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91. 发明申请

US20050158670A1 Apparatus for processing substrate and method of processing the same 失效
公开(公告)号：US20050158670A1
公开(公告)日：2005-07-21
申请号：US11030135
申请日：2005-01-07
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： B05C5/02 , B05C9/14 , B05C11/08 , B05D1/40 , B05D3/02 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/38 , H01L21/00 , H01L21/027 , G03F7/00
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

92. 发明申请

US20050118536A1 Apparatus for processing substrate and method of processing the same 失效
公开(公告)号：US20050118536A1
公开(公告)日：2005-06-02
申请号：US11030064
申请日：2005-01-07
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： B05C5/02 , B05C9/14 , B05C11/08 , B05D1/40 , B05D3/02 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/38 , H01L21/00 , H01L21/027 , G03F7/40
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

93. 发明授权

US06881058B2 Apparatus for processing substrate and method of processing the same 失效
标题翻译：基板处理装置及其处理方法
公开(公告)号：US06881058B2
公开(公告)日：2005-04-19
申请号：US10026419
申请日：2001-12-26
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： B05C5/02 , B05C9/14 , B05C11/08 , B05D1/40 , B05D3/02 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/38 , H01L21/00 , H01L21/027 , F27D7/06
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.
摘要翻译：用涂膜处理的基板的加热装置具有内部空间的室，在内部空间中加热被处理基板的加热板和分隔构件。加热板具有支撑表面，该支撑表面支撑在腔室内待处理的基底。分隔构件布置在腔室中以面向支撑表面。分隔构件将内部空间分隔成第一和第二空间，并且具有允许第一和第二空间彼此连通的多个孔。加热板的支撑表面设置在第一空间中。形成空气流的气流形成机构设置在第二空间中。该机理将从光致抗蚀剂膜蒸发的物质排出。

94. 发明授权

US06831258B2 Heating device, method for evaluating heating device and pattern forming method 失效
标题翻译：加热装置，加热装置的评价方法和图案形成方法
公开(公告)号：US06831258B2
公开(公告)日：2004-12-14
申请号：US10611345
申请日：2003-06-30
申请人： Kei Hayasaki , Shinichi Ito , Kenji Kawano
发明人： Kei Hayasaki , Shinichi Ito , Kenji Kawano
IPC分类号： H05B102
CPC分类号： H01L21/67115 , G03F7/168 , G03F7/38
摘要： A heating apparatus for performing heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to detect intensity of reflected light from the resist on the wafer, and a control section for controlling heating performed by the heating plate on the basis of the detected intensity of reflected light so that heating amount applied to a plurality of wafers becomes constant. Accordingly, the heating amount of the wafer can be controlled to be constant and variations in dimension of resist patterns can be reduced.
摘要翻译：用于在曝光前后施加抗蚀剂的晶片上进行热处理的加热装置包括用于加热放置在加热板上的晶片的加热板，用于在晶片上照射光以检测反射的强度的光强度检测装置来自晶片上的抗蚀剂的光，以及控制部分，用于根据检测到的反射光强度控制由加热板进行的加热，使得施加到多个晶片的加热量变得恒定。因此，可以将晶片的加热量控制为恒定，并且可以减小抗蚀剂图案的尺寸变化。

95. 发明授权

US06337772B2 Optical element, optical system using optical element, and optical device with optical element 失效
标题翻译：光学元件，使用光学元件的光学系统和具有光学元件的光学装置
公开(公告)号：US06337772B2
公开(公告)日：2002-01-08
申请号：US09792242
申请日：2001-02-23
申请人： Tsukasa Uehara , Makoto Sekita , Kenji Kawano , Seiji Iida
发明人： Tsukasa Uehara , Makoto Sekita , Kenji Kawano , Seiji Iida
IPC分类号： G02B2714
CPC分类号： G02B17/086 , G02B17/0848 , G02B17/0896
摘要： In an optical element (B1) prepared by integrally forming, on surfaces of a transparent member, a refracting surface (R2) for receiving a light beam, a plurality of reflecting surfaces (R3, R4, R5) with curvatures, and a refracting surface (R6) for outputting the light beam reflected by the plurality of reflecting surfaces, a reference portion (7) for defining the position of the optical element in a predetermined direction with respect to a Y′-Z′ plane including an incident reference axis (5) and an exit reference axis (5) of at least one reflecting surface of the optical element (B1) is formed on the optical element.
摘要翻译：在通过在透明构件的表面上一体地形成用于接收光束的折射表面（R2），具有曲率的多个反射表面（R3，R4，R5）和折射表面（B1）制备的光学元件（B1）（R6），用于输出由多个反射表面反射的光束;基准部分（7），用于相对于包括入射参考轴线的Y'-Z'平面在预定方向上限定光学元件的位置（ 5），并且光学元件（B1）的至少一个反射表面的出射参考轴线（5）形成在光学元件上。

96. 发明授权

US5728494A Exposure mask and method and apparatus for manufacturing the same 失效
标题翻译：曝光掩模及其制造方法和装置
公开(公告)号：US5728494A
公开(公告)日：1998-03-17
申请号：US730017
申请日：1996-10-11
申请人： Kenji Kawano , Shinichi Ito , Iwao Higashikawa , Masamitsu Itoh , Takashi Kamo , Hiroaki Hazama , Takayuki Iwamatsu
发明人： Kenji Kawano , Shinichi Ito , Iwao Higashikawa , Masamitsu Itoh , Takashi Kamo , Hiroaki Hazama , Takayuki Iwamatsu
IPC分类号： G03F1/32 , G03F1/68 , G03F9/00
CPC分类号： G03F1/32 , G03F1/68
摘要： This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film. In addition, this invention provides a method of manufacturing an exposure mask, including the steps of forming a translucent film on a light-transmitting substrate, forming a photosensitive resin film on the translucent film, forming a photosensitive resin pattern by exposing the photosensitive resin film to a radiation or a charged particle beam, removing an exposed portion of the translucent film by using the photosensitive resin pattern as a mask, removing the photosensitive resin pattern, and forming a stabilized region in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film before the step of forming the photo-sensitive resin film or after the step of forming the photosensitive resin pattern. Also, this invention provides an apparatus for manufacturing an exposure mask.
摘要翻译：本发明提供一种曝光掩模，其包括形成在透光基板上并具有掩模图案的半透明膜，以及形成在透光基板和半透膜之间的边界中的至少半透明的表面的稳定区域膜以防止半透明膜的物理性质的变化。此外，本发明提供一种制造曝光掩模的方法，包括以下步骤：在透光性基板上形成半透膜，在半透膜上形成感光性树脂膜，通过使感光性树脂膜曝光，形成感光性树脂图案通过使用感光性树脂图案作为掩模去除透光性膜的露出部分，除去感光性树脂图案，在透光性基板与透光性的界面之间形成稳定区域或在形成感光树脂膜的步骤之前或在形成感光性树脂图案的步骤之后，至少在半透明膜的表面上。此外，本发明提供了一种用于制造曝光掩模的装置。

97. 发明授权

US5514499A Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same 失效
标题翻译：相移掩模，其包括多层结构和使用其形成图案的方法
公开(公告)号：US5514499A
公开(公告)日：1996-05-07
申请号：US249038
申请日：1994-05-25
申请人： Takayuki Iwamatsu , Kenji Kawano , Hideya Miyazaki , Shinichi Ito , Soichi Inoue , Hiroyuki Sato , Satoshi Tanaka , Koji Hashimoto
发明人： Takayuki Iwamatsu , Kenji Kawano , Hideya Miyazaki , Shinichi Ito , Soichi Inoue , Hiroyuki Sato , Satoshi Tanaka , Koji Hashimoto
IPC分类号： G03F1/00 , G03F1/26 , G03F1/32 , G03F1/34 , G03F9/00
CPC分类号： G03F1/34 , G03F1/26 , G03F1/32
摘要： A reflection phase shifting mask used to expose a pattern by forming reflected light having a phase difference upon reflection of light, includes a substrate for reflecting exposure light, a phase shifting layer formed on a portion on the substrate, and a light transmitting medium formed on the substrate and the phase shifting layer, wherein the thickness of the phase shifting layer is set such that the phase difference between light reflected by the substrate and light reflected by the phase shifting layer becomes 180.degree..
摘要翻译：用于通过在光反射时形成具有相位差的反射光来曝光图案的反射相移掩模包括反射曝光光的基板，形成在基板上的部分上的相移层和形成在基板上的光传输介质基板和相移层，其中相移层的厚度被设定为使得由基板反射的光与由相移层反射的光之间的相位差成为180度。

98. 发明授权

US5453772A Liquid container with bladder-like member and liquid path along an interior container wall 失效
标题翻译：具有囊状构件的液体容器和沿着内部容器壁的液体路径
公开(公告)号：US5453772A
公开(公告)日：1995-09-26
申请号：US400383
申请日：1995-03-03
申请人： Kenji Aono , Yoshifumi Hattori , Masashi Kitani , Etsurou Suzuki , Hideo Saikawa , Masami Kojima , Kenji Kawano , Koichi Tanno
发明人： Kenji Aono , Yoshifumi Hattori , Masashi Kitani , Etsurou Suzuki , Hideo Saikawa , Masami Kojima , Kenji Kawano , Koichi Tanno
IPC分类号： B41J2/175
CPC分类号： B41J2/17513
摘要： An ink tank for storing ink to be supplied to a recording unit comprises a bag-like member arranged in an inner space of the ink tank and communicating with the atmosphere, which bag-like member has a volume variable from substantially zero to a volume substantially equal to that of the inner space of the ink tank. Ink is stored in a space defined between the ink tank and the bag-like member and a liquid path is formed in an inner wall surface of the ink tank.
摘要翻译：用于存储要供应到记录单元的墨水的墨盒包括布置在墨水罐的内部空间中并与大气连通的袋状构件，该袋状构件的体积可变量基本为零至基本上为体积等于墨水罐的内部空间。墨水被储存在墨水盒和袋状构件之间的空间中，并且液体通道形成在墨水盒的内壁表面中。

99. 发明授权

US5365260A Ink supply device with elastic valve for liquid supplying slit 失效
标题翻译：供液装置带弹性阀用于供液缝
公开(公告)号：US5365260A
公开(公告)日：1994-11-15
申请号：US900013
申请日：1992-06-17
申请人： Masashi Kitani , Yoshifumi Hattori , Etsurou Suzuki , Hideo Saikawa , Masami Kojima , Kenji Kawano , Koichi Tanno , Kenji Aono
发明人： Masashi Kitani , Yoshifumi Hattori , Etsurou Suzuki , Hideo Saikawa , Masami Kojima , Kenji Kawano , Koichi Tanno , Kenji Aono
IPC分类号： B41J2/175
CPC分类号： B41J2/1752 , B41J2/17513
摘要： An ink jet cartridge is composed integrally of a recording head and an ink tank, which are constructed in mutually separable manner, in order to enable repeated use of the recording head by replacement of the ink tank. In an ink supply part in the ink tank, an elastic partition wall is provided with a slit which is normally closed but is opened under a predetermined pressure difference. The slit is so designed as to generate an appropriate negative pressure on the recording head, thereby preventing ink leakage. Also a slit shielding valve member is provided to shield the slit at the abrupt inhaling action of the ink tank at the detaching of the ink tank, in order to prevent air intrusion into the ink tank.
摘要翻译：为了能够通过更换墨水盒来重复使用记录头，喷墨墨盒由记录头和墨盒一体地构成，它们以相互可分离的方式构造。在墨盒中的供墨部分中，弹性分隔壁设有通常关闭但在预定压力差下打开的狭缝。狭缝被设计成在记录头上产生适当的负压，从而防止油墨泄漏。另外还提供了一个狭缝屏蔽阀件，用于在油墨盒拆卸时在油墨罐的突然吸入作用下屏蔽狭缝，以防止空气侵入墨水盒。

100. 发明授权

US5270739A Liquid container having an elastic dome-shaped pressure control device with a slit 失效
标题翻译：液体容器具有带狭缝的弹性圆顶形压力控制装置
公开(公告)号：US5270739A
公开(公告)日：1993-12-14
申请号：US824572
申请日：1992-01-23
申请人： Masashi Kitani , Yoshifumi Hattori , Etsurou Suzuki , Hideo Saikawa , Masami Kojima , Kenji Kawano , Koichi Tanno , Kenji Aono
发明人： Masashi Kitani , Yoshifumi Hattori , Etsurou Suzuki , Hideo Saikawa , Masami Kojima , Kenji Kawano , Koichi Tanno , Kenji Aono
IPC分类号： B41J2/175 , B41J2/01
CPC分类号： B41J2/17546 , B41J2/17513 , B41J2/1752
摘要： A liquid container includes a liquid outlet for supplying liquid, a pressure control device disposed in the container and adjacent to the outlet The pressure control device has a value function for permitting liquid supply through the outlet within a predetermined pressure range.

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