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61. 发明授权

US06782337B2 Methods and systems for determining a critical dimension an a presence of defects on a specimen 失效
标题翻译：用于确定临界尺寸的样品上存在缺陷的方法和系统
公开(公告)号：US06782337B2
公开(公告)日：2004-08-24
申请号：US09956848
申请日：2001-09-20
申请人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
发明人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
IPC分类号： G06F1900
CPC分类号： G03F7/70708 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/9501 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和缺陷的存在。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

62. 发明授权

US06433541B1 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
标题翻译：在去除薄膜的过程中使用涡流测量进行原位金属化监测
公开(公告)号：US06433541B1
公开(公告)日：2002-08-13
申请号：US09633198
申请日：2000-08-07
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： G01B706
CPC分类号： G01N27/72
摘要： Disclosed is a method of obtaining information in-situ regarding a film of a sample using an eddy probe during a process for removing the film. The eddy probe has at least one sensing coil. An AC voltage is applied to the sensing coil(s) of the eddy probe. One or more first signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate the film of the sample. One or more second signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate to a reference material having a fixed composition and/or distance from the sensing coil. The first signals are calibrated based on the second signals so that undesired gain and/or phase changes within the first signals are corrected. A property value of the film is determined based on the calibrated first signals. An apparatus for performing the above described method is also disclosed.
摘要翻译：公开了一种在除去膜的过程中使用涡流探针在原位获取样品的膜的方法。涡流探头具有至少一个感测线圈。交流电压被施加到涡流探头的感测线圈上。当感测线圈靠近样品的膜定位时，在涡流探针的感测线圈中测量一个或多个第一信号。当感测线圈靠近具有与感测线圈的固定成分和/或距离的参考材料定位时，在涡流探针的感测线圈中测量一个或多个第二信号。第一信号基于第二信号进行校准，从而校正第一信号内的不期望的增益和/或相位变化。基于校准的第一信号确定胶片的属性值。还公开了一种用于执行上述方法的装置。

63. 发明授权

US08643840B2 Cell for light source 有权
标题翻译：光源单元
公开(公告)号：US08643840B2
公开(公告)日：2014-02-04
申请号：US13119571
申请日：2011-02-17
申请人： Kenneth P. Gross , Yung-Ho Chuang , John Fielden
发明人： Kenneth P. Gross , Yung-Ho Chuang , John Fielden
IPC分类号： G01N21/73 , H01S3/225
CPC分类号： H01J17/16 , G01J3/10 , G01N21/211 , G01N2021/213 , H01J61/302 , H01J65/04 , H01J65/042 , H01J65/06
摘要： A cell for a vacuum ultraviolet plasma light source, the cell having a closed sapphire tube containing at least one noble gas. Such a cell does not have a metal housing, metal-to-metal seals, or any other metal flanges or components, except for the electrodes (in some embodiments). In this manner, the cell is kept to a relatively small size, and exhibits a more uniform heating of the gas and cell than can be readily achieved with a hybridized metal/window cell design. These designs generally result in higher plasma temperatures (a brighter light source), shorter wavelength output, and lower optical noise due to fewer gas convection currents created between the hotter plasma regions and surrounding colder gases. These cells provide a greater amount of output with wavelengths in the vacuum ultraviolet range than do quartz or fused silica cells. These cells also produce continuous spectral emission well into the infrared range, making them a broadband light source.
摘要翻译：一种用于真空紫外线等离子体光源的电池，该电池具有包含至少一种惰性气体的封闭蓝宝石管。除了电极（在一些实施例中），这种电池不具有金属外壳，金属对金属密封件或任何其它金属法兰或部件。以这种方式，电池被保持为相对小的尺寸，并且表现出比使用杂化金属/窗口电池设计容易实现的气体和电池的更均匀的加热。这些设计通常导致更高的等离子体温度（较亮的光源），更短的波长输出和更低的光学噪声，这是由于较热的等离子体区域和周围较冷的气体之间产生的较小的气体对流电流。这些电池在真空紫外线范围内提供比石英或熔融石英电池更大的输出量。这些细胞还能够在红外范围内产生连续的光谱发射，使其成为宽带光源。

64. 发明授权

US08502979B2 Methods and systems for determining a critical dimension and overlay of a specimen 有权
标题翻译：用于确定试样的临界尺寸和覆盖层的方法和系统
公开(公告)号：US08502979B2
公开(公告)日：2013-08-06
申请号：US13467042
申请日：2012-05-09
申请人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdul-Halim
发明人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdul-Halim
IPC分类号： G01B11/00 , G01B11/30 , G01B11/14 , G01B11/28
CPC分类号： G01N21/27 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N21/956 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , G03F7/70708 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including: but not limited to, critical dimension and overlay misregistration; defects and thin film characteristics; critical dimension and defects; critical dimension and thin film characteristics; critical dimension, thin film characteristics and defects; macro defects and micro defects; flatness, thin film characteristics and defects; overlay misregistration and flatness; an implant characteristic and defects; and adhesion and thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和重叠错位; 缺陷和薄膜特性; 临界尺寸和缺陷; 临界尺寸和薄膜特性; 临界尺寸，薄膜特性和缺陷; 宏观缺陷和微缺陷; 平整度，薄膜特性和缺陷; 重叠错位和平整度; 植入物特征和缺陷; 附着力和厚度。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

65. 发明申请

US20130080984A1 PROCESS AWARE METROLOGY 有权
标题翻译：过程技巧
公开(公告)号：US20130080984A1
公开(公告)日：2013-03-28
申请号：US13411433
申请日：2012-03-02
申请人： Xuefeng Liu , Yung-Ho Alex Chuang , John Fielden , Bin-Ming Benjamin Tsai , Jingjing Zhang
发明人： Xuefeng Liu , Yung-Ho Alex Chuang , John Fielden , Bin-Ming Benjamin Tsai , Jingjing Zhang
IPC分类号： G06F17/50
CPC分类号： G06F17/5018 , G03F7/70625 , G06F17/10 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06F2217/16 , H01L22/12 , H01L22/20
摘要： Systems and methods for process aware metrology are provided.
摘要翻译：提供了流程感知度量的系统和方法。

66. 发明授权

US07928390B1 Infrared metrology 有权
标题翻译：红外测量
公开(公告)号：US07928390B1
公开(公告)日：2011-04-19
申请号：US12193361
申请日：2008-08-18
申请人： Guorong V. Zhuang , John Fielden
发明人： Guorong V. Zhuang , John Fielden
IPC分类号： G01J5/02
CPC分类号： G01J3/447 , G01J3/108
摘要： A spectroscopic instrument of the type providing an infrared light beam from an infrared light source along an infrared light path, where the infrared light beam includes a wide range of wavelengths of radiation within a target range of from about two microns to about three hundred microns, where the infrared light source includes a supercontinuum source having a CO2 pumping laser adapted to fire into a solid-core photonic crystal fiber formed at least in part of at least one of AlClxBr(1-x), NaCl, and ZnSe, which solid-core photonic crystal fiber produces the infrared light beam when excited by the pumping laser.
摘要翻译：这种类型的光谱仪器沿着红外光路提供来自红外光源的红外光束，其中红外光束包括在约2微米至约300微米的目标范围内的宽范围的辐射波长，其中所述红外光源包括具有CO 2泵送激光器的超连续光源，所述激光源适于射入至少部分由AlCl x Br（1-x），NaCl和ZnSe中的至少一种形成的固体光子晶体光纤，核心光子晶体光纤在被激光激发时产生红外光束。

67. 发明授权

US07760364B1 Systems and methods for near-field heterodyne spectroscopy 失效
标题翻译：近场外差光谱的系统和方法
公开(公告)号：US07760364B1
公开(公告)日：2010-07-20
申请号：US12256324
申请日：2008-10-22
申请人： Guorong V. Zhuang , John Fielden , Christopher F. Bevis
发明人： Guorong V. Zhuang , John Fielden , Christopher F. Bevis
IPC分类号： G01B9/02
CPC分类号： G01N21/1717 , G01N2021/1725 , G01Q60/22
摘要： In a near-field heterodyne spectroscopy system, a near-field generation device receives the output of a pump beam source and is also made to vibrate or move at a frequency f to generate a modulated near-field beam having a near-field component. The outputs of the pump beam source and a probe beam source (optional) as well as the modulated near-field beam are directed to the same point on a sample. At least one of the outputs of the pump beam source and probe beam source is modulated at a frequency Ω. Thus, the reflected beam that results from the interaction with the region illuminated by the modulated near-field beam is modulated at frequencies Ω+f and Ω−f. Because the excitation is near-field, the electric field in the sample is evanescent and ensures a shallow probing depth as well as smaller lateral dimensions beyond diffraction limit.
摘要翻译：在近场外差光谱系统中，近场产生装置接收泵浦光束源的输出，并且还使其以频率f振动或移动以产生具有近场分量的调制近场光束。泵浦光束源和探测光束源（可选）以及调制的近场光束的输出被引导到样品上的相同点。泵浦光源和探测光束源的输出中的至少一个以频率＆OHgr进行调制。因此，由与被调制的近场光束照射的区域的相互作用产生的反射光束被调制在频率ωgr+ f和＆omegr; -f。因为激发是近场的，所以样品中的电场是消逝的，并且确保了较深的探测深度以及超过衍射极限的较小的横向尺寸。

68. 发明授权

US07751046B2 Methods and systems for determining a critical dimension and overlay of a specimen 有权
标题翻译：用于确定试样的临界尺寸和覆盖层的方法和系统
公开(公告)号：US07751046B2
公开(公告)日：2010-07-06
申请号：US10401242
申请日：2003-03-27
申请人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdulhalim
发明人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdulhalim
IPC分类号： G01B11/00 , G01N21/00 , G01B11/30 , G01B11/14 , G01B11/02
CPC分类号： G01N21/27 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N21/956 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , G03F7/70708 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and overlay misregistration. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和重叠错位。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

69. 发明申请

US20090279088A1 SYSTEMS AND METHODS FOR MEASUREMENT OF A SPECIMEN WITH VACUUM ULTRAVIOLET LIGHT 有权
标题翻译：用真空紫外线灯测量样品的系统和方法
公开(公告)号：US20090279088A1
公开(公告)日：2009-11-12
申请号：US12506019
申请日：2009-07-20
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G03F7/70933 , G03F7/70916
摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括设置在净化环境中的第一光学子系统。净化的环境可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

70. 发明授权

US07606677B1 Dynamic measurement control 失效
标题翻译：动态测量控制
公开(公告)号：US07606677B1
公开(公告)日：2009-10-20
申请号：US10986269
申请日：2004-11-10
申请人： Gary R. Janik , Eric Bouche , John Fielden
发明人： Gary R. Janik , Eric Bouche , John Fielden
IPC分类号： G06F3/01
CPC分类号： H01L22/20 , H01L22/12
摘要： A metrology recipe includes dynamic instructions that allow a metrology tool to perform a secondary metrology operation on a test wafer when previous measurement data indicates a process issue with that test wafer. The metrology recipe can instruct the metrology tool to perform an efficient default metrology operation on all test wafers, and perform a more in-depth secondary metrology operation on only those wafers that warrant additional scrutiny. In this manner, critical metrology data can be captured with a minimum of effect on metrology throughput. The metrology data used to determine whether or not the secondary metrology operation is to be performed can be generated from default metrology operations within the same tool, or can be generated by measurements taken by a completely different tool. Such “external” metrology data can be received via a communications network, either directly or from a server on the network for processing the metrology data.
摘要翻译：计量配方包括动态指令，允许计量工具在测试晶片上执行次级测量操作，以前的测量数据表明该测试晶片的过程问题。计量配方可以指示计量工具在所有测试晶圆上执行有效的默认计量操作，并对仅需要额外检查的晶圆进行更深入的次级测量操作。以这种方式，可以以最小的测量吞吐量影响来捕获关键测量数据。用于确定是否要执行二次测量操作的计量数据可以由同一工具内的默认计量操作生成，也可以通过完全不同的工具进行测量来生成。这样的“外部”计量学数据可以经由通信网络直接地或从网络上的服务器接收以处理度量数据。

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