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1. 发明授权

US11773905B2 Axial alignment assembly, and charged particle microscope comprising such an alignment assembly 有权
公开(公告)号：US11773905B2
公开(公告)日：2023-10-03
申请号：US17325946
申请日：2021-05-20
申请人： FEI Company
发明人： Pleun Dona , Casper Maria Smit
IPC分类号： F16C33/76 , H01J37/15
CPC分类号： F16C33/768 , F16C33/761 , H01J37/15 , H01J2237/1415
摘要： An axial alignment assembly (100) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.

2. 发明授权

US11764028B2 Charged particle beam device and axis adjustment method thereof 有权
公开(公告)号：US11764028B2
公开(公告)日：2023-09-19
申请号：US17056993
申请日：2018-05-22
申请人： Hitachi High-Tech Corporation
发明人： Yuta Imai , Masahiro Sasajima , Yoshihiro Takahoko
IPC分类号： H01J37/14 , H01J37/15 , H01J37/21 , H01J37/28 , H01J37/145 , H01J37/12 , H01J37/141
CPC分类号： H01J37/145 , H01J37/15 , H01J37/21 , H01J37/12 , H01J37/141 , H01J37/28
摘要： A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

3. 发明公开

US20230154724A1 POLE PIECE FOR A TRANSMISSION ELECTRON MICROSCOPE 审中-公开
公开(公告)号：US20230154724A1
公开(公告)日：2023-05-18
申请号：US17797684
申请日：2021-02-25
申请人： THE PROVOST, FELLOWS, SCHOLARS AND OTHER MEMBERS OF BOARD OF TRINITY COLLEGE DUBLIN
发明人： Lewys Jones , David O'Mahony
IPC分类号： H01J37/15
CPC分类号： H01J37/15 , H01J37/26
摘要： A pole piece for a transmission electron microscope, the pole piece comprising an upper pole piece, containing a first pathway for an electron beam, a lower pole piece which is coupled to the upper pole piece and which contains a second pathway operatively connected to the first pathway, the upper pole piece and lower pole piece being separated by a gap between the first pathway and the second pathway. The pole piece has a mechanism which can extend or reduce the distance between the upper pole piece and the lower pole piece by changing the distance between the first pathway and the second pathway.

4. 发明授权

US11430639B2 Plasma processing system 有权
公开(公告)号：US11430639B2
公开(公告)日：2022-08-30
申请号：US16679325
申请日：2019-11-11
申请人： XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
发明人： Woohyun Jeong
IPC分类号： H01L21/683 , H01J37/32 , H01J37/15
摘要： A plasma processing system is disclosed. The plasma processing system includes an electrostatic chuck (ESC) and an edge ring assembly surrounding the ESC. The edge ring assembly includes a coupling ring and temperature modifying elements disposed within the coupling ring.

5. 发明授权

US10916403B2 Ion beam apparatus including slit structure for extracting ion beam 有权
公开(公告)号：US10916403B2
公开(公告)日：2021-02-09
申请号：US16380012
申请日：2019-04-10
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Jongchul Park
IPC分类号： H01J37/147 , H01J37/317 , H01J37/305 , H01J37/08 , H01J37/04 , H01J37/15 , H01J37/32
摘要： An ion beam apparatus includes a source part generating plasma therein, a process part in which a process using an ion beam is performed, and a slit structure provided between the source part and the process part and extracting the ion beam from the plasma. The slit structure includes at least one electrode structure. The electrode structure has a slit penetrating the electrode structure and extending in a first direction. The ion beam is irradiated onto a substrate at an incident angle through the slit. The incident angle of the ion beam is adjusted by rotating the electrode structure on a rotation axis parallel to the first direction.

6. 发明申请

US20190006147A1 METHOD AND APPARATUS FOR INSPECTION 审中-公开
公开(公告)号：US20190006147A1
公开(公告)日：2019-01-03
申请号：US16064193
申请日：2016-12-09
申请人： ASML NETHERLANDS B.V.
发明人： Bernardo KASTRUP , Johannes Catharinus Hubertus MULKENS , Marinus Aart VAN DEN BRINK , Jozef Petrus Henricus BENSCHOP , Erwin Paul SMAKMAN , Tamara DRUZHININA , Coen Adrianus VERSCHUREN
IPC分类号： H01J37/26 , H01J37/28 , H01J37/15 , H01J37/244
摘要： An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

7. 发明授权

US09269536B2 Double ended electrode manipulator 有权
标题翻译：双端电极机械手
公开(公告)号：US09269536B2
公开(公告)日：2016-02-23
申请号：US13862058
申请日：2013-04-12
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Jon Ballou , Jeannot Morin , Manny Sieradzki , Joseph C. Olson
IPC分类号： H01J37/30 , H01J37/15
CPC分类号： H01J37/3007 , H01J37/15 , H01J2237/083 , H01J2237/1502 , H01J2237/31701
摘要： An electrode adjustment method and apparatus are disclosed for use in workpiece processing. The assembly may include an electrode assembly having first and second ends. First and second manipulators may be coupled to the first and second ends. The manipulators may be used to selectively impart movement to the first and second ends of the electrode assembly to adjust one or more properties of an ion beam passing through the electrodes. The first and second manipulators may be independently actuatable so that the first and second ends of the electrode can be adjusted independent of one another. Methods of using the disclosed apparatus are also disclosed.
摘要翻译：公开了用于工件加工的电极调节方法和装置。组件可以包括具有第一端和第二端的电极组件。第一和第二操纵器可以联接到第一和第二端。操纵器可以用于选择性地赋予电极组件的第一和第二端的运动以调节通过电极的离子束的一个或多个特性。第一和第二操纵器可以独立地致动，使得可以彼此独立地调节电极的第一和第二端。还公开了使用所公开的装置的方法。

8. 发明授权

US08466431B2 Techniques for improving extracted ion beam quality using high-transparency electrodes 有权
标题翻译：使用高透明电极提高离子束质量的技术
公开(公告)号：US08466431B2
公开(公告)日：2013-06-18
申请号：US12370555
申请日：2009-02-12
申请人： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
发明人： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
IPC分类号： H01J37/15 , G21K5/10
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/08 , H01J37/09 , H01J37/304 , H01J2237/0453 , H01J2237/0458 , H01J2237/083 , H01J2237/24542
摘要： Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.
摘要翻译：公开了使用高透明电极提高离子束质量的技术。在一个特定的示例性实施例中，技术可以被实现为用于离子注入的装置。该装置可以包括用于产生离子束的离子源，其中离子源包括具有离子束穿过其中的孔的面板。该装置还可以包括至少包括抑制电极和高透明度接地电极的一组提取电极，其中所述提取电极组可以经由面板从离子源提取离子束，并且其中高透明度接地电极可以被配置为优化抑制电极和高透明度接地电极之间的气体传导，以改善提取的离子束质量。

9. 发明授权

US5296713A Ion source device 失效
标题翻译：离子源装置
公开(公告)号：US5296713A
公开(公告)日：1994-03-22
申请号：US7786
申请日：1993-01-22
申请人： Hisato Tanaka
发明人： Hisato Tanaka
IPC分类号： H01J37/067 , H01J27/04 , H01J37/08 , H01J37/15 , H01J37/317 , H01L21/265 , H01J3/02
CPC分类号： H01J27/04 , H01J2237/31701
摘要： An ion source device includes an electron generating chamber detachably combined with an electron attraction electrode and an ion generating chamber through insulating members. Hooks are projected from both sides of the electron generating chamber. A holder plate is arranged under the ion generating chamber with an insulating member interposed between them. A fixing member is arranged under the holder plate. The fixing member includes a pusher supported by coned disc springs and this pusher of the fixing member is fitted into a recess on the underside of the holder plate and struck against the top of the recess. A pair of holder members are arranged along both sides of the device. The holder members are detachably engaged with the hooks of the electron generating chamber at the upper portion thereof and also detachably engaged with the fixing member at the lower portion thereof. The components ranging from the electron generating chamber to the holder plate are held and fixed between the hooks of the electron generating chamber and the pusher of the fixing member through the holder members.
摘要翻译：离子源装置包括通过绝缘构件与电子吸引电极和离子产生室可拆卸地组合的电子发生室。钩从电子发生室的两侧突出。在离子产生室下方设置有夹持板，其间插入绝缘构件。固定构件设置在保持板下方。固定构件包括由锥形盘弹簧支撑的推动器，并且固定构件的推动器装配到保持器板的下侧上的凹部中并撞击凹部的顶部。一对保持器构件沿着装置的两侧布置。保持器构件在其上部与电子发生室的钩可拆卸地接合，并且在其下部可拆卸地与固定构件接合。从电子发生室到保持板的组件通过保持件保持和固定在电子发生室的钩和固定构件的推动器之间。

10. 发明授权

US4827127A Apparatus using charged particle beam 失效
标题翻译：使用带电粒子束的装置
公开(公告)号：US4827127A
公开(公告)日：1989-05-02
申请号：US922715
申请日：1986-10-24
申请人： Hideo Todokoro
发明人： Hideo Todokoro
IPC分类号： H01J37/10 , H01J37/04 , H01J37/147 , H01J37/15 , H01J37/26 , H01J37/28
CPC分类号： H01J37/268 , H01J37/04 , H01J37/15 , G01R31/307
摘要： An apparatus using a charged particle beam is disclosed which includes means for generating charged particles, means for accelerating the charged particles so that the charged particles have desired kinetic energy, lens means including at least one objective lens for focusing a charged particle beam formed of the accelerated, charged particles, on the surface of a specimen, scanning means for scanning the surface of the specimen two-dimensionally with the focused beam, detection means for detecting secondary electrons, reflected electrons, X-rays and light, all of which emerge from the surface of the specimen, objective lens moving means for moving an objective lens nearest to the specimen, and deflection means linked with the objective lens moving means for deflecting the charged particle beam so that the charged particle beam carries out parallel displacement at the objective lens by an amount corresponding to the moving distance of the objective lens.
摘要翻译：公开了一种使用带电粒子束的装置，其包括用于产生带电粒子的装置，用于加速带电粒子以使带电粒子具有期望动能的装置，透镜装置包括至少一个物镜，用于聚焦由在样品表面上加速带电的颗粒，用聚焦光束二维扫描样品的扫描装置的扫描装置，用于检测二次电子，反射电子，X射线和光的检测装置，所有这些都从样本表面，用于移动最接近样本的物镜的物镜移动装置以及与物镜移动装置连接的偏转装置，用于偏转带电粒子束，使得带电粒子束在物镜处执行平行位移相当于物镜的移动距离的量。

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