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51. 发明授权

US07791023B2 Electron holography system 有权
标题翻译：电子全息系统
公开(公告)号：US07791023B2
公开(公告)日：2010-09-07
申请号：US11746096
申请日：2007-05-09
申请人： Hiroto Kasai , Yutaka Kaneko
发明人： Hiroto Kasai , Yutaka Kaneko
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/147 , G03H5/00 , H01J37/26 , H01J2237/1514 , H01J2237/2487 , H01J2237/2614
摘要： In electron holography observation using a transmission electron microscope, searching of conditions of an electron optical condition which are necessary for realizing a requested spatial resolution is sophisticated and for persons unaccustomed to operation of the electron microscope, the observation is time consuming work. In addition to the fundamental electron microscope proper, an input unit for inputting a spatial resolution requested in the holography observation, a calculation unit for calculating positions of electron biprism and specimen necessary for realizing the requested spatial resolution from the inputted value and parameters characteristic of the device and mechanisms for moving the two positions for realizing the obtained calculation results are provided.
摘要翻译：在使用透射电子显微镜的电子全息观察中，为了实现所要求的空间分辨率而需要搜索电子光学条件的条件是复杂的，对于不习惯电子显微镜操作的人，观察是耗时的工作。除了基本电子显微镜本身之外，输入单元用于输入在全息图观察中要求的空间分辨率，计算单元，用于根据输入的值和参数特性来计算实现所请求的空间分辨率所需的电子双棱镜和样本的位置提供了用于移动两个位置以实现所获得的计算结果的装置和机构。

52. 发明申请

US20090057556A1 METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM 失效
标题翻译：使用电子束检测系统的方法和装置
公开(公告)号：US20090057556A1
公开(公告)日：2009-03-05
申请号：US12211343
申请日：2008-09-16
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

53. 发明申请

US20080067396A1 Electron Lens and Charged Particle Beam Apparatus 失效
标题翻译：电子透镜和带电粒子束装置
公开(公告)号：US20080067396A1
公开(公告)日：2008-03-20
申请号：US11749181
申请日：2007-05-16
申请人： Takashi Ohshima , Mitsugu Sato , Yutaka Kaneko , Souichi Katagiri , Koichiro Takeuchi
发明人： Takashi Ohshima , Mitsugu Sato , Yutaka Kaneko , Souichi Katagiri , Koichiro Takeuchi
IPC分类号： H01J1/50
CPC分类号： H01J37/143 , H01J37/28 , H01J2237/1405 , H01J2237/2813 , H01J2237/31749
摘要： The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.
摘要翻译：本发明提供一种产生很小像差的小型电子透镜，以及诸如扫描电子显微镜的带电粒子束装置，其具有超级紧凑并且提供高分辨率。上磁极和样本侧磁极磁耦合到由诸如稀土钴体系或钕铁硼体系的高强度磁性材料制成的永磁体的各极上，即，轴向对称，并且在其中心具有孔。在中心轴的一侧产生内部间隙。因此，磁性透镜轴向形成。此外，将外部磁场屏蔽并具有调节磁阻的半静态磁路设置在外部。样品侧磁极和磁路限定永磁体外磁阻最高的区域。由永磁体，上磁极，样品芯磁极和半静态磁路限定的空间填充有由非磁性材料制成的填充物。因此，构成物镜。

54. 发明授权

US06987265B2 Method and an apparatus of an inspection system using an electron beam 失效
公开(公告)号：US06987265B2
公开(公告)日：2006-01-17
申请号：US10083481
申请日：2002-02-27
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

55. 发明授权

US06583413B1 Method of inspecting a circuit pattern and inspecting instrument 有权
标题翻译：检查电路图案和检查仪器的方法
公开(公告)号：US06583413B1
公开(公告)日：2003-06-24
申请号：US09652606
申请日：2000-08-30
申请人： Hiroyuki Shinada , Atsuko Takafuji , Takanori Ninomiya , Yuko Sasaki , Mari Nozoe , Hisaya Murakoshi , Taku Ninomiya , Yuji Kasai , Hiroshi Makino , Yutaka Kaneko , Kenji Tanimoto
发明人： Hiroyuki Shinada , Atsuko Takafuji , Takanori Ninomiya , Yuko Sasaki , Mari Nozoe , Hisaya Murakoshi , Taku Ninomiya , Yuji Kasai , Hiroshi Makino , Yutaka Kaneko , Kenji Tanimoto
IPC分类号： G01N2300
CPC分类号： G01N23/225 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.
摘要翻译：电路图形检查装置包括用于对样品照射电子束的电子光学系统，电子束偏转器，用于从样品检测二次带电粒子的检测器，以及用于在第一模式和第二模式之间切换的模式设置单元模式。在第一模式中电子束电流比第二模式中的电子束电流大，并且在第一模式中电子束扫描速度高于第二模式。电路图形检查装置被配置为使得首先在第一模式中观察样本，然后基于在第一模式中由检测器的输出产生的图像数据来选择样本上的特定位置，然后选择特定位置在第二模式下观察样品。

56. 发明授权

US06512227B2 Method and apparatus for inspecting patterns of a semiconductor device with an electron beam 有权
公开(公告)号：US06512227B2
公开(公告)日：2003-01-28
申请号：US09982965
申请日：2001-10-22
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Atsuko Takafuji , Hiroshi Toyama , Katsuya Sugiyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Atsuko Takafuji , Hiroshi Toyama , Katsuya Sugiyama
IPC分类号： G01N2300
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An object of the present invention is to provide an inspection method using an electron beam and an inspection apparatus therefor, which are capable of enhancing the resolution, improving the inspection speed and reliability, and realizing miniaturization the apparatus. To achieve the above object, according to the present invention, there is provided an inspection method using an electron beam, including the steps of; applying a voltage on a sample via a sample stage; converging an electron beam on the sample; scanning the sample with the converged electron beam and simultaneously, continuously moving the sample stage; detecting charged particles generated from the sample; and detecting a defect on the sample on the basis of the detected charged particles; wherein a distance between the sample and the shield frame is determined on the basis of a critical discharge between the sample stage and the shield frame; coils of at least hexapoles for correcting the shape of an electron beam are provided; the electron beam is deflected for blanking during movement of the sample with the crossover of the electron beam taken as a fulcrum of blanking; or the magnitude of the voltage applied to the sample may be determined depending on the kind of sample.

57. 发明授权

US06172363B2 Method and apparatus for inspecting integrated circuit pattern 失效
公开(公告)号：US06172363B2
公开(公告)日：2001-01-09
申请号：US08811511
申请日：1997-03-04
申请人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
IPC分类号： H01J37244
CPC分类号： G01R31/305 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.

58. 发明授权

US5829476A Dual-stream filling valve 失效
标题翻译：双流灌装阀
公开(公告)号：US5829476A
公开(公告)日：1998-11-03
申请号：US897554
申请日：1997-07-21
申请人： Yutaka Kaneko , Adam M. Koller , Sven Arne Anderssen , Bengt Andersson
发明人： Yutaka Kaneko , Adam M. Koller , Sven Arne Anderssen , Bengt Andersson
IPC分类号： B65B3/32 , B65B37/06 , B65B39/00 , B67C3/04 , B67C3/20 , B67C3/28 , F16K11/22 , F16K21/00 , B67D5/54 , B67D5/00
CPC分类号： B65B39/004 , B65B3/326 , B65B37/06 , B65B39/00 , B67C3/04 , B67C3/208 , B65B2039/009 , Y10T137/87684
摘要： A dual-stream filling valve is used in a flowable material filling apparatus to introducing at least two flowable materials into a container. The dual-stream filling valve defines a material flow path therethrough. The valve includes a primary filling tube having an inlet end and a discharge end and defining a primary filling tube internal flow region. The primary filling tube defines a first opening therein intermediate the inlet and discharge ends. A secondary filling tube has an inlet end and a discharge end and defines a secondary filling tube internal flow region. The secondary filling tube is positioned at least in part within the primary filling tube internal flow region, penetrating the primary filling tube through the first opening. The dual-stream valve includes a valve plug that includes a portion that is movable relative to the secondary filling tube between an opened state wherein flow communication is established between the internal flow regions of the primary and secondary filling tubes and a closed state wherein flow communication is terminated between the internal flow regions of the primary and secondary filling tubes. An actuator is provided for moving the valve plug portion between the opened and closed positions. The actuator is disposed fully external of the secondary filling tube flow region.
摘要翻译：双流填充阀用于可流动材料填充设备中以将至少两种可流动材料引入容器中。双流填充阀限定穿过其中的材料流动路径。阀包括具有入口端和排出端并限定主要填充管内部流动区域的初级填充管。主填充管在其中间限定入口和排出端的第一开口。次级填充管具有入口端和排出端，并且限定了第二填充管内部流动区域。第二填充管至少部分地位于主填充管内部流动区域内，穿过第一开口穿过主填充管。双流阀包括阀塞，该阀塞包括可在相对于辅助填充管可移动的部分之间的打开状态，其中在主要和次要填充管的内部流动区域之间建立流动连通的关闭状态和其中流动连通在第一和第二填充管的内部流动区域之间终止。提供致动器用于在打开位置和关闭位置之间移动阀塞部分。致动器设置在第二填充管流动区域的完全外部。

59. 发明授权

US5679506A Cyan coupler for silver halide color photographic light-sensitive material 失效
标题翻译：青色耦合剂用于卤化银彩色摄影感光材料
公开(公告)号：US5679506A
公开(公告)日：1997-10-21
申请号：US651802
申请日：1996-05-20
申请人： Satoru Ikesu , Rudchenko F. Vladimir , Mitsuhiro Fukuda , Yutaka Kaneko
发明人： Satoru Ikesu , Rudchenko F. Vladimir , Mitsuhiro Fukuda , Yutaka Kaneko
IPC分类号： C07D487/04 , G03C7/38
CPC分类号： C07D487/04 , G03C7/3835
摘要： A silver halide color photographic light sensitive material is disclosed, comprising a support having thereon a silver halide emulsion layer containing silver halide grains, wherein said silver halide emulsion layer contains a cyan dye forming coupler represented by the following formula (1) or (2), ##STR1##
摘要翻译：公开了一种卤化银彩色照相感光材料，其包括其上具有含有卤化银颗粒的卤化银乳剂层的载体，其中所述卤化银乳剂层含有由下式（1）或（2）表示的青色成色剂，，

60. 发明授权

US5658720A Photographic material containing cyan coupler 失效
标题翻译：含青色成色剂的摄影材料
公开(公告)号：US5658720A
公开(公告)日：1997-08-19
申请号：US570324
申请日：1995-12-11
申请人： Satoru Ikesu , Mitsuhiro Fukuda , Vladimir F. Rudchenko , Yutaka Kaneko
发明人： Satoru Ikesu , Mitsuhiro Fukuda , Vladimir F. Rudchenko , Yutaka Kaneko
IPC分类号： C07D487/04 , G03C7/38
CPC分类号： C07D487/04 , G03C7/3835
摘要： A silver halide photographic light sensitive material comprising a support having thereon a silver halide emulsion layer containing a cyan dye-forming coupler represented by the following formula (I) or (II). ##STR1##
摘要翻译：一种卤化银照相感光材料，其包含其上具有由下式（I）或（II）表示的形成青色染料的成色剂的卤化银乳剂层的载体。公式（I）公式（II）

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