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91. 发明授权

US08225496B2 Automated integrated solar cell production line composed of a plurality of automated modules and tools including an autoclave for curing solar devices that have been laminated 失效
标题翻译：由多个自动模块和工具组成的自动化集成太阳能电池生产线，包括用于固化已层压的太阳能装置的高压釜
公开(公告)号：US08225496B2
公开(公告)日：2012-07-24
申请号：US12202199
申请日：2008-08-29
申请人： Robert Z. Bachrach , Yong-Kee Chae , Soo Young Choi , Nicholas G. J. De Vries , Yacov Elgar , Eric A. Englhardt , Michel R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J. B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
发明人： Robert Z. Bachrach , Yong-Kee Chae , Soo Young Choi , Nicholas G. J. De Vries , Yacov Elgar , Eric A. Englhardt , Michel R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J. B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
IPC分类号： H01L51/44 , H01L51/48 , H01L21/768 , H01L31/072
CPC分类号： H01L21/67236 , B23K26/364 , B26F3/002 , B26F3/004 , B65G49/064 , B65G2249/02 , B65G2249/04 , C03B33/03 , C03B33/033 , H01L21/67132 , H01L21/67712 , H01L21/67715 , H01L21/67721 , H01L21/67727 , H01L21/6776 , H01L31/022425 , H01L31/03921 , H01L31/0504 , H01L31/075 , H02S50/00 , H02S50/10 , Y02E10/548 , Y02P40/57 , Y10T29/49002 , Y10T29/49355 , Y10T29/5196 , Y10T29/53113 , Y10T29/5313 , Y10T29/5317 , Y10T29/53187 , Y10T29/53365 , Y10T29/53417 , Y10T225/10 , Y10T225/325 , Y10T225/329
摘要： The present invention generally relates to a system that can be used to form a photovoltaic device, or solar cell, using processing modules that are adapted to perform one or more steps in the solar cell formation process. The automated solar cell fab is generally an arrangement of automated processing modules and automation equipment that is used to form solar cell devices. The automated solar fab will thus generally comprise a substrate receiving module that is adapted to receive a substrate, one or more absorbing layer deposition cluster tools having at least one processing chamber that is adapted to deposit a silicon-containing layer on a surface of the substrate, one or more back contact deposition chambers, one or more material removal chambers, a solar cell encapsulation device, an autoclave module, an automated junction box attaching module, and one or more quality assurance modules that are adapted to test and qualify the completely formed solar cell device.
摘要翻译：本发明一般涉及一种可用于形成光伏器件或太阳能电池的系统，该系统使用适于在太阳能电池形成过程中执行一个或多个步骤的处理模块。自动化太阳能电池制造厂通常是用于形成太阳能电池器件的自动化处理模块和自动化设备的布置。因此，自动化太阳能工厂将通常包括适于接收衬底的衬底接收模块，一个或多个吸收层沉积簇工具，其具有至少一个适于在衬底的表面上沉积含硅层的处理室，一个或多个背接触沉积室，一个或多个材料去除室，太阳能电池封装装置，高压釜模块，自动接线盒附接模块和一个或多个质量保证模块，其适于测试和限定完全形成太阳能电池装置。

92. 发明授权

US08174400B2 Frequency monitoring to detect plasma process abnormality 有权
标题翻译：频率监测检测等离子体过程异常
公开(公告)号：US08174400B2
公开(公告)日：2012-05-08
申请号：US13042408
申请日：2011-03-07
申请人： Beom Soo Park , Soo Young Choi , John M. White , Hong Soon Kim , James Hoffman
发明人： Beom Soo Park , Soo Young Choi , John M. White , Hong Soon Kim , James Hoffman
IPC分类号： G08B21/00
CPC分类号： H01J37/32174 , H01J37/32935 , H03H7/40
摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.
摘要翻译：通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。在第二方面，第二对下限和上限不适合电源的频率。两个方面优选一起用于检测异常状况的不同出现。

93. 发明申请

US20120103264A1 METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 审中-公开
标题翻译：用流平面设计沉积均匀硅膜的方法和装置
公开(公告)号：US20120103264A1
公开(公告)日：2012-05-03
申请号：US13349332
申请日：2012-01-12
申请人： SOO YOUNG CHOI , Tae Kyung Won , John M. White
发明人： SOO YOUNG CHOI , Tae Kyung Won , John M. White
IPC分类号： C23C16/455
CPC分类号： C23C16/24 , C23C16/45565 , C23C16/5096 , H01J37/32449
摘要： Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for depositing a uniform film for solar cell applications includes a processing chamber, and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides. The gas distribution plate further includes a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners, and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes.
摘要翻译：提供了具有由气体分配板产生的流动梯度的方法和装置。在一个实施例中，该方法和装置特别适用于但不限于沉积太阳能电池应用的硅膜。用于沉积用于太阳能电池应用的均匀膜的设备包括处理室和设置在处理室中的四边形气体分配板，并且具有由四个侧面分开的至少四个角。气体分配板还包括通过气体分配板形成的第一多个扼流圈，位于角部的第一多个扼流圈，以及通过气体分配板形成的第二多个扼流圈，沿着侧面设置的第二多个扼流圈在所述角区域之间的所述气体分配板中，所述第一多个扼流器具有比所述第二多个扼流圈更大的流动阻力。

94. 发明申请

US20110095402A1 Gate dielectric film with controlled structural and physical properties over a large surface area substrate 审中-公开
标题翻译：具有在大表面积衬底上具有受控结构和物理性质的栅介质膜
公开(公告)号：US20110095402A1
公开(公告)日：2011-04-28
申请号：US12930230
申请日：2010-12-30
申请人： Beom Soo Park , Soo Young Choi , Tae Kyung Won , John M. White
发明人： Beom Soo Park , Soo Young Choi , Tae Kyung Won , John M. White
IPC分类号： H01L29/51
CPC分类号： E06C7/48 , E06C7/482 , E06C7/484
摘要： An α-SiNx:H gate dielectric film deposited over a substrate surface having a surface area larger than 100 cm×100 cm, wherein said α-SiNx:H gate dielectric film exhibits a film thickness which varies by less than about 20% over said surface area, a film density which varies by less than about 17% over said surface area, and wherein said film exhibits a Si—H bonded structure content of less than about 15 atomic % over said surface area.
摘要翻译：一种沉积在表面积大于100cm×100cm的衬底表面上的α-SiNx：H栅极电介质膜，其中所述α-SiNx：H栅极电介质膜的膜厚比所述表面积，比所述表面积变化小于约17％的膜密度，并且其中所述膜在所述表面积上表现出小于约15原子％的Si-H键合结构含量。

95. 发明授权

US07785672B2 Method of controlling the film properties of PECVD-deposited thin films 有权
标题翻译：控制PECVD沉积薄膜的膜性能的方法
公开(公告)号：US07785672B2
公开(公告)日：2010-08-31
申请号：US11021416
申请日：2004-12-22
申请人： Soo Young Choi , John M. White , Qunhua Wang , Beom Soo Park
发明人： Soo Young Choi , John M. White , Qunhua Wang , Beom Soo Park
IPC分类号： H05G1/24 , H05H1/02
CPC分类号： H01J37/32082 , C23C16/345 , C23C16/45565 , C23C16/5096 , H01J37/3244 , H01L21/0217 , H01L21/02274 , H01L21/31612
摘要： We have discovered methods of controlling a combination of PECVD deposition process parameters during deposition of thin films which provides improved control over surface standing wave effects which affect deposited film thickness uniformity and physical property uniformity. By minimizing surface standing wave effects, the uniformity of film properties across a substrate surface onto which the films have been deposited is improved. In addition, we have developed a gas diffusion plate design which assists in the control of plasma density to be symmetrical or asymmetrical over a substrate surface during film deposition, which also provides improved control over uniformity of deposited film thickness.
摘要翻译：我们已经发现了在沉积薄膜期间控制PECVD沉积工艺参数的组合的方法，其提供了影响沉积膜厚度均匀性和物理性质均匀性的表面驻波效应的改进控制。通过最小化表面驻波效应，改善了膜沉积在其上的衬底表面上的膜性质的均匀性。此外，我们开发了一种气体扩散板设计，其有助于在膜沉积期间等离子体密度在衬底表面上对称或不对称，这也提供了对沉积膜厚度的均匀性的改进的控制。

96. 发明申请

US20080003358A1 Power loading substrates to reduce particle contamination 有权
标题翻译：功率负载基板以减少颗粒污染
公开(公告)号：US20080003358A1
公开(公告)日：2008-01-03
申请号：US11478279
申请日：2006-06-29
申请人： Dong-Kil Yim , John M. White , Soo Young Choi , Han Byoul Kim , Beom Soo Park , Jin Man Ha
发明人： Dong-Kil Yim , John M. White , Soo Young Choi , Han Byoul Kim , Beom Soo Park , Jin Man Ha
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： C23C16/4401 , C23C14/02 , C23C14/564 , C23C16/0209 , H01J2237/2001
摘要： A method for preventing particle contamination within a processing chamber is disclosed. Preheating the substrate within the processing chamber may cause a thermophoresis effect so that particles within the chamber that are not adhered to a surface may not come to rest on the substrate. One method to increase the substrate temperature is to plasma load the substrate. Plasma loading comprises providing an inert gas plasma to the substrate to heat the substrate. Another method to increase the substrate temperature is high pressure loading the substrate. High pressure loading comprises heating the substrate while increasing the chamber pressure to between about 1 Torr and about 10 Torr. By rapidly increasing the substrate temperature within the processing chamber prior to substrate processing, particle contamination is less likely to occur.
摘要翻译：公开了一种防止处理室内的颗粒污染的方法。预处理室内的衬底可能引起热泳效应，使得室内未附着于表面的颗粒可能不会停留在衬底上。增加衬底温度的一种方法是等离子体加载衬底。等离子体负载包括向衬底提供惰性气体等离子体以加热衬底。提高衬底温度的另一种方法是加载衬底的高压。高压负载包括加热衬底，同时将腔室压力提高到约1托和约10托之间。通过在基板处理之前快速增加处理室内的基板温度，不太可能发生颗粒污染。

97. 发明授权

US06355108B1 Film deposition using a finger type shadow frame 有权
标题翻译：使用手指型阴影框的胶片沉积
公开(公告)号：US06355108B1
公开(公告)日：2002-03-12
申请号：US09338245
申请日：1999-06-22
申请人： Tae Kyung Won , Quanyuan Shang , Robert M. Robertson , Soo Young Choi , Kam S. Law , Robert I. Greene , John M. White
发明人： Tae Kyung Won , Quanyuan Shang , Robert M. Robertson , Soo Young Choi , Kam S. Law , Robert I. Greene , John M. White
IPC分类号： C23C1600
CPC分类号： C23C16/24 , C23C16/345 , C23C16/4583 , C23C16/4585 , H01J37/32623
摘要： The present invention relates generally to a clamping and alignment assembly for a substrate processing system. The clamping and aligning assembly generally includes a shadow frame, a floating plasma shield and a plurality of insulating alignment pins. The shadow frame comprises a plurality of tabs extending inwardly therefrom and is shaped to accommodate a substrate. The tabs comprise protruding contact surfaces for stabilizing a substrate on a support member during processing. The insulating alignment pins are disposed at a perimeter of a movable support member and cooperate with an alignment recess formed in the shadow frame to urge the shadow frame into a desired position. Preferably, the floating plasma shield is disposed on the insulating alignment pins in spaced relationship between the support member and the shadow frame to shield the perimeter of the support member during processing.
摘要翻译：本发明一般涉及用于衬底处理系统的夹紧和对准组件。夹持和对准组件通常包括阴影框架，浮动等离子体屏蔽件和多个绝缘对准销钉。阴影框架包括从其向内延伸的多个突片，并且成形为容纳衬底。突片包括用于在加工期间稳定支撑构件上的基板的突出接触表面。绝缘对准销布置在可移动支撑构件的周边处，并与形成在阴影框架中的对准凹槽配合，以将阴影框架推动到期望的位置。优选地，浮动等离子体屏蔽以间隔开的关系设置在绝缘对准销上，在支撑构件和阴影框架之间，以在加工期间屏蔽支撑构件的周边。

98. 发明授权

US09293706B2 Method for encapsulating an organic light emitting diode 有权
标题翻译：封装有机发光二极管的方法
公开(公告)号：US09293706B2
公开(公告)日：2016-03-22
申请号：US13366109
申请日：2012-02-03
申请人： Dieter Haas , John M. White , Byung-sung Leo Kwak , Soo Young Choi , Jrjyan Jerry Chen , Jose Manuel Dieguez-Campo
发明人： Dieter Haas , John M. White , Byung-sung Leo Kwak , Soo Young Choi , Jrjyan Jerry Chen , Jose Manuel Dieguez-Campo
IPC分类号： H01L33/52 , H01L51/00 , H01L51/52
CPC分类号： H01L51/0014 , H01L51/5253
摘要： Methods for encapsulating OLED structures disposed on a substrate using a soft/polymer mask technique are provided. The soft/polymer mask technique can efficiently provide a simple and low cost OLED encapsulation method, as compared to convention hard mask patterning techniques. The soft/polymer mask technique can utilize a single polymer mask to complete the entire encapsulation process with low cost and without alignment issues present when using conventional metal masks. Rather than utilizing a soft/polymer mask, the encapsulation layers may be blanked deposited and then laser ablated such that no masks are utilized during the encapsulation process.
摘要翻译：提供了使用软/聚合物掩模技术封装设置在基板上的OLED结构的方法。与常规的硬掩模图案化技术相比，软/聚合物掩模技术可以有效地提供简单且低成本的OLED封装方法。软/聚合物掩模技术可以利用单个聚合物掩模以低成本完成整个封装工艺，并且在使用常规金属掩模时不存在对准问题。不是使用软/聚合物掩模，而是可以将封装层消隐沉积，然后激光烧蚀，使得在封装过程中不使用掩模。

99. 发明授权

US08372205B2 Reducing electrostatic charge by roughening the susceptor 有权
标题翻译：通过粗化基座来减少静电电荷
公开(公告)号：US08372205B2
公开(公告)日：2013-02-12
申请号：US11182168
申请日：2005-07-15
申请人： Soo Young Choi , Beom Soo Park , Quanyuan Shang , John M. White , Dong-Kil Yim , Chung-Hee Park
发明人： Soo Young Choi , Beom Soo Park , Quanyuan Shang , John M. White , Dong-Kil Yim , Chung-Hee Park
IPC分类号： H01L21/306 , C23C16/00 , C23F1/00
CPC分类号： C23C16/4581 , B24C1/06 , B24C1/10 , B24C3/322 , C23C16/4404 , C23C16/545 , C25D11/04 , C25D11/16 , C25D11/18 , H01J37/32082 , H01J37/32477 , H01J37/32559 , H01J37/32715 , H01L21/68757
摘要： A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 200 to about 2000 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 200 to about 2000 micro-inches. In one embodiment, a substrate support assembly includes an electrically conductive body having a substrate support surface, a substrate support structure that is adapted to support the conductive body and the conductive body is covered by an electrically insulative coating.
摘要翻译：提供了一种基板支撑件及其制造方法。在本发明的一个实施例中，衬底支撑件包括具有由电绝缘涂层覆盖的衬底支撑表面的导电体。以基板支撑表面为中心的涂层的至少一部分具有介于约200至约2000微英寸之间的表面光洁度。在另一个实施例中，衬底支撑件包括阳极化铝体，其在主体部分上具有表面光洁度，其适于在其上支撑约200至约2000微英寸的衬底。在一个实施例中，衬底支撑组件包括具有衬底支撑表面的导电体，适于支撑导电体的衬底支撑结构，并且导电体被电绝缘涂层覆盖。

100. 发明授权

US08343592B2 Asymmetrical RF drive for electrode of plasma chamber 有权
标题翻译：等离子体室用电极的非对称RF驱动
公开(公告)号：US08343592B2
公开(公告)日：2013-01-01
申请号：US12343519
申请日：2008-12-24
申请人： Jozef Kudela , Carl A. Sorensen , Soo Young Choi , John M. White
发明人： Jozef Kudela , Carl A. Sorensen , Soo Young Choi , John M. White
IPC分类号： H05H1/24 , H01L21/306 , C23C16/00
CPC分类号： H01L21/02 , B44C1/227 , C23C16/513 , H01J37/32091 , H01J37/32577 , H01L21/02104
摘要： RF power is coupled to one or more RF drive points (50-56) on an electrode (20-28) of a plasma chamber such that the level of RF power coupled to the RF drive points (51-52, 55-56) on the half (61) of the electrode that is closer to the workpiece passageway (12) exceeds the level of RF power coupled to the RF drive points (53-54), if any, on the other half (62) of the electrode. Alternatively, RF power is coupled to one or more RF drive points on an electrode of a plasma chamber such that the weighted mean of the drive point positions is between the center (60) of the electrode and the workpiece passageway. The weighted mean is based on weighting each drive point position by the time-averaged level of RF power coupled to that drive point position. The invention offsets an increase in plasma density that otherwise would exist adjacent the end of the electrode closest to the passageway.
摘要翻译： RF功率耦合到等离子体室的电极（20-28）上的一个或多个RF驱动点（50-56），使得耦合到RF驱动点（51-52,55-56）的RF功率的电平更靠近工件通道（12）的电极的一半（61）超过了电极的另一半（62）上耦合到RF驱动点（53-54）的RF功率的水平（如果有的话）。或者，RF功率耦合到等离子体室的电极上的一个或多个RF驱动点，使得驱动点位置的加权平均值在电极的中心（60）和工件通道之间。加权平均值基于通过耦合到该驱动点位置的RF功率的时间平均水平来加权每个驱动点位置。本发明抵消等离子体密度的增加，否则其将邻近电极最靠近通道的端部存在。

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