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1. 发明授权

US07759652B2 Electron lens and charged particle beam apparatus 失效
标题翻译：电子透镜和带电粒子束装置
公开(公告)号：US07759652B2
公开(公告)日：2010-07-20
申请号：US11749181
申请日：2007-05-16
申请人： Takashi Ohshima , Mitsugu Sato , Yutaka Kaneko , Souichi Katagiri , Koichiro Takeuchi
发明人： Takashi Ohshima , Mitsugu Sato , Yutaka Kaneko , Souichi Katagiri , Koichiro Takeuchi
IPC分类号： H01J1/50
CPC分类号： H01J37/143 , H01J37/28 , H01J2237/1405 , H01J2237/2813 , H01J2237/31749
摘要： The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.
摘要翻译：本发明提供一种产生很小像差的小型电子透镜，以及诸如扫描电子显微镜的带电粒子束装置，其具有超级紧凑并且提供高分辨率。上磁极和样本侧磁极磁耦合到由诸如稀土钴体系或钕铁硼体系的高强度磁性材料制成的永磁体的各极上，即，轴向对称，并且在其中心具有孔。在中心轴的一侧产生内部间隙。因此，磁性透镜轴向形成。此外，将外部磁场屏蔽并具有调节磁阻的半静态磁路设置在外部。样品侧磁极和磁路限定永磁体外磁阻最高的区域。由永磁体，上磁极，样品芯磁极和半静态磁路限定的空间填充有由非磁性材料制成的填充物。因此，构成物镜。

2. 发明申请

US20080067396A1 Electron Lens and Charged Particle Beam Apparatus 失效
标题翻译：电子透镜和带电粒子束装置
公开(公告)号：US20080067396A1
公开(公告)日：2008-03-20
申请号：US11749181
申请日：2007-05-16
申请人： Takashi Ohshima , Mitsugu Sato , Yutaka Kaneko , Souichi Katagiri , Koichiro Takeuchi
发明人： Takashi Ohshima , Mitsugu Sato , Yutaka Kaneko , Souichi Katagiri , Koichiro Takeuchi
IPC分类号： H01J1/50
CPC分类号： H01J37/143 , H01J37/28 , H01J2237/1405 , H01J2237/2813 , H01J2237/31749
摘要： The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.
摘要翻译：本发明提供一种产生很小像差的小型电子透镜，以及诸如扫描电子显微镜的带电粒子束装置，其具有超级紧凑并且提供高分辨率。上磁极和样本侧磁极磁耦合到由诸如稀土钴体系或钕铁硼体系的高强度磁性材料制成的永磁体的各极上，即，轴向对称，并且在其中心具有孔。在中心轴的一侧产生内部间隙。因此，磁性透镜轴向形成。此外，将外部磁场屏蔽并具有调节磁阻的半静态磁路设置在外部。样品侧磁极和磁路限定永磁体外磁阻最高的区域。由永磁体，上磁极，样品芯磁极和半静态磁路限定的空间填充有由非磁性材料制成的填充物。因此，构成物镜。

3. 发明授权

US07582885B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07582885B2
公开(公告)日：2009-09-01
申请号：US11401878
申请日：2006-04-12
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
IPC分类号： H01J1/50
CPC分类号： H01J41/14 , H01J37/28 , H01J41/12 , H01J2237/0245 , H01J2237/062 , H01J2237/06341 , H01J2237/1825
摘要： A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
摘要翻译：提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游，并且将最少数量的离子泵放置在下游，使得两个泵组合使用。此外，通过将可拆卸线圈安装在电子枪部件上，可以将真空度保持在10-8Pa以下的真空度的高真空下。

4. 发明授权

US07615765B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07615765B2
公开(公告)日：2009-11-10
申请号：US11589821
申请日：2006-10-31
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/18 , H01J37/28 , H01J2237/022 , H01J2237/1825 , H01J2237/188 , H01J2237/31749
摘要： There is provided a compact charged particle beam apparatus with a non-evaporable getter pump which maintains high vacuum even during emission of an electron beam without generating foreign particles. The apparatus comprises: a charged particle source; a charged particle optics which focuses a charged particle beam emitted from the charged particle source on a sample and performs scanning; and means of vacuum pumping which evacuates the charged particle optics. The means of vacuum pumping has a differential pumping structure with two or more vacuum chambers connected through an opening in series. A pump made of non-evaporable getter alloy is placed in an upstream vacuum chamber with a high degree of vacuum, and a gas absorbing surface of the non-evaporable getter alloy is fixed without contact with another part.
摘要翻译：提供了一种具有非蒸发性吸气泵的紧凑型带电粒子束装置，即使在电子束的发射期间也能保持高真空而不产生异物。该装置包括：带电粒子源; 带电粒子光学器件，其将从带电粒子源发射的带电粒子束聚焦在样品上并执行扫描; 以及抽空带电粒子光学元件的真空泵送装置。真空泵送装置具有差分泵送结构，其中两个或多个真空室通过串联的开口连接。将由不可蒸发的吸气剂合金制成的泵放置在具有高真空度的上游真空室中，并且非蒸发性吸气剂合金的气体吸收表面固定而不与另一部分接触。

5. 发明申请

US20070102650A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20070102650A1
公开(公告)日：2007-05-10
申请号：US11589821
申请日：2006-10-31
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/18 , H01J37/28 , H01J2237/022 , H01J2237/1825 , H01J2237/188 , H01J2237/31749
摘要： There is provided a compact charged particle beam apparatus with a non-evaporable getter pump which maintains high vacuum even during emission of an electron beam without generating foreign particles. The apparatus comprises: a charged particle source; a charged particle optics which focuses a charged particle beam emitted from the charged particle source on a sample and performs scanning; and means of vacuum pumping which evacuates the charged particle optics. The means of vacuum pumping has a differential pumping structure with two or more vacuum chambers connected through an opening in series. A pump made of non-evaporable getter alloy is placed in an upstream vacuum chamber with a high degree of vacuum, and a gas absorbing surface of the non-evaporable getter alloy is fixed without contact with another part.
摘要翻译：提供了一种具有非蒸发性吸气泵的紧凑型带电粒子束装置，即使在电子束的发射期间也能保持高真空而不产生异物。该装置包括：带电粒子源; 带电粒子光学器件，其将从带电粒子源发射的带电粒子束聚焦在样品上并执行扫描; 以及抽空带电粒子光学元件的真空泵送装置。真空泵送装置具有差分泵送结构，其中两个或多个真空室通过串联的开口连接。将由不可蒸发的吸气剂合金制成的泵放置在具有高真空度的上游真空室中，并且非蒸发性吸气剂合金的气体吸收表面固定而不与另一部分接触。

6. 发明申请

US20060231773A1 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20060231773A1
公开(公告)日：2006-10-19
申请号：US11401878
申请日：2006-04-12
申请人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
发明人： Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
IPC分类号： G21G5/00
CPC分类号： H01J41/14 , H01J37/28 , H01J41/12 , H01J2237/0245 , H01J2237/062 , H01J2237/06341 , H01J2237/1825
摘要： A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
摘要翻译：提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游，并且将最少数量的离子泵放置在下游，使得两个泵组合使用。此外，通过将可拆卸线圈安装在电子枪部件上，可以将真空度保持在10 -8 Pa以下的真空度的高真空下。

7. 发明授权

US07928377B2 Charged particle beam apparatus and sample manufacturing method 有权
标题翻译：带电粒子束装置和样品制造方法
公开(公告)号：US07928377B2
公开(公告)日：2011-04-19
申请号：US11258035
申请日：2005-10-26
申请人： Tohru Ishitani , Tsuyoshi Ohnishi , Mitsugu Sato , Koichiro Takeuchi
发明人： Tohru Ishitani , Tsuyoshi Ohnishi , Mitsugu Sato , Koichiro Takeuchi
IPC分类号： G01N23/04
CPC分类号： H01J37/26 , G01N1/32 , H01J37/28 , H01J2237/206 , H01J2237/2802 , H01J2237/30466 , H01J2237/3174 , H01J2237/31745 , H01J2237/31749
摘要： It is possible to carry out a highly accurate thin film machining by irradiation of an ion beam to a sample and a high-resolution STEM observation of the sample by irradiating an electron beam with a high throughput almost without moving the sample. The FIB irradiation system has an irradiation axis almost orthogonally intersecting an irradiation axis of the STEM observation electron beam irradiation system. The sample is arranged at the intersection point of the irradiation axes. The FIB machining plane of the sample is extracted from the thin film plane of the STEM observation sample. The transmitting/scattered beam detector are arranged at backward of the sample on the electron beam irradiation axis viewed from the electron beam irradiation direction.
摘要翻译：通过用离子束照射样品和样品的高分辨率STEM观察，可以通过以高生成量的电子束照射几乎不移动样品来进行高精度的薄膜加工。 FIB照射系统具有与STEM观察电子束照射系统的照射轴几乎正交相交的照射轴。样品布置在照射轴的交点处。从STEM观察样品的薄膜平面提取样品的FIB加工面。发射/散射光束检测器被布置在从电子束照射方向观察的电子束照射轴上样品的后方。

8. 发明申请

US20060097166A1 Charged particle beam apparatus and sample manufacturing method 有权
标题翻译：带电粒子束装置和样品制造方法
公开(公告)号：US20060097166A1
公开(公告)日：2006-05-11
申请号：US11258035
申请日：2005-10-26
申请人： Tohru Ishitani , Tsuyoshi Ohnishi , Mitsugu Sato , Koichiro Takeuchi
发明人： Tohru Ishitani , Tsuyoshi Ohnishi , Mitsugu Sato , Koichiro Takeuchi
IPC分类号： G21K7/00 , H01J37/08
CPC分类号： H01J37/26 , G01N1/32 , H01J37/28 , H01J2237/206 , H01J2237/2802 , H01J2237/30466 , H01J2237/3174 , H01J2237/31745 , H01J2237/31749
摘要： It is possible to carry out a highly accurate thin film machining by irradiation of an ion beam to a sample and a high-resolution STEM observation of the sample by irradiating an electron beam with a high throughput almost without moving the sample. The FIB irradiation system has an irradiation axis almost orthogonally intersecting an irradiation axis of the STEM observation electron beam irradiation system. The sample is arranged at the intersection point of the irradiation axes. The FIB machining plane of the sample is extracted from the thin film plane of the STEM observation sample. The transmitting/scattered beam detector are arranged at backward of the sample on the electron beam irradiation axis viewed from the electron beam irradiation direction.
摘要翻译：通过用离子束照射样品和样品的高分辨率STEM观察，可以通过以高生成量的电子束照射几乎不移动样品来进行高精度的薄膜加工。 FIB照射系统具有与STEM观察电子束照射系统的照射轴几乎正交相交的照射轴。样品布置在照射轴的交点处。从STEM观察样品的薄膜平面提取样品的FIB加工面。发射/散射光束检测器被布置在从电子束照射方向观察的电子束照射轴上样品的后方。

9. 发明申请

US20090101817A1 CHARGED PARTICLE APPLICATION APPARATUS 审中-公开
标题翻译：充电颗粒应用设备
公开(公告)号：US20090101817A1
公开(公告)日：2009-04-23
申请号：US12252862
申请日：2008-10-16
申请人： Takashi OHSHIMA , Michio Hatano , Hideyuki Nagaishi , Mitsugu Sato , Muneyuki Fukuda
发明人： Takashi OHSHIMA , Michio Hatano , Hideyuki Nagaishi , Mitsugu Sato , Muneyuki Fukuda
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J37/3056 , H01J2237/2441 , H01J2237/2443 , H01J2237/2444 , H01J2237/2445 , H01J2237/2482
摘要： The present invention provides a highly sensitive, thin detector useful for observing low-voltage, high-resolution SEM images, and provides a charged particle beam application apparatus based on such a detector. The charged particle beam application apparatus includes a charged particle irradiation source, a charged particle optics for irradiating a sample with a charged particle beam emitted from the charged particle irradiation source, and an electron detection section for detecting electrons that are secondarily generated from the sample. The electron detection section includes a diode device that is a combination of a phosphor layer, which converts the electrons to an optical signal, and a device for converting the optical signal to electrons and subjecting the electrons to avalanche multiplication, or includes a diode device having an electron absorption region that is composed of at least a wide-gap semiconductor substrate with a bandgap greater than 2 eV.
摘要翻译：本发明提供了一种用于观察低电压，高分辨率SEM图像的高灵敏度，薄的检测器，并提供了基于这种检测器的带电粒子束施加装置。带电粒子束施加装置包括带电粒子照射源，用于从带电粒子照射源发射的带电粒子束照射样品的带电粒子光学器件和用于检测从样品二次产生的电子的电子检测部分。电子检测部分包括二极管器件，其是将电子转换成光信号的荧光体层的组合，以及用于将光信号转换为电子并使电子进行雪崩倍增的器件，或包括具有至少由带隙大于2eV的宽间隙半导体衬底构成的电子吸收区域。

10. 发明申请

US20120298864A1 Charged Particle Beam Apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20120298864A1
公开(公告)日：2012-11-29
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/26
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

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