专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

US08836660B2 Tactile display and CAD system 有权
标题翻译：触觉显示和CAD系统
公开(公告)号：US08836660B2
公开(公告)日：2014-09-16
申请号：US13498813
申请日：2009-09-28
申请人： Akihito Sano , Yoshihiro Tanaka , Hideo Fujimoto , Eisuke Kajisa , Kenji Wada
发明人： Akihito Sano , Yoshihiro Tanaka , Hideo Fujimoto , Eisuke Kajisa , Kenji Wada
IPC分类号： G06F3/041 , G03B21/00 , G06F3/01 , G06F17/50
CPC分类号： G06F3/016 , G03B21/003 , G06F3/011 , G06F17/50 , G09B21/003
摘要： Provided is a technique capable of allowing a person to perceive a fine relief on an object surface clearly. A tactile device of a tactile display slides above an object. The tactile device comprises three rods which are free to move up and down. Lower ends of the rods are in contact with a surface of the object. Upper ends of respective rods touch a palmar-side skin equivalent to positions of three joints of a first finger or a second finger. When the tactile device is slid, upper ends of respective rods move up and down in accordance with a surface relief of the object. In response to the movement of the tactile device, the three rods push three finger joint positions of the palmar-side skin with a stroke equal to a height of the relief.
摘要翻译：提供了一种能够使人能够清楚地感知物体表面上的细小浮雕的技术。触觉显示器的触觉装置在物体上方滑动。触觉装置包括可自由上下移动的三根棒。杆的下端与物体的表面接触。各杆的上端接触相当于第一手指或第二手指的三个关节位置的手掌皮肤。当触觉装置滑动时，各个杆的上端根据物体的表面浮雕而上下移动。响应于触觉装置的移动，三个杆以等于浮雕的高度的笔画推动手掌皮肤的三个手指关节位置。

72. 发明授权

US08530583B2 Thermo- and/or photo-sensitive material and insulator film made thereof 失效
标题翻译：热敏和/或感光材料及其制成的绝缘体膜
公开(公告)号：US08530583B2
公开(公告)日：2013-09-10
申请号：US13133827
申请日：2009-11-10
申请人： Kenji Wada , Katsuyuki Watanabe , Keiji Yamamoto
发明人： Kenji Wada , Katsuyuki Watanabe , Keiji Yamamoto
IPC分类号： C08F30/08
CPC分类号： H01L23/5329 , C07F7/20 , C07F7/21 , C08F230/08 , C08G77/045 , C08G77/12 , C08G77/20 , C08G77/50 , C08L83/04 , C09D183/04 , C09D183/14 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L2924/0002 , H01L2924/00
摘要： A composition for film formation which can form a film suitable for use as an interlayer dielectric in a semiconductor device, etc. and having an appropriate even thickness and can give a film having excellent characteristics including permittivity and Young's modulus; and a dielectric film obtained from the film-forming composition. The composition contains a compound (X) having a functional group which is partly eliminated by heating, irradiation with light, irradiation with radiation, or a combination thereof to generate volatile matter and yield an unsaturated group in the remaining part of the functional group.
摘要翻译：一种用于成膜的组合物，其可以形成适合用作半导体器件等中的层间电介质的膜，并且具有适当的均匀厚度，并且可以得到具有包括介电常数和杨氏模量的优异特性的膜; 以及由成膜组合物得到的电介质膜。该组合物含有具有通过加热，光照射，辐射照射或其组合部分消除的官能团的化合物（X），以产生挥发性物质，并在该官能团的剩余部分产生不饱和基团。

73. 发明授权

US08507172B2 Positive resist composition and pattern forming method using the positive resist composition 有权
标题翻译：使用正型抗蚀剂组合物的正性抗蚀剂组成和图案形成方法
公开(公告)号：US08507172B2
公开(公告)日：2013-08-13
申请号：US12523232
申请日：2008-01-28
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03F7/039 , G03F7/11 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0758 , G03F7/2041
摘要： A positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under action of an acid; and (C) a compound capable of decomposing under action of an acid to generate an acid.
摘要翻译：正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在酸的作用下在碱性显影剂中的溶解度增加的树脂; 和（C）能够在酸作用下分解以产生酸的化合物。

74. 发明授权

US08092976B2 Resist composition and pattern forming method using the same 有权
标题翻译：抗蚀剂组合物和图案形成方法使用其
公开(公告)号：US08092976B2
公开(公告)日：2012-01-10
申请号：US11863562
申请日：2007-09-28
申请人： Sou Kamimura , Kenji Wada
发明人： Sou Kamimura , Kenji Wada
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/12 , Y10S430/122
摘要： A resist composition containing: a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of from 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and a compound capable of generating a compound having a structure represented by the following formula (A-I) upon irradiation with actinic rays or radiation: Q1-X1—NH—X2-Q2 (A-I) wherein Q1 and Q2 each independently represents a monovalent organic group, provided that either one of Q1 and Q2 has a proton acceptor functional group, Q1 and Q2 may be combined with each other to form a ring and the ring formed may have a proton acceptor functional group; and X1 and X2 each independently represents —CO— or —SO2—.
摘要翻译：一种抗蚀剂组合物，其含有具有能够在酸作用下分解的重均分子量为1,000〜5000的聚合物，其在碱性显影剂中的溶解度在酸的作用下增加; 以及能够在用光化射线或辐射照射时产生具有下式（AI）表示的结构的化合物的化合物：Q1-X1-NH-X2-Q2（AI）其中Q1和Q2各自独立地表示一价有机基团条件是Q1和Q2中的任一个具有质子受体官能团，Q1和Q2可以彼此结合形成环，形成的环可以具有质子受体官能团; 且X 1和X 2各自独立地表示-CO-或-SO 2 - 。

75. 发明授权

US08034547B2 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的抗蚀剂组合物，图案形成方法中使用的负显影液和用于图案形成方法的负显影用漂洗溶液
公开(公告)号：US08034547B2
公开(公告)日：2011-10-11
申请号：US12145151
申请日：2008-06-24
申请人： Hideaki Tsubaki , Shinji Tarutani , Kazuyoshi Mizutani , Kenji Wada , Wataru Hoshino
发明人： Hideaki Tsubaki , Shinji Tarutani , Kazuyoshi Mizutani , Kenji Wada , Wataru Hoshino
IPC分类号： G03F7/30
CPC分类号： G03F7/0397 , G03F7/325 , Y10S430/106 , Y10S430/111
摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
摘要翻译：图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

76. 发明授权

US07914965B2 Resist composition and method of pattern formation with the same 有权
标题翻译：抗蚀剂的组成和图案形成方法相同
公开(公告)号：US07914965B2
公开(公告)日：2011-03-29
申请号：US11229518
申请日：2005-09-20
申请人： Hyou Takahashi , Kenji Wada
发明人： Hyou Takahashi , Kenji Wada
IPC分类号： G03F7/038 , G03F7/039 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/116
摘要： A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
摘要翻译：抗蚀剂组合物包含（A）分子量为3,000以下的化合物，其分子中具有两个以上一价阴离子的结构和具有两个以上一价阳离子的结构。

77. 发明授权

US07811356B2 Method of purifying metal 有权
标题翻译：净化金属的方法
公开(公告)号：US07811356B2
公开(公告)日：2010-10-12
申请号：US11631287
申请日：2005-07-04
申请人： Kenji Wada , Toshiaki Fukuyama , Ryotatsu Otsuka
发明人： Kenji Wada , Toshiaki Fukuyama , Ryotatsu Otsuka
IPC分类号： C22B61/00 , C22B9/02 , C01B31/00
CPC分类号： C22B9/02 , C01B33/037 , C22B61/00 , Y02P10/234
摘要： The disclosure is directed to a method for purifying metals, which can very efficiently and inexpensively eliminate impurity elements included in various metallic or semiconductor materials, or more specifically included in metallurgical grade silicon.
摘要翻译：本发明涉及一种净化金属的方法，其可以非常有效和廉价地消除包括在各种金属或半导体材料中，或更具体地包括在冶金级硅中的杂质元素。

78. 发明授权

US07723243B2 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus 有权
标题翻译：多层结构形成方法，布线基板的制造方法以及电子设备的制造方法
公开(公告)号：US07723243B2
公开(公告)日：2010-05-25
申请号：US11707022
申请日：2007-02-16
申请人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
发明人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
IPC分类号： H01L21/31
CPC分类号： H05K3/4664 , H05K3/125 , H05K2203/013 , Y10S257/921
摘要： There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.
摘要翻译：提供一种多层结构形成方法，包括：（A）在基板上形成含有第一光固化材料的第一绝缘材料层; （B）通过向第一绝缘材料层照射具有第一波长的光而使第一绝缘材料层半硬化; （C）通过从液滴喷射装置的喷嘴向半硬化的第一绝缘材料层喷射导电材料的液滴，在半硬化的第一绝缘材料层上形成导电材料层; （D）形成包含第二光固化材料的第二绝缘材料层以覆盖半硬化的第一绝缘材料层和导电材料层; 和（E）形成第一绝缘层，位于第一绝缘材料上的导电层和通过同时加热第一绝缘材料层，导电材料层和覆盖第一绝缘层和导电层的第二绝缘层第二绝缘材料层。

79. 发明授权

US07527911B2 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition 失效
标题翻译：感光组合物，使用光敏组合物中使用的化合物和化合物的图案形成方法
公开(公告)号：US07527911B2
公开(公告)日：2009-05-05
申请号：US11708017
申请日：2007-02-20
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , Y10S430/122
摘要： A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: wherein Z represents a monovalent organic group, when two Z's are present, the two Z's may be the same or different, and they may be bonded to each other to form a cyclic structure; X represents —CO— or —SO2—, when two X's are present, the two X's may be the same or different; R represents a monovalent organic group, when two R's are present, the two R's may be the same or different, and they may be bonded to each other to form a cyclic structure; Z and R may be bonded to each other to form a cyclic structure; and n represents an integer of 1 or 2; and the compound capable of generating the organic acid represented by formula (I).
摘要翻译：一种光敏组合物，其包含（A）在通过光化射线或辐射照射时能够产生由式（I）表示的有机酸的化合物：其中Z表示一价有机基团，当存在两个Z时，两个Z可以是相同或不同，并且它们可以彼此键合以形成环状结构; 当存在两个X时，X表示-CO-或-SO2-，两个X可以相同或不同; R表示一价有机基团，当存在两个R时，两个R可以相同或不同，并且它们可以彼此键合以形成环状结构; Z和R可以彼此键合形成环状结构; n表示1或2的整数; 和能够产生由式（I）表示的有机酸的化合物。

80. 发明授权

US07425404B2 Chemical amplification resist composition and pattern-forming method using the same 失效
标题翻译：化学放大抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07425404B2
公开(公告)日：2008-09-16
申请号：US11206220
申请日：2005-08-18
申请人： Shinji Tarutani , Hyou Takahashi , Kenji Wada
发明人： Shinji Tarutani , Hyou Takahashi , Kenji Wada
IPC分类号： G03F7/039 , G03F7/038
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.
摘要翻译：一种化学放大抗蚀剂组合物，其包含（A）通过酸的作用增加在碱性显影剂中的溶解度的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有氟原子和羟基，pKa值为4〜15，和（D）溶剂，以及使用其的图案形成方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式