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1. 发明授权

US08895921B2 Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus 有权
标题翻译：这种检查装置的真空室的检查装置和可更换门以及检查装置的操作方法
公开(公告)号：US08895921B2
公开(公告)日：2014-11-25
申请号：US13809685
申请日：2011-07-14
申请人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/26 , G01N21/62 , H01J37/22 , H01J37/256 , H01J37/28
CPC分类号： H01J37/22 , G01N21/62 , G01N2021/625 , H01J37/226 , H01J37/228 , H01J37/256 , H01J37/26 , H01J37/28 , H01J2237/204 , H01J2237/2445 , H01J2237/2482 , H01J2237/2808
摘要： An inspection apparatus is provided comprising in combination at least an optical microscope (2, 3, 4) and an ion- or electron microscope (7, 8) equipped with a source (7) for emitting a primary beam (9) of radiation to a sample (10) in a sample holder. The apparatus may comprise a detector (8) for detection of secondary radiation (11) backscattered from the sample and induced by the primary beam. The optical microscope is equipped with an light collecting device (2) to receive in use luminescence light (12) emitted by the sample and to focus it on a photon-detector (4).
摘要翻译：提供一种检查装置，其至少包括光学显微镜（2,3,4）和配备有用于发射辐射的主光束（9）的源（7）的离子或电子显微镜（7,8）的组合，在样品架中的样品（10）。该装置可包括检测器（8），用于检测从样品反向散射并由主光束引发的次级辐射（11）。光学显微镜配备有光收集装置（2），以使用由样品发射的发光（12）接收并将其聚焦在光子检测器（4）上。

2. 发明申请

US20110068276A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110068276A1
公开(公告)日：2011-03-24
申请号：US12885380
申请日：2010-09-17
申请人： Pieter Kruit , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Aernout Christiaan Zonnevylle
IPC分类号： G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜从其小透镜光轴。

3. 发明授权

US09715992B2 Integrated optical and charged particle inspection apparatus 有权
公开(公告)号：US09715992B2
公开(公告)日：2017-07-25
申请号：US14390095
申请日：2013-04-02
申请人： DELMIC B.V. , Jacob Pieter Hoogenboom , Pieter Kruit , Nalan M. SC Liv , Aernout Christiaan Zonnevylle
发明人： Jacob Pieter Hoogenboom , Pieter Kruit , Nalan Liv , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/22 , G01C21/32 , H01J37/28 , G01C21/34
CPC分类号： H01J37/222 , G01C21/32 , G01C21/3484 , H01J37/22 , H01J37/226 , H01J37/228 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2806
摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.

4. 发明授权

US09607806B2 Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams 有权
公开(公告)号：US09607806B2
公开(公告)日：2017-03-28
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K1/08 , H01J37/30 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

5. 发明申请

US20130200262A1 INSPECTION APPARATUS AND REPLACEABLE DOOR FOR A VACUUM CHAMBER OF SUCH AN INSPECTION APPARATUS AND A METHOD FOR OPERATING AN INSPECTION APPARATUS 有权
标题翻译：这种检查装置的真空室的检查装置和可更换的门以及操作检查装置的方法
公开(公告)号：US20130200262A1
公开(公告)日：2013-08-08
申请号：US13809685
申请日：2011-07-14
申请人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/22 , H01J37/26 , G01N21/62
CPC分类号： H01J37/22 , G01N21/62 , G01N2021/625 , H01J37/226 , H01J37/228 , H01J37/256 , H01J37/26 , H01J37/28 , H01J2237/204 , H01J2237/2445 , H01J2237/2482 , H01J2237/2808
摘要： An inspection apparatus is provided comprising in combination at least an optical microscope (2, 3, 4) and an ion- or electron microscope (7, 8) equipped with a source (7) for emitting a primary beam (9) of radiation to a sample (10) in a sample holder. The apparatus may comprise a detector (8) for detection of secondary radiation (11) backscattered from the sample and induced by the primary beam. The optical microscope is equipped with an light collecting device (2) to receive in use luminescence light (12) emitted by the sample and to focus it on a photon-detector (4).
摘要翻译：提供一种检查装置，其至少包括光学显微镜（2,3,4）和配备有用于发射辐射的主光束（9）的源（7）的离子或电子显微镜（7,8）的组合，在样品架中的样品（10）。该装置可包括检测器（8），用于检测从样品反向散射并由主光束引发的次级辐射（11）。光学显微镜配备有光收集装置（2），以使用由样品发射的发光（12）接收并将其聚焦在光子检测器（4）上。

6. 发明申请

US20120305798A1 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 有权
标题翻译：充电颗粒多波束装置
公开(公告)号：US20120305798A1
公开(公告)日：2012-12-06
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K5/04 , H01J3/26 , H01J3/18 , H01J3/14
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
摘要翻译：本发明涉及一种用于在带电粒子多子束装置中操纵多个带电粒子束的一个或多个带电粒子束的方法和装置。所述操纵器装置包括平面基板，所述平面基板包括在所述基板的平面中的通孔的阵列，这些通孔中的每一个布置成使所述至少一个带电粒子束通过，其中每个所述通孔具有一个或布置在通孔周围的更多电极和用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置用于通过开口提供每个个体的一个或多个电极，最小的模拟可调电压。

7. 发明授权

US08294117B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08294117B2
公开(公告)日：2012-10-23
申请号：US12885380
申请日：2010-09-17
申请人： Pieter Kruit , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Aernout Christiaan Zonnevylle
IPC分类号： G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet center line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet center line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜从其小透镜光轴。

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