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1. 发明授权

US08823309B2 Stage device 有权
标题翻译：舞台装置
公开(公告)号：US08823309B2
公开(公告)日：2014-09-02
申请号：US13391962
申请日：2010-09-17
申请人： Hironori Ogawa , Masahiro Koyama , Nobuo Shibata , Masaru Matsushima , Shuichi Nakagawa , Katsunori Onuki , Yoshimasa Fukushima
发明人： Hironori Ogawa , Masahiro Koyama , Nobuo Shibata , Masaru Matsushima , Shuichi Nakagawa , Katsunori Onuki , Yoshimasa Fukushima
IPC分类号： G03B27/42 , H01L21/027
CPC分类号： H01J37/20 , H01J2237/20228 , H01J2237/20278
摘要： Disclosed is a smaller and lighter stage device which can be applied to a device such as a length measurement SEM for inspecting and/or evaluating a semiconductor, and in which the effect of a magnetic field on an electron beam can be reduced. Linear motors 110, 111, 112, 113 are disposed on four sides of a base 104 to be distanced from an electron beam projection position (the center of the stage device), respectively. The base 104 has dimensions substantially equivalent to minimum dimensions determined by the size of a top table 101 and a movable stroke. Linear motor stators 110, 112 are configured to have a “C-shaped” structure whose opening faces outside of the stage device, respectively. Further, a movable table is coupled to the top table via linear guides 107, 109 composed of a nonmagnetic material or roller mechanisms composed of a nonmagnetic material.
摘要翻译：公开了一种可以应用于诸如用于检查和/或评估半导体的长度测量SEM的装置的较小和较轻的平台装置，其中可以减小磁场对电子束的影响。直线电动机110,111,112,113分别设置在基座104的四侧，与电子束突出位置（台装置的中心）分开。基座104的尺寸基本上等于由顶台101和可移动冲程的尺寸确定的最小尺寸。线性电动机定子110,112被构造为具有开口面分别位于舞台装置外侧的“C”形结构。此外，可移动工作台通过由非磁性材料构成的线性引导件107,109或由非磁性材料构成的滚子机构联接到顶台。

2. 发明授权

US06744054B2 Evacuation use sample chamber and circuit pattern forming apparatus using the same 有权
标题翻译：疏散使用样品室和使用其的电路图案形成装置
公开(公告)号：US06744054B2
公开(公告)日：2004-06-01
申请号：US10002144
申请日：2001-12-05
申请人： Masaki Mizuochi , Yoshimasa Fukushima , Mitsuru Inoue
发明人： Masaki Mizuochi , Yoshimasa Fukushima , Mitsuru Inoue
IPC分类号： G21K508
CPC分类号： H01J37/18 , H01J37/20
摘要： An evacuation use sample chamber is constituted by a top table 21 which is provided with a recessed portion disposed in a sample chamber main body 10 and for mounting a sample 8 and a groove portion surrounding the recessed portion; a stage 20 which holds the top table 21 and is displaceable in front and back, right and left and up and down directions together with the top table 21; a sample chamber cover 11 which covers above the sample chamber main body 10 including the top table 21; and an evacuation use pipe 21C which communicates with the groove portion and evacuates gas between the bottom face of the sample chamber cover 11 and the top face of the top table 21 including the sample 8. Thereby, an evacuation use sample chamber which performs a stable evacuation and keeps around a sample at a predetermined high vacuum and a circuit pattern forming apparatus which permits a highly accurate pattern drawing over the entire region of the sample are provided.
摘要翻译：排气用样品室由顶台21构成，顶台21设置有设置在样品室主体10中的凹部，并且用于安装样品8和围绕凹部的槽部; 保持顶台21并与顶台21一起在前后左右上下方向上移动的台架20; 样品室盖11，其覆盖包括顶台21的样品室主体10的上方; 以及与槽部连通并在样品室盖11的底面与包含样品8的顶台21的顶面之间排出气体的排气用管21C。由此，进行稳定的排气用样品室抽出并保持预定的高真空下的样品，并且提供允许在样品的整个区域上进行高精度图案绘制的电路图案形成装置。

3. 发明申请

US20050230637A1 System and method for electron-beam lithography 失效
标题翻译：电子束光刻系统和方法
公开(公告)号：US20050230637A1
公开(公告)日：2005-10-20
申请号：US11109861
申请日：2005-04-20
申请人： Yoshimasa Fukushima , Hiroshi Tsuji , Sayaka Tanimoto
发明人： Yoshimasa Fukushima , Hiroshi Tsuji , Sayaka Tanimoto
IPC分类号： B32B27/04 , G01F23/00 , H01J37/317 , H01L21/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2001 , H01L21/67109
摘要： To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater current is suppressed. Namely, heater wires are used to control the temperature of a sample so that the temperature will be maintained constant. In order to minimize the adverse effect of a magnetic field during the passage of currents through the heater wires, two heater wires are layered with the arrangement of the upper and lower sides, currents are fed to flow through the heater wires in mutually opposite directions, and the ratio of the current flowing through the upper heater wire to the one flowing through the lower heater wire is slightly changed from zero.
摘要翻译：为了实现高分辨率光刻，在电子束光刻期间用加热器线控制样品的温度，抑制由加热器电流引起的磁场的不利影响。即，使用加热丝来控制样品的温度，使得温度保持恒定。为了最小化在通过加热线的电流通过期间的磁场的不利影响，两个加热丝线被上下排列地层叠，电流被馈送以相互相反的方向流过加热丝，并且流过上加热线的电流与流过下加热丝的流的比例从零开始稍微变化。

4. 发明授权

US06730916B1 Electron beam lithography apparatus 有权
标题翻译：电子束光刻设备
公开(公告)号：US06730916B1
公开(公告)日：2004-05-04
申请号：US09691234
申请日：2000-10-19
申请人： Hiroshi Tsuji , Mitsuru Inoue , Norio Saitou , Yasuhiro Someda , Yoshimasa Fukushima
发明人： Hiroshi Tsuji , Mitsuru Inoue , Norio Saitou , Yasuhiro Someda , Yoshimasa Fukushima
IPC分类号： H01J3720
CPC分类号： H01J37/09 , H01J37/20 , H01J2237/3175 , H02K11/01 , H02K41/03
摘要： An electron beam lithography apparatus of the present invention prevents the electron beam trajectory from being affected by a leakage magnetic field from a permanent magnet which is used as a sample stage guide/driving mechanism. In this electron beam lithography apparatus, an air bearing guide is used as a sample stage guide mechanism, and the stage posture is held by attracting the stage floating on a surface plate to the surface plate side by the permanent magnet. To avoid the leakage magnetic field from the permanent magnet from affecting the electron beam irradiation position on the sample, the permanent magnet is magnetically shielded by a shield member. In addition, to reduce variations in magnetic field above the sample, which are generated when the shield member moves in a leakage magnetic field from the electron lens, another shield member is arranged under the electron lens.
摘要翻译：本发明的电子束光刻设备防止电子束轨迹受到用作样品台引导/驱动机构的永久磁铁的泄漏磁场的影响。在该电子束光刻装置中，使用空气轴承引导件作为样品台引导机构，通过永久磁铁吸引在表面板上浮动到台板侧的台架来保持台阶姿态。为了避免来自永磁体的泄漏磁场影响样品上的电子束照射位置，永磁体被屏蔽部件磁屏蔽。此外，为了减小当屏蔽部件在来自电子透镜的泄漏磁场中移动时产生的样品上方的磁场的变化，在电子透镜下方设置有另一个屏蔽部件。

5. 发明授权

US06281024B1 Semiconductor device inspection and analysis method and its apparatus and a method for manufacturing a semiconductor device 失效
标题翻译：半导体装置检查分析方法及其装置及半导体装置的制造方法
公开(公告)号：US06281024B1
公开(公告)日：2001-08-28
申请号：US09322149
申请日：1999-05-28
申请人： Yasuhiro Yoshitake , Kenji Watanabe , Yoshimasa Fukushima , Minori Noguchi
发明人： Yasuhiro Yoshitake , Kenji Watanabe , Yoshimasa Fukushima , Minori Noguchi
IPC分类号： H01L2100
CPC分类号： H01L21/67253
摘要： A method and system for inspecting and/or analyzing semiconductor devices in which particles in a semiconductor wafer which is processed in a semiconductor device manufacturing line are detected. A particle is selected from among the detected particles and the selected particle is etched to expose a cross section of the selected particle. The selected particle whose cross section is exposed has the element thereof analyzed, and after analyzation, the semiconductor wafer is continued to be processed in the semiconductor device manufacturing line. For etching, pattern data having an edge which intersects the selected particle is created and the semiconductor wafer which is coated with a photosensitive material is exposed by a light pattern according to the pattern data so that an edge intersects the selected particle. Thereafter, the etching is carried out to expose the cross section of the selected particle and analyzation is effected.
摘要翻译：检测和/或分析其中检测半导体器件制造线中处理的半导体晶片中的粒子的半导体器件的方法和系统。从检测到的颗粒中选择颗粒，并蚀刻所选择的颗粒以暴露所选择的颗粒的横截面。所选择的粒子的横截面被暴露，其元素被分析，并且在分析之后，半导体晶片在半导体器件制造线中继续被处理。为了蚀刻，产生具有与所选粒子相交的边缘的图案数据，并且通过根据图案数据的光图案使被感光材料涂覆的半导体晶片曝光，使得边缘与所选择的粒子相交。此后，进行蚀刻以暴露所选粒子的横截面并进行分析。

6. 发明授权

US4565601A Method and apparatus for controlling sample temperature 失效
标题翻译：用于控制样品温度的方法和装置
公开(公告)号：US4565601A
公开(公告)日：1986-01-21
申请号：US675863
申请日：1984-11-28
申请人： Yutaka Kakehi , Norio Nakazato , Yoshimasa Fukushima , Kousai Hiratsuka , Fumio Shibata , Noriaki Yamamoto , Tsunehiko Tsubone
发明人： Yutaka Kakehi , Norio Nakazato , Yoshimasa Fukushima , Kousai Hiratsuka , Fumio Shibata , Noriaki Yamamoto , Tsunehiko Tsubone
IPC分类号： B61D19/02 , C23C14/54 , G05D23/19 , H01J37/20 , B44C1/22 , C03C15/00 , C03C25/06 , C23F1/02
CPC分类号： G05D23/1919 , C23C14/541 , H01J37/20
摘要： This invention relates to a method and apparatus for controlling temperature of a sample and is intended to prevent a sample from being deformed by the pressure of a heat transmission gas by mounting and fixing the sample being mounted and processed in a vacuum on and to the sample stand and supplying the heat transmission gas to the gap between the under surface of the sample thus fixed and the sample stand; effectively control the temperature of the sample being processed in a vacuum by limiting the size of the gap between the under surface of the sample and the sample stand; and make the heat transmission gas least affect the process by limiting the flow of the heat transmission gas in the vacuum process chamber.
摘要翻译：本发明涉及一种用于控制样品温度的方法和装置，旨在通过将真空中安装和处理的样品安装并固定到样品上来防止样品被传热气体的压力变形将传热气体放置并供给到如此固定的样品的下表面与样品台之间的间隙; 通过限制样品的下表面和样品台之间的间隙的大小，有效地控制在真空中正在处理的样品的温度; 并且通过限制真空处理室中的传热气体的流动使得传热气体对该过程最不重要。

7. 发明申请

US20050002012A1 Stage apparatus, static pressure bearing apparatus, positioning method, exposure apparatus and method for manufacturing device 审中-公开
标题翻译：平台装置，静压轴承装置，定位方法，曝光装置及制造装置的方法
公开(公告)号：US20050002012A1
公开(公告)日：2005-01-06
申请号：US10845206
申请日：2004-05-14
申请人： Shigeo Sakino , Yoshimasa Fukushima
发明人： Shigeo Sakino , Yoshimasa Fukushima
IPC分类号： F16C32/06 , G03F7/20 , G11B5/31 , H01L21/027 , H01L21/68 , G11B5/027
CPC分类号： F16C29/025 , F16C32/0603 , F16C33/748 , F16C39/02 , F16C2300/62 , G03F7/70716 , G03F7/70816 , G03F7/7095 , G11B5/3163
摘要： Using a conductive material having volume resistance of approximately 1E−3 Ω·cm or above for a movable guide 3 axially supported by a static pressure bearing 10 makes it possible to sufficiently reduce deflection of beams caused by eddy current generated due to a leaked magnetic field from an electron lens of an electron beam exposure apparatus or deflection of beams due to the influences from increased charge by secondary electrons.
摘要翻译：对于由静压轴承10轴向支撑的可动引导件3，使用体积电阻大约为1E -3Ω·cm以上的导电材料，可以充分减少由于泄漏而产生的涡流引起的光束偏转来自电子束曝光装置的电子透镜的磁场或由于二次电子增加的电荷的影响而导致的光束的偏转。

8. 发明授权

US06794665B2 Electron beam drawing apparatus 失效
标题翻译：电子束描绘装置
公开(公告)号：US06794665B2
公开(公告)日：2004-09-21
申请号：US10356505
申请日：2003-02-03
申请人： Masaki Kurihara , Toshihiko Horiuchi , Yoshimasa Fukushima , Masaki Mizuochi
发明人： Masaki Kurihara , Toshihiko Horiuchi , Yoshimasa Fukushima , Masaki Mizuochi
IPC分类号： H01J3720
CPC分类号： H01J37/023 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0216
摘要： An electron beam drawing apparatus has a sample chamber having a bottom plate, a side wall, and a top plate. Pillar members are disposed at four corners of the sample chamber and a frame is fixed to the pillar members. A plurality of supporting apparatuses for positioning a column mounted on the top plate to the frame are arranged around the column, thereby suppressing vibration of the column at the time of movement of a stage.
摘要翻译：电子束描绘装置具有一个具有底板，侧壁和顶板的样品室。支柱构件设置在样品室的四个角处，并且框架固定到柱构件。用于将安装在顶板上的柱定位到框架上的多个支撑装置围绕柱布置，从而在台架移动时抑制柱的振动。

9. 发明授权

US06659441B2 Travelling worktable apparatus 失效
公开(公告)号：US06659441B2
公开(公告)日：2003-12-09
申请号：US10206343
申请日：2002-07-29
申请人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
发明人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
IPC分类号： G02B718
CPC分类号： H01L21/68 , B23Q1/58 , B23Q1/621 , B23Q17/2495
摘要： In a travelling worktable apparatus including a roller guide unit to guide a travelling table. Deformation of a sample table caused in association with precision of the guide unit such as deviation in precision of rail attachment and precision of rollers is prevented while keeping rigidity of the roller guide. This keeps a fixed distance between a bar mirror unit and a sample on the sample table. For this purpose, the Y table (top table) of the prior art is subdivided into a travelling table to hold the roller guide and a sample table to mount a sample thereon. These tables are fixed by a pin which can be more easily deformed than the tables and are linked with each other by an elastic body.

10. 发明授权

US06446950B2 Travelling worktable apparatus 有权
标题翻译：旅行工作台设备
公开(公告)号：US06446950B2
公开(公告)日：2002-09-10
申请号：US09793941
申请日：2001-02-27
申请人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
发明人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
IPC分类号： G02B718
CPC分类号： H01L21/68 , B23Q1/58 , B23Q1/621 , B23Q17/2495
摘要： In a travelling worktable apparatus including a roller guide unit to guide a travelling table. Deformation of a sample table caused in association with precision of the guide unit such as deviation in precision of rail attachment and precision of rollers is prevented while keeping rigidity of the roller guide. This keeps a fixed distance between a bar mirror unit and a sample on the sample table. For this purpose, the Y table (top table) of the prior art is subdivided into a travelling table to hold the roller guide and a sample table to mount a sample thereon. These tables are fixed by a pin which can be more easily deformed than the tables aid are linked with each other by an elastic body.
摘要翻译：一种行进工作台装置，包括：引导单元，用于引导行进台。在保持滚子引导件的刚性的同时，防止与引导单元的精度相关的样品台的变形，例如轨道安装的精度偏差和辊的精度。这样可以在样品台上的条形镜单元和样品之间保持一定的距离。为此，现有技术的Y台（上表）被细分为行进台以保持滚子引导件和样品台以将样品安装在其上。这些表由一个销固定，该销可以比通过弹性体彼此连接的工作台更容易变形。

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