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1. 发明授权

US08198008B2 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board 有权
标题翻译：光敏树脂组合物，感光元件，抗蚀剂图案形成方法和印刷线路板的制造方法
公开(公告)号：US08198008B2
公开(公告)日：2012-06-12
申请号：US12838025
申请日：2010-07-16
申请人： Masahiro Miyasaka , Takashi Kumaki
发明人： Masahiro Miyasaka , Takashi Kumaki
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/031 , C08F2/50 , Y10S430/106 , Y10S430/114 , Y10S430/116 , Y10S430/121 , Y10S430/146
摘要： A photosensitive resin composition comprising: (A) a binder polymer; (B) a photopolymerizable compound that has an ethylenically unsaturated bond; and (C1) a compound represented by general formula (1) below, wherein, at least one R represents a C1-10 alkoxy group or a C1-12 alkyl group; the sum of a, b, and c is 1 to 6; and when the sum of a, b, and c is 2 to 6, each R may be the same as or different from one another.
摘要翻译：一种感光性树脂组合物，其含有：（A）粘合剂聚合物; （B）具有烯键式不饱和键的光聚合性化合物; 和（C1）由下述通式（1）表示的化合物，其中至少一个R表示C 1-10烷氧基或C 1-12烷基; a，b，c之和为1〜6; 并且当a，b和c的和为2至6时，每个R可以彼此相同或不同。

2. 发明授权

US06749995B2 Light sensitive composition, light sensitive planographic printing plate recursor, and image formation method 失效
标题翻译：光敏组合物，光敏平版印刷板递归和成像方法
公开(公告)号：US06749995B2
公开(公告)日：2004-06-15
申请号：US10353420
申请日：2003-01-29
申请人： Toshiyuki Matsumura
发明人： Toshiyuki Matsumura
IPC分类号： G03F7029
CPC分类号： G03F7/029 , Y10S430/116 , Y10S430/117 , Y10S430/126 , Y10S430/127
摘要： Disclosed is a light sensitive composition containing a compound represented by the following formula (1): wherein R1, R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group, provided that R1 and R2 may combine with each other to form a ring or R2 and R3 may combine with each other to form a ring.
摘要翻译：公开了含有下式（1）表示的化合物的光敏性组合物：其中R 1，R 2和R 3独立地表示氢原子，取代或未取代的烷基，取代或未取代的烯基，取代或未取代的芳基或取代或未取代的杂环基，条件是R 1和R 2可以彼此结合形成环或R 2和R 3可以结合彼此形成一个戒指。

3. 发明申请

US20040067451A1 Multiphoton photochemical process and articles preparable thereby 有权
标题翻译：多光子光化学过程和物品可制作
公开(公告)号：US20040067451A1
公开(公告)日：2004-04-08
申请号：US10455675
申请日：2003-06-05
发明人： Robert J. DeVoe , Harvey W. Kalweit , Catherine A. Leatherdale , Todd R. Williams
IPC分类号： C08F002/00
CPC分类号： C08F2/50 , G03F7/0047 , G03F7/029 , G03F7/0295 , G03F7/031 , G03F7/038 , G03F7/2053 , Y10S430/114 , Y10S430/115 , Y10S430/116 , Y10S430/117
摘要： A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inclusive.
摘要翻译：一种通过将光反应性组合物在多光子吸收条件下曝光来制造制品的方法。光通过具有最小光学元件的光学系统，该光学元件的数值孔径在0.65至1.25的范围内，包括端值。

4. 发明授权

US06340552B1 Photosensitive composition containing a dissolution inhibitor and an acid releasing compound 失效
标题翻译：含有溶解抑制剂和释放酸的化合物的光敏组合物
公开(公告)号：US06340552B1
公开(公告)日：2002-01-22
申请号：US08247356
申请日：1994-05-23
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C1492
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示

5. 发明授权

US06306553B1 Photosensitive composition and method of forming a pattern using the same 失效
标题翻译：光敏组合物和使用其形成图案的方法
公开(公告)号：US06306553B1
公开(公告)日：2001-10-23
申请号：US08473963
申请日：1995-06-07
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C176
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C═O or —SO2—; Y represents a divalent organic group; R1 and R2 can be bonded together, forming a ring; and at least one of R1, R2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

6. 发明授权

US06280905B1 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US06280905B1
公开(公告)日：2001-08-28
申请号：US09556528
申请日：2000-04-21
申请人： Katsuo Koshimura , Tsukasa Toyoshima , Takashi Nishioka , Tadaaki Tanaka
发明人： Katsuo Koshimura , Tsukasa Toyoshima , Takashi Nishioka , Tadaaki Tanaka
IPC分类号： G03F7032
CPC分类号： G03F7/033 , Y10S430/108 , Y10S430/116 , Y10S430/123 , Y10S430/124 , Y10S430/125
摘要： A photosensitive resin composition which comprises (1) a particulate copolymer comprising 10-99.8% by mole of the unit of (i) an aliphatic conjugated diene monomer, 0.1-30% by mole of the unit of (ii) a monomer having one polymerizable unsaturated group and an amino group, 0.1-20% by mole of the unit of (iii) a monomer having at least two polymerizable unsaturated groups and 0-40% by mole of the unit of (iv) a copolymerizable other monomer having one polymerizable unsaturated group, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator typically represented by 9-fluorenone or 2-i-propylthioxanthone. A photosensitive resin composition is provided which can be developed by using water, has a low hardness and high resilience, and is excellent in balance of properties.
摘要翻译：一种感光性树脂组合物，其包含（1）包含（i）脂肪族共轭二烯单体的单元的10-99.8摩尔％的粒状共聚物，（ii）具有一个可聚合的单体的单元的0.1-30摩尔％不饱和基团和氨基，0.1-20摩尔％的单元（iii）具有至少两个可聚合不饱和基团的单体和0-40摩尔％的单元（iv）可共聚的其它单体，其具有一个可聚合的不饱和基团，（2）可光聚合的不饱和单体和（3）通常用9-芴酮或2-异丙基噻吨酮代表的光聚合引发剂。提供一种可通过使用水显影，具有低硬度和高的光敏树脂组合物弹性，并且性能优越。

7. 发明授权

US6162931A Fluorinated xanthene derivatives 失效
标题翻译：氟化呫吨衍生物
公开(公告)号：US6162931A
公开(公告)日：2000-12-19
申请号：US631202
申请日：1996-04-12
申请人： Kyle R. Gee , Martin Poot , Dieter H. Klaubert , Wei-Chuan Sun , Richard P. Haugland , Fei Mao
发明人： Kyle R. Gee , Martin Poot , Dieter H. Klaubert , Wei-Chuan Sun , Richard P. Haugland , Fei Mao
IPC分类号： G01N33/48 , C07B61/00 , C07C37/00 , C07C37/055 , C07C39/27 , C07C205/26 , C07C205/37 , C07C209/36 , C07C213/00 , C07C217/82 , C07C245/20 , C07D311/82 , C07D493/10 , C07F9/6561 , C07K1/13 , C07K16/18 , C09B11/00 , C09B11/24 , C09B11/28 , G01N1/30 , G01N21/76 , C07D311/78 , C07D311/88 , C07D471/00
CPC分类号： C09B11/00 , C07C37/055 , C07C41/18 , C07C201/08 , C07C201/12 , C07C205/26 , C07C205/37 , C07C209/10 , C07C213/02 , C07C213/08 , C07C245/20 , C07D311/82 , C09B11/24 , G01N1/30 , Y10S430/116 , Y10S430/126 , C07C39/245 , C07C211/52 , C07C217/84 , C07C215/76 , C07C43/225
摘要： The family of dyes of the invention are fluoresceins and rhodols that are directly substituted on one or more aromatic carbons by fluorine. These fluorine-substituted fluorescent dyes possess greater photostability and have lower sensitivity to pH changes in the physiological range of 6-8 than do non-fluorinated dyes, exhibit less quenching when conjugated to a substance, and possess additional advantages. The dyes of the invention are useful as detectable tracers and for preparing conjugates of organic and inorganic substances.
摘要翻译：本发明的染料族是在一个或多个芳族碳上被氟直接取代的荧光素和二醇。这些氟取代的荧光染料具有更高的光稳定性，并且对于6-8生理范围内的pH变化的敏感性低于非氟化染料，当与物质缀合时表现出较少的淬灭，并且具有额外的优点。本发明的染料可用作可检测的示踪剂并用于制备有机和无机物质的共轭物。

8. 发明授权

US6045974A Borate photoinitiators from monoboranes 失效
标题翻译：来自单硼烷的硼酸酯光引发剂
公开(公告)号：US6045974A
公开(公告)日：2000-04-04
申请号：US247147
申请日：1999-02-09
申请人： Allan Francis Cunningham , Martin Kunz , Hisatoshi Kura
发明人： Allan Francis Cunningham , Martin Kunz , Hisatoshi Kura
IPC分类号： C07F5/02 , C08F2/46 , C08F2/48 , C08F2/50 , C08F4/42 , C08F4/52 , C09D5/46 , G03C1/725 , G03F7/029
CPC分类号： G03F7/029 , C07F5/027 , C08F2/50 , Y10S430/115 , Y10S430/116 , Y10S430/121 , Y10S430/123
摘要： The invention relates to photopolymerizable compositions comprising as photoinitiator a borate of the formula I or I' ##STR1## R.sub.1, R.sub.2 and R.sub.3 are, for example and independently of one another, phenyl or another aromatic hydrocarbon, with or without any heteroatoms, which radicals are unsubstituted or are substituted, or the radicals R.sub.1 and R.sub.2 form bridges to produce structures of the formula II, IIa or IIb ##STR2## with the provisos that not more than two of the radicals R.sub.1, R.sub.2 and R.sub.3 are identical and either at least two of the radicals R.sub.1, R.sub.2 and R.sub.3 are aromatic hydrocarbon radicals or phenyl radicals which are substituted in both ortho-positions or at least one radical R.sub.1, R.sub.2 or R.sub.3 is a sterically bulky aryl radical and the remaining radicals of R.sub.1, R.sub.2 and R.sub.3 are aromatic hydrocarbon radicals or are phenyl radicals which are substituted in at least one ortho-position; R.sub.4 is, for example, phenyl or C.sub.1 -C.sub.20 alkyl and G is a radical which is able to form positive ions.
摘要翻译：本发明涉及可光聚合组合物，其包含作为光引发剂的式I或I'R1的硼酸酯，R 2和R 3彼此例如彼此独立地为具有或不具有任何杂原子的苯基或另一芳族烃基，该基团为未取代的或或者基团R 1和R 2形成桥以产生式II，IIa或IIb的结构，条件是不超过两个基团R 1，R 2和R 3相同，并且基团R 1， R2和R3是在两个邻位或至少一个基团R 1，R 2或R 3中被取代的芳族烃基或苯基，其中R 1，R 2和R 3的剩余基团是芳族烃基，或者是在至少一个邻位取代的苯基; R4是例如苯基或C1-C20烷基，G是能够形成正离子的基团。

9. 发明授权

US6007965A Photopolymerizable compositions including squarylium compounds 失效
标题翻译：包含方酸化合物的光聚合组合物
公开(公告)号：US6007965A
公开(公告)日：1999-12-28
申请号：US946353
申请日：1997-10-07
申请人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito , Hitoshi Kawato
发明人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito , Hitoshi Kawato
IPC分类号： C08F2/50 , C08F222/10 , G03F7/031 , G03C1/73
CPC分类号： C08F2/50 , G03F7/031 , C08F2222/1026 , Y10S430/115 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/145
摘要： The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presensitized plate for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
摘要翻译：本发明涉及包含具有至少一个烯键式不饱和双键的可加成聚合化合物的光聚合性组合物; 由式（I）表示的自由基产生剂和方酸盐化合物：该组合物对可见光和近红外光，特别是He-Ne激光，LED，二极管激光等具有高度敏感性，其具有波长范围 600nm以上，因此可用作全息图材料，用于激光直接工艺的预敏板，干膜抗蚀剂，数字证明，感光性微胶囊。

10. 发明授权

US5858617A Photopolymerizable composition and presensitized planographic printing plate employing the same 失效
标题翻译：可光聚合组合物和使用其的未敏化平版印刷版
公开(公告)号：US5858617A
公开(公告)日：1999-01-12
申请号：US812030
申请日：1997-03-06
申请人： Noritaka Nakayama , Mitsunori Matsuura , Shinji Matsumoto
发明人： Noritaka Nakayama , Mitsunori Matsuura , Shinji Matsumoto
IPC分类号： G03F7/029 , G03F7/031 , G03C1/725
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121
摘要： A photopolymerizable composition and a presensitized planographic printing plate employing the same are disclosed which comprise a compound having an ethylenically unsaturated bond and a dye represented by the following formula (1) or (2): ##STR1##
摘要翻译：公开了含有烯属不饱和键的化合物和由下式（1）或（2）表示的染料的可光聚合组合物和使用其的预感平版印刷版：

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