A1
公开(公告)日：2013-07-18
申请号：US13823205
申请日：2012-08-01
申请人： Norihiro Itoh , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
发明人： Norihiro Itoh , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
IPC分类号： H01L21/02 , H01L21/465
CPC分类号： H01L21/02041 , H01L21/465 , H01L21/67051 , H01L21/6719 , H01L21/68785 , H01L21/68792
摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).
摘要翻译：液体处理装置包括：水平地保持基板并旋转基板的基板保持件（21），将处理液体供给到由基板保持件保持的基板的处理液喷嘴（82），布置在由基板保持器保持的基板的周缘的外侧，接收由处理液喷嘴供给到基板的处理液，从上方覆盖基板保持体的基板的顶板（32），旋转顶板的顶板旋转驱动机构和围绕顶板的周缘的液体接收构件（130），并具有圆形的液体容纳空间（132）。

4. 发明授权

US09177838B2 Liquid process apparatus and liquid process method 有权
标题翻译：液体加工设备和液体加工方法
公开(公告)号：US09177838B2
公开(公告)日：2015-11-03
申请号：US13546394
申请日：2012-07-11
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
IPC分类号： B08B3/00 , H01L21/67 , G03F7/42
CPC分类号： H01L21/67051 , G03F7/423
摘要： A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.
摘要翻译：顶板32设置成在顶板32从由基板保持单元21保持的基板W上方覆盖的前进位置和从前进位置缩回的缩回位置之间沿水平方向移动。被配置为向下供给净化气体的空气罩70被设置为在从由基板保持单元21保持的基板W的上方覆盖着空气罩的下部位置和位于下部位置上方的上部位置之间提升。

5. 发明授权

US09691602B2 Liquid process apparatus and liquid process method 有权
公开(公告)号：US09691602B2
公开(公告)日：2017-06-27
申请号：US13546372
申请日：2012-07-11
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
IPC分类号： H01L21/02 , H01L21/67
CPC分类号： H01L21/02041 , H01L21/67051 , H01L21/6719 , Y02E60/34 , Y10T137/0318 , Y10T137/598
摘要： A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.

6. 发明申请

US20130014786A1 LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD 有权
标题翻译：液体过程设备和液体过程方法
公开(公告)号：US20130014786A1
公开(公告)日：2013-01-17
申请号：US13546372
申请日：2012-07-11
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
IPC分类号： B08B3/04 , F17D1/00
CPC分类号： H01L21/02041 , H01L21/67051 , H01L21/6719 , Y02E60/34 , Y10T137/0318 , Y10T137/598
摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.
摘要翻译：顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

7. 发明授权

US09768010B2 Liquid treatment apparatus 有权
公开(公告)号：US09768010B2
公开(公告)日：2017-09-19
申请号：US13823205
申请日：2012-08-01
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
IPC分类号： H01L21/02 , H01L21/465 , H01L21/67 , H01L21/687
CPC分类号： H01L21/02041 , H01L21/465 , H01L21/67051 , H01L21/6719 , H01L21/68785 , H01L21/68792
摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).

8. 发明授权

US08449684B2 Substrate cleaning method, substrate cleaning system and program storage medium 有权
标题翻译：基板清洗方法，基板清洗系统和程序存储介质
公开(公告)号：US08449684B2
公开(公告)日：2013-05-28
申请号：US11783748
申请日：2007-04-11
申请人： Tsukasa Watanabe , Naoki Shindo
发明人： Tsukasa Watanabe , Naoki Shindo
IPC分类号： B08B7/00 , B08B7/04 , B08B3/00
CPC分类号： H01L21/67057 , B08B3/048 , B08B3/12
摘要： The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate W is subjected to an ultrasonic cleaning process. The step of generating ultrasonic waves includes a step of generating ultrasonic waves in the cleaning tank while the cleaning liquid is being supplied into the cleaning tank. A supply rate at which the cleaning liquid is supplied into the cleaning tank at a certain timing in the step of generating ultrasonic waves differs from a supply rate at which the cleaning liquid is supplied into the cleaning tank at another timing in the step of generating ultrasonic waves.
摘要翻译：本发明提供一种能够以高去除效率从待处理基板的整个表面去除颗粒的基板清洗方法。在本发明的基板清洗方法中，将待处理基板W浸入清洗槽12内的清洗液中。然后，在包含在清洗槽12内的清洗液中产生超声波，使基板 W进行超声波清洗处理。产生超声波的步骤包括在将清洁液供给到清洗槽中时在清洗槽中产生超声波的步骤。在产生超声波的步骤中的某个时刻将清洗液供给到清洗槽中的供给速度与在生成超声波的步骤中的另一定时将清洗液供给到清洗槽中的供给速度不同波浪。

9. 发明申请

US20120283980A1 METHOD OF MANAGING CLINICAL TESTING APPARATUS, CLINICAL TESTING SYSTEM, AND MAINTENANCE MANAGEMENT APPARATUS 有权
标题翻译：临床试验装置，临床试验系统和维护管理装置的管理方法
公开(公告)号：US20120283980A1
公开(公告)日：2012-11-08
申请号：US13459848
申请日：2012-04-30
申请人： Yusuke Suga , Naoki Shindo , Atsumasa Sone , Hiroyuki Koyama , Shunsuke Ariyoshi
发明人： Yusuke Suga , Naoki Shindo , Atsumasa Sone , Hiroyuki Koyama , Shunsuke Ariyoshi
IPC分类号： G06F17/18
CPC分类号： G06F19/366 , G01N35/00623 , G01N35/00871 , G05B2219/24001 , G05B2219/2657 , G06F19/00 , G16H10/40
摘要： A management system connected with a clinical testing apparatus is disclosed. The system acquires, from the clinical testing apparatus, a parameter that varies according to deterioration of the unit at a plurality of points of time, stores the parameters and/or analysis results that are obtained by analyzing the parameters, and provides a screen data for showing the stored parameters and/or the stored analysis results in a time-series format. A method for managing a clinical testing apparatus and a clinical testing system for the method are also disclosed.
摘要翻译：公开了一种与临床试验装置连接的管理系统。该系统从临床测试装置获取根据多个时间点的单元的劣化而变化的参数，存储通过分析参数获得的参数和/或分析结果，并提供用于以时间序列格式显示存储的参数和/或存储的分析结果。还公开了用于管理该方法的临床测试装置和临床测试系统的方法。

10. 发明授权

US08090585B2 Audio decoding device 有权
标题翻译：音频解码装置
公开(公告)号：US08090585B2
公开(公告)日：2012-01-03
申请号：US11822907
申请日：2007-07-11
申请人： Hideyuki Kakuno , Naoki Shindo
发明人： Hideyuki Kakuno , Naoki Shindo
IPC分类号： G10L19/00 , G10L21/00
CPC分类号： H04S3/008 , G10L19/008 , H04N21/439 , H04S2420/03
摘要： An audio decoding device comprises an audio decoding section for decoding first stream data and second stream data to generate two pieces of audio data and a data processing parameter, an external setting section in which a parameter corresponding to the data processing parameter is set, and an audio data processing section for processing the two pieces of audio data. When the data processing parameter contained in the second stream data is inappropriate, the audio data processing section performs data processing using the parameter set in the external setting section. When the data processing parameter contained in the second stream data is appropriate, the audio data processing section performs data processing using the data processing parameter generated by the audio decoding section.
摘要翻译：音频解码装置包括用于解码第一流数据的音频解码部分和第二数据流数据以产生两条音频数据和数据处理参数，其中设置与数据处理参数对应的参数的外部设置部分，以及音频数据处理部分，用于处理两个音频数据。当包含在第二流数据中的数据处理参数不合适时，音频数据处理部分使用在外部设置部分中设置的参数进行数据处理。当包含在第二流数据中的数据处理参数适当时，音频数据处理部分使用由音频解码部分生成的数据处理参数进行数据处理。

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