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1. 发明申请

US20180356321A1 SAMPLE PREPARATION METHOD AND SAMPLE PREPARING APPARATUS 审中-公开
公开(公告)号：US20180356321A1
公开(公告)日：2018-12-13
申请号：US16105092
申请日：2018-08-20
申请人： NIKON CORPORATION
发明人： Ichiro SASE
IPC分类号： G01N1/44 , G01N1/30 , C12M1/12 , G01N23/04 , G01N23/225 , H01J37/20
CPC分类号： G01N1/44 , C12M1/00 , C12M25/00 , G01N1/28 , G01N1/30 , G01N23/04 , G01N23/225 , G01N33/48 , G02B21/00 , H01J37/20
摘要： A sample preparation method includes: irradiating a first region of a sample with light at a time t1; irradiating a second region different from the first region with the tight at a time t2 after the time t1; and fixing the sample at a time t3 after the time t2. A sample preparing apparatus includes: a light radiating unit that irradiates a first region of a sample with light at time t1 and irradiates a second region different from the first region with the light at a time t2 after the time t1; and a fixing unit that fixes the sample at a time t3 after the time t2.

2. 发明申请

US20180247400A1 Pattern-Measuring Apparatus and Semiconductor-Measuring System 审中-公开
公开(公告)号：US20180247400A1
公开(公告)日：2018-08-30
申请号：US15964559
申请日：2018-04-27
申请人： Hitachi High-Technologies Corporation
发明人： Yasutaka TOYODA , Norio HASEGAWA , Takeshi KATO , Hitoshi SUGAHARA , Yutaka HOJO , Daisuke HIBINO , Hiroyuki SHINDO
IPC分类号： G06T7/00 , H01J37/22 , G01N23/2251 , H01J37/28 , H01L21/66 , G01N23/225
CPC分类号： G06T7/001 , G01N23/225 , G01N23/2251 , G01N2223/6113 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01L22/12
摘要： A pattern-measuring apparatus and a semiconductor-measuring system are provided which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In particular, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.

3. 发明授权

US10018824B2 Temporal compressive sensing systems 有权
公开(公告)号：US10018824B2
公开(公告)日：2018-07-10
申请号：US15802876
申请日：2017-11-03
申请人： Integrated Dynamic Electron Solutions, Inc.
发明人： Bryan W. Reed
IPC分类号： G01N23/00 , G02B21/36 , G06T11/00 , H01J37/22 , H01J37/28 , H01J37/26 , G01N23/225
CPC分类号： G02B21/365 , G01N23/225 , G06T11/003 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24455 , H01J2237/262 , H01J2237/2802
摘要： Methods and systems for temporal compressive sensing are disclosed, where within each of one or more sensor array data acquisition periods, one or more sensor array measurement datasets comprising distinct linear combinations of time slice data are acquired, and where mathematical reconstruction allows for calculation of accurate representations of the individual time slice datasets.

4. 发明授权

US09966226B2 Cross-section processing and observation method and cross-section processing and observation apparatus 有权
公开(公告)号：US09966226B2
公开(公告)日：2018-05-08
申请号：US14728004
申请日：2015-06-02
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Atsushi Uemoto , Xin Man , Tatsuya Asahata
IPC分类号： G01N23/225 , H01J37/304 , H01J37/26 , H01J37/30 , G01N23/22 , G01N23/04 , G01T1/36 , H01J37/28 , G01N1/32
CPC分类号： H01J37/265 , G01N1/32 , G01N23/04 , G01N23/2208 , G01N23/225 , G01N23/2251 , G01N23/2255 , G01T1/36 , H01J37/28 , H01J37/3005 , H01J37/304 , H01J37/3045 , H01J2237/2611 , H01J2237/28 , H01J2237/2807 , H01J2237/2812 , H01J2237/30472 , H01J2237/30483 , H01J2237/31745 , H01J2237/31749
摘要： A cross-section processing and observation method performed by a cross-section processing and observation apparatus comprises a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections. In a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material or of a non-specified material that is different from a pre-specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

5. 发明申请

US20170210630A1 METHOD FOR MANUFACTURING POLYCRYSTALLINE SILICON BAR AND POLYCRYSTALLINE SILICON BAR 审中-公开
公开(公告)号：US20170210630A1
公开(公告)日：2017-07-27
申请号：US15327693
申请日：2015-07-28
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Shuichi MIYAO , Shigeyoshi NETSU
IPC分类号： C01B33/035 , G01N23/225 , G01N23/207 , C01B33/02 , G01N23/203
CPC分类号： C01B33/035 , C01B33/02 , C01P2002/60 , G01N23/203 , G01N23/207 , G01N23/225
摘要： In the present invention, when polycrystalline silicon bar is manufactured by the Siemens method, polycrystalline silicon is deposited, for example, under the conditions that during performing the deposition reaction of polycrystalline silicon, the reaction temperature is set to fall within a range from 1100° C. to 1150° C. and the internal pressure of the furnace is controlled to fall within a range from 0.45 to 0.9 MPa. By controlling the internal pressure of the furnace so as to fall within such a range, it is possible to obtain a polycrystalline silicon bar having an average value of the crystal grain sizes of 6 μm or less, based on the crystal grain sizes evaluated by the EBSD method in arbitrary portions.

6. 发明申请

US20170146787A1 TEMPORAL COMPRESSIVE SENSING SYSTEMS 有权
公开(公告)号：US20170146787A1
公开(公告)日：2017-05-25
申请号：US15243235
申请日：2016-08-22
申请人： Integrated Dynamic Electron Solutions, Inc.
发明人： Bryan W. Reed
IPC分类号： G02B21/36 , G06T11/00 , H01J37/22
CPC分类号： G02B21/365 , G01N23/225 , G06T11/003 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24455 , H01J2237/262 , H01J2237/2802
摘要： Methods and systems for temporal compressive sensing are disclosed, where within each of one or more sensor array data acquisition periods, one or more sensor array measurement datasets comprising distinct linear combinations of time slice data are acquired, and where mathematical reconstruction allows for calculation of accurate representations of the individual time slice datasets.

7. 发明申请

US20170067837A1 Analysis Method and X-Ray Photoelectron Spectroscope 有权
标题翻译：分析方法和X射线光电子能谱仪
公开(公告)号：US20170067837A1
公开(公告)日：2017-03-09
申请号：US15258374
申请日：2016-09-07
申请人： JEOL Ltd.
发明人： Masahide Shima
IPC分类号： G01N23/223 , G01N23/225
CPC分类号： G01N23/223 , G01N23/225 , G01N23/227 , G01N23/2273 , G01N23/2276
摘要： An analysis method includes: acquiring a photoelectron spectrum and an X-ray-excited Auger spectrum, the photoelectron spectrum being obtained by detecting photoelectrons emitted from a specimen by irradiating the specimen with X-rays, and the X-ray-excited Auger spectrum being obtained by detecting Auger electrons emitted from the specimen by irradiating the specimen with X-rays; calculating a quantitative value of each element included in the specimen based on the photoelectron spectrum; and performing a curve fitting process on the X-ray-excited Auger spectrum by using an electron beam-excited Auger electron standard spectrum, and calculating a quantitative value of an analysis target element in each chemical bonding state included in the specimen.
摘要翻译：分析方法包括：获取光电子谱和X射线激发俄歇光谱，通过用X射线照射样本来检测从样品发射的光电子，获得的光电子光谱，X射线激发的俄歇谱通过用X射线照射样本来检测从样品发射的俄歇电子获得的; 基于光电子能谱计算样品中包含的每个元素的定量值; 并通过使用电子束激发的俄歇电子标准光谱对X射线激发俄歇光谱进行曲线拟合处理，并计算样品中包含的各化学键合状态下的分析对象元素的定量值。

8. 发明授权

US09390886B2 Electro-optical inspection apparatus using electron beam 有权
标题翻译：使用电子束的电光检查装置
公开(公告)号：US09390886B2
公开(公告)日：2016-07-12
申请号：US11884367
申请日：2006-02-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
IPC分类号： G01N23/00 , H01J37/244 , G01N23/225 , H01J37/22 , G02F1/1362 , H01L27/146
CPC分类号： H01J37/244 , G01N23/225 , G02F2001/136254 , H01J37/226 , H01J2237/15 , H01J2237/2482 , H01J2237/2817 , H01L27/146 , H01L27/14601
摘要： An electron beam apparatus for capturing images by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. The detecting device includes a plurality of unit detectors each including an area sensor, a bundle of optical fibers having one end coupled to a detection plane of the area sensor, and an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the respective sub-visual field is focused. An electromagnetic deflector deflects the secondary electron beam each time the electron beam is irradiated to the next sub-visual field to move the secondary electron beams over the surfaces of the FOPs.
摘要翻译：一种电子束装置，用于通过偏转器偏转一次电子束以照射通过划分样品表面上的评估区域而形成的每个副视野并且检测在每个样本表面上包含样品表面上的信息的二次电子来捕获图像通过检测装置的子视野。检测装置包括多个单元检测器，每个单元检测器包括一个区域传感器，一束光纤，其一端连接到该区域传感器的检测平面，并且一个FOP涂覆在该光纤束的另一端上，并形成有闪烁体，其上从相应的子视野发射的二次电子束聚焦。每当电子束照射到下一个子视场时，电磁偏转器偏转二次电子束，以将二次电子束移动到FOP的表面上。

9. 发明申请

US20160189923A1 APPARATUS AND METHOD 审中-公开
标题翻译：装置和方法
公开(公告)号：US20160189923A1
公开(公告)日：2016-06-30
申请号：US14911570
申请日：2014-08-08
申请人： SWINBURNE UNIVERSITY OF TECHNOLOGY
发明人： Saulius JUODKAZIS , Gediminas GERVINSKAS , Gediminas SENIUTINAS
IPC分类号： H01J37/26 , H01J37/30 , H01J37/28
CPC分类号： H01J37/265 , B82Y40/00 , G01N23/225 , G01N2223/073 , G01N2223/351 , G01N2223/611 , H01J37/026 , H01J37/263 , H01J37/28 , H01J37/3002 , H01J2237/004 , H01J2237/0047 , H01J2237/28
摘要： An apparatus for imaging or fabrication using charged particles, the apparatus including: a charged particle source configured to generate a charged particle beam of ions or electrons; a sample holder mounted relative to the charged particle source to hold a sample in the charged particle beam for the imaging or fabrication; and an optical source system configured to generate an optical beam, wherein the optical source system is mounted relative to the sample holder to direct the optical beam onto the sample to modify an electric charge of the sample during the imaging or fabrication to improve spatial resolution of the imaging or fabrication.
摘要翻译：一种用于使用带电粒子进行成像或制造的装置，所述装置包括：被配置为产生离子或电子的带电粒子束的带电粒子源; 相对于带电粒子源安装的样品保持器，以将样品保持在带电粒子束中用于成像或制造; 以及被配置为产生光束的光源系统，其中所述光源系统相对于所述样品保持器安装以将所述光束引导到所述样品上，以在成像或制造期间修改所述样品的电荷，以改善所述样品的空间分辨率成像或制作。

10. 发明申请

US20160178543A1 ANALYZING AN OBJECT USING A PARTICLE BEAM APPARATUS 有权
标题翻译：使用颗粒光束装置分析对象
公开(公告)号：US20160178543A1
公开(公告)日：2016-06-23
申请号：US14972589
申请日：2015-12-17
申请人： Carl Zeiss Microscopy GmbH
发明人： Richard Schillinger , Wolfgang Berger
IPC分类号： G01N23/225 , G01N23/203
CPC分类号： G01N23/2208 , G01N23/203 , G01N23/223 , G01N23/225 , G01N23/2251 , G01N23/2252 , G01N23/2254 , H01J37/244 , H01J2237/2441 , H01J2237/2446
摘要： Described herein is a method for analyzing an object using a particle beam apparatus, for example an electron beam apparatus and/or an ion beam apparatus, or using an x-ray beam device and a particle beam apparatus or an x-ray beam device, by means of which the method is carried out. In the method, information about the object is loaded from a data memory into a control device. Furthermore, a group of detection units from the multiplicity of detection units is identified using the information loaded into the control device. A first detector segment is formed from the group of detection units using the control device. Interaction particles and/or interaction radiation, which is/are detected, is/are generated by guiding a particle beam onto the object and scanning the object using the particle beam, where a detector segment signal is read from the detector segment.
摘要翻译：本文描述了使用粒子束装置，例如电子束装置和/或离子束装置，或者使用x射线束装置和粒子束装置或X射线束装置来分析物体的方法，通过该方法进行该方法。在该方法中，关于对象的信息从数据存储器加载到控制设备中。此外，使用加载到控制装置中的信息来识别来自多个检测单元的一组检测单元。使用控制装置的一组检测单元形成第一检测器段。通过将粒子束引导到物体上并使用粒子束扫描物体来生成被检测的相互作用粒子和/或相互作用辐射，其中从检测器段读取检测器段信号。

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