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1. 发明申请

US20210240019A1 SPECTRAL AND PHASE MODULATION TUNABLE BIREFRINGENCE DEVICES 有权
公开(公告)号：US20210240019A1
公开(公告)日：2021-08-05
申请号：US17234341
申请日：2021-04-19
申请人： Ibrahim ABDULHALIM
发明人： Ibrahim ABDULHALIM
IPC分类号： G02F1/137 , E06B3/67 , E06B9/24 , G02F1/13 , G02F1/1335 , G02F1/13363 , G02F1/1337 , G02F1/1343
摘要： The present invention describes a liquid crystal composite tunable device for fast polarisation-independent modulation of an incident light beam comprising: (a) two supporting and functional panels, at least one of them coated with a transparent conductive electrode layer and with optionally at least one additional layer selected from an alignment layer, antireflective coating layer, thermochromic or electrochromic layer, photoconductive or photosensitive layer, and (b) a composite structure sandwiched between said two panels and made of a liquid crystal and porous microparticles infiltrated with said liquid crystal. The porous microparticles have an average refractive index approximately equals to one of the liquid crystal principal refractive indices, matching that of the liquid crystal at one orientational state (for example, parallel n∥), and exhibiting large mismatch at another orientational state (for example, perpendicular n⊥). This refractive index mismatch between said microparticles and said liquid crystal is tuned by applying an external electric or magnetic field, thermally or optically.

2. 发明申请

US20130323858A1 Optical Sensor with Enhanced Sensitivity 有权
标题翻译：具有增强灵敏度的光学传感器
公开(公告)号：US20130323858A1
公开(公告)日：2013-12-05
申请号：US13985509
申请日：2012-02-14
申请人： Ibrahim Abdulhalim
发明人： Ibrahim Abdulhalim
IPC分类号： G01N21/65
CPC分类号： G01N21/658 , G01N21/554 , G01N33/54373
摘要： The invention is a surface plasmon resonance (SPR) sensor to determine the presence and quantity of biological or chemical entities in an analyte. The sensor comprises a metal periodic structure deposited as a thin layer of a noble metal, comprising a one dimensional array of nanoslits or a two dimensional array of nanoholes on a transparent dielectric substrate, a nm-thick layer of transparent dielectric protection layer on top of the metal periodic structure and a functionalization layer, which acts as a binding layer to biological or biochemical entities in an analyte that is in contact with the functionaliztion layer.
摘要翻译：本发明是一种表面等离子体共振（SPR）传感器，用于确定分析物中生物或化学实体的存在和数量。传感器包括沉积为贵金属薄层的金属周期性结构，其包括在透明电介质基底上的纳米级的一维阵列或纳米孔的二维阵列，在透明电介质基底上方的纳米厚的透明介电保护层金属周期结构和官能化层，其作为与功能化层接触的分析物中的生物或生物化学实体的结合层。

3. 发明授权

US08525994B2 Periodic patterns and technique to control misaligment between two layers 有权
标题翻译：周期性模式和技术来控制两层之间的错配
公开(公告)号：US08525994B2
公开(公告)日：2013-09-03
申请号：US12428401
申请日：2009-04-22
申请人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
发明人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC分类号： G01B11/00
CPC分类号： G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
摘要翻译：提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。

4. 发明申请

US20100073688A1 PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS 有权
标题翻译：周期性模式和技术来控制两层之间的缺失
公开(公告)号：US20100073688A1
公开(公告)日：2010-03-25
申请号：US12628092
申请日：2009-11-30
申请人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
发明人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC分类号： G01B11/14
CPC分类号： G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
摘要翻译：提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。

5. 发明申请

US20070127025A1 Periodic Patterns and Technique to Control Misalignment Between Two Layers 有权
标题翻译：周期性模式和技术来控制两层之间的对准
公开(公告)号：US20070127025A1
公开(公告)日：2007-06-07
申请号：US11673115
申请日：2007-02-09
申请人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
发明人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC分类号： G01B11/00
CPC分类号： G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
摘要翻译：提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。

6. 发明授权

US11567381B2 Spectral and phase modulation tunable birefringence devices 有权
公开(公告)号：US11567381B2
公开(公告)日：2023-01-31
申请号：US17234341
申请日：2021-04-19
申请人： Ibrahim Abdulhalim
发明人： Ibrahim Abdulhalim
IPC分类号： G02F1/137 , E06B9/24 , G02F1/13 , E06B3/67 , G02F1/1335 , G02F1/13363 , G02F1/1337 , G02F1/1343
摘要： The present invention describes a liquid crystal composite tunable device for fast polarisation-independent modulation of an incident light beam comprising: (a) two supporting and functional panels, at least one of them coated with a transparent conductive electrode layer and with optionally at least one additional layer selected from an alignment layer, antireflective coating layer, thermochromic or electrochromic layer, photoconductive or photosensitive layer, and (b) a composite structure sandwiched between said two panels and made of a liquid crystal and porous microparticles infiltrated with said liquid crystal. The porous microparticles have an average refractive index approximately equals to one of the liquid crystal principal refractive indices, matching that of the liquid crystal at one orientational state (for example, parallel n∥), and exhibiting large mismatch at another orientational state (for example, perpendicular n⊥). This refractive index mismatch between said microparticles and said liquid crystal is tuned by applying an external electric or magnetic field, thermally or optically.

7. 发明授权

US08860948B2 High resolution extended depth of field optical coherence tomography 有权
标题翻译：高分辨率扩展景深光学相干断层扫描
公开(公告)号：US08860948B2
公开(公告)日：2014-10-14
申请号：US13012563
申请日：2011-01-24
申请人： Ibrahim Abdulhalim , Zeev Zalevsky
发明人： Ibrahim Abdulhalim , Zeev Zalevsky
IPC分类号： G01B11/02 , G01B9/02 , A61B5/00
CPC分类号： G01B9/02056 , A61B5/0066 , G01B9/02005 , G01B9/02091
摘要： An optical coherence tomography (OCT) imager comprising: a low coherence light source that provides light; a photosensor for imaging light; optics that directs a first portion of the light along a first optical path so that it is imaged on the photosensor and a second portion of the light along a second optical path so that it is reflected by material in the target to the photosensor where it is imaged to interfere with light from the first portion to form an interference pattern; and a mask through which light from at least one of the first and second portions of light passes that generates a relative phase perturbation between portions of light that passes through it.
摘要翻译：一种光学相干断层摄影（OCT）成像器，包括：提供光的低相干光源; 用于成像光的光电传感器; 将光的第一部分沿着第一光路引导的光学器件，使得其沿着第二光路被成像在光传感器和光的第二部分上，使得其被物体中的材料反射到光传感器，在那里它是成像以干扰来自第一部分的光以形成干涉图案; 以及掩模，来自第一和第二部分光中的至少一个的光通过该掩模，其在穿过该光的部分光之间产生相对相位扰动。

8. 发明授权

US07751046B2 Methods and systems for determining a critical dimension and overlay of a specimen 有权
标题翻译：用于确定试样的临界尺寸和覆盖层的方法和系统
公开(公告)号：US07751046B2
公开(公告)日：2010-07-06
申请号：US10401242
申请日：2003-03-27
申请人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdulhalim
发明人： Ady Levy , Kyle A. Brown , Rodney Smedt , Gary Bultman , Mehrdad Nikoonahad , Dan Wack , John Fielden , Ibrahim Abdulhalim
IPC分类号： G01B11/00 , G01N21/00 , G01B11/30 , G01B11/14 , G01B11/02
CPC分类号： G01N21/27 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N21/956 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , G03F7/70708 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and overlay misregistration. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和重叠错位。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

9. 发明申请

US20060065625A1 Periodic patterns and technique to control misalignment between two layers 审中-公开
公开(公告)号：US20060065625A1
公开(公告)日：2006-03-30
申请号：US11281820
申请日：2005-11-16
申请人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
发明人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC分类号： H01L21/306 , G01L21/30
CPC分类号： G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

10. 发明授权

US06483580B1 Spectroscopic scatterometer system 失效
标题翻译：光谱散射仪系统
公开(公告)号：US06483580B1
公开(公告)日：2002-11-19
申请号：US09036557
申请日：1998-03-06
申请人： Yiping Xu , Ibrahim Abdulhalim
发明人： Yiping Xu , Ibrahim Abdulhalim
IPC分类号： G01J300
CPC分类号： G03F7/70625 , G01B11/0641 , G01N21/211 , G01N21/4788 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/213 , G01N2021/556 , G01N2021/95615 , G03F7/70491 , G03F7/70616 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.
摘要翻译：在半导体晶片上的衍射结构的衍射测量之前，必要时，首先使用光谱反射计或光谱椭偏仪测量膜下面的膜的膜厚度和折射率。然后使用严格的模型来计算衍射结构的强度或椭偏特征。然后使用使用偏振和宽带辐射的分光散射仪测量衍射结构，以获得衍射结构的强度或椭偏特征。然后将这样的签名与数据库中的签名相匹配，以确定结构的光栅形状参数。

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