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1. 发明申请

US20180164694A1 LITHOGRAPHY APPARATUS 审中-公开
公开(公告)号：US20180164694A1
公开(公告)日：2018-06-14
申请号：US15674129
申请日：2017-08-10
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Do Hyung KIM , Seong Sue KIM
IPC分类号： G03F7/20
CPC分类号： G03F7/70166 , G03F1/38 , G03F7/2004 , G03F7/2063 , G03F7/70033 , G03F7/70708 , G03F7/70716 , G03F7/70825 , G03F7/70833 , G03F7/70916
摘要： A lithography apparatus is provided. The lithography apparatus a reticle having a first surface and a second surface facing each other, and a pattern region formed on the first surface, a reticle stage facing the second surface of the reticle, the reticle stage to chuck the reticle, a protection conductor within a chamber housing the reticle and the reticle stage; and a power source to supply a voltage to the protection conductor.

2. 发明申请

US20180143544A1 DECOMPRESSION PROCESSING APPARATUS 审中-公开
公开(公告)号：US20180143544A1
公开(公告)日：2018-05-24
申请号：US15802078
申请日：2017-11-02
申请人： DISCO CORPORATION
发明人： Hidekazu Iida
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70708 , H01L21/3065 , H01L21/67109 , H01L21/6831
摘要： Disclosed herein is a decompression processing apparatus for processing a wafer in a decompressed state including a chamber having a decompressing unit configured to decompress the inside of the chamber, an opening and closing door configured to open and close a carrying-in-and-out opening for carrying the wafer into and out of the chamber, and an inert gas supply source configured to supply an inert gas to the inside of the chamber. The inside of the chamber is maintained in a dry state by continuing to supply the inert gas in a state in which the opening and closing door is opened.

3. 发明申请

US20170212428A1 VACUUM LINEAR FEED-THROUGH AND VACUUM SYSTEM HAVING SAID VACUUM LINEAR FEED-THROUGH 有权
公开(公告)号：US20170212428A1
公开(公告)日：2017-07-27
申请号：US15481619
申请日：2017-04-07
申请人： Carl Zeiss SMT GmbH
发明人： Matthias Roos , Eugen Foca
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/70841 , G03F7/70916 , H01J2237/022 , H01J2237/2006 , H01J2237/20221
摘要： A vacuum linear feed-through (20), e.g., for an EUV lithography system, includes: a vacuum diaphragm bellows (21), which has a first end (21a) attaching a component and a second end (21b), opposite the first end, attaching to a vacuum housing, and an actuator device (27) generating a linear reciprocating motion of the bellows. The feed-through has at least one first shield (30, 30′), connected to the bellows at the first end, and at least one second shield (31, 31′), connected to the bellows at the second end. The first and second shield annularly surround the bellows, and the first and second shield overlap in the longitudinal direction of the bellows (21). At least one first shield and at least one second shield are formed of a permanently magnetic material, and/or the feed-through has a voltage-generating device (33) generating an electric field (E) between the first shield and the second shield.

4. 发明申请

US20170131643A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND METHOD OF CLAMPING AN OBJECT 有权
公开(公告)号：US20170131643A1
公开(公告)日：2017-05-11
申请号：US15029565
申请日：2015-06-03
申请人： ASML Netherlands B.V.
发明人： Paul JANSSEN , Richard Joseph BRULS , Petrus Jacobus Maria VAN GILS
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/70866 , G03F7/70916 , H01L21/6831 , H01L21/6875
摘要： A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.

5. 发明授权

US09618856B2 Method of overlay in extreme ultra-violet (EUV) lithography 有权
公开(公告)号：US09618856B2
公开(公告)日：2017-04-11
申请号：US15191831
申请日：2016-06-24
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Chia-Ching Huang , Chia-Hao Hsu , Chia-Chen Chen
IPC分类号： G03B27/52 , G03F7/20 , H01L21/683 , C23C16/04 , C23C16/34 , C23C16/56
CPC分类号： G03F7/70708 , C23C16/042 , C23C16/34 , C23C16/56 , G03F7/70633 , G03F7/70783 , H01L21/6833 , Y10T29/49155
摘要： The present disclosure relates to a deformable reticle chuck. In some embodiments, an extreme ultraviolet (EUV) deformable reticle chuck has a substrate of insulating material with a plurality of protrusions extending outward from a first side of the substrate. A resistive material is arranged along a second side of the substrate below the plurality of protrusions. The resistive material is configured to expand in response to an applied current or voltage to adjust a shape of a reticle.

6. 发明授权

US09494875B2 Chuck, a chuck control system, a lithography apparatus and a method of using a chuck 有权
标题翻译：卡盘，卡盘控制系统，光刻设备和使用卡盘的方法
公开(公告)号：US09494875B2
公开(公告)日：2016-11-15
申请号：US14349900
申请日：2012-09-19
申请人： ASML Netherlands B.V.
发明人： Sebastiaan Maria Johannes Cornelissen , Noud Jan Gilissen , Anko Jozef Cornelus Sijben , Roger Wilhelmus Antonius Henricus Schmitz , Arnoud Willem Notenboom , Ronald Van Der Wilk , Manon Elise Will
IPC分类号： G03F7/20 , H01L21/683 , G10L15/08 , G10L15/22
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70875 , G03F7/70908 , G10L15/08 , G10L2015/223 , H01L21/6831
摘要： A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.
摘要翻译：公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48）用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。

7. 发明申请

US20160306285A1 METHOD OF OVERLAY IN EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY 有权
标题翻译：超极紫外（EUV）光刻法的覆盖方法
公开(公告)号：US20160306285A1
公开(公告)日：2016-10-20
申请号：US15191831
申请日：2016-06-24
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Chia-Ching Huang , Chia-Hao Hsu , Chia-Chen Chen
IPC分类号： G03F7/20 , C23C16/56 , C23C16/04 , H01L21/683 , C23C16/34
CPC分类号： G03F7/70708 , C23C16/042 , C23C16/34 , C23C16/56 , G03F7/70633 , G03F7/70783 , H01L21/6833 , Y10T29/49155
摘要： The present disclosure relates to a deformable reticle chuck. In some embodiments, an extreme ultraviolet (EUV) deformable reticle chuck has a substrate of insulating material with a plurality of protrusions extending outward from a first side of the substrate. A resistive material is arranged along a second side of the substrate below the plurality of protrusions. The resistive material is configured to expand in response to an applied current or voltage to adjust a shape of a reticle.
摘要翻译：本公开涉及可变形的光罩卡盘。在一些实施例中，极紫外（EUV）可变形标线卡盘具有绝缘材料的基底，其具有从基底的第一侧向外延伸的多个突起。电阻材料沿着多个突起下方的衬底的第二侧布置。电阻材料被配置为响应于所施加的电流或电压而膨胀以调整掩模版的形状。

8. 发明授权

US09436100B2 Exposure machine 有权
标题翻译：曝光机
公开(公告)号：US09436100B2
公开(公告)日：2016-09-06
申请号：US14087806
申请日：2013-11-22
申请人： Boe Technology Group Co., Ltd. , Chengdu Boe Optoelectronics Technology Co., Ltd.
发明人： Zhong Lu , ByungChun Lee , Lijuan Huang , Fujiang Jin
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70708 , G03F7/2008
摘要： Disclosed is exposure machine, comprising: a loading frame, for placing an object to be exposed; a light source device, located at one side of a plane where the loading frame is positioned, wherein the light emitting direction of the light source device is perpendicular to a plane where the object to be exposed is positioned. During exposure, the loading frame will not reflect the light transmitting through the object to be exposed, and thus the stage spots are avoided. Further, when the exposure machine is operated in a vertical manner, a bidirectional exposure may be achieved only by adding a single prism into the light source device in the prior art, and thus the exposure efficiency is greatly improved.
摘要翻译：公开了一种曝光机，包括：装载框架，用于放置待曝光的物体; 光源装置，位于装载框架所在的平面的一侧，其中光源装置的发光方向垂直于要暴露的物体所在的平面。在曝光期间，装载框架不会反射透过待曝光物体的光线，从而避免舞台光斑。此外，当曝光机以垂直方式操作时，可以仅通过在现有技术中向光源装置中添加单个棱镜来实现双向曝光，因此大大提高了曝光效率。

9. 发明授权

US09429857B2 Electrostatic clamp, lithographic apparatus and method 有权
标题翻译：静电夹，光刻设备及方法
公开(公告)号：US09429857B2
公开(公告)日：2016-08-30
申请号：US14395979
申请日：2013-03-19
申请人： ASML Netherlands B.V.
发明人： Ronald Van Der Wilk , Roger Wilhelmus Antonius Henricus Schmitz , Arnoud Willem Notenboom , Manon Elise Will
IPC分类号： G03B27/52 , G03F7/20 , H01L21/683
CPC分类号： G03F7/70708 , G03F7/70875 , H01L21/6831
摘要： An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.
摘要翻译：一种构造成保持物体的静电夹具（21），所述静电夹具包括电极（24），由位于所述电极上的电阻材料形成的电阻部分（23）和由电介质材料形成的电介质部分位于电阻部分上。

10. 发明授权

US09366973B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09366973B2
公开(公告)日：2016-06-14
申请号：US13983203
申请日：2011-12-20
申请人： David Christopher Ockwell , Noud Jan Gilissen
发明人： David Christopher Ockwell , Noud Jan Gilissen
IPC分类号： G03F7/20 , H01H13/83 , H01H13/704 , H01H13/7065 , H01H3/12 , H01H13/86
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , H01L21/6831 , H01L21/6833 , H01L21/6875 , Y10T29/49826
摘要： A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.
摘要翻译：为光刻设备提供衬底支撑件。支撑件包括被构造成保持衬底和用于衬底台的卡盘的衬底台。在操作中，基板台被卡盘支撑并夹紧。衬底支撑件包括在支撑块的表面上的第一组毛刺，用于在夹紧过程中抵靠衬底台，并且在衬底台的表面上具有第二组毛刺，用于在夹紧期间抵靠支撑块。

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