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1. 发明申请

US20130185046A1 Analyzing A Patterning Process Using A Model Of Yield 失效
标题翻译：使用产量模型分析模式化过程
公开(公告)号：US20130185046A1
公开(公告)日：2013-07-18
申请号：US13613061
申请日：2012-09-13
申请人： Saeed Bagheri , Fook-Luen Heng , Rajiv Vasant Joshi , Kafai Lai , David Osmond Melville , Saibal Mukhopadhyay , Alan E. Rosenbluth , Rama N. Singh , Kehan Tian
发明人： Saeed Bagheri , Fook-Luen Heng , Rajiv Vasant Joshi , Kafai Lai , David Osmond Melville , Saibal Mukhopadhyay , Alan E. Rosenbluth , Rama N. Singh , Kehan Tian
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F1/70 , G06F2217/10
摘要： Techniques are presented that include accessing results of forward simulations of circuit yield, the results including at least circuit yield results including simulated device shapes. Using the circuit yield results, high-level traits of at least the simulated device shapes are determined. Based on the determined high-level traits and using the circuit yield results, a compact model for predicted yield is constructed, the compact model including a plurality of adjustable parameters, and the constructing the compact model for predicted yield including adjusting the adjustable parameters until at least one first predetermined criterion is met. An optimization problem is constructed including at least the compact model for yield, an objective, and a plurality of constraints. Using the optimization problem, the objective is modified subject to the plurality of constraints until at least one second predetermined criterion is met.
摘要翻译：提出了包括访问电路产量正向模拟的结果的技术，结果至少包括电路产量结果，包括模拟设备形状。使用电路产量结果，确定至少模拟装置形状的高级特征。基于确定的高水平特征和使用电路产量结果，构建了一种预测产量的紧凑模型，该紧凑模型包括多个可调参数，并构建了用于预测产量的紧凑模型，包括调整可调参数直到满足至少一个第一预定标准。构建最优化问题，其至少包括用于产量，目标和多个约束的紧凑模型。使用优化问题，根据多个约束修改目标，直到满足至少一个第二预定标准。

2. 发明申请

US20130185045A1 ANALYZING A PATTERNING PROCESS USING A MODEL OF YIELD 有权
标题翻译：使用模型的分析方法分析
公开(公告)号：US20130185045A1
公开(公告)日：2013-07-18
申请号：US13352713
申请日：2012-01-18
申请人： Saeed BAGHERI , Fook-Luen HENG , Rajiv Vasant JOSHI , Kafai LAI , David Osmond MELVILLE , Saibal MUKHOPADHYAY , Alan E. ROSENBLUTH , Rama N. SINGH , Kehan TIAN
发明人： Saeed BAGHERI , Fook-Luen HENG , Rajiv Vasant JOSHI , Kafai LAI , David Osmond MELVILLE , Saibal MUKHOPADHYAY , Alan E. ROSENBLUTH , Rama N. SINGH , Kehan TIAN
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F1/70 , G06F2217/10
摘要： Techniques are presented that include accessing results of forward simulations of circuit yield, the results including at least circuit yield results including simulated device shapes. Using the circuit yield results, high-level traits of at least the simulated device shapes are determined. Based on the determined high-level traits and using the circuit yield results, a compact model for predicted yield is constructed, the compact model including a plurality of adjustable parameters, and the constructing the compact model for predicted yield including adjusting the adjustable parameters until at least one first predetermined criterion is met. An optimization problem is constructed including at least the compact model for yield, an objective, and a plurality of constraints. Using the optimization problem, the objective is modified subject to the plurality of constraints until at least one second predetermined criterion is met.
摘要翻译：提出了包括访问电路产量正向模拟的结果的技术，结果至少包括电路产量结果，包括模拟设备形状。使用电路产量结果，确定至少模拟装置形状的高级特征。基于确定的高水平特征和使用电路产量结果，构建了一种预测产量的紧凑模型，该紧凑模型包括多个可调参数，并构建了用于预测产量的紧凑模型，包括调整可调参数直到满足至少一个第一预定标准。构建最优化问题，其至少包括用于产量，目标和多个约束的紧凑模型。使用优化问题，根据多个约束修改目标，直到满足至少一个第二预定标准。

3. 发明申请

US20120167029A1 PHYSICAL DESIGN SYSTEM AND METHOD 失效
标题翻译：物理设计系统与方法
公开(公告)号：US20120167029A1
公开(公告)日：2012-06-28
申请号：US13413759
申请日：2012-03-07
申请人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
发明人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F17/5009 , G06F17/5072
摘要： A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要翻译：一种用于设计复杂集成电路（IC）的设计系统，一种IC设计方法和程序产品。布局单元接收表示网格和字形格式的部分的电路描述。检查单元检查设计的网格和字形部分。精心设计单元从检查的设计生成目标布局。数据准备单元准备掩模制作的目标布局。模式高速缓存单元用先前缓存的结果有选择地替换设计的部分，以提高设计效率。

4. 发明授权

US07536664B2 Physical design system and method 失效
标题翻译：物理设计系统及方法
公开(公告)号：US07536664B2
公开(公告)日：2009-05-19
申请号：US10917193
申请日：2004-08-12
申请人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
发明人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
IPC分类号： G06F17/50 , G06F19/00
CPC分类号： G06F17/5081 , G06F17/5009 , G06F17/5072
摘要： A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要翻译：一种用于设计复杂集成电路（IC）的设计系统，一种IC设计方法和程序产品。布局单元接收表示网格和字形格式的部分的电路描述。检查单元检查设计的网格和字形部分。精心设计单元从检查的设计生成目标布局。数据准备单元准备掩模制作的目标布局。模式高速缓存单元用先前缓存的结果有选择地替换设计的部分，以提高设计效率。

5. 发明授权

US5052763A Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations 失效
标题翻译：具有两个子系统的光学系统分别校正奇异像差并一起校正均匀像差
公开(公告)号：US5052763A
公开(公告)日：1991-10-01
申请号：US575043
申请日：1990-08-28
申请人： Rama N. Singh , Janusz S. Wilczynski
发明人： Rama N. Singh , Janusz S. Wilczynski
IPC分类号： G02B13/24 , G02B13/26 , G02B17/00 , G02B17/08 , G02B27/00 , G02B27/18 , G03F7/20
CPC分类号： G02B17/0892 , G02B13/26 , G02B17/008 , G02B17/08 , G02B27/0025 , G03F7/70225 , G03F7/70275
摘要： An optical system having a substantially flat image field is disclosed. The optical system is formed from optical subsystems wherein an input optical subsystem forms an intermediate image has a curvature which compensates that from the remaining optical components of the system to result in a substantially flat image for the optical system. Preferably the optical elements preceding the intermediate image and the optical elements succeeding the intermediate image are separately corrected for odd aberrations. The optical elements preceding the intermediate image and the optical elements succeeding the intermediate image compensate for each other and result in a substantially aberration free flat image for the optical system. The optical system preferably contains an input optical subsystem and an output optical subsystem wherein the input optical subsystem is a catadioptric system and wherein the output optical system is a dioptric system. Most preferably the input optical system is a 1X catadioptric system and the output optical system is an NX dioptric system. The optical systems of the present invention are used for subquarter micron photolithography tools for microelectronic fabrication, such as scanners and steppers.

6. 发明授权

US08510699B1 Performance driven layout optimization using morphing of a basis set of representative layouts 失效
标题翻译：性能驱动布局优化使用变形的基础代表性布局
公开(公告)号：US08510699B1
公开(公告)日：2013-08-13
申请号：US13416588
申请日：2012-03-09
申请人： Emrah Acar , Aditya Bansal , Rama N. Singh , Amith Singhee
发明人： Emrah Acar , Aditya Bansal , Rama N. Singh , Amith Singhee
IPC分类号： G06F17/50 , G06F9/455
CPC分类号： G06F9/455 , G06F17/5068
摘要： Techniques for generating variants of a circuit layout and evaluating quality of the variants are provided. In one aspect, a method for generating at least one variant layout for a cell design includes the following steps. At least a first basis layout and a second basis layout are obtained for the cell design, each having a plurality of shapes, each of the shapes being a polygon having a plurality of sides and vertices. One or more of the shapes in the first basis layout are linked with one or more of the shapes in the second basis layout that represent a common feature of the cell design resulting in a plurality of linked shapes. Starting with either the first basis layout or the second basis layout, a location of the vertices of each of the linked shapes are changed to produce the variant layout for the cell design.
摘要翻译：提供了用于产生电路布局的变型和评估变体的质量的技术。一方面，用于为单元设计生成至少一个变体布局的方法包括以下步骤。为单元设计获得至少第一基础布局和第二基本布局，每个布局具有多个形状，每个形状是具有多个边和顶点的多边形。第一基本布局中的一个或多个形状与第二基本布局中的一个或多个形状相关联，其表示单元设计的共同特征，导致多个连接形状。从第一基本布局或第二基本布局开始，改变每个链接形状的顶点的位置，以产生单元格设计的变体布局。

7. 发明申请

US20100318956A1 METHOD OF INTEGRATED CIRCUIT CHIP FABRICATION AND PROGRAM PRODUCT THEREFOR 有权
标题翻译：集成电路芯片制造方法及其程序产品
公开(公告)号：US20100318956A1
公开(公告)日：2010-12-16
申请号：US12482504
申请日：2009-06-11
申请人： Geng Han , Fook-Luen Heng , Jin Fuw Lee , Chao Yi Tien , Rama N. Singh
发明人： Geng Han , Fook-Luen Heng , Jin Fuw Lee , Chao Yi Tien , Rama N. Singh
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.
摘要翻译：一种用于集成电路（IC）芯片制造，物理设计系统及其程序产品的物理设计方法。设计形状被分段为光学邻近校正（OPC）的段，并确定段的谐波平均值。根据形状确定电气意图，并为段确定谐波平均值。可以基于使用谐波平均成本函数测量的移动段的对谐波平均值的影响来移动段。最后分段形状传递给OPC。

8. 发明授权

US06600528B2 Integrated prism sheet for improved viewing angle in direct view color filterless liquid crystal displays 有权
公开(公告)号：US06600528B2
公开(公告)日：2003-07-29
申请号：US09741466
申请日：2000-12-19
申请人： Evan G. Colgan , Rama N. Singh , Yoichi Taira , Robert L. Wisnieff , Fumiaki Yamada
发明人： Evan G. Colgan , Rama N. Singh , Yoichi Taira , Robert L. Wisnieff , Fumiaki Yamada
IPC分类号： G02F11336
CPC分类号： G02F1/133621 , G02F1/133504 , G02F1/133526
摘要： A display device provides a first optical device disposed in a light path for spatially separating angularly separated light into color components, and a pixel which receives each of the color components through a sub-pixel. Each sub-pixel controls transmitted light intensity therethrough. A black matrix is formed in operative relationship with the sub-pixels including apertures for receiving the color components. A microstructured layer is disposed in the light path and receives or transmits the color components from or to the apertures of the black matrix. The microstructured layer includes tilted and/or curved surfaces for redirecting laterally shifted color components shifted by the first optical device and may also diffuse light.

9. 发明授权

US5597222A Optical relay lens system for projection displays 失效
标题翻译：用于投影显示的光学中继透镜系统
公开(公告)号：US5597222A
公开(公告)日：1997-01-28
申请号：US373696
申请日：1995-01-17
申请人： Fuad E. Doany , Rama N. Singh
发明人： Fuad E. Doany , Rama N. Singh
IPC分类号： G02B13/00 , G03B21/14
CPC分类号： H04N9/3152 , G02B13/0095 , H04N9/3105
摘要： A projection display which includes reflective light valves such as liquid crystal spatial light modulators, and a 1.times. optical relay lens system. The 1.times. optical relay lens system eliminates the requirement for a projection lens having a large retrofocus distance. Projection displays based upon reflective liquid crystal light valves (spatial light modulators) require dichroic beam splitters necessary for color separation and a polarizing beam splitter necessary for light valve operation positioned between the light valves and the projection lens. The 1.times. optical relay lens produces a relayed intermediate image of the light valves, and incorporates therein the dichroic beam splitters and the polarizing beam splitter. The 1.times. optical relay lens produces an intermediate image which is projected by the projection lens at a given magnification with minimal working distance, which results in relatively less residual lateral color and an inexpensive projection lens.
摘要翻译：包括诸如液晶空间光调制器的反射光阀和1x光学中继透镜系统的投影显示器。 1x光学中继透镜系统消除了对具有大的后向聚焦距离的投影透镜的要求。基于反射型液晶光阀（空间光调制器）的投影显示器需要用于分色所需的二向色分束器和位于光阀和投影透镜之间的光阀操作所需的偏振分束器。 1x光学中继透镜产生光阀的中继中间图像，并且其中包括二向色分束器和偏振分束器。 1x光学中继透镜产生中间图像，该中间图像由投影透镜以给定的放大倍率投影，工作距离最小，这导致相对较少的剩余侧面颜色和便宜的投影透镜。

10. 发明授权

US5315604A Optical structure for adjusting the peak power of a laser beam 失效
标题翻译：用于调整激光束的峰值功率的光学结构
公开(公告)号：US5315604A
公开(公告)日：1994-05-24
申请号：US10207
申请日：1993-01-28
申请人： George Chiu , Rama N. Singh , Janusz S. Wilczynski
发明人： George Chiu , Rama N. Singh , Janusz S. Wilczynski
IPC分类号： B23K26/067 , G01B9/02
CPC分类号： B23K26/0613 , B23K26/067 , Y10S372/70
摘要： Structure is disclosed for the ablation of material by the use of a laser beam wherein the laser provides a beam which is directed through an illumination and projection optical system for imaging on the material which is to be ablated. In the present invention the peak power of the laser beam is adjustable. The laser beam peak power adjustment structure includes a laser that provides a pulsed beam. The laser beam is directed into a beam splitter wherein the laser beam is split into two beam components. The first beam component passes through beam splitter with negligible or no delay, then passes through a quarter waveplate and impinges on a first mirror which reflects it back to the beam splitter. The second beam component is directed at an angle of 90 degrees by the beam splitter and toward a second mirror. The second mirror is at a predetermined distance from the beam splitter which introduces a total predetermined delay for the reflected second beam component as it is directed back to the beam splitter. The reflected first beam component and the delayed reflected second beam component are combined at the beam splitter to form a third beam which passes from the beam splitter toward the conventional optical column for the ablation tool including the mask and target. The resultant third beam directed to the mask therefore consists of original beam pulses and delayed beam pulses which combine to reduce the peak power of the third beam component.
摘要翻译：公开了通过使用激光束消融材料的结构，其中激光器提供通过照明和投影光学系统引导的光束，用于在待烧蚀的材料上成像。在本发明中，激光束的峰值功率是可调节的。激光束峰值功率调整结构包括提供脉冲光束的激光器。激光束被引导到分束器中，其中激光束被分成两个光束分量。第一光束分量通过可忽略或没有延迟的分束器，然后通过四分之一波片并撞击在第一反射镜上，将其反射回分束器。第二光束分量通过分束器以90度的角度指向第二反射镜。第二反射镜距离分束器预定距离，当反射的第二光束分量被引导回分束器时，该反射镜对于反射的第二光束分量引入总预定的延迟。反射的第一光束分量和延迟的反射的第二光束分量在分束器处组合以形成第三光束，其从分束器向用于包括掩模和靶的消融工具的常规光学柱传递。所产生的指向掩模的第三光束由原始光束脉冲和延迟光束脉冲组成，其结合以减小第三光束分量的峰值功率。

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