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21. 发明授权

US6139191A Half bearing 失效
标题翻译：半轴承
公开(公告)号：US6139191A
公开(公告)日：2000-10-31
申请号：US322464
申请日：1999-05-28
申请人： Gerd Andler , Jens-Peter Heinss , Klaus Goedicke , Christoph Metzner
发明人： Gerd Andler , Jens-Peter Heinss , Klaus Goedicke , Christoph Metzner
IPC分类号： F16C33/12 , C22C13/00 , C22C21/00 , C23C14/06 , C23C14/16 , C23C14/30 , F16C17/02 , F16C33/02 , F16C33/06 , F16C33/10 , F16C33/14
CPC分类号： C23C14/30 , C23C14/06 , F16C17/02 , F16C33/121 , F16C33/124 , F16C33/14 , Y10S384/912
摘要： A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapor deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterized in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.
摘要翻译：半轴承具有背衬构件和至少一个金属覆盖层，其通过电子束气相沉积施加，并且其包含至少一种精细分散的基体材料中的组分，该组分的原子量大于基体材料的原子量，其中所述细分散组分（7）的浓度从所述半轴承（1）的顶点区域（8）朝向所述部分表面的区域（9）连续地减小。该方法的特征在于，在涂覆过程中，在轴承壳体的顶点区域中设置0.1至5Pa的惰性气体压力。

22. 发明授权

US6083356A Method and device for pre-treatment of substrates 失效
标题翻译：用于预处理底物的方法和装置
公开(公告)号：US6083356A
公开(公告)日：2000-07-04
申请号：US91099
申请日：1998-09-14
申请人： Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
发明人： Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
IPC分类号： C23C14/02 , H01J37/32 , B01J19/08
CPC分类号： H01J37/32018 , C23C14/022 , H01J37/34 , H01J2237/3322
摘要： Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.
摘要翻译： PCT No.PCT / EP96 / 05032 Sec。 371日期：1998年9月14日 102（e）1998年9月14日PCT PCT 1996年11月15日PCT公布。公开号WO97 / 22988 PCT 日期1997年6月26日用于在真空中通过辉光放电在真空中预处理衬底表面以用于在真空中进行随后的涂覆过程的工艺和设备。该方法包括保持待预处理的基板和反电极之间的低压辉光放电，其中反电极由真空涂覆工艺中要沉积的涂层的至少一部分组成。该方法还包括周期性地交替使衬底的极性作为阴极或作为低压辉光放电的阳极，以及分别控制两极性的脉冲长度和放电电压中的至少一个。极性的交替频率设定在1Hz〜1000kHz的范围内。该装置包括可抽空的真空室，定位成保持待预处理的基板的基板保持器，至少一个对电极和耦合到待预处理的基板的交流电压发生器，电极。基板和对电极以无电势的方式安装。

23. 发明授权

US06005218A Process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas 失效
标题翻译：将双极脉冲形式的能量馈入低压等离子体的过程和电路
公开(公告)号：US06005218A
公开(公告)日：1999-12-21
申请号：US836030
申请日：1997-08-11
申请人： Hendrik Walde , Jonathan Reschke , Klaus Goedicke , Torsten Winkler , Volker Kirchhoff , Peter Frach
发明人： Hendrik Walde , Jonathan Reschke , Klaus Goedicke , Torsten Winkler , Volker Kirchhoff , Peter Frach
IPC分类号： H01J37/32 , H05H1/46 , B23K10/00
CPC分类号： H01J37/32018 , H01J37/32027 , H01J37/32064 , H05H1/46
摘要： A process and circuit for the bipolar pulse-shaped feeding of energy into low-pressure plasmas is provided. Within an average time period, a power which is to be as high as possible is to be fed into the low pressure discharge. In each polarization, the same power is to be fed although the impedance differs considerably. In a system for plasma and surface treatment techniques having at least two electrodes and one power supply, the outputs of at least two potential-free direct current supplies are switched such that an output of one direct current supply is conductively connected with an output of the same polarity of the other direct current supply. By means of a switch which is connected with each feed line to the electrodes and whose other outputs are led in a combined manner to the other outputs of the direct current source, these switches are operated via a timing generator in synchronism with the pole changing frequency. The switches are opened up in the event of the occurrence of an arcing. The process is used for the bipolar pulse sputtering for depositing electrically insulating layers on workpieces. Preferably, such layers are used for a mechanical protection, protection against wear and the improvement of sliding characteristics.
摘要翻译： PCT No.PCT / DE95 / 01473 Sec。 371日期1997年8月11日 102（e）日期1997年8月11日PCT 1995年10月19日PCT PCT。 WO96 / 13964 PCT出版物日期：1996年5月9日提供了将能量双极脉冲馈入低压等离子体的工艺和电路。在平均时间段内，要将尽可能高的功率送入低压放电。在每个极化中，尽管阻抗明显不同，但仍要输入相同的功率。在具有至少两个电极和一个电源的等离子体和表面处理技术的系统中，切换至少两个无电势直流电源的输出，使得一个直流电源的输出与相同极性的另一个直流电源。通过与每个馈电线连接到电极并且其另外的输出以直流电源的其他输出的方式被引导的开关，这些开关通过与极点变化频率同步的定时发生器来操作。发生电弧时，开关被打开。该工艺用于双极脉冲溅射，用于在工件上沉积电绝缘层。优选地，这些层用于机械保护，防止磨损和改善滑动特性。

24. 发明授权

US5846608A Process for ion-supported vacuum coating 失效
标题翻译：离子支持真空镀膜工艺
公开(公告)号：US5846608A
公开(公告)日：1998-12-08
申请号：US722024
申请日：1996-10-11
申请人： Manfred Neumann , Klaus Goedicke , Siegfried Schiller , Jonathan Reschke , Henry Morgner , Falk Milde , Fred Fietzke
发明人： Manfred Neumann , Klaus Goedicke , Siegfried Schiller , Jonathan Reschke , Henry Morgner , Falk Milde , Fred Fietzke
IPC分类号： H05H1/32 , C23C14/32 , C23C14/56 , H01J37/32 , H05H1/46 , C23C14/08
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/562 , H01J37/32706
摘要： A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.
摘要翻译： PCT No.PCT / DE95 / 00476 Sec。 371日期：1996年10月11日 102（e）日期1996年10月11日PCT提交1995年4月7日PCT公布。公开号WO95 / 28508 日期：1995年10月26日一种用于离子支持真空涂层的装置。该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面，导电和电绝缘基板的高速涂布。基底主要是带状，特别是宽度超过一米的塑料片。根据本发明，在本来已知的用于真空涂覆的装置中，将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底，直接设置在其后面的电极，例如，冷却辊相对于等离子体或几乎处于等离子体电位的电极。脉冲的形式，电压和持续时间适用于涂层任务和材料。该方法特别用于沉积磨损保护，防腐蚀和阻隔涂层。用户是包装行业等。

25. 发明授权

US5780803A Process for the stabilization of plasma generation by means of electron beam vaporizer 失效
标题翻译：通过电子束蒸发器稳定等离子体产生的方法
公开(公告)号：US5780803A
公开(公告)日：1998-07-14
申请号：US821030
申请日：1997-03-20
申请人： Klaus Goedicke , Volker Kirchhoff , Christoph Metzner , Bert Scheffel
发明人： Klaus Goedicke , Volker Kirchhoff , Christoph Metzner , Bert Scheffel
IPC分类号： C23C14/32 , H01J37/304 , H01J37/305 , B23K10/00 , B23K15/00
CPC分类号： H01J37/304 , C23C14/32 , H01J37/3053
摘要： The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.
摘要翻译：本发明涉及通过电子束蒸发器来稳定大衬底表面涂层中的等离子体产生的方法。为了以高蒸发速率和蒸气云的稳定等离子体激发而不使用附加电极获得设备的稳定操作，根据本发明，电子束蒸发器的蒸发速率最初设定得高至至少10％电子束功率被蒸汽吸收在蒸发室中，并测量所得等离子体的光发射。然后控制电子枪的操作参数或工艺参数，使得光发射，因此能量吸收保持恒定。

26. 发明授权

US06522076B2 Process and switching arrangement for pulsing energy introduction into magnetron discharges 失效
标题翻译：脉冲能量引入磁控管放电的过程和开关布置
公开(公告)号：US06522076B2
公开(公告)日：2003-02-18
申请号：US09817346
申请日：2001-03-27
申请人： Klaus Goedicke , Torsten Winkler , Michael Jungh{overscore (a)}hnel , Karsten Handt , Henry Güldner , Henrik Wolf , Frank Eckholz
发明人： Klaus Goedicke , Torsten Winkler , Michael Jungh{overscore (a)}hnel , Karsten Handt , Henry Güldner , Henrik Wolf , Frank Eckholz
IPC分类号： H05B3126
CPC分类号： H01J37/3444 , H01J37/3405 , H05H1/46
摘要： Process and control arrangement for introducing pulsing energy introduction into magnetron discharges. The process includes feeding a charge to the electrodes of a magnetron arrangement via a ignition source at a time t0, and, after the feeding of the electric charge, determining an ignition of the magnetron discharge. The process also includes introducing a current, having a predetermined value, from a boost source at a time t1, and, at a time t2, separating the ignition source from the electrodes of the magnetron arrangement. The introduction of the current by the boost source continues for a certain duration tEIN. The process also includes interrupting the introduction of the electric energy for a predetermined time tAUS.
摘要翻译：将脉冲能量引入磁控管放电的过程和控制布置。该过程包括在时间t0经由点火源将电荷馈送到磁控管装置的电极，并且在馈送电荷之后，确定磁控管放电的点火。该过程还包括在时间t1从升压源引入具有预定值的电流，并且在时间t2将点火源与磁控管装置的电极分开。升压源引入的电流持续一段时间tEIN。该过程还包括中断电能在预定时间tAUS的引入。

27. 发明授权

US06436248B1 Thin film disk with barrier layer 失效
标题翻译：具有阻隔层的薄膜盘
公开(公告)号：US06436248B1
公开(公告)日：2002-08-20
申请号：US09434590
申请日：1999-11-05
申请人： Heinz Baur , Ralf Bluethner , Hans Buchberger , Klaus Goedicke , Michael Junghaehnel , Karl-Heinz Lehnert , Manfred Mueller , Hans-Herrman Schneider , Torsten Winkler
发明人： Heinz Baur , Ralf Bluethner , Hans Buchberger , Klaus Goedicke , Michael Junghaehnel , Karl-Heinz Lehnert , Manfred Mueller , Hans-Herrman Schneider , Torsten Winkler
IPC分类号： C23C1434
CPC分类号： G11B5/7325 , C23C14/165 , C23C14/34
摘要： A method of coating of thin film coated magnetic disks and thin film magnetic disks made thereby is described. In accordance with the invention, a barrier layer is deposited on the substrate before the underlayer film(s) to increase the corrosion resistance of metallic substrate magnetic disks and, in the case of nonmetallic substrates, to reduce the diffusion of water to the substrate and of freely moveable ions from the substrate. Preferably the barrier layer is deposited by medium frequency pulsed sputtering at a frequency of 10 to 200 kHz and a pulse length to pulse pause ratio from 5:1 to 1:10. Aluminum or chromium are the preferred materials for the barrier layer. Additional improvements may be achieved where the sputtering process gas contains a proportion of oxygen and/or nitrogen.
摘要翻译：描述了由此制成的薄膜涂覆磁盘和薄膜磁盘的涂覆方法。根据本发明，在下层膜之前在衬底上沉积阻挡层以提高金属基底磁盘的耐腐蚀性，并且在非金属基底的情况下，减少水向衬底的扩散，可自由移动的离子。优选地，阻挡层通过中频脉冲溅射以10至200kHz的频率和脉冲长度与脉冲间隔比从5:1沉积到1:10。铝或铬是阻挡层的优选材料。当溅射工艺气体含有一部分氧和/或氮时，可以实现另外的改进。

28. 发明授权

US06340416B1 Process and system for operating magnetron discharges 有权
标题翻译：用于操作磁控管放电的过程和系统
公开(公告)号：US06340416B1
公开(公告)日：2002-01-22
申请号：US09341998
申请日：1999-07-22
申请人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
发明人： Klaus Goedicke , Torsten Winkler , Michael Junghähnel , Fred Fietzke , Volker Kirchhoff , Jonathan Reschke
IPC分类号： C23C1434
CPC分类号： H01J37/34
摘要： Magnetron discharges are pulse-operated to avoid the so-called “arcing”. In the case of magnetron discharges from alternating current-fed magnetrons, the process is limited to the minor power of the energy supply because of the load-carrying capacity of the required electric components. When the magnetron discharges are fed by direct current, their effectiveness deteriorates because of the deposition of layers on the anode surfaces. The new process should enable a high supply power and prevent arcing. In magnetron discharges with at least two magnetron electrodes, the energy is supplied in such a way that at least one magnetron electrode is a cathode or anode and a number n1 of direct current pulses of said polarity is supplied. The poles of at least one magnetron electrode are then reversed and a number n2 of direct currents of this polarity are supplied. The process is carried on in this manner, the frequency of the direct current pulses being higher than that of the polarity reversals. The energy supply effectiveness is thus improved. This process and system enable the production of layers having the most different properties, for example for the glass, packaging, electronic, and machine construction industries.
摘要翻译：磁控管放电是脉冲操作的，以避免所谓的“电弧”。在由交流馈电磁控管放电的磁控管的情况下，由于所需的电气部件的承载能力，该过程被限制在能量供应的次要功率。当磁控管放电由直流供电时，由于层在阳极表面上的沉积，它们的有效性降低。新的过程应该能够实现高供电和防止电弧。在具有至少两个磁控管电极的磁控管放电中，以至少一个磁控管电极为阴极或阳极并且提供所述极性的直流电脉冲数n1的方式提供能量。然后至少一个磁控管电极的极被反转，并且提供这个极性的直流电的数量n2。以这种方式进行该过程，直流脉冲的频率高于极性反转的频率。从而提高能源供应效率。该方法和系统能够生产具有最不同性质的层，例如用于玻璃，包装，电子和机械制造业。

29. 发明授权

US06210726B1 PVD Al2O3 coated cutting tool 有权
标题翻译： PVD Al2O3涂层切割工具
公开(公告)号：US06210726B1
公开(公告)日：2001-04-03
申请号：US09187006
申请日：1998-11-06
申请人： Siegfried Schiller , Klaus Goedicke , Fred Fietzke , Olaf Zywitzki , Mats Sjöstrand , Björn Ljungberg , Tomas Hilding , Viveka Alfredsson
发明人： Siegfried Schiller , Klaus Goedicke , Fred Fietzke , Olaf Zywitzki , Mats Sjöstrand , Björn Ljungberg , Tomas Hilding , Viveka Alfredsson
IPC分类号： B32B702
CPC分类号： C23C14/081 , C23C14/352 , Y10T407/27 , Y10T428/24975 , Y10T428/25 , Y10T428/252 , Y10T428/265
摘要： The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of a refractory compound of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grain size of less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C., preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;-angles 45.8 and 66.8 degrees when using Cu&kgr;&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [(440)]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.
摘要翻译：本发明描述了一种用于金属加工的涂层切割工具。该涂层由一层或多层难熔化合物形成，其中至少一层细粒结晶的γ相氧化铝Al 2 O 3具有小于0.1μm的粒度。在二氧化硅脉冲DMS技术（双重磁控管溅射）中，在450℃至700℃，优选550℃至650℃的范围内的衬底温度下沉积Al 2 O 3层，具体取决于待涂层的工具体。通过X射线衍射鉴定γ相氧化铝。当使用Cukappaalpha辐射时，在2θ角45.8°和66.8°处发生的（400）和（440）平面的反射识别γ相Al 2 O 3。氧化铝层在[（440）]方向上也非常强烈地纹理化。 Al2O3层实际上没有裂纹和卤素杂质。此外，Al2O3层使刀具的切削刃具有非常光滑的表面光洁度。

30. 发明授权

US6146019A Plain bearing 失效
标题翻译：平面轴承
公开(公告)号：US6146019A
公开(公告)日：2000-11-14
申请号：US322584
申请日：1999-05-28
申请人： Gerd Andler , Jens-Peter Heinss , Klaus Goedicke , Christoph Metzner
发明人： Gerd Andler , Jens-Peter Heinss , Klaus Goedicke , Christoph Metzner
IPC分类号： F16C33/06 , C23C14/16 , C23C14/30 , C23C14/54 , F16C33/02 , F16C33/12 , F16C33/14
CPC分类号： F16C33/12 , C23C14/16 , C23C14/30 , C23C14/541 , F16C33/122 , F16C33/14 , F16C2204/20 , Y10S384/912 , Y10T29/49647 , Y10T29/49705
摘要： A plain bearing is described, the overlay (3) of which exhibits properties which are markedly improved with regard to wear resistance in comparison with overlays applied by electroplating and conventional electron beam vapor deposition methods. The surface of the overlay (3) comprises round raised portions (4) and depressed portions (6), wherein, in relation to the horizontal section plane (7), the raised portions (4) cover a proportion of the surface area amounting to 30% to 50%, based on the entire surface area of the plain bearing, the section plane (7) being at a height at which the total proportion of the surface area consisting of the raised portions (4), and obtained in vertical section, is equal to the total corresponding proportion consisting of the depressed portions (6). The round raised portions exhibit a diameter D of 3 to 8 .mu.m, in plan view, wherein, in the case of raised portions (4) and depressed portions (6) which in plan view are not circular, this value relates to the maximum diameter. The surface exhibits a roughness of R.sub.z =3 to 7 .mu.m. The method of producing such plain bearings is based on electron beam vapour deposition, wherein a backing member with a roughness of R.sub.z .ltoreq.2 .mu.m is used and vapor deposition of the overlay is effected at a pressure
摘要翻译：描述了滑动轴承，其覆盖层（3）与通过电镀和常规电子束气相沉积方法施加的覆盖层相比具有显着改善的耐磨性性能。覆盖层（3）的表面包括圆形凸起部分（4）和凹陷部分（6），其中相对于水平截面（7），凸起部分（4）覆盖一定比例的表面积 30％至50％，基于滑动轴承的整个表面积，截面（7）处于由凸起部分（4）组成的表面积的总比例并且在垂直截面中获得的高度等于由凹陷部分（6）组成的总相应比例。圆形隆起部分在平面图中呈现出3至8μm的直径D，其中在俯视图中不是圆形的凸起部分（4）和凹陷部分（6）的情况下，该值与最大值直径。表面粗糙度Rz = 3〜7μm。制造这种滑动轴承的方法是基于电子束气相沉积，其中使用Rz≤2μm的粗糙度的背衬构件，并且在压力<0.1Pa下进行覆盖层的气相沉积。

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