专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06391111B1 Coating apparatus 有权
标题翻译：涂装设备
公开(公告)号：US06391111B1
公开(公告)日：2002-05-21
申请号：US09231659
申请日：1999-01-15
申请人： Akihiro Fujimoto , Kazuo Sakamoto , Nobukazu Ishizaka , Izumi Hasegawa
发明人： Akihiro Fujimoto , Kazuo Sakamoto , Nobukazu Ishizaka , Izumi Hasegawa
IPC分类号： B05B1302
CPC分类号： B05C11/1034 , B05C11/08 , B05C11/1026 , B05C11/1047 , H01L21/6715 , H01L21/67253
摘要： To provide a coating apparatus which is capable of making short a lag time up to action of a valve and making operate a discharging pump and a valve with the best timing. By employing electric-air regulators ER1 and ER2 of small size and high response speed as a speed controller for controlling a switching speed of a switching valve AV or a suck-back valve SV, total flowing course is made short, thereby a time lag up to operation of a valve is made short. Further, by detecting the pressure of a resist liquid being discharged from a discharging pump 120 by a pressure sensor 123, and by controlling the operation of each device of a discharging pump 120, a switching valve AV, and a suck-back valve SV through a controller 180, a discharging pump 120, a switching valve AV, and a suck-back valve SV can be operated with the best timings, and generation of particles due to dripping of a resist liquid at a tip end of a resist nozzle 60 is prevented from occurring.
摘要翻译：提供一种涂覆装置，其能够使阀的作用更短的滞后时间，并且以最佳时机操作排出泵和阀。通过采用小型，高响应速度的电气调节器ER1和ER2作为用于控制切换阀AV或回吸阀SV的切换速度的速度控制器，总流程减短，从而时间延迟使阀门的操作变短。此外，通过检测由压力传感器123从排出泵120排出的抗蚀剂液体的压力，并且通过控制排出泵120，切换阀AV和回吸阀SV的每个装置的操作，通过控制器180，排出泵120，切换阀AV和回吸阀SV可以以最佳的时机运行，并且由于抗蚀剂喷嘴60的尖端处的抗蚀剂液体的滴落而产生的颗粒是防止发生。

2. 发明授权

US06193783B1 Apparatus and method for supplying a process solution 有权
标题翻译：用于提供工艺溶液的装置和方法
公开(公告)号：US06193783B1
公开(公告)日：2001-02-27
申请号：US09328770
申请日：1999-06-09
申请人： Kazuo Sakamoto , Akihiro Fujimoto , Nobukazu Ishizaka , Izumi Hasegawa
发明人： Kazuo Sakamoto , Akihiro Fujimoto , Nobukazu Ishizaka , Izumi Hasegawa
IPC分类号： B01D1900
CPC分类号： B01D19/0063
摘要： A process solution supplying apparatus including a solution source from which a process solution is supplied, a supply pipe having an upstream end and a downstream end and connected at the upstream end to the solution source, a nozzle connected to the downstream end of the supply pipe, a pump provided on the supply pipe, for supplying the process solution from the solution source to the nozzle, an upstream control valve provided on the supply pipe and located between the pump and the solution source, and a deaerating mechanism provided between the pump and the upstream control valve, for removing gases from the process solution.
摘要翻译：一种工艺溶液供给装置，包括供给了处理液的溶液源，具有上游端和下游端的供给管，并且在上游端与溶液源连接，与供给管的下游端连接的喷嘴设置在所述供给管上的用于将所述处理液从所述溶液源供给到所述喷嘴的泵，设置在所述供给管上且位于所述泵与所述溶液源之间的上游侧阀，以及设置在所述泵和所述泵之间的脱气机构，上游控制阀，用于从工艺溶液中除去气体。

3. 发明授权

US06824616B2 Substrate processing method and substrate processing system 失效
标题翻译：基板加工方法和基板处理系统
公开(公告)号：US06824616B2
公开(公告)日：2004-11-30
申请号：US10121612
申请日：2002-04-15
申请人： Takahiro Kitano , Shinichi Sugimoto , Shinji Kobayashi , Naoya Hirakawa , Akira Fukutomi , Nobukazu Ishizaka
发明人： Takahiro Kitano , Shinichi Sugimoto , Shinji Kobayashi , Naoya Hirakawa , Akira Fukutomi , Nobukazu Ishizaka
IPC分类号： C23C1400
CPC分类号： H01L21/6715 , B05D3/0466 , B05D3/0486 , G03F7/162
摘要： The present invention relates to a processing method for processing a substrate, and comprises a step of coating a coating solution on a surface of the substrate while relatively moving a coating solution discharge nozzle and the substrate and discharging the coating solution from the nozzle onto the substrate. Thereafter, the substrate is exposed to a solvent atmosphere of the coating solution or the pressure is temporarily applied thereto in a container. Thereafter, the pressure inside the container in which the substrate is housed is reduced to dry the coating solution on the substrate. According to the present invention, it is possible to narrow the so-called edge cutting width, which is at a periphery part of the substrate and is not commercialized, and to maintain an in-plane uniformity of the coating film.
摘要翻译：本发明涉及一种处理基板的处理方法，包括在使涂布液排出喷嘴和基板相对移动并将涂布溶液从喷嘴排出到基板上的同时在基板的表面上涂布涂布液的步骤。此后，将基板暴露于涂布溶液的溶剂气氛中，或者将压力暂时施加到容器中。此后，将容纳基板的容器内部的压力减小，以使基材上的涂布溶液干燥。根据本发明，可以缩小位于基板的周边部分并且不商业化的所谓的边缘切割宽度，并且保持涂膜的面内均匀性。

4. 发明授权

US06514344B2 Film forming unit 失效
标题翻译：成膜单元
公开(公告)号：US06514344B2
公开(公告)日：2003-02-04
申请号：US09735459
申请日：2000-12-14
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05B300
CPC分类号： H01L21/6715
摘要： The present invention is a film forming unit for forming a film on a substrate by supplying a coating solution on the substrate from a discharge nozzle, including moving means for moving the discharge nozzle, wherein the moving means comprises a supporting member for supporting the discharge nozzle, a moving member for moving the supporting member, a guide shaft passing through bearing portion which is formed in the supporting member, and an air supply mechanism for supplying air to a space between the bearing portion and the guide shaft. The discharge nozzle discharges the coating solution while moving along the guide shaft. On the substrate the coating solution is applied along the locus of the discharge nozzle movement. Since air is supplied to the space between the bearing portion and the guide shaft, the supporting member can be made to be in the state of floating relative the guide shaft. As a result, even if the discharge nozzle moves at high speed, the discharge of the coating solution is prevented from being disturbed so that the predetermined coating of the coating solution is performed precisely.
摘要翻译：本发明是一种用于在基板上形成膜的成膜单元，该装置包括：用于移动排放喷嘴的移动装置，该排出喷嘴由排放喷嘴提供在基板上，其中移动装置包括用于支撑排出喷嘴，用于移动支撑构件的移动构件，穿过形成在支撑构件中的轴承部分的引导轴和用于将空气供给到轴承部分和引导轴之间的空间的空气供应机构。排出喷嘴在沿着导向轴移动的同时排出涂布溶液。在基材上，涂布溶液沿排出喷嘴运动的轨迹施加。由于空气被供给到轴承部和引导轴之间的空间，所以支撑部件能够相对于引导轴处于浮动状态。结果，即使排出喷嘴高速移动，也可以防止涂布液的排出受到干扰，从而精确地进行涂布液的预定涂布。

5. 发明授权

US5882426A Method of cleaning a substrate by scrubbing 失效
标题翻译：通过洗涤清洁基材的方法
公开(公告)号：US5882426A
公开(公告)日：1999-03-16
申请号：US798342
申请日：1997-02-10
申请人： Akira Yonemizu , Nobukazu Ishizaka , Tomoko Hamada
发明人： Akira Yonemizu , Nobukazu Ishizaka , Tomoko Hamada
IPC分类号： B08B1/04 , B08B7/04 , B08B11/02 , H01L21/00 , H01L21/304
CPC分类号： H01L21/67098 , B08B1/007 , B08B1/04 , B08B11/02 , H01L21/67028
摘要： The present invention provides a cleaning method in which an object to be cleaned is held such that a surface of the object to be cleaned faces a cleaning body and the object to be cleaned and the cleaning body are moved relative to each other in a state where the cleaning body is in contact with the surface to the object to be cleaned, thereby cleaning the surface of the object to be cleaned, wherein a contact pressure of the cleaning body to the surface of the object to be cleaned is set at most 20 gf/cm.sup.2, when the surface is cleaned.
摘要翻译：本发明提供了一种清洁方法，其中待清洁物体被保持成使得待清洁物体的表面面向清洁体，并且待清洁物体和清洁体相对于彼此移动，清洁体与要清洁的物体的表面接触，从而清洁被清洁物体的表面，其中清洁体与被清洁物体的表面的接触压力设定为最多20gf / cm2，当表面被清洁。

6. 发明授权

US06936107B2 Coating film forming apparatus and coating unit 失效
标题翻译：涂膜成膜装置和涂装单元
公开(公告)号：US06936107B2
公开(公告)日：2005-08-30
申请号：US10728768
申请日：2003-12-08
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： H01L21/027 , G03F7/16 , H01L21/00 , B05C11/10
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
摘要翻译：一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂各单位。在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

7. 发明申请

US20050100679A1 Substrate processing method and substrate processing system 失效
标题翻译：基板加工方法和基板处理系统
公开(公告)号：US20050100679A1
公开(公告)日：2005-05-12
申请号：US10964684
申请日：2004-10-15
申请人： Takahiro Kitano , Shinichi Sugimoto , Shinji Kobayashi , Naoya Hirakawa , Akira Fukutomi , Nobukazu Ishizaka
发明人： Takahiro Kitano , Shinichi Sugimoto , Shinji Kobayashi , Naoya Hirakawa , Akira Fukutomi , Nobukazu Ishizaka
IPC分类号： H01L21/027 , B05D3/04 , G03F7/16 , H01L21/00 , B05C5/00
CPC分类号： H01L21/6715 , B05D3/0466 , B05D3/0486 , G03F7/162
摘要： The present invention relates to a processing method for processing a substrate, and comprises a step of coating a coating solution on a surface of the substrate while relatively moving a coating solution discharge nozzle and the substrate and discharging the coating solution from the nozzle onto the substrate. Thereafter, the substrate is exposed to a solvent atmosphere of the coating solution or the pressure is temporarily applied thereto in a container. Thereafter, the pressure inside the container in which the substrate is housed is reduced to dry the coating solution on the substrate. According to the present invention, it is possible to narrow the so-called edge cutting width, which is at a periphery part of the substrate and is not commercialized, and to maintain an in-plane uniformity of the coating film.
摘要翻译：本发明涉及一种处理基板的处理方法，包括在使涂布液排出喷嘴和基板相对移动并将涂布溶液从喷嘴排出到基板上的同时在基板的表面上涂布涂布液的步骤。此后，将基板暴露于涂布溶液的溶剂气氛中，或者将压力暂时施加到容器中。此后，将容纳基板的容器内部的压力减小，以使基材上的涂布溶液干燥。根据本发明，可以缩小位于基板的周边部分并且不商业化的所谓的边缘切割宽度，并且保持涂膜的面内均匀性。

8. 发明授权

US06676757B2 Coating film forming apparatus and coating unit 有权
标题翻译：涂膜成膜装置和涂装单元
公开(公告)号：US06676757B2
公开(公告)日：2004-01-13
申请号：US09734877
申请日：2000-12-13
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C1110
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
摘要翻译：一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂各单位。在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

9. 发明授权

US07179504B2 Substrate processing method and substrate processing system 失效
标题翻译：基板加工方法和基板处理系统
公开(公告)号：US07179504B2
公开(公告)日：2007-02-20
申请号：US10964684
申请日：2004-10-15
申请人： Takahiro Kitano , Shinichi Sugimoto , Shinji Kobayashi , Naoya Hirakawa , Akira Fukutomi , Nobukazu Ishizaka
发明人： Takahiro Kitano , Shinichi Sugimoto , Shinji Kobayashi , Naoya Hirakawa , Akira Fukutomi , Nobukazu Ishizaka
IPC分类号： B05D3/02 , B05D3/12
CPC分类号： H01L21/6715 , B05D3/0466 , B05D3/0486 , G03F7/162
摘要： The present invention relates to a processing method for processing a substrate, and comprises a step of coating a coating solution on a surface of the substrate while relatively moving a coating solution discharge nozzle and the substrate and discharging the coating solution from the nozzle onto the substrate. Thereafter, the substrate is exposed to a solvent atmosphere of the coating solution or the pressure is temporarily applied thereto in a container. Thereafter, the pressure inside the container in which the substrate is housed is reduced to dry the coating solution on the substrate. According to the present invention, it is possible to narrow the so-called edge cutting width, which is at a periphery part of the substrate and is not commercialized, and to maintain an in-plane uniformity of the coating film.
摘要翻译：本发明涉及一种处理基板的处理方法，包括在使涂布液排出喷嘴和基板相对移动并将涂布溶液从喷嘴排出到基板上的同时在基板的表面上涂布涂布液的步骤。此后，将基板暴露于涂布溶液的溶剂气氛中，或者将压力暂时施加到容器中。此后，将容纳基板的容器内部的压力减小，以使基材上的涂布溶液干燥。根据本发明，可以缩小位于基板的周边部分并且不商业化的所谓的边缘切割宽度，并且保持涂膜的面内均匀性。

10. 发明授权

US07087118B2 Coating film forming apparatus and coating unit 失效
标题翻译：涂膜成膜装置和涂装单元
公开(公告)号：US07087118B2
公开(公告)日：2006-08-08
申请号：US11080756
申请日：2005-03-16
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C11/10 , B05B12/12
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
摘要翻译：一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂各单位。在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式