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1. 发明申请

US20110183258A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION 有权
标题翻译：正极性组合物，使用组合物的图案形成方法和化合物在组合物中的使用
公开(公告)号：US20110183258A1
公开(公告)日：2011-07-28
申请号：US12673096
申请日：2008-08-11
申请人： Hidenori Takahashi , Kenji Wada , Sou Kamimura
发明人： Hidenori Takahashi , Kenji Wada , Sou Kamimura
IPC分类号： G03F7/004 , G03F7/20 , C07C309/73 , C07C69/716 , C07D319/12 , C07D311/94
CPC分类号： C07C309/72 , C07C69/716 , C07C309/65 , C07C309/74 , C07C311/48 , C07C317/44 , C07C317/46 , C07C323/20 , C07C2601/14 , C07C2602/08 , C07C2602/10 , C07C2602/42 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）在通过光化射线或辐射照射时能够产生酸的化合物，（B）能够通过酸的作用增加在碱性显影剂中的溶解度的树脂，和（C）提供具有特定结构的化合物，其通过酸的作用而分解以产生酸，使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物作为正性抗蚀剂组合物，其表现出良好的性能使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物的图案形成方法，线条粗糙度，图案塌陷，在正常曝光（干曝光）中的灵敏度和分辨率，浸渍曝光和双重曝光。

2. 发明授权

US08507174B2 Positive resist composition, pattern forming method using the composition, and compound for use in the composition 有权
标题翻译：正性抗蚀剂组合物，使用该组合物的图案形成方法和用于该组合物的化合物
公开(公告)号：US08507174B2
公开(公告)日：2013-08-13
申请号：US12673096
申请日：2008-08-11
申请人： Hidenori Takahashi , Kenji Wada , Sou Kamimura
发明人： Hidenori Takahashi , Kenji Wada , Sou Kamimura
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： C07C309/72 , C07C69/716 , C07C309/65 , C07C309/74 , C07C311/48 , C07C317/44 , C07C317/46 , C07C323/20 , C07C2601/14 , C07C2602/08 , C07C2602/10 , C07C2602/42 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）在通过光化射线或辐射照射时能够产生酸的化合物，（B）能够通过酸的作用增加在碱性显影剂中的溶解度的树脂，和（C）提供具有特定结构的化合物，其通过酸的作用而分解以产生酸，使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物作为正性抗蚀剂组合物，其表现出良好的性能使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物的图案形成方法，线条粗糙度，图案塌陷，在正常曝光（干曝光）中的灵敏度和分辨率，浸渍曝光和双重曝光。

3. 发明授权

US07718344B2 Resist composition and pattern forming method using the same 有权
标题翻译：抗蚀剂组合物和图案形成方法使用其
公开(公告)号：US07718344B2
公开(公告)日：2010-05-18
申请号：US11864049
申请日：2007-09-28
申请人： Sou Kamimura , Kenji Wada , Yasutomo Kawanishi
发明人： Sou Kamimura , Kenji Wada , Yasutomo Kawanishi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1): wherein Y1 to Y13 each independently represents a hydrogen atom or a substituent, and adjacent members of Y1 to Y13 may combine with each other to form a ring; and Z represents a single bond or a divalent linking group.
摘要翻译：抗蚀剂组合物包括：（B）具有能够在酸的作用下分解并且重均分子量为1,000至5,000的基团的聚合物，其在碱性显影剂中的溶解度在酸的作用下增加; 和（Z）含有具有由式（Z-1）表示的结构的锍阳离子的化合物：其中Y 1至Y 13各自独立地表示氢原子或取代基，并且Y 1至Y 13的相邻成员可以相互结合形成戒指; Z表示单键或二价连接基团。

4. 发明授权

US07615330B2 Positive resist composition and pattern formation method using the same 有权
标题翻译：正型抗蚀剂组成和使用其的图案形成方法
公开(公告)号：US07615330B2
公开(公告)日：2009-11-10
申请号：US11727267
申请日：2007-03-26
申请人： Sou Kamimura , Tomoya Sasaki , Yasutomo Kawanishi , Kenji Wada
发明人： Sou Kamimura , Tomoya Sasaki , Yasutomo Kawanishi , Kenji Wada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.
摘要翻译：含有具有本文定义的式（ZI）所示结构的锍阳离子的化合物的正性抗蚀剂组合物，通过酸的作用增加在碱性显影液中的溶解度的低分子量化合物和产生在通过光化射线或辐射照射时具有如本文所定义的式（AI）表示的结构的化合物。

5. 发明授权

US08110333B2 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound 有权
标题翻译：含有新型锍化合物的抗蚀剂组合物，使用抗蚀剂组合物的图案形成方法和新型锍化合物
公开(公告)号：US08110333B2
公开(公告)日：2012-02-07
申请号：US12184780
申请日：2008-08-01
申请人： Sou Kamimura , Yasutomo Kawanishi , Kenji Wada , Tomotaka Tsuchimura
发明人： Sou Kamimura , Yasutomo Kawanishi , Kenji Wada , Tomotaka Tsuchimura
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： A resist composition includes (A) a compound represented by the following formula (I): wherein each of R1 to R13 independently represents a hydrogen atom or a substituent, provided that at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents an anion containing a proton acceptor functional group.
摘要翻译：抗蚀剂组合物包括（A）由下式（I）表示的化合物：其中R 1至R 13各自独立地表示氢原子或取代基，条件是R 1至R 13中的至少一个为含有醇羟基的取代基 ; Z表示单键或二价连接基团; X表示含有质子受体官能团的阴离子。

6. 发明申请

US20080081282A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：使用它的耐蚀组合物和图案形成方法
公开(公告)号：US20080081282A1
公开(公告)日：2008-04-03
申请号：US11863562
申请日：2007-09-28
申请人： Sou Kamimura , Kenji Wada
发明人： Sou Kamimura , Kenji Wada
IPC分类号： G03C1/00 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/12 , Y10S430/122
摘要： A resist composition containing: a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of from 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and a compound capable of generating a compound having a structure represented by the following formula (A-I) upon irradiation with actinic rays or radiation: Q1-X1—NH—X2-Q2 (A-I) wherein Q1 and Q2 each independently represents a monovalent organic group, provided that either one of Q1 and Q2 has a proton acceptor functional group, Q1 and Q2 may be combined with each other to form a ring and the ring formed may have a proton acceptor functional group; and X1 and X2 each independently represents —CO— or —SO2—.
摘要翻译：一种抗蚀剂组合物，其含有具有能够在酸作用下分解的重均分子量为1,000〜5000的聚合物，其在碱性显影剂中的溶解度在酸的作用下增加; 以及能够在用光化射线或辐射照射时产生具有由下式（AI）表示的结构的化合物的化合物：<？in-line-formula description =“In-line formula”end =“lead”？> Q 1-N-1个-N-X 2 -Q 2（AI）<β在线式其中Q 1和Q 2各自独立地表示一价有机基团，条件是Q < SUB> 1和Q 2具有质子受体官能团，Q 1和Q 2可以彼此结合成形成环，所形成的环可具有质子受体官能团; X 1和X 2各自独立地表示-CO - 或-SO 2 - 。

7. 发明授权

US08092976B2 Resist composition and pattern forming method using the same 有权
标题翻译：抗蚀剂组合物和图案形成方法使用其
公开(公告)号：US08092976B2
公开(公告)日：2012-01-10
申请号：US11863562
申请日：2007-09-28
申请人： Sou Kamimura , Kenji Wada
发明人： Sou Kamimura , Kenji Wada
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/12 , Y10S430/122
摘要： A resist composition containing: a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of from 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and a compound capable of generating a compound having a structure represented by the following formula (A-I) upon irradiation with actinic rays or radiation: Q1-X1—NH—X2-Q2 (A-I) wherein Q1 and Q2 each independently represents a monovalent organic group, provided that either one of Q1 and Q2 has a proton acceptor functional group, Q1 and Q2 may be combined with each other to form a ring and the ring formed may have a proton acceptor functional group; and X1 and X2 each independently represents —CO— or —SO2—.
摘要翻译：一种抗蚀剂组合物，其含有具有能够在酸作用下分解的重均分子量为1,000〜5000的聚合物，其在碱性显影剂中的溶解度在酸的作用下增加; 以及能够在用光化射线或辐射照射时产生具有下式（AI）表示的结构的化合物的化合物：Q1-X1-NH-X2-Q2（AI）其中Q1和Q2各自独立地表示一价有机基团条件是Q1和Q2中的任一个具有质子受体官能团，Q1和Q2可以彼此结合形成环，形成的环可以具有质子受体官能团; 且X 1和X 2各自独立地表示-CO-或-SO 2 - 。

8. 发明申请

US20070224540A1 Positive resist composition and pattern formation method using the same 有权
标题翻译：正型抗蚀剂组成和使用其的图案形成方法
公开(公告)号：US20070224540A1
公开(公告)日：2007-09-27
申请号：US11727267
申请日：2007-03-26
申请人： Sou Kamimura , Tomoya Sasaki , Yasutomo Kawanishi , Kenji Wada
发明人： Sou Kamimura , Tomoya Sasaki , Yasutomo Kawanishi , Kenji Wada
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.
摘要翻译：含有具有本文定义的式（ZI）所示结构的锍阳离子的化合物的正性抗蚀剂组合物，通过酸的作用增加在碱性显影液中的溶解度的低分子量化合物和产生在通过光化射线或辐射照射时具有如本文所定义的式（AI）表示的结构的化合物。

9. 发明授权

US08404427B2 Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition 有权
标题翻译：光敏组合物，图案形成方法和使用光敏组合物的抗蚀剂膜
公开(公告)号：US08404427B2
公开(公告)日：2013-03-26
申请号：US12786127
申请日：2010-05-24
申请人： Kenji Wada , Kunihiko Kodama
发明人： Kenji Wada , Kunihiko Kodama
IPC分类号： G03F7/028 , G03F7/039 , G03F7/26
CPC分类号： C07D307/33 , C07C381/12 , C07D307/20 , C07D307/32 , C07D307/77 , C07D309/30 , C07D409/12 , C07D409/14 , C07D493/08 , C07D493/14 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758
摘要： A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.
摘要翻译：含有具有特定结构的化合物的光敏组合物，使用该感光性组合物的图案形成方法和在感光性组合物中使用的具有特定结构的化合物。

10. 发明授权

US08241840B2 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的抗蚀剂组合物，图案形成方法中使用的负显影液和用于图案形成方法的负显影用漂洗溶液
公开(公告)号：US08241840B2
公开(公告)日：2012-08-14
申请号：US12825088
申请日：2010-06-28
申请人： Hideaki Tsubaki , Shinji Tarutani , Kazuyoshi Mizuyoshi , Kenji Wada , Wataru Hoshino
发明人： Hideaki Tsubaki , Shinji Tarutani , Kazuyoshi Mizuyoshi , Kenji Wada , Wataru Hoshino
IPC分类号： G03F7/30 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/325 , Y10S430/106 , Y10S430/111
摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
摘要翻译：图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

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