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1. 发明授权

US07952074B2 Method and apparatus for inspecting integrated circuit pattern 有权
标题翻译：检查集成电路图案的方法和装置
公开(公告)号：US07952074B2
公开(公告)日：2011-05-31
申请号：US12190388
申请日：2008-08-12
申请人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
IPC分类号： G01N23/22
CPC分类号： G01R31/305 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspection method and an apparatus therefore, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined changed state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
摘要翻译：因此，电路图案检查方法和其中待检查的样品的待检查部分的整体被制成处于预定的改变状态的装置，被检查部分被成像高分辨率照射，在扫描电子束时，在从电子束照射的时刻起经过规定的时间后，在照射电子束的部分检测到二次带电粒子，根据这样检测的次级通过使用如此形成的图像来检查带电粒子信号，并检查待检查的部分。

2. 发明申请

US20100078556A1 Electron Beam Apparatus And Method of Generating An Electron Beam Irradiation Pattern 审中-公开
标题翻译：电子束装置及其产生电子束照射模式的方法
公开(公告)号：US20100078556A1
公开(公告)日：2010-04-01
申请号：US12630378
申请日：2009-12-03
申请人： Ryo Fujita , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
发明人： Ryo Fujita , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
IPC分类号： G01N23/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31769
摘要： High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.
摘要翻译：通过使用小剂量的电子束进行高对比度曝光，以高精度在晶片上形成图案，进行高精度检查。在图案形成中，执行邻近效应校正处理。此外，基于使用电子束的曝光特性的逆特性的滤波结果来执行电子束的曝光。此外，在图案检查中，基于滤波结果照射电子束，以获得形成的图案的边缘的周边区域。

3. 发明授权

US07635851B2 Electron beam apparatus and method of generating an electron beam irradiation pattern 有权
标题翻译：电子束装置和产生电子束照射图案的方法
公开(公告)号：US07635851B2
公开(公告)日：2009-12-22
申请号：US11519872
申请日：2006-09-13
申请人： Ryo Fujita , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
发明人： Ryo Fujita , Haruo Yoda , Kimiaki Ando , Yuji Inoue , Masato Muraki
IPC分类号： H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31769
摘要： High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering using an inverse characteristic of exposure characteristics of the electron beams. Furthermore, in pattern inspection, electron beams are irradiated based on a result of filtering for obtaining a peripheral region of an edge of the pattern formed.
摘要翻译：通过使用小剂量的电子束进行高对比度曝光，以高精度在晶片上形成图案，进行高精度检查。在图案形成中，执行邻近效应校正处理。此外，基于使用电子束的曝光特性的逆特性的滤波结果来执行电子束的曝光。此外，在图案检查中，基于滤波结果照射电子束，以获得形成的图案的边缘的周边区域。

4. 发明申请

US20080095217A1 CORRELATION DETECTION METHOD, CORRELATION DETECTION APPARATUS, TRANSMISSION DIVERSITY DETECTION METHOD AND TRANSMISSION DIVERSITY DETECTION CIRCUIT 审中-公开
标题翻译：相关检测方法，相关检测装置，传输多样性检测方法和传输多样性检测电路
公开(公告)号：US20080095217A1
公开(公告)日：2008-04-24
申请号：US11877418
申请日：2007-10-23
申请人： Kimiaki ANDO
发明人： Kimiaki ANDO
IPC分类号： H03D1/00 , H04B1/00 , H04L7/00
CPC分类号： H04B1/7085
摘要： A correlation detection apparatus detects a correlation between a reception signal and a spreading code. A logic circuit is operated with a chip clock. The logic circuit generates the spreading code of an offset unit of ½ chip according to a combination value of chips next to each other in a spreading code sequence, the spreading code sequence taking values of “+1” and “−1.” The logic circuit includes a ⅔ value converter that outputs a “0” when chips next to each other are not similar, outputs a “+1” when chips next to each other are of a value “+1”, and outputs a “−1” when chips next to each other are of a value “−1.”
摘要翻译：相关检测装置检测接收信号和扩展码之间的相关性。逻辑电路采用芯片时钟运行。逻辑电路根据扩展码序列中彼此相邻的码片的组合值，生成1/2码片的偏移单元的扩展码，扩展码序列取“+1”和“-1”。逻辑电路包括2/3值转换器，当彼此相邻的芯片不相似时，输出“0”，当彼此相邻的芯片为“+1”时输出“+1”，并输出当彼此相邻的芯片的值为“-1”时为“-1”。

5. 发明申请

US20060033050A1 Electron-beam drawing apparatus and electron-beam drawing method 审中-公开
标题翻译：电子束描绘装置和电子束拉制法
公开(公告)号：US20060033050A1
公开(公告)日：2006-02-16
申请号：US11251807
申请日：2005-10-18
申请人： Kimiaki Ando , Haruo Yoda , Rikio Tomiyoshi , Masamichi Kawano
发明人： Kimiaki Ando , Haruo Yoda , Rikio Tomiyoshi , Masamichi Kawano
IPC分类号： G21K5/10
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3174 , H01J2237/31776
摘要： In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and an electron-beam drawing method capable of accurately drawing even an oblique figure. A first rectangular aperture and a second parallelogrammatic aperture are used and a variable parallelogrammatic electron beam formed by two apertures is used to draw a desired pattern on the surface of a sample. Moreover, oblique-side-portion-contour decomposition means is used to draw an oblique-side portion by a variable parallelogram and the inside of an oblique side by a triangle and a quadrangle (rectangle).
摘要翻译：在绘制斜图形图形的情况下，当使用细长矩形波束绘制斜图时，会出现在倾斜侧部分发生边缘粗糙度以降低绘图精度的问题。本发明解决了上述问题，并且提供了能够精确地绘制斜图的电子束描绘装置和电子束描绘方法。使用第一矩形孔和第二平行四边形孔，并且使用由两个孔形成的可变平行四边形电子束来在样品的表面上画出期望的图案。此外，倾斜侧部分轮廓分解装置用于通过可变的平行四边形和斜边的内侧以三角形和四边形（矩形）绘制斜侧部分。

6. 发明授权

US06403973B1 Electron beam exposure method and apparatus and semiconductor device manufactured using the same 失效
标题翻译：电子束曝光方法和使用其制造的装置和半导体器件
公开(公告)号：US06403973B1
公开(公告)日：2002-06-11
申请号：US09498617
申请日：2000-02-07
申请人： Hiroyuki Takahashi , Masahide Okumura , Koji Nagata , Kimiaki Ando
发明人： Hiroyuki Takahashi , Masahide Okumura , Koji Nagata , Kimiaki Ando
IPC分类号： H01J3730
CPC分类号： H01J37/304 , H01J2237/3045 , H01J2237/3175
摘要： The present invention provides an electron beam exposure method and an exposure apparatus suitable for use in the electron beam exposure technology for performing exposure on a sample placed on a sample table by an electron beam while continuously moving the sample table, both of which are capable of performing high-accuracy and high-speed exposure without being affected by glitch noise of a DA converter used for trace deflection of the electron beam. Displacements of the position of the sample table and the position to apply the electron beam are determined and the determined displacements are divided into the amount of a shot synchronous trace and the amount of a real time trace each synchronized with shot timing for applying the electron beam to thereby reduce the amount of the real time trace, whereby degradation in exposure accuracy due to the glitch noise of the DA converter used for trace deflection is prevented from occurring. It is therefore possible to carry out high-accuracy exposure. Since the number of trace region pass-changeovers can be reduced by increasing the range of trace deflection, wasted time can be reduced and hence high-speed exposure is made possible.
摘要翻译：本发明提供电子束曝光方法和适用于电子束曝光技术的曝光装置，用于在连续移动样品台的同时通过电子束对放置在样品台上的样品进行曝光，两者都能够执行高精度和高速曝光，而不受用于电子束的迹线偏转的DA转换器的毛刺噪声的影响。确定样品台的位置和施加电子束的位置的位移，并将所确定的位移分为射击同步轨迹的量和每个与施加电子束的喷射定时同步的实时轨迹的量从而减少实时迹线的量，从而防止由于用于迹线偏转的DA转换器的毛刺噪声引起的曝光精度的劣化。因此，可以进行高精度的曝光。由于可以通过增加迹线偏转的范围来减少迹线区域通过切换的数量，所以可以减少浪费的时间，因此可以实现高速曝光。

7. 发明授权

US06373708B1 Contactless IC card 失效
标题翻译：非接触式IC卡
公开(公告)号：US06373708B1
公开(公告)日：2002-04-16
申请号：US09373722
申请日：1999-08-13
申请人： Kimiaki Ando , Takehiro Ohkawa , Kazuo Kaneko
发明人： Kimiaki Ando , Takehiro Ohkawa , Kazuo Kaneko
IPC分类号： H05K114
CPC分类号： G06K19/07779 , G06K19/07749 , G06K19/07783 , H05K1/16
摘要： The pattern line width of a coil is partially widened in a predetermined dimension and wiring patterns of a coil on the surface side and a coil on the rear side are arranged so as not to be in overlapped positions. Consequently, a direct current resistance of the coil can be reduced and an adverse influence by a self resonance of the coil on a communication can be reduced.
摘要翻译：线圈的图案线宽度以预定尺寸部分地变宽，并且表面侧的线圈的布线图案和后侧的线圈被布置成不处于重叠位置。因此，可以减小线圈的直流电阻，并且可以减少线圈对通信的自谐振的不利影响。

8. 发明授权

US4820928A Lithography apparatus 失效
标题翻译：平版印刷设备
公开(公告)号：US4820928A
公开(公告)日：1989-04-11
申请号：US106499
申请日：1987-10-09
申请人： Mitsuo Ooyama , Kimiaki Ando , Yoshio Kawamura , Norio Saitou , Takanori Simura , Hiroyuki Kohida
发明人： Mitsuo Ooyama , Kimiaki Ando , Yoshio Kawamura , Norio Saitou , Takanori Simura , Hiroyuki Kohida
IPC分类号： G02B5/18 , H01J37/302 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/302 , H01J37/3174 , H01J2237/31762
摘要： A lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, including a framing pattern memory for storing therein closed framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for scanning the framing pattern memory having stored therein closed framing lines of the pattern to be drawn and for generating a beam deflection address for drawing the pattern and a beam blanking control signal.
摘要翻译：其中控制诸如电子束或离子束的带电粒子扫描样品的期望区域并由此绘制图案的光刻设备，包括用于存储图案的闭合框线的框架图案存储器以点图像的形式绘制的帧图案生成器，用于以点图像的形式将要绘制的图案的成帧线写入所述成帧图案存储器的成像模式生成器，以及用于扫描已存储在其中的成帧模式存储器的光栅扫描电路闭合要绘制的图案的成帧线和用于产生用于绘制图案的光束偏转地址和光束消隐控制信号。

9. 发明申请

US20120314211A1 INSPECTING APPARATUS AND INSPECTING METHOD 有权
标题翻译：检查装置和检查方法
公开(公告)号：US20120314211A1
公开(公告)日：2012-12-13
申请号：US13520460
申请日：2010-12-08
申请人： Kimiaki Ando , Hiroshi Kikuchi , Yuji Inoue
发明人： Kimiaki Ando , Hiroshi Kikuchi , Yuji Inoue
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/94 , H01L22/12
摘要： Provided is a method wherein a multi-anode detector is used for the purpose of detecting scattered light from a wafer, data obtained from the detector (multi-anode) for detecting defects is used, the shape of a beam radiated to the wafer, a rotational shift between the radius direction and the beam long side, and the like are calculated, and the optical axis of the irradiation beam is adjusted. Furthermore, the method is provided with a technique which feeds back the correction quantities for rotation and amplitude to inspection signal data, on the basis of the correction data, and corrects inspection data. Since fine correction with the adjustment of an optics system and signal processing is made possible, positional accuracy of defect inspection and accuracy of defect level (defect size) are improved.
摘要翻译：提供了一种多阳极检测器用于检测来自晶片的散射光的方法，使用从用于检测缺陷的检测器（多阳极）获得的数据，辐射到晶片的光束的形状，计算半径方向与光束长边之间的旋转偏移等，并调整照射光束的光轴。此外，该方法具有基于校正数据将检查信号数据的旋转和振幅校正量反馈并校正检查数据的技术。由于通过光学系统的调整和信号处理的精细校正成为可能，故缺陷检查的位置精度和缺陷水平（缺陷尺寸）的精度提高。

10. 发明授权

US07643462B2 Selective storing order method in CDMA receiver 失效
标题翻译： CDMA接收机选择性存储顺序法
公开(公告)号：US07643462B2
公开(公告)日：2010-01-05
申请号：US10559685
申请日：2004-05-27
申请人： Kimiaki Ando
发明人： Kimiaki Ando
IPC分类号： H04B7/216 , H04B7/00
CPC分类号： H04B1/712
摘要： A receiver allows a user to select received data before de-spreading or symbol data after de-spreading according to various factors when data is simultaneously received via multiple channels and to store the selected data, reduces the capacity of the storage memory, and enhances the degree of freedom of the timing of de-spreading processing. Storing the received data in the storage memory not in the form of symbol data produced after de-spreading but in the form of received data before de-spreading. This reduces the capacity of the storage memory and enhances the degree of the freedom of the timing of the de-spreading process.
摘要翻译：接收机允许用户在通过多个信道同时接收数据并且存储所选择的数据时，根据各种因素在解扩后选择接收数据或解扩后的符号数据，降低存储存储器的容量，并且增强解扩处理时间的自由度。将接收的数据存储在存储存储器中，不是以解扩展之后产生的符号数据的形式，而是在解扩之前以接收数据的形式存储。这降低了存储存储器的容量并增加了解扩过程的定时自由度。

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