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    • 1. 发明授权
    • Evacuation use sample chamber and circuit pattern forming apparatus using the same
    • 疏散使用样品室和使用其的电路图案形成装置
    • US06744054B2
    • 2004-06-01
    • US10002144
    • 2001-12-05
    • Masaki MizuochiYoshimasa FukushimaMitsuru Inoue
    • Masaki MizuochiYoshimasa FukushimaMitsuru Inoue
    • G21K508
    • H01J37/18H01J37/20
    • An evacuation use sample chamber is constituted by a top table 21 which is provided with a recessed portion disposed in a sample chamber main body 10 and for mounting a sample 8 and a groove portion surrounding the recessed portion; a stage 20 which holds the top table 21 and is displaceable in front and back, right and left and up and down directions together with the top table 21; a sample chamber cover 11 which covers above the sample chamber main body 10 including the top table 21; and an evacuation use pipe 21C which communicates with the groove portion and evacuates gas between the bottom face of the sample chamber cover 11 and the top face of the top table 21 including the sample 8. Thereby, an evacuation use sample chamber which performs a stable evacuation and keeps around a sample at a predetermined high vacuum and a circuit pattern forming apparatus which permits a highly accurate pattern drawing over the entire region of the sample are provided.
    • 排气用样品室由顶台21构成,顶台21设置有设置在样品室主体10中的凹部,并且用于安装样品8和围绕凹部的槽部; 保持顶台21并与顶台21一起在前后左右上下方向上移动的台架20; 样品室盖11,其覆盖包括顶台21的样品室主体10的上方; 以及与槽部连通并在样品室盖11的底面与包含样品8的顶台21的顶面之间排出气体的排气用管21C。由此,进行稳定的排气用样品室 抽出并保持预定的高真空下的样品,并且提供允许在样品的整个区域上进行高精度图案绘制的电路图案形成装置。
    • 2. 发明授权
    • Electron beam lithography apparatus
    • 电子束光刻设备
    • US06730916B1
    • 2004-05-04
    • US09691234
    • 2000-10-19
    • Hiroshi TsujiMitsuru InoueNorio SaitouYasuhiro SomedaYoshimasa Fukushima
    • Hiroshi TsujiMitsuru InoueNorio SaitouYasuhiro SomedaYoshimasa Fukushima
    • H01J3720
    • H01J37/09H01J37/20H01J2237/3175H02K11/01H02K41/03
    • An electron beam lithography apparatus of the present invention prevents the electron beam trajectory from being affected by a leakage magnetic field from a permanent magnet which is used as a sample stage guide/driving mechanism. In this electron beam lithography apparatus, an air bearing guide is used as a sample stage guide mechanism, and the stage posture is held by attracting the stage floating on a surface plate to the surface plate side by the permanent magnet. To avoid the leakage magnetic field from the permanent magnet from affecting the electron beam irradiation position on the sample, the permanent magnet is magnetically shielded by a shield member. In addition, to reduce variations in magnetic field above the sample, which are generated when the shield member moves in a leakage magnetic field from the electron lens, another shield member is arranged under the electron lens.
    • 本发明的电子束光刻设备防止电子束轨迹受到用作样品台引导/驱动机构的永久磁铁的泄漏磁场的影响。 在该电子束光刻装置中,使用空气轴承引导件作为样品台引导机构,通过永久磁铁吸引在表面板上浮动到台板侧的台架来保持台阶姿态。 为了避免来自永磁体的泄漏磁场影响样品上的电子束照射位置,永磁体被屏蔽部件磁屏蔽。 此外,为了减小当屏蔽部件在来自电子透镜的泄漏磁场中移动时产生的样品上方的磁场的变化,在电子透镜下方设置有另一个屏蔽部件。
    • 4. 发明授权
    • in-facility information provision system and in-facility information provision method
    • 设施内信息提供系统和设施信息提供方法
    • US07454216B2
    • 2008-11-18
    • US11071342
    • 2005-03-04
    • Hiroaki ShikanoNaohiko IrieAtsushi ItoJunji InabaMitsuru InoueKazutaka Sakai
    • Hiroaki ShikanoNaohiko IrieAtsushi ItoJunji InabaMitsuru InoueKazutaka Sakai
    • H04Q7/20
    • G06Q30/00
    • To enable an appropriate change of a path according to a situation of a user and a situation of a target store and the path without having a special terminal when the user of a facility utilizes the target store and an appropriate guidance, spatial recognition nodes respectively provided with a sensor and information processing equipment are installed in each location in the facility and connected via a network. The nodes recognize the position, the action and the behavior of a user of the facility. A server controlling a system manages the recognition result and constantly grasps the situation of the user. The situation of the user is recognized by the node installed at a destination and on a path, and notified to the server. The server displays appropriate path information based on the recognition result on any of plural information displays installed in the facility when the user approaches.
    • 为了在设施的用户利用目标存储和适当的指导的情况下,根据用户的情况和目标存储的情况以及路径而不具有特殊终端的路径的适当改变,分别提供了空间识别节点 传感器和信息处理设备安装在设施的每个位置并通过网络连接。 节点识别设施的用户的位置,动作和行为。 控制系统的服务器管理识别结果并且不断掌握用户的情况。 用户的情况由安装在目的地和路径上的节点识别,并通知给服务器。 当用户接近时,服务器基于在设施中安装的多个信息显示器中的任一个上的识别结果来显示适当的路径信息。
    • 5. 发明申请
    • EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    • 曝光装置和装置制造方法
    • US20080158530A1
    • 2008-07-03
    • US11959197
    • 2007-12-18
    • Hirofumi FujiiHiroshi ItoMitsuru Inoue
    • Hirofumi FujiiHiroshi ItoMitsuru Inoue
    • G03B27/42
    • G03B27/58G03F7/70725G03F7/709
    • An exposure apparatus including a projection optical system and configured to expose a substrate to light via the projection optical system includes a support configured to support the projection optical system, an object supported by the support and movable relative the support, an actuator configured to drive the object, a detector configured to detect a relative position between the object and the support, and a controller configured to perform a control of the actuator based on an output of the detector to cause the object to follow the support. The controller is configured to perform an estimation of a vibration of the support based on an output of the detector in parallel with the control to cause the object to follow the support.
    • 包括投影光学系统并经配置以经由投影光学系统将基板曝光于光的曝光装置包括:支撑构件,用于支撑投影光学系统;由支撑件支撑并可相对于支撑件移动的物体;致动器, 物体,被配置为检测物体和支撑体之间的相对位置的检测器,以及被配置为基于检测器的输出执行致动器的控制以使物体跟随支撑件的控制器。 控制器被配置为基于检测器的输出与控制并行地执行对支撑件的振动的估计,以使对象遵循支撑。
    • 10. 发明申请
    • VEHICULAR SUSPENSION ARM
    • 车用悬挂臂
    • US20090295113A1
    • 2009-12-03
    • US12063601
    • 2006-08-16
    • Mitsuru InoueFumio KikuchiYutaka HozumiJun Matsuike
    • Mitsuru InoueFumio KikuchiYutaka HozumiJun Matsuike
    • B60G7/00
    • B60G7/001B60G2200/144B60G2204/129B60G2204/1431B60G2206/014B60G2206/017B60G2206/122B60G2206/722B60G2206/8103B60G2206/8201
    • A vehicular suspension arm is provided in which an arm main body (1) includes a main plate (2) press-formed as a main part of the arm main body and having a short cylindrical part (EB) provided integrally with one end by flanging, and a reinforcing plate (H) superimposed on one of upper and lower faces of the main plate (2) and reinforcing the main plate (2). The reinforcing plate (H) has an eye-shaped head part (Ha) formed in an annular shape and arranged coaxially with the short cylindrical part (EB), and a tail part (Hb) extending integrally from the eye-shaped head part (Ha) along the longitudinal direction of the main plate (2), is formed from a single plate material that is thicker than the main plate (2), and has at least the tail part (Hb) welded to the main plate (2). A bush press-fit portion (P1) is formed from an inner peripheral face of the eye-shaped head part (Ha) and an inner peripheral face of the short cylindrical part (EB). This ensures that the cross-sectional shape of a transition section from the bush press-fit portion to the plate-type arm main body is adequate, thus enabling the rigidity and strength required for the transition section to be easily guaranteed and, furthermore, it becomes possible to meet a requirement for increasing the strength of the arm without specially increasing the space around the outer periphery of the bush press-fit portion.
    • 提供一种车辆悬架臂,其中臂主体(1)包括主压板(2)作为臂主体的主要部分,该主板(2)具有通过折边与一端一体设置的短圆柱形部分(EB) ,以及叠加在主板(2)的上表面和下表面之一上并加强主板(2)的加强板(H)。 所述加强板(H)具有与所述短圆筒部(EB)同轴配置的环状的眼形头部(Ha),和从所述眼形头部( Ha)沿着主板(2)的纵向方向由与板(2)相比厚的单个板材形成,并且至少具有焊接到主板(2)的尾部(Hb) 。 衬套压入部(P1)由眼形头部(Ha)的内周面和短圆筒部(EB)的内周面形成。 这确保了从衬套压合部到板式臂主体的过渡部的横截面形状是足够的,因此能够容易地保证过渡部所需的刚性和强度,此外, 可以满足增加臂的强度的要求,而不会特别地增加衬套压合部的外周周围的空间。