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1. 发明授权

US06659441B2 Travelling worktable apparatus 失效
公开(公告)号：US06659441B2
公开(公告)日：2003-12-09
申请号：US10206343
申请日：2002-07-29
申请人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
发明人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
IPC分类号： G02B718
CPC分类号： H01L21/68 , B23Q1/58 , B23Q1/621 , B23Q17/2495
摘要： In a travelling worktable apparatus including a roller guide unit to guide a travelling table. Deformation of a sample table caused in association with precision of the guide unit such as deviation in precision of rail attachment and precision of rollers is prevented while keeping rigidity of the roller guide. This keeps a fixed distance between a bar mirror unit and a sample on the sample table. For this purpose, the Y table (top table) of the prior art is subdivided into a travelling table to hold the roller guide and a sample table to mount a sample thereon. These tables are fixed by a pin which can be more easily deformed than the tables and are linked with each other by an elastic body.

2. 发明授权

US06446950B2 Travelling worktable apparatus 有权
标题翻译：旅行工作台设备
公开(公告)号：US06446950B2
公开(公告)日：2002-09-10
申请号：US09793941
申请日：2001-02-27
申请人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
发明人： Masaki Mizuochi , Yoshimasa Fukushima , Masami Katsuyama , Toshinori Kobayashi
IPC分类号： G02B718
CPC分类号： H01L21/68 , B23Q1/58 , B23Q1/621 , B23Q17/2495
摘要： In a travelling worktable apparatus including a roller guide unit to guide a travelling table. Deformation of a sample table caused in association with precision of the guide unit such as deviation in precision of rail attachment and precision of rollers is prevented while keeping rigidity of the roller guide. This keeps a fixed distance between a bar mirror unit and a sample on the sample table. For this purpose, the Y table (top table) of the prior art is subdivided into a travelling table to hold the roller guide and a sample table to mount a sample thereon. These tables are fixed by a pin which can be more easily deformed than the tables aid are linked with each other by an elastic body.
摘要翻译：一种行进工作台装置，包括：引导单元，用于引导行进台。在保持滚子引导件的刚性的同时，防止与引导单元的精度相关的样品台的变形，例如轨道安装的精度偏差和辊的精度。这样可以在样品台上的条形镜单元和样品之间保持一定的距离。为此，现有技术的Y台（上表）被细分为行进台以保持滚子引导件和样品台以将样品安装在其上。这些表由一个销固定，该销可以比通过弹性体彼此连接的工作台更容易变形。

3. 发明授权

US06744054B2 Evacuation use sample chamber and circuit pattern forming apparatus using the same 有权
标题翻译：疏散使用样品室和使用其的电路图案形成装置
公开(公告)号：US06744054B2
公开(公告)日：2004-06-01
申请号：US10002144
申请日：2001-12-05
申请人： Masaki Mizuochi , Yoshimasa Fukushima , Mitsuru Inoue
发明人： Masaki Mizuochi , Yoshimasa Fukushima , Mitsuru Inoue
IPC分类号： G21K508
CPC分类号： H01J37/18 , H01J37/20
摘要： An evacuation use sample chamber is constituted by a top table 21 which is provided with a recessed portion disposed in a sample chamber main body 10 and for mounting a sample 8 and a groove portion surrounding the recessed portion; a stage 20 which holds the top table 21 and is displaceable in front and back, right and left and up and down directions together with the top table 21; a sample chamber cover 11 which covers above the sample chamber main body 10 including the top table 21; and an evacuation use pipe 21C which communicates with the groove portion and evacuates gas between the bottom face of the sample chamber cover 11 and the top face of the top table 21 including the sample 8. Thereby, an evacuation use sample chamber which performs a stable evacuation and keeps around a sample at a predetermined high vacuum and a circuit pattern forming apparatus which permits a highly accurate pattern drawing over the entire region of the sample are provided.
摘要翻译：排气用样品室由顶台21构成，顶台21设置有设置在样品室主体10中的凹部，并且用于安装样品8和围绕凹部的槽部; 保持顶台21并与顶台21一起在前后左右上下方向上移动的台架20; 样品室盖11，其覆盖包括顶台21的样品室主体10的上方; 以及与槽部连通并在样品室盖11的底面与包含样品8的顶台21的顶面之间排出气体的排气用管21C。由此，进行稳定的排气用样品室抽出并保持预定的高真空下的样品，并且提供允许在样品的整个区域上进行高精度图案绘制的电路图案形成装置。

4. 发明授权

US06794665B2 Electron beam drawing apparatus 失效
标题翻译：电子束描绘装置
公开(公告)号：US06794665B2
公开(公告)日：2004-09-21
申请号：US10356505
申请日：2003-02-03
申请人： Masaki Kurihara , Toshihiko Horiuchi , Yoshimasa Fukushima , Masaki Mizuochi
发明人： Masaki Kurihara , Toshihiko Horiuchi , Yoshimasa Fukushima , Masaki Mizuochi
IPC分类号： H01J3720
CPC分类号： H01J37/023 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0216
摘要： An electron beam drawing apparatus has a sample chamber having a bottom plate, a side wall, and a top plate. Pillar members are disposed at four corners of the sample chamber and a frame is fixed to the pillar members. A plurality of supporting apparatuses for positioning a column mounted on the top plate to the frame are arranged around the column, thereby suppressing vibration of the column at the time of movement of a stage.
摘要翻译：电子束描绘装置具有一个具有底板，侧壁和顶板的样品室。支柱构件设置在样品室的四个角处，并且框架固定到柱构件。用于将安装在顶板上的柱定位到框架上的多个支撑装置围绕柱布置，从而在台架移动时抑制柱的振动。

5. 发明授权

US4824309A Vacuum processing unit and apparatus 失效
标题翻译：真空处理单元和设备
公开(公告)号：US4824309A
公开(公告)日：1989-04-25
申请号：US904202
申请日：1986-09-08
申请人： Yutaka Kakehi , Norio Nakazato , Yoshimasa Fukushima , Fumio Shibata , Tsunehiko Tsubone , Norio Kanai
发明人： Yutaka Kakehi , Norio Nakazato , Yoshimasa Fukushima , Fumio Shibata , Tsunehiko Tsubone , Norio Kanai
IPC分类号： H01L21/677 , B01J3/00 , B01J3/03 , B23Q41/02 , B65G49/07 , C23C14/54 , C23C14/56 , H01J37/18 , H01L21/00 , H01L21/02 , H01L21/67 , B65G65/00
CPC分类号： C23C14/541 , B01J3/006 , B01J3/03 , C23C14/568 , H01J37/185 , H01L21/02 , Y10S414/139
摘要： A vacuum processing unit and apparatus comprises a buffer chamber that can be evacuated, a processing chamber that can be communicated with said buffer chamber a first sample carrier installed in said buffer chamber, a vacuum opening/closing device provided in the buffer chamber to correspond to the first sample carrier, a vacuum prechamber provided for the buffer chamber via the vacuum opening/closing device, a second sample carrier which carries the sample between the vacuum prechamber and the first sample carrier via the vacuum opening/closing device, and a third sample carrier which carries the sample between said first sample carrier and the processing chamber. The vacuum processing units can be connected in groups via vacuum opening/closing devices provided for the buffer chambers in locations corresponding to the end of the first sample carriers therein. The number of connected processing chambers can be freely changed to meet a change in the process or the manufacturing line.
摘要翻译：真空处理单元和装置包括可以抽真空的缓冲室，可与所述缓冲室连通的处理室，安装在所述缓冲室中的第一样品载体，设置在所述缓冲室中的真空开闭装置，以对应于第一样品载体，经由真空开闭装置为缓冲室设置的真空预处理机，第二样品载体，其通过真空开闭装置将样品携带在真空预处理器和第一样品载体之间;第三样品载体，其携带在所述第一样品载体和处理室之间的样品。真空处理单元可以通过在与第一样品载体的端部对应的位置处设置用于缓冲室的真空开/关装置分组连接。连接的处理室的数量可以自由地改变以满足过程或生产线的变化。

6. 发明申请

US20120145920A1 Stage Device 有权
标题翻译：舞台装置
公开(公告)号：US20120145920A1
公开(公告)日：2012-06-14
申请号：US13391962
申请日：2010-09-17
申请人： Hironori Ogawa , Masahiro Koyama , Nobuo Shibata , Masaru Matsushima , Shuichi Nakagawa , Katsunori Onuki , Yoshimasa Fukushima
发明人： Hironori Ogawa , Masahiro Koyama , Nobuo Shibata , Masaru Matsushima , Shuichi Nakagawa , Katsunori Onuki , Yoshimasa Fukushima
IPC分类号： G21K5/10 , H02K41/02
CPC分类号： H01J37/20 , H01J2237/20228 , H01J2237/20278
摘要： Disclosed is a smaller and lighter stage device which can be applied to a device such as a length measurement SEM for inspecting and/or evaluating a semiconductor, and in which the effect of a magnetic field on an electron beam can be reduced. Linear motors 110, 111, 112, 113 are disposed on four sides of a base 104 to be distanced from an electron beam projection position (the center of the stage device), respectively. The base 104 has dimensions substantially equivalent to minimum dimensions determined by the size of a top table 101 and a movable stroke. Linear motor stators 110, 112 are configured to have a “C-shaped” structure whose opening faces outside of the stage device, respectively. Further, a movable table is coupled to the top table via linear guides 107, 109 composed of a nonmagnetic material or roller mechanisms composed of a nonmagnetic material.
摘要翻译：公开了一种可以应用于诸如用于检查和/或评估半导体的长度测量SEM的装置的较小和较轻的平台装置，其中可以减小磁场对电子束的影响。直线电动机110,111,112,113分别设置在基座104的四侧，与电子束突出位置（台装置的中心）分开。基座104的尺寸基本上等于由顶台101和可移动冲程的尺寸确定的最小尺寸。线性电动机定子110,112被构造为具有开口面分别位于舞台装置外侧的“C”形结构。此外，可移动工作台通过由非磁性材料构成的线性引导件107,109或由非磁性材料构成的滚子机构联接到顶台。

7. 发明授权

US07276709B2 System and method for electron-beam lithography 失效
标题翻译：电子束光刻系统和方法
公开(公告)号：US07276709B2
公开(公告)日：2007-10-02
申请号：US11109861
申请日：2005-04-20
申请人： Yoshimasa Fukushima , Hiroshi Tsuji , Sayaka Tanimoto
发明人： Yoshimasa Fukushima , Hiroshi Tsuji , Sayaka Tanimoto
IPC分类号： H01J37/20
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2001 , H01L21/67109
摘要： To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater current is suppressed. Namely, heater wires are used to control the temperature of a sample so that the temperature will be maintained constant. In order to minimize the adverse effect of a magnetic field during the passage of currents through the heater wires, two heater wires are layered with the arrangement of the upper and lower sides, currents are fed to flow through the heater wires in mutually opposite directions, and the ratio of the current flowing through the upper heater wire to the one flowing through the lower heater wire is slightly changed from zero.
摘要翻译：为了实现高分辨率光刻，在电子束光刻期间用加热器线控制样品的温度，抑制由加热器电流引起的磁场的不利影响。即，使用加热丝来控制样品的温度，使得温度保持恒定。为了最小化在通过加热线的电流通过期间的磁场的不利影响，两个加热丝线被上下排列地层叠，电流被馈送以相互相反的方向流过加热丝，并且流过上加热线的电流与流过下加热丝的流的比例从零开始稍微变化。

8. 发明授权

US08823309B2 Stage device 有权
标题翻译：舞台装置
公开(公告)号：US08823309B2
公开(公告)日：2014-09-02
申请号：US13391962
申请日：2010-09-17
申请人： Hironori Ogawa , Masahiro Koyama , Nobuo Shibata , Masaru Matsushima , Shuichi Nakagawa , Katsunori Onuki , Yoshimasa Fukushima
发明人： Hironori Ogawa , Masahiro Koyama , Nobuo Shibata , Masaru Matsushima , Shuichi Nakagawa , Katsunori Onuki , Yoshimasa Fukushima
IPC分类号： G03B27/42 , H01L21/027
CPC分类号： H01J37/20 , H01J2237/20228 , H01J2237/20278
摘要： Disclosed is a smaller and lighter stage device which can be applied to a device such as a length measurement SEM for inspecting and/or evaluating a semiconductor, and in which the effect of a magnetic field on an electron beam can be reduced. Linear motors 110, 111, 112, 113 are disposed on four sides of a base 104 to be distanced from an electron beam projection position (the center of the stage device), respectively. The base 104 has dimensions substantially equivalent to minimum dimensions determined by the size of a top table 101 and a movable stroke. Linear motor stators 110, 112 are configured to have a “C-shaped” structure whose opening faces outside of the stage device, respectively. Further, a movable table is coupled to the top table via linear guides 107, 109 composed of a nonmagnetic material or roller mechanisms composed of a nonmagnetic material.
摘要翻译：公开了一种可以应用于诸如用于检查和/或评估半导体的长度测量SEM的装置的较小和较轻的平台装置，其中可以减小磁场对电子束的影响。直线电动机110,111,112,113分别设置在基座104的四侧，与电子束突出位置（台装置的中心）分开。基座104的尺寸基本上等于由顶台101和可移动冲程的尺寸确定的最小尺寸。线性电动机定子110,112被构造为具有开口面分别位于舞台装置外侧的“C”形结构。此外，可移动工作台通过由非磁性材料构成的线性引导件107,109或由非磁性材料构成的滚子机构联接到顶台。

9. 发明申请

US20050230637A1 System and method for electron-beam lithography 失效
标题翻译：电子束光刻系统和方法
公开(公告)号：US20050230637A1
公开(公告)日：2005-10-20
申请号：US11109861
申请日：2005-04-20
申请人： Yoshimasa Fukushima , Hiroshi Tsuji , Sayaka Tanimoto
发明人： Yoshimasa Fukushima , Hiroshi Tsuji , Sayaka Tanimoto
IPC分类号： B32B27/04 , G01F23/00 , H01J37/317 , H01L21/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2001 , H01L21/67109
摘要： To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater current is suppressed. Namely, heater wires are used to control the temperature of a sample so that the temperature will be maintained constant. In order to minimize the adverse effect of a magnetic field during the passage of currents through the heater wires, two heater wires are layered with the arrangement of the upper and lower sides, currents are fed to flow through the heater wires in mutually opposite directions, and the ratio of the current flowing through the upper heater wire to the one flowing through the lower heater wire is slightly changed from zero.
摘要翻译：为了实现高分辨率光刻，在电子束光刻期间用加热器线控制样品的温度，抑制由加热器电流引起的磁场的不利影响。即，使用加热丝来控制样品的温度，使得温度保持恒定。为了最小化在通过加热线的电流通过期间的磁场的不利影响，两个加热丝线被上下排列地层叠，电流被馈送以相互相反的方向流过加热丝，并且流过上加热线的电流与流过下加热丝的流的比例从零开始稍微变化。

10. 发明授权

US06730916B1 Electron beam lithography apparatus 有权
标题翻译：电子束光刻设备
公开(公告)号：US06730916B1
公开(公告)日：2004-05-04
申请号：US09691234
申请日：2000-10-19
申请人： Hiroshi Tsuji , Mitsuru Inoue , Norio Saitou , Yasuhiro Someda , Yoshimasa Fukushima
发明人： Hiroshi Tsuji , Mitsuru Inoue , Norio Saitou , Yasuhiro Someda , Yoshimasa Fukushima
IPC分类号： H01J3720
CPC分类号： H01J37/09 , H01J37/20 , H01J2237/3175 , H02K11/01 , H02K41/03
摘要： An electron beam lithography apparatus of the present invention prevents the electron beam trajectory from being affected by a leakage magnetic field from a permanent magnet which is used as a sample stage guide/driving mechanism. In this electron beam lithography apparatus, an air bearing guide is used as a sample stage guide mechanism, and the stage posture is held by attracting the stage floating on a surface plate to the surface plate side by the permanent magnet. To avoid the leakage magnetic field from the permanent magnet from affecting the electron beam irradiation position on the sample, the permanent magnet is magnetically shielded by a shield member. In addition, to reduce variations in magnetic field above the sample, which are generated when the shield member moves in a leakage magnetic field from the electron lens, another shield member is arranged under the electron lens.
摘要翻译：本发明的电子束光刻设备防止电子束轨迹受到用作样品台引导/驱动机构的永久磁铁的泄漏磁场的影响。在该电子束光刻装置中，使用空气轴承引导件作为样品台引导机构，通过永久磁铁吸引在表面板上浮动到台板侧的台架来保持台阶姿态。为了避免来自永磁体的泄漏磁场影响样品上的电子束照射位置，永磁体被屏蔽部件磁屏蔽。此外，为了减小当屏蔽部件在来自电子透镜的泄漏磁场中移动时产生的样品上方的磁场的变化，在电子透镜下方设置有另一个屏蔽部件。

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