专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

US20230256557A1 EASY-DETACHABLE GRINDING DEVICE FOR CEMENT WALK-BEHIND TROWEL MACHINE 审中-公开
公开(公告)号：US20230256557A1
公开(公告)日：2023-08-17
申请号：US17673820
申请日：2022-02-17
申请人： Yun-Jui Yang
发明人： Yun-Jui Yang
IPC分类号： B24B7/18 , E04F21/24 , B24B47/12 , B24B41/047 , B24B7/22
CPC分类号： B24B7/186 , E04F21/247 , E04F21/248 , B24B47/12 , B24B41/047 , B24B7/22
摘要： An easy-detachable grinding device for a cement walk-behind trowel machine comprises a plurality of installing units arranged on a seat which is installed with the central disk and the outer rotary disks. In use, it is only needed to buckle the installing units to the grinding knives of a power source of a cement walk-behind trowel machine so that the central disk and the outer rotary disks are assembled to the cement walk behind trowel machine. The original grinding knives are unnecessary to be detached from the cement walk behind trowel machine. Furthermore the grinding device can be detached easily as it is not used, while the original used grinding knives can be used again. No more vehicle is needed. Outer rotary disks are arranged on the periphery of the central disk so as to have a large grinding area.

2. 发明授权

US11685016B2 Cooling device for a rotating polishing disk 有权
公开(公告)号：US11685016B2
公开(公告)日：2023-06-27
申请号：US16550620
申请日：2019-08-26
申请人： Lake Country Tool, LLC
发明人： Scott S. McLain , Charles B. Kendall, III
IPC分类号： B24B23/02 , B24B41/047 , B24B55/02
CPC分类号： B24B55/02 , B24B23/02 , B24B41/047
摘要： A cooling device for a rotating machine has a fan assembly coupled with a backing plate. A hub, on the backing plate, secures the cooling device with a shaft. The backing plate includes one or more vents to enable air to exit the cooling device. The fan includes an opening to enable air to enter the cooling device. A chamber is formed between the fan assembly and the backing plate. During rotation, air is drawn into the opening. The air is passed into the chamber and exits through the vents to cool a work surface or working pad attached to the backing plate.

3. 发明申请

US20180345452A1 BUFF PROCESSING DEVICE AND SUBSTRATE PROCESSING DEVICE 审中-公开
公开(公告)号：US20180345452A1
公开(公告)日：2018-12-06
申请号：US15776733
申请日：2016-10-11
申请人： EBARA CORPORATION
发明人： Hideo AIZAWA , Junji KUNISAWA , Mitsuru MIYAZAKI , Naoki TOYOMURA
IPC分类号： B24B41/047
CPC分类号： B24B41/047 , H01L21/304
摘要： In-plane uniformity of buff processing is improved. According to a first form, a buff processing device for executing buff processing of a substrate is provided. Such buff processing device has a rotatable shaft, a buff head body, a torque transmission mechanism for transmitting rotation of the shaft to the buff head body, and an elastic member for elastically supporting the buff head body in a longitudinal direction of the shaft.

4. 发明申请

US20180056471A1 SUBSTRATE GRINDING DEVICE 审中-公开
公开(公告)号：US20180056471A1
公开(公告)日：2018-03-01
申请号：US15522862
申请日：2016-05-13
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Weiqin Hu , Changxu Chen
IPC分类号： B24B7/22 , B24B57/02 , B24B37/10 , B24B41/047
CPC分类号： B24B7/228 , B24B37/105 , B24B37/34 , B24B41/047 , B24B57/02
摘要： The present application has disclosed a substrate grinding device, which includes a carrying platform, a lifting platform and a grinding head, the lifting platform is located above the carrying platform and configured to be movable in a direction perpendicular to an upper surface of the carrying platform with respect to the carrying platform upwardly or downwardly; and the grinding head is mounted to the lifting platform and configured to grind a grind region of a substrate to be ground disposed on the carrying platform, the grind region being a region of the substrate where there is a partial scratch.

5. 发明申请

US20170361414A1 POLISHING OR GRINDING PAD ASSEMBLY 审中-公开
公开(公告)号：US20170361414A1
公开(公告)日：2017-12-21
申请号：US15690498
申请日：2017-08-30
申请人： DIAMOND TOOL SUPPLY, INC.
发明人： Tchavdar V. TCHAKAROV
IPC分类号： B24B7/18 , B24B41/047
CPC分类号： B24D7/08 , A47L11/164 , A47L11/4038 , B24B7/186 , B24B7/22 , B24B41/047 , B24B41/0475 , B24D7/066 , B24D11/00 , B24D13/14 , B24D18/0072
摘要： A floor polishing or grinding pad assembly is provided. In one aspects a polishing or grinding pad assembly employs a flexible pad, a reinforcement layer or ring, and multiple floor-contacting tools such as disks. In yet another aspect, at least one of the floor-contacting tools has a workpiece-contacting bottom plane having angle offset from that of a base surface of the tool, a flexible pad and/or a flexible reinforcement layer. A further aspect employs a smaller set of disks alternating between and/or offset from a larger set of the disks.

6. 发明授权

US09757836B2 Grinding apparatus 有权
公开(公告)号：US09757836B2
公开(公告)日：2017-09-12
申请号：US14175101
申请日：2014-02-07
申请人： Veen Holdings Pty Ltd
发明人： Tim Van Der Veen
IPC分类号： B24B7/18 , B24B41/047 , B24B7/00 , B24B27/00
CPC分类号： B24B7/18 , B24B7/005 , B24B7/186 , B24B27/0076 , B24B41/047
摘要： A grinding apparatus for grinding a floor, the apparatus comprising a body having a travelling mechanism which enables the body to travel across a floor while the apparatus is grinding; a first grinding head incorporating at least one grinding tool and having an operable configuration in which the first grinding head is able to grind a first floor portion; and a second grinding head incorporating at least one grinding tool and having an operable configuration in which the second grinding head is able to grind a second floor portion; wherein the first and second grinding heads are mountable to the body whereby their positions relative to the body are able to be varied.

7. 发明申请

US20170043445A1 GRINDING/MILLING MACHINE FOR LEVELLING OF HORIZONTAL SURFACES 审中-公开
标题翻译：用于水平表面平整的研磨/研磨机
公开(公告)号：US20170043445A1
公开(公告)日：2017-02-16
申请号：US15306636
申请日：2015-04-27
申请人： Per-Erik LILIENBERG
发明人： Per-Erik LILIENBERG
IPC分类号： B24B7/18 , B24B27/00
CPC分类号： B24B7/186 , B24B27/0007 , B24B27/0076 , B24B41/047 , B28D1/18
摘要： A grinding/milling machine for levelling of horizontal surfaces, having a mobile drive unit, including a vertically pivotable boom suspended from the mobile unit, a rigid girder pivotally fastened at the end of the boom and two motorized machining and/or milling machines, each being arranged at a respective opposite end of the rigid girder.
摘要翻译：一种用于使水平表面平整的研磨/铣削机，具有可移动的驱动单元，包括悬挂在移动单元上的垂直枢转臂，可枢转地固定在悬臂末端的刚性梁和两个电动机械加工和/或铣床，每个被布置在刚性梁的相应的相对端。

8. 发明申请

US20150367477A1 A BRUSH UNIT, A DEVICE FOR BRUSH-POLISHING THAT USES THE BRUSH UNIT, A SYSTEM FOR BRUSH-POLISHING, AND A METHOD FOR BRUSH-POLISHING 有权
标题翻译：刷子单元，用于刷洗单元的布置装置，用于刷抛光的系统和用于刷抛光的方法
公开(公告)号：US20150367477A1
公开(公告)日：2015-12-24
申请号：US14763224
申请日：2014-01-20
申请人： SINTOKOGIO, LTD.
发明人： Tsuguhito Hayashi , Youichiro HIRATSUKA , Shigeru TANAHASHI
IPC分类号： B24B29/00 , B24B27/00 , B24D13/14 , B24B41/047 , B24B47/12 , B24B9/00 , B24B41/00
CPC分类号： B24B29/005 , B24B9/00 , B24B9/002 , B24B27/0023 , B24B27/0069 , B24B27/0076 , B24B41/005 , B24B41/047 , B24B47/12 , B24D13/145
摘要： The purpose of the present invention is to provide a device for brush-polishing by means of a polishing brush that rotates and revolves as in a planetary motion, wherein the conditions to polish can be easily set in accordance with the properties of the workpiece and the purposes to polish. A brush unit has a polishing brush that rotates and revolves. The brush unit includes a mechanism for driving the rotation that rotates the polishing brush and the mechanism for driving the revolution that revolves it. By adjusting the speed of the rotation by the mechanism for driving the rotation the capabilities to polish the workpiece are enhanced. By adjusting the speed of the revolution by the mechanism for driving the revolution the entire workpiece is uniformly polished.
摘要翻译：本发明的目的是提供一种借助于像行星运动一样旋转和旋转的抛光刷进行刷磨的装置，其中抛光条件可以根据工件的特性和抛光目的。刷子单元具有旋转和旋转的抛光刷。电刷单元包括用于驱动使抛光刷旋转的旋转的机构和用于驱动旋转的旋转的机构。通过用于驱动旋转的机构来调节旋转速度，增强了对工件进行抛光的能力。通过用于驱动旋转的机构来调节旋转速度，整个工件被均匀地抛光。

9. 发明授权

US09132527B2 Backing plate unit for a rotary grinding machine 有权
标题翻译：旋转磨床的支撑板单元
公开(公告)号：US09132527B2
公开(公告)日：2015-09-15
申请号：US13579889
申请日：2011-08-24
申请人： Peter Jöst
发明人： Peter Jöst
IPC分类号： B24B55/10 , B24B41/047 , B24D9/08 , B24B9/10
CPC分类号： B24B55/102 , B24B9/10 , B24B41/047 , B24D9/08
摘要： A backing plate unit for a rotary grinding machine includes a backing plate with a front face for mounting a grinding disc and a back face opposite the front face, a drive shaft that can be attached to the tool adaptor of the rotary grinding machine, and a suction hood that is rotatably fixed to the drive shaft. The backing plate 10 includes suction openings that penetrate the backing plate so that the suction hood 30 vacuums dust through the backing plate to the back face of the backing plate.
摘要翻译：用于旋转研磨机的背板单元包括具有用于安装研磨盘的前表面和与前表面相对的后表面的背板，可附接到旋转研磨机的工具适配器的驱动轴，以及可旋转地固定在驱动轴上的吸气罩。背板10包括穿透背板的抽吸开口，使得吸气罩30将灰尘通过背板抽吸到背板的背面。

10. 发明申请

US20140242886A1 POLISHING HEAD IN CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME 有权
标题翻译：化学机械抛光装置中的抛光头和包括其的化学机械抛光装置
公开(公告)号：US20140242886A1
公开(公告)日：2014-08-28
申请号：US14183714
申请日：2014-02-19
申请人： SAMSUNG ELECTRONICS., LTD.
发明人： Chang Gyu WOO , Sung Ho SHIN , Joo Yeop NAM , Ki Hong CHO
IPC分类号： B24B37/10 , B24B41/047 , B24B37/32
CPC分类号： B24B41/047 , B24B37/32
摘要： A polishing head of a chemical mechanical polishing apparatus includes a housing moving up and down, a base assembly connected to a bottom of the housing to support the housing, a membrane on a bottom of the base assembly and a retainer ring surrounding the membrane and connected to the bottom of the base assembly, the membrane including a pressing portion to adsorb and press a substrate, a first partition on the pressing portion and extending from an edge of the pressing portion along a height direction, a first horizontal extending portion extending from an upper end portion of the first partition toward a center of the membrane, and a second horizontal extending portion from the upper end portion of the first partition toward the center of the membrane, the second horizontal extending portion being above the first horizontal extending portion and including a curved portion expanding by pneumatic pressure.
摘要翻译：化学机械抛光装置的抛光头包括上下移动的壳体，连接到壳体的底部以支撑壳体的底座组件，底座组件的底部上的膜和围绕膜的保持环，并连接所述膜包括用于吸附和挤压基板的按压部分，所述按压部分上的第一隔板并且沿着所述高度方向从所述按压部分的边缘延伸;第一水平延伸部分，从所述基部组件的底部延伸，所述第一分隔件的上端部朝向所述膜的中心，以及从所述第一隔板的上端部朝向所述膜的中心的第二水平延伸部，所述第二水平延伸部位于所述第一水平延伸部的上方，通过气动压力膨胀的弯曲部分。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式