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41. 发明授权

US08890095B2 Reliability in a maskless lithography system 有权
标题翻译：无掩模光刻系统的可靠性
公开(公告)号：US08890095B2
公开(公告)日：2014-11-18
申请号：US11492572
申请日：2006-07-24
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit , Marco Jan-Jaco Wieland
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit , Marco Jan-Jaco Wieland
IPC分类号： H01J37/15 , G03F7/20 , B82Y40/00 , H01J37/317 , B82Y10/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70425 , H01J2237/31757
摘要： A maskless lithography system for transferring a pattern onto a surface of a target. At least one beamlet optical unit generates a plurality of beamlets. At least one measuring unit measures properties of each beamlet. At least one control unit generates and delivers pattern data to the beamlet optical unit. The control unit is operationally coupled to the measuring unit for identifying invalid beamlets which have a measured property value outside a predefined range of values for the property. At least one actuator induces a shift of the beamlet optical unit and the target with respect to one another. The actuator is operationally coupled with the control unit. The control unit determines the shift, positioning valid beamlets at the position of the invalid beamlets, thus replacing the invalid beamlets with valid beamlets.
摘要翻译：一种用于将图案转印到目标表面上的无掩模光刻系统。至少一个子束光学单元产生多个子束。至少一个测量单元测量每个子束的性质。至少一个控制单元生成并将模式数据传送到子束光学单元。控制单元可操作地耦合到测量单元，用于识别具有超出该属性的预定义值范围的测量属性值的无效子束。至少一个致动器引起子束光学单元和目标相对于彼此的偏移。致动器可操作地与控制单元耦合。控制单元确定移位，在无效子束的位置定位有效子束，从而用有效的子束替换无效子束。

42. 再颁专利

USRE44908E1 Electron beam exposure system 有权
标题翻译：电子束曝光系统
公开(公告)号：USRE44908E1
公开(公告)日：2014-05-27
申请号：US13343036
申请日：2012-01-04
申请人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
发明人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
IPC分类号： H01J37/30 , H01J37/304 , H01J37/06
CPC分类号： H01J3/02 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/0435 , H01J2237/06308 , H01J2237/06375 , H01J2237/3045
摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.
摘要翻译：本发明涉及一种用于将图案转印到目标表面上的电子束曝光装置，包括：用于产生多个电子束的小波发生器; 用于接收所述多个电子子束的调制阵列，包括用于调制电子束的强度的多个调制器; 连接到用于单独控制调制器的调制阵列的控制器，可操作地连接到每个调制器的调节器，用于单独调整每个调制器的控制信号; 一种聚焦电子光学系统，包括静电透镜阵列，其中每个透镜将由所述调制阵列传输的相应单独的子束聚焦成小于300nm的横截面，以及用于将其曝光表面保持在其上的靶保持器其图案将在聚焦电子光学系统的第一焦平面中转印。

43. 发明申请

US20120305798A1 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 有权
标题翻译：充电颗粒多波束装置
公开(公告)号：US20120305798A1
公开(公告)日：2012-12-06
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K5/04 , H01J3/26 , H01J3/18 , H01J3/14
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
摘要翻译：本发明涉及一种用于在带电粒子多子束装置中操纵多个带电粒子束的一个或多个带电粒子束的方法和装置。所述操纵器装置包括平面基板，所述平面基板包括在所述基板的平面中的通孔的阵列，这些通孔中的每一个布置成使所述至少一个带电粒子束通过，其中每个所述通孔具有一个或布置在通孔周围的更多电极和用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置用于通过开口提供每个个体的一个或多个电极，最小的模拟可调电压。

44. 发明授权

US08294117B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08294117B2
公开(公告)日：2012-10-23
申请号：US12885380
申请日：2010-09-17
申请人： Pieter Kruit , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Aernout Christiaan Zonnevylle
IPC分类号： G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet center line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet center line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜从其小透镜光轴。

45. 发明授权

US08263942B2 System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission 有权
标题翻译：用于多光束光刻的系统，方法和装置，包括用于均匀电子发射的分配器阴极
公开(公告)号：US08263942B2
公开(公告)日：2012-09-11
申请号：US13082333
申请日：2011-04-07
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
IPC分类号： H01J19/14 , H01J1/20 , H01J1/14
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
摘要翻译：分配器阴极，其包括排放表面，用于材料释放的储存器，当被加热时，功能降低颗粒和至少一个通道，用于允许功能降低颗粒从所述储存器扩散到所述发射表面，所述发射表面包括至少一个发射区域和至少一个覆盖有发射抑制材料并且围绕每个发射区域的非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道，并在从放射区域的扩散长度距离，用于允许功能降低颗粒从所述储存器扩散到所述发射区域。

46. 发明授权

US08153991B2 Direct write lithography system 有权
标题翻译：直写光刻系统
公开(公告)号：US08153991B2
公开(公告)日：2012-04-10
申请号：US11149893
申请日：2005-06-10
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： H01J3/14
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70375 , H01J37/3174 , H01J37/3177 , H01J2237/31774 , H01J2237/31777 , H01J2237/31779 , Y10S438/942 , Y10S438/949 , Y10T428/24802
摘要： A direct write lithography system. The system includes a converter having an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each filed emitter having an activation area. A plurality of individually controllable light sources, each light source arranged for activating one field emitter. A controller controls each light source individually. Each electron beam is focused from the field emitters with a diameter smaller than the diameter of a light source on an object plane.
摘要翻译：直写光刻系统。该系统包括具有光可控电子源阵列的转换器，每个场发射器布置成用于将光转换成电子束，场发射器在每两个相邻的场发射器之间具有元件距离，每个场发射器具有激活区域。多个可单独控制的光源，每个光源被布置用于激活一个场发射器。控制器分别控制每个光源。每个电子束从场发射器聚焦，其直径小于物平面上光源的直径。

47. 发明申请

US20100045958A1 LITHOGRAPHY SYSTEM 有权
标题翻译： LITHOGRAPHY系统
公开(公告)号：US20100045958A1
公开(公告)日：2010-02-25
申请号：US12611847
申请日：2009-11-03
申请人： Jan-Jaco Marco Wieland , Johannes Christiaan van 't Spijker , Remco Jager , Pieter Kruit
发明人： Jan-Jaco Marco Wieland , Johannes Christiaan van 't Spijker , Remco Jager , Pieter Kruit
IPC分类号： G03B27/72
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译：一种用于将图案转印到目标表面上的无掩模光刻系统。用于产生多个子束的至少一个光束发生器。多个调制器调制小波束的幅度，并且控制单元控制调制器。控制单元生成并将模式数据传送到调制器，以控制每个单独子束的幅度。控制单元包括用于存储图案数据的至少一个数据存储器，用于从数据存储器读出数据的至少一个读出单元，至少一个数据转换器，用于将从数据存储器读出的数据转换为至少一个调制光束，以及至少一个光发射器，用于将至少一个调制光束传输到调制调制器。

48. 发明授权

US07612866B2 Lithography system 有权
标题翻译：光刻系统
公开(公告)号：US07612866B2
公开(公告)日：2009-11-03
申请号：US11982119
申请日：2007-11-01
申请人： Jan-Jaco Marco Wieland , Johannes Christiaan van't Spijker , Remco Jager , Pieter Kruit
发明人： Jan-Jaco Marco Wieland , Johannes Christiaan van't Spijker , Remco Jager , Pieter Kruit
IPC分类号： G03B27/54
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译：一种用于将图案转印到目标表面上的无掩模光刻系统。用于产生多个子束的至少一个光束发生器。多个调制器调制小波束的幅度，并且控制单元控制调制器。控制单元生成并将模式数据传送到调制器，以控制每个单独子束的幅度。控制单元包括用于存储图案数据的至少一个数据存储器，用于从数据存储器读出数据的至少一个读出单元，至少一个数据转换器，用于将从数据存储器读出的数据转换为至少一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。

49. 发明申请

US20090027649A1 Lithography system, method of clamping and wafer table 有权
标题翻译：平版印刷系统，夹紧方法和晶圆台
公开(公告)号：US20090027649A1
公开(公告)日：2009-01-29
申请号：US12218080
申请日：2008-07-11
申请人： Guido De Boer , Michel Pieter Dansberg , Pieter Kruit
发明人： Guido De Boer , Michel Pieter Dansberg , Pieter Kruit
IPC分类号： G03B27/60
CPC分类号： G03F7/70691 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要： The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.
摘要翻译：本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是用于将所述目标夹持在所述台上。所述夹紧装置包括固定液体层（3），其包括在目标台和目标台之间的这样的厚度上，其设置有液体（C）的材料和目标（1）的相应的接触面（A，B）和目标表（2），出现压降（PCap）。

50. 发明申请

US20080170668A1 MICRO X-RAY SOURCE 审中-公开
标题翻译：微型X射线源
公开(公告)号：US20080170668A1
公开(公告)日：2008-07-17
申请号：US11851729
申请日：2007-09-07
申请人： Pieter Kruit , Cornelis Wouter Hagen , Elvira Hendrika Mulder
发明人： Pieter Kruit , Cornelis Wouter Hagen , Elvira Hendrika Mulder
IPC分类号： H01J35/12 , H01J9/18
CPC分类号： H01J35/14 , H01J35/116 , H01J35/18 , H01J35/186
摘要： A micro X-ray source comprising a target acting as anode, and a cathode, which during operation interacts with the target and functions as electron source, wherein the target is embodied as a metal foil possessing a spot where the electrons from the electron source arrive, and the metal foil being locally thinner at the spot.
摘要翻译：包括作为阳极的靶的微X射线源和在操作期间与靶相互作用并用作电子源的阴极，其中靶被实施为具有来自电子源的电子到达的点的金属箔并且金属箔在现场局部变薄。

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