专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080320435A1 OPTICAL PROXIMITY CORRECTION IMPROVEMENT BY FRACTURING AFTER PRE-OPTICAL PROXIMITY CORRECTION 审中-公开
公开(公告)号：US20080320435A1
公开(公告)日：2008-12-25
申请号：US12170471
申请日：2008-07-10
申请人： Martin Burkhardt , Nakgeuon Seong
发明人： Martin Burkhardt , Nakgeuon Seong
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G06F2217/12 , Y02P90/265
摘要： A method for fabricating a mask used to make integrated circuits is provided using an improved OPC process whereby a pre-fracturing OPC process is performed on the target design of the integrated circuit. The pre-fractured OPC design is then fractured and a post-fracturing OPC process performed to make the final mask. Either rule-based OPC or model-based OPC processes can be used for both of the OPC steps or each step can be either side-based or model-based OPC.

2. 发明授权

US08520186B2 Active spectral control of optical source 有权
标题翻译：光源的有源光谱控制
公开(公告)号：US08520186B2
公开(公告)日：2013-08-27
申请号：US12860288
申请日：2010-08-20
申请人： Nakgeuon Seong , Ivan B. Lalovic , Nigel R. Farrar , Robert J. Rafac , Joseph J. Bendik
发明人： Nakgeuon Seong , Ivan B. Lalovic , Nigel R. Farrar , Robert J. Rafac , Joseph J. Bendik
IPC分类号： G03B27/68 , G03B27/42
CPC分类号： G03F7/70575 , G03F7/70525
摘要： A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.
摘要翻译：控制光束的光谱特性的方法包括将光束引导到被配置为在晶片上产生图案的光刻曝光装置; 接收表示光束的光谱特性的信息; 接收表示所述光刻曝光装置的光学成像条件的信息; 基于所接收的光谱特性信息和所接收的光学成像条件信息来估计光束的特征值; 确定所估计的光束特性值是否与目标光束特性值匹配; 并且如果确定估计光束特性值与目标光束特性值不匹配，则调整光束的光谱特性。

3. 发明申请

US20050177810A1 Lithographic process window optimization under complex constraints on edge placement 有权
标题翻译：边缘放置复杂约束下的平版印刷工艺窗口优化
公开(公告)号：US20050177810A1
公开(公告)日：2005-08-11
申请号：US10776901
申请日：2004-02-10
申请人： Fook-Luen Heng , Mark Lavin , Jin-Fuw Lee , Daniel Ostapko , Alan Rosenbluth , Nakgeuon Seong
发明人： Fook-Luen Heng , Mark Lavin , Jin-Fuw Lee , Daniel Ostapko , Alan Rosenbluth , Nakgeuon Seong
IPC分类号： G03F1/14 , G03F7/20 , G06F17/50 , H01L21/00
CPC分类号： G03F1/36
摘要： A novel method and system for layout optimization relative to lithographic process windows which facilitates lithographic constraints to be non-localized in order to impart a capability of printing a given circuit with a process window beyond the process windows which are attainable with conventional simplified design rules.
摘要翻译：一种用于相对于光刻工艺窗口的布局优化的新颖方法和系统，其有助于光刻约束被非局部化，以便赋予给定电路打印超过可以用常规简化设计规则达到的过程窗口的处理窗口的能力。

4. 发明授权

US08473885B2 Physical design system and method 失效
公开(公告)号：US08473885B2
公开(公告)日：2013-06-25
申请号：US13413759
申请日：2012-03-07
申请人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woeltgens
发明人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woeltgens
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F17/5009 , G06F17/5072
摘要： A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.

5. 发明申请

US20070224526A1 Fast method to model photoresist images using focus blur and resist blur 有权
标题翻译：使用聚焦模糊和抵抗模糊来快速模拟光刻胶图像
公开(公告)号：US20070224526A1
公开(公告)日：2007-09-27
申请号：US11378536
申请日：2006-03-17
申请人： Timothy Brunner , Gregg Gallatin , Ronald Gordon , Kafai Lai , Alan Rosenbluth , Nakgeuon Seong
发明人： Timothy Brunner , Gregg Gallatin , Ronald Gordon , Kafai Lai , Alan Rosenbluth , Nakgeuon Seong
IPC分类号： G03C5/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/70575
摘要： A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.
摘要翻译：一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应图片。该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定图形对象的图像与目标图案与显性多色2D内核的卷积。

6. 发明授权

US06919146B2 Planar reticle design/fabrication method for rapid inspection and cleaning 失效
标题翻译：平面标线设计/制造方法，用于快速检查和清洁
公开(公告)号：US06919146B2
公开(公告)日：2005-07-19
申请号：US10179827
申请日：2002-06-25
申请人： Daniel A. Corliss , Christopher J. Progler , Nakgeuon Seong
发明人： Daniel A. Corliss , Christopher J. Progler , Nakgeuon Seong
IPC分类号： G01N15/02 , G01N21/94 , G01N21/956 , G03F1/48 , G03F1/84 , G03F9/00 , G03C5/00
CPC分类号： G03F1/00 , G01N15/0227 , G01N21/94 , G01N21/956 , G01N2021/95676 , G03F1/48 , G03F1/84 , Y10S430/151
摘要： A reticle has a transparent substrate, mask shapes on the substrate, a transparent material covering the mask shapes and an optional anti-reflective material over the transparent material.
摘要翻译：掩模版具有透明基板，基板上的掩模形状，覆盖掩模形状的透明材料和透明材料上的任选的抗反射材料。

7. 发明授权

US08238644B2 Fast method to model photoresist images using focus blur and resist blur 有权
标题翻译：使用聚焦模糊和抵抗模糊来快速模拟光刻胶图像
公开(公告)号：US08238644B2
公开(公告)日：2012-08-07
申请号：US11378536
申请日：2006-03-17
申请人： Timothy A. Brunner , Gregg M. Gallatin , Ronald L. Gordon , Kafai Lai , Alan E. Rosenbluth , Nakgeuon Seong
发明人： Timothy A. Brunner , Gregg M. Gallatin , Ronald L. Gordon , Kafai Lai , Alan E. Rosenbluth , Nakgeuon Seong
IPC分类号： G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/70575
摘要： A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.
摘要翻译：一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应图片。该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定图形对象的图像与目标图案与显性多色2D内核的卷积。

8. 发明申请

US20120167029A1 PHYSICAL DESIGN SYSTEM AND METHOD 失效
标题翻译：物理设计系统与方法
公开(公告)号：US20120167029A1
公开(公告)日：2012-06-28
申请号：US13413759
申请日：2012-03-07
申请人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
发明人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F17/5009 , G06F17/5072
摘要： A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要翻译：一种用于设计复杂集成电路（IC）的设计系统，一种IC设计方法和程序产品。布局单元接收表示网格和字形格式的部分的电路描述。检查单元检查设计的网格和字形部分。精心设计单元从检查的设计生成目标布局。数据准备单元准备掩模制作的目标布局。模式高速缓存单元用先前缓存的结果有选择地替换设计的部分，以提高设计效率。

9. 发明申请

US20110205512A1 Active Spectral Control of Optical Source 有权
标题翻译：光源的主动光谱控制
公开(公告)号：US20110205512A1
公开(公告)日：2011-08-25
申请号：US12860288
申请日：2010-08-20
申请人： Nakgeuon Seong , Ivan B. Lalovic , Nigel R. Farrar , Robert J. Rafac , Joseph J. Bendik
发明人： Nakgeuon Seong , Ivan B. Lalovic , Nigel R. Farrar , Robert J. Rafac , Joseph J. Bendik
IPC分类号： G03B27/54
CPC分类号： G03F7/70575 , G03F7/70525
摘要： A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.
摘要翻译：控制光束的光谱特性的方法包括将光束引导到被配置为在晶片上产生图案的光刻曝光装置; 接收表示光束的光谱特性的信息; 接收表示所述光刻曝光装置的光学成像条件的信息; 基于所接收的光谱特性信息和所接收的光学成像条件信息来估计光束的特征值; 确定所估计的光束特性值是否与目标光束特性值匹配; 并且如果确定估计光束特性值与目标光束特性值不匹配，则调整光束的光谱特性。

10. 发明授权

US07536664B2 Physical design system and method 失效
标题翻译：物理设计系统及方法
公开(公告)号：US07536664B2
公开(公告)日：2009-05-19
申请号：US10917193
申请日：2004-08-12
申请人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
发明人： John M. Cohn , James A. Culp , Ulrich A. Finkler , Fook-Luen Heng , Mark A. Lavin , Jin Fuw Lee , Lars W. Liebmann , Gregory A. Northrop , Nakgeuon Seong , Rama N. Singh , Leon Stok , Pieter J. Woltgens
IPC分类号： G06F17/50 , G06F19/00
CPC分类号： G06F17/5081 , G06F17/5009 , G06F17/5072
摘要： A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要翻译：一种用于设计复杂集成电路（IC）的设计系统，一种IC设计方法和程序产品。布局单元接收表示网格和字形格式的部分的电路描述。检查单元检查设计的网格和字形部分。精心设计单元从检查的设计生成目标布局。数据准备单元准备掩模制作的目标布局。模式高速缓存单元用先前缓存的结果有选择地替换设计的部分，以提高设计效率。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式