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81. 发明授权

US6022268A Polishing pads and methods relating thereto 失效
标题翻译：抛光垫及其相关方法
公开(公告)号：US6022268A
公开(公告)日：2000-02-08
申请号：US54948
申请日：1998-04-03
申请人： John V. H. Roberts , David B. James , Lee Melbourne Cook
发明人： John V. H. Roberts , David B. James , Lee Melbourne Cook
IPC分类号： B24B37/24 , B24B37/26 , B24B41/047 , B24D3/26 , B24D3/28 , B24D13/14 , B24B1/00
CPC分类号： B24B37/24 , B24B37/26 , B24B41/047 , B24D13/142 , B24D3/26 , B24D3/28
摘要： This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and have an innovative surface topography and texture which generally improves predictability and polishing performance.
摘要翻译：本发明描述了可用于制造半导体器件等的改进的抛光垫。本发明的垫具有有利的亲水性抛光材料，并且具有创新的表面形貌和纹理，其通常改善了可预测性和抛光性能。

82. 发明授权

US5609447A Surface decarburization of a drill bit 失效
标题翻译：钻头表面脱碳
公开(公告)号：US5609447A
公开(公告)日：1997-03-11
申请号：US314510
申请日：1994-09-28
申请人： Robert W. Britzke , Jimmy Eason , Zhigang Fang
发明人： Robert W. Britzke , Jimmy Eason , Zhigang Fang
IPC分类号： B23B51/02 , B24B3/26 , B24D3/26 , C21D3/04 , C21D9/22
CPC分类号： C21D9/22 , B23B51/02 , B24B3/26 , B24D3/26 , C21D3/04 , B23B2228/10 , B23B2251/122 , B23B2251/125 , B23B2251/18 , B23B2251/426 , Y10T408/78 , Y10T408/9097
摘要： A drill but having a drill body with a cutting tip, an axis of symmetry, and a plurality of flutes wherein said flutes have a rake surface at said cutting tip. The cutting tip includes a plurality of side blades between said flutes and joined at a web, a plurality of flank surfaces extending from an outer diameter of said cutting tip to said axis of symmetry, and a plurality of primary cutting edges at the intersection of said flank surfaces with said rake surfaces. Both the rake and flank surfaces have extensions which would intersect each other at an intersection. The primary cutting edges include an angular surface formed on the forward end of said rake surfaces which is located such that the length of said extension of said rake surface measured between said angular surface and said intersection is a first predetermined value and the length of said extension of said flank surface measured between said angular surface and said intersection is a second predetermined value. The primary cutting edges also have a hardened layer formed from the outer surface of the primary cutting edge.
摘要翻译：一种钻头，但具有具有切割尖端，对称轴线和多个凹槽的钻体，其中所述凹槽在所述切割尖端处具有前刀面。切割尖端包括在所述凹槽之间并在腹板处连接的多个侧叶片，从所述切割尖端的外径延伸到所述对称轴线的多个侧面表面以及在所述切口的交叉点处的多个主切削刃具有所述前刀面的侧面。两个耙面和侧面都有一个在交叉点处相交的延伸部分。主切削刃包括形成在所述前刀面的前端上的角度表面，其被定位成使得在所述角度表面和所述相交处之间测量的所述前刀面的所述延伸部分的长度是第一预定值，并且所述延伸部分的长度在所述角度表面和所述交点之间测量的所述侧面的第二预定值。主切削刃还具有由主切削刃的外表面形成的硬化层。

83. 发明申请

US20150174735A1 HIGH POROSITY ABRASIVE ARTICLES AND METHODS OF MANUFACTURING SAME 审中-公开
公开(公告)号：US20150174735A1
公开(公告)日：2015-06-25
申请号：US14634075
申请日：2015-02-27
申请人： SAINT-GOBAIN ABRASIVES, INC. , SAINT-GOBAIN ABRASIFS
发明人： Rachana Upadhyay , Richard W. J. Hall
IPC分类号： B24D3/32 , B24D18/00
CPC分类号： B24D3/32 , B24B37/245 , B24D3/26 , B24D11/00 , B24D18/00 , B24D18/0027
摘要： An abrasive article includes a polymer matrix and abrasive grains dispersed in the polymer matrix, wherein the abrasive article has a void volume of at least 50%. The polymer matrix is polymerized from a monomer including at least one double bond.

84. 发明授权

US08986407B2 High porosity abrasive articles and methods of manufacturing same 有权
标题翻译：高孔隙度磨料制品及其制造方法
公开(公告)号：US08986407B2
公开(公告)日：2015-03-24
申请号：US12372549
申请日：2009-02-17
申请人： Rachana Upadhyay , Richard W. J. Hall
发明人： Rachana Upadhyay , Richard W. J. Hall
IPC分类号： C09K3/14 , B24D11/00 , B24D3/26 , B24B37/24 , B24D18/00
CPC分类号： B24D3/32 , B24B37/245 , B24D3/26 , B24D11/00 , B24D18/00 , B24D18/0027
摘要： An abrasive article includes a polymer matrix and abrasive grains dispersed in the polymer matrix, wherein the abrasive article has a void volume of at least 50%. The polymer matrix is polymerized from a monomer including at least one double bond.
摘要翻译：磨料制品包括分散在聚合物基质中的聚合物基体和磨料颗粒，其中磨料制品具有至少50％的空隙体积。聚合物基体由包含至少一个双键的单体聚合。

85. 发明申请

US20120279138A1 POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US20120279138A1
公开(公告)日：2012-11-08
申请号：US13552346
申请日：2012-07-18
申请人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
发明人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
IPC分类号： B24B37/24
CPC分类号： B24B37/24 , B24D3/26 , B24D11/001
摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.
摘要翻译：抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300μm聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为原料组分，活性氢化合物包括30至85重量％的具有2至4个官能团的高分子量多元醇和羟值为20〜100mg KOH / g。

86. 发明授权

US08167690B2 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：US08167690B2
公开(公告)日：2012-05-01
申请号：US12440003
申请日：2007-04-23
申请人： Takeshi Fukuda , Satoshi Maruyama , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Satoshi Maruyama , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B24D11/00
CPC分类号： B24D3/26 , B24B37/24
摘要： A polishing pad of excellent durability has a polishing layer is arranged on a base material layer, and the polishing layer comprises a thermosetting polyurethane foam having roughly spherical interconnected cells with an average cell diameter of 35 to 300 μm.
摘要翻译：具有优异耐久性的抛光垫在基材层上设置有抛光层，抛光层包括具有平均泡孔直径为35〜300μm的大致球形的互连电池的热固性聚氨酯泡沫。

87. 发明申请

US20100029185A1 POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US20100029185A1
公开(公告)日：2010-02-04
申请号：US12519339
申请日：2007-11-27
申请人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
发明人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
IPC分类号： B24B37/00 , B24D11/00 , H01L21/304
CPC分类号： B24B37/24 , B24D3/26 , B24D11/001
摘要： An object of the invention is to provide a polishing pad excellent in durability and in the adhesiveness between a polishing layer and a base material layer. The first invention relates to a polishing pad comprising a polishing layer arranged on a base material layer, wherein the polishing layer comprises a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm, the polyurethane foam comprises an isocyanate component and an active hydrogen-containing compound as starting components, and the active hydrogen-containing compound comprises 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.
摘要翻译：本发明的目的是提供一种抛光层和基材层之间的耐久性和粘合性优异的抛光垫。第一发明涉及一种抛光垫，其包括布置在基材层上的抛光层，其中所述抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至300μm的具有大致球形的互连孔，所述聚氨酯泡沫包含异氰酸酯组分和含活性氢的化合物作为起始组分，并且所述活性含氢化合物包含30至85重量％的具有2-4个官能团和羟基值为20至100mg KOH的高分子量多元醇 /G。

88. 发明申请

US20100003896A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20100003896A1
公开(公告)日：2010-01-07
申请号：US12439154
申请日：2007-08-17
申请人： Yoshiyuki Nakai , Tsuyoshi Kimura , Atsushi Kazuno , Kazuyuki Ogawa , Tetsuo Shimomura
发明人： Yoshiyuki Nakai , Tsuyoshi Kimura , Atsushi Kazuno , Kazuyuki Ogawa , Tetsuo Shimomura
IPC分类号： B24B1/00 , C08G18/28 , C09K3/14 , B24D11/00
CPC分类号： B24B37/24 , B24B29/00 , B24D3/26 , B24D3/32 , C08G18/10 , C08G18/14 , C08G18/4854 , C08G18/6674 , C08G18/724 , C08G18/7831 , C08G18/3814 , C08G18/792
摘要： A polishing pad capable of maintaining a high level of dimensional stability during absorption of moisture or water includes a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of an isocyanate-terminated prepolymer (A), a polymerized diisocyanate, and a chain extender, and the isocyanate-terminated prepolymer (A) includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol. A method for manufacturing such a polishing pad includes mixing a first component containing an isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to form a polyurethane foam. The pad so made is used in the manufacture of semiconductor devices.
摘要翻译：能够在吸收水分或水的同时维持高水平的尺寸稳定性的抛光垫包括：抛光层，其包括具有细孔的聚氨酯泡沫，其中聚氨酯泡沫包括异氰酸酯封端的预聚物（A）的反应的固化产物，聚合二异氰酸酯和扩链剂，异氰酸酯封端的预聚物（A）包括异氰酸酯单体，高分子量多元醇（a）和低分子量多元醇。制造这种抛光垫的方法包括将含有异氰酸酯封端的预聚物的第一组分与含有扩链剂的第二组分混合并固化该混合物以形成聚氨酯泡沫。如此制成的焊盘用于制造半导体器件。

89. 发明申请

US20090264050A1 HIGH POROSITY ABRASIVE ARTICLES AND METHODS OF MANUFACTURING SAME 有权
标题翻译：高度磨蚀性物品及其制造方法
公开(公告)号：US20090264050A1
公开(公告)日：2009-10-22
申请号：US12372549
申请日：2009-02-17
申请人： Rachana Upadhyay , Richard W. J. Hall
发明人： Rachana Upadhyay , Richard W. J. Hall
IPC分类号： B24B1/00 , C09G1/02
CPC分类号： B24D3/32 , B24B37/245 , B24D3/26 , B24D11/00 , B24D18/00 , B24D18/0027
摘要： An abrasive article includes a polymer matrix and abrasive grains dispersed in the polymer matrix, wherein the abrasive article has a void volume of at least 50%. The polymer matrix is polymerized from a monomer including at least one double bond.
摘要翻译：磨料制品包括分散在聚合物基质中的聚合物基体和磨料颗粒，其中磨料制品具有至少50％的空隙体积。聚合物基体由包含至少一个双键的单体聚合。

90. 发明授权

US07264641B2 Polishing pad comprising biodegradable polymer 失效
标题翻译：抛光垫包括可生物降解的聚合物
公开(公告)号：US07264641B2
公开(公告)日：2007-09-04
申请号：US10705533
申请日：2003-11-10
申请人： Abaneshwar Prasad
发明人： Abaneshwar Prasad
IPC分类号： B24D11/00 , B24B1/00 , B24B29/00
CPC分类号： B24B37/22 , B24B37/24 , B24D3/26 , C23F3/00 , H01L21/3212
摘要： The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxyalkanoic acids, hydroxybutyric acid, hydroxyvaleric acid, caprolactone, p-dioxanone, trimethylene carbonate, butylene succinate, butylene adipate, monosaccharides, dicarboxylic acid anhydrides, enantiomers thereof, and combinations thereof. The invention is further directed to methods of its use.
摘要翻译：本发明涉及一种用于化学机械抛光的抛光垫，其包括可生物降解的聚合物。生物可降解聚合物包括选自乙醇酸，乳酸，羟基链烷酸，羟基丁酸，羟基戊酸，己内酯，对二恶烷酮，三亚甲基碳酸酯，丁二酸丁二醇酯，己二酸丁二醇酯，单糖，二羧酸酐，对映异构体及其组合。本发明进一步涉及其使用方法。

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