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1. 发明授权

US07764376B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07764376B2
公开(公告)日：2010-07-27
申请号：US12506019
申请日：2009-07-20
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G03F7/70933 , G03F7/70916
摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括设置在净化环境中的第一光学子系统。净化的环境可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

2. 发明授权

US07623239B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07623239B2
公开(公告)日：2009-11-24
申请号：US12103320
申请日：2008-04-15
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

3. 发明授权

US07359052B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07359052B2
公开(公告)日：2008-04-15
申请号：US10846053
申请日：2004-05-14
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

4. 发明授权

US07564552B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07564552B2
公开(公告)日：2009-07-21
申请号：US10845958
申请日：2004-05-14
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G03F7/70933 , G03F7/70916
摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括设置在净化环境中的第一光学子系统。净化的环境可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

5. 发明申请

US20050254050A1 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US20050254050A1
公开(公告)日：2005-11-17
申请号：US10846053
申请日：2004-05-14
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J3/10 , G01J3/36 , G01J4/00 , G01N21/21
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

6. 发明申请

US20050252752A1 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US20050252752A1
公开(公告)日：2005-11-17
申请号：US10845958
申请日：2004-05-14
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G03F7/20 , H01H27/00
CPC分类号： G03F7/70933 , G03F7/70916
摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括设置在净化环境中的第一光学子系统。净化的环境可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

7. 发明申请

US20090279088A1 SYSTEMS AND METHODS FOR MEASUREMENT OF A SPECIMEN WITH VACUUM ULTRAVIOLET LIGHT 有权
标题翻译：用真空紫外线灯测量样品的系统和方法
公开(公告)号：US20090279088A1
公开(公告)日：2009-11-12
申请号：US12506019
申请日：2009-07-20
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G03F7/70933 , G03F7/70916
摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括设置在净化环境中的第一光学子系统。净化的环境可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

8. 发明申请

US20080252889A1 SYSTEMS AND METHODS FOR MEASUREMENT OF A SPECIMEN WITH VACUUM ULTRAVIOLET LIGHT 有权
标题翻译：用真空紫外线灯测量样品的系统和方法
公开(公告)号：US20080252889A1
公开(公告)日：2008-10-16
申请号：US12103320
申请日：2008-04-15
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

9. 发明授权

US07369233B2 Optical system for measuring samples using short wavelength radiation 有权
标题翻译：用于使用短波长辐射测量样品的光学系统
公开(公告)号：US07369233B2
公开(公告)日：2008-05-06
申请号：US10718126
申请日：2003-11-19
申请人： Mehrdad Nikoonahad , Shing Lee , Hidong Kwak , Sergio Edelstein , Guoheng Zhao , Gary Janik
发明人： Mehrdad Nikoonahad , Shing Lee , Hidong Kwak , Sergio Edelstein , Guoheng Zhao , Gary Janik
IPC分类号： G01N21/17
CPC分类号： G01N21/9501 , G01N21/8806
摘要： In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.
摘要翻译：在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量，可以减少波长分量。这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。以这种方式，样品不需要放置在真空中，从而提高系统产量。

10. 发明申请

US20050194971A1 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
公开(公告)号：US20050194971A1
公开(公告)日：2005-09-08
申请号：US11115835
申请日：2005-04-26
申请人： Kurt Lehman , Shing Lee , Walter Johnson , John Fielden
发明人： Kurt Lehman , Shing Lee , Walter Johnson , John Fielden
IPC分类号： G01N27/72 , G01B7/06
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.

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