专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20190189487A1 TRANSFER HEAD FOR MICRO LED 审中-公开
公开(公告)号：US20190189487A1
公开(公告)日：2019-06-20
申请号：US16216376
申请日：2018-12-11
申请人： POINT ENGINEERING CO., LTD.
发明人： Bum Mo AHN , Seung Ho Park , Sung Hyun BYUN
IPC分类号： H01L21/677 , H01L25/075 , H01L33/06 , H01L33/00 , H01L27/15 , H01L33/44 , H01L33/40 , H01L33/42 , H01L21/683
CPC分类号： H01L21/67712 , H01L21/6838 , H01L25/0753 , H01L27/153 , H01L33/0079 , H01L33/06 , H01L33/405 , H01L33/42 , H01L33/44 , H01L2933/0016
摘要： Disclosed is a transfer head for transferring micro-LEDs from a first substrate to a second substrate, particularly, using a vacuum adsorption method. The transfer head includes a porous member having a plurality of pores, in which the micro-LEDs are transferred by creating or releasing a vacuum pressure in the pore of the porous member.

2. 发明授权

US09922854B2 Vertical inline CVD system 有权
公开(公告)号：US09922854B2
公开(公告)日：2018-03-20
申请号：US13098253
申请日：2011-04-29
申请人： Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
发明人： Shinichi Kurita , Jozef Kudela , Suhail Anwar , John M. White , Dong-Kil Yim , Hans Georg Wolf , Dennis Zvalo , Makoto Inagawa , Ikuo Mori
IPC分类号： C23C16/458 , C23C16/46 , C23C16/511 , C23C16/54 , H01J37/32 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67712 , C23C16/4587 , C23C16/46 , C23C16/463 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/3222 , H01J37/32513 , H01J37/32522 , H01J37/32889 , H01J37/32899 , H01L21/67098 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67201
摘要： The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.

3. 发明申请

US20170204510A1 SUBSTRATE PROCESSING DEVICE 审中-公开
公开(公告)号：US20170204510A1
公开(公告)日：2017-07-20
申请号：US15326032
申请日：2015-07-23
申请人： ULVAC, INC.
发明人： Tetsushi FUJINAGA , Atsuhito IHORI , Masahiro MATSUMOTO , Noriaki TANI , Harunori IWAI
IPC分类号： C23C14/34 , H01J37/32 , H05K3/16 , H01J37/34
CPC分类号： C23C14/3464 , C23C14/022 , C23C14/50 , C23C14/568 , H01J37/32752 , H01J37/3417 , H01L21/67109 , H01L21/67173 , H01L21/67706 , H01L21/67712 , H01L21/6776 , H01L21/6831 , H05K3/16 , H05K2201/0145 , H05K2201/0154 , H05K2201/0158
摘要： A substrate processing apparatus includes a sputter chamber, two targets located in the sputter chamber to form thin films on two film formation surfaces of a substrate through sputtering, and a transport mechanism that transports the substrate along a transport passage located in the sputter chamber. One of the two targets is located at one side of the transport passage opposed to one of the two film formation surfaces of the substrate at a front side with respect to a direction in which the substrate is transported. Another one of the two targets is located at another side of the transport passage opposed to another one of the two film formation surfaces of the substrate at a rear side with respect to the direction in which the substrate is transported.

4. 发明授权

US09558977B2 Transport device with rotating receiving part 有权
标题翻译：具有旋转接收部件的运输装置
公开(公告)号：US09558977B2
公开(公告)日：2017-01-31
申请号：US14729294
申请日：2015-06-03
申请人： DAIFUKU CO., LTD.
发明人： Makoto Usami , Yukio Iizuka
IPC分类号： H01L21/677 , H01L21/673 , H01L21/687
CPC分类号： H01L21/6773 , H01L21/67379 , H01L21/67712 , H01L21/67733 , H01L21/68707
摘要： A transport device simultaneously transports a plurality of articles with a simple device configuration. The transport device includes a chucking device that holds a magazine. An overhead carriage that transports the magazine held by the chucking device includes article storage parts that each accommodate the magazine held by the chucking device. The article storage parts include rotary tables that receive, from the chucking device, the magazine held by the chucking device. The rotary tables having received the magazines from the chucking device move from the chucking device to the article storage parts.
摘要翻译：运输设备以简单的设备配置同时传送多个物品。输送装置包括夹持盒的夹持装置。运送由夹紧装置保持的料仓的架空托架包括各自容纳由夹紧装置保持的料仓的物品收纳部。物品存放部件包括旋转工作台，其从夹紧装置接收由夹紧装置保持的盒子。从夹紧装置接收到的杂志的旋转台从夹紧装置移动到物品收纳部。

5. 发明申请

US20160233300A1 SYSTEM FOR GLASS SHEET SEMICONDUCTOR COATING AND RESULTANT PRODUCT 审中-公开
标题翻译：玻璃薄膜半导体涂层和结果产品系统
公开(公告)号：US20160233300A1
公开(公告)日：2016-08-11
申请号：US15131062
申请日：2016-04-18
申请人： WILLARD & KELSEY SOLAR GROUP, LLC
发明人： James E. HEIDER , Michael J. CICAK , Leo ADOLINE, JR. , Gary T. FAYKOSH
IPC分类号： H01L29/06 , C23C16/458 , C23C16/46
CPC分类号： H01L29/0657 , B65G49/066 , B65G2249/02 , C23C14/50 , C23C14/566 , C23C16/458 , C23C16/46 , H01L21/67236 , H01L21/67706 , H01L21/67712 , H01L21/67721 , H01L21/67754 , H01L21/6776 , H01L21/68707 , H01L29/0649
摘要： A system (20) for coating semiconductor material on glass sheets is performed by conveying the glass sheets vertically suspended at upper extremities thereof through a system (20) having a housing (22) including a vacuum chamber (24). The glass sheets are conveyed on shuttles (42) through an entry load lock station (26) into the housing vacuum chamber (24), through a heating station (30) and at least one deposition station (32, 34) in the housing (22), and to a cooling station 36 prior to exiting of the system through an exit load lock station (28). The resultant semiconductor coated glass sheet (G) has tong marks (44′) formed during the coating processing.
摘要翻译：通过将具有包括真空室（24）的壳体（22）的系统（20）输送到垂直悬挂在其上端的玻璃板，进行用于在玻璃板上涂覆半导体材料的系统（20）。玻璃板通过入口装载锁定站（26）穿过梭子（42）通过加热站（30）和壳体中的至少一个沉积站（32,34）输送到壳体真空室（24） 22），并且在通过出口加载锁定站（28）离开系统之前到达冷却站36。所得到的半导体涂覆玻璃板（G）在涂覆处理期间形成有钳痕（44'）。

6. 发明授权

US09406538B2 Indexed inline substrate processing tool 有权
标题翻译：索引式在线基板处理工具
公开(公告)号：US09406538B2
公开(公告)日：2016-08-02
申请号：US14034921
申请日：2013-09-24
申请人： APPLIED MATERIALS, INC.
发明人： David K. Carlson
IPC分类号： C23C16/458 , C23C16/48 , C23C16/54 , H01L21/673 , H01L21/677 , H01L21/67
CPC分类号： H01L21/6776 , C23C16/4587 , C23C16/481 , C23C16/54 , H01L21/67115 , H01L21/67173 , H01L21/67712
摘要： In some embodiments, an indexed inline substrate processing tool may include a substrate carrier having a base and pair of opposing substrate supports having respective substrate support surfaces that extend upwardly and outwardly from the base; and a plurality of modules coupled to one another in a linear arrangement, wherein each module of the plurality of modules comprises an enclosure having a first end, a second end, and a lower surface to support the substrate carrier and to provide a path for the substrate carrier to move linearly through the plurality of modules, and wherein at least one module of the plurality of modules comprises: a window disposed in a side of the enclosure; a heating lamp coupled to the side of the enclosure; a gas inlet disposed proximate a top of the enclosure; and an exhaust disposed opposite the gas inlet.
摘要翻译：在一些实施例中，索引的在线衬底处理工具可以包括具有基部和一对相对的衬底支撑件的衬底载体，其具有从基部向上和向外延伸的相应的衬底支撑表面; 以及多个模块，其以线性布置彼此耦合，其中所述多个模块中的每个模块包括具有第一端，第二端和下表面的外壳，以支撑所述衬底载体并且为衬底载体线性移动通过所述多个模块，并且其中所述多个模块中的至少一个模块包括：设置在所述外壳侧面的窗口; 耦合到外壳侧面的加热灯; 设置在所述外壳的顶部附近的气体入口; 和与气体入口相对设置的废气。

7. 发明授权

US09355876B2 Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations 有权
标题翻译：过程负载锁定装置，电梯组件，电子设备处理系统以及在负载锁定位置处理衬底的方法
公开(公告)号：US09355876B2
公开(公告)日：2016-05-31
申请号：US14203098
申请日：2014-03-10
申请人： Applied Materials, Inc.
发明人： Paul B. Reuter , Ganesh Balasubramanian , JuanCarlos Rocha-Alvarez , Jeffrey B. Robinson , Dale Robert du Bois , Paul Connors
IPC分类号： B23Q3/16 , H01L21/67
CPC分类号： H01L21/67178 , H01L21/67103 , H01L21/6719 , H01L21/67201 , H01L21/67313 , H01L21/67712 , Y10T29/49998
摘要： A process load lock apparatus is disclosed. The process load lock apparatus includes a load lock chamber adapted to couple between a mainframe section and a factory interface, the load lock chamber including an entry and an exit each having a slit valve, and a load lock process chamber located at a different level than the load lock chamber at the load lock location wherein the load lock process chamber is adapted to carry out a process on a substrate, such as oxide removal or other processes. Systems including the process load lock apparatus and methods of operating the process load lock apparatus are provided. A lift assembly including a containment ring is also disclosed, as are numerous other aspects.
摘要翻译：公开了一种加工装载锁定装置。过程加载锁定装置包括适于联接在主机部分和工厂接口之间的装载锁定室，该装载锁定室包括一个入口和一个出口，每个入口和出口均具有狭缝阀，而负载锁定处理室位于与在负载锁定位置处的负载锁定室，其中负载锁定处理室适于在衬底上执行诸如氧化物去除或其它过程的过程。提供了包括过程加载锁定装置和操作加工装载锁定装置的方法的系统。还公开了包括容纳环的电梯组件，以及许多其它方面。

8. 发明申请

US20150380285A1 HIGH THROUGHPUT HEATED ION IMPLANTATION SYSTEM AND METHOD 有权
标题翻译：高强度加热离子植入系统和方法
公开(公告)号：US20150380285A1
公开(公告)日：2015-12-31
申请号：US14317778
申请日：2014-06-27
申请人： Axcelis Technologies, Inc.
发明人： Armin Huseinovic , Joseph Ferrara , Brian Terry
IPC分类号： H01L21/67 , H01L21/677 , H01L21/265
CPC分类号： H01L21/67201 , H01J37/185 , H01J37/20 , H01J37/3171 , H01L21/265 , H01L21/67103 , H01L21/67109 , H01L21/67115 , H01L21/67161 , H01L21/67213 , H01L21/67712
摘要： An ion implantation system has an ion implantation apparatus coupled to first and second dual load lock assemblies, each having a respective first and second chamber separated by a common wall. Each first chamber has a pre-heat apparatus configured to heat a workpiece to a first temperature. Each second chamber has a post-cool apparatus configured to cool the workpiece to a second temperature. A thermal chuck retains the workpiece in a process chamber for ion implantation, and the thermal chuck is configured to heat the workpiece to a third temperature. A pump and vent are in selective fluid communication with the first and second chambers. A controller is configured to heat the workpiece to the first temperature in an atmospheric environment via the pre-heat apparatus, to heat the workpiece to the second temperature via the thermal chuck, to implant ions into the workpiece via the ion implantation apparatus, and to transfer the workpiece between atmospheric and vacuum environments via a control of the pre-heat apparatus, post-cool apparatus, pump, vent, and thermal chuck.
摘要翻译：离子注入系统具有耦合到第一和第二双负载锁定组件的离子注入装置，每个具有由公共壁分隔的相应的第一和第二室。每个第一室具有构造成将工件加热到第一温度的预热装置。每个第二腔室具有后冷却装置，其被配置为将工件冷却至第二温度。热卡盘将工件保持在用于离子注入的处理室中，并且热卡盘构造成将工件加热到第三温度。泵和排气口与第一和第二室选择性地流体连通。控制器被配置为经由预热装置在大气环境中将工件加热到第一温度，以经由热卡盘将工件加热到第二温度，以通过离子注入装置将离子注入工件，并且通过预热装置，后冷却装置，泵，通风口和热卡盘的控制在大气和真空环境之间传送工件。

9. 发明申请

US20150348764A1 ROTATING DISK CARRIER WITH PBN HEATER 审中-公开
标题翻译：旋转托盘与PBN加热器
公开(公告)号：US20150348764A1
公开(公告)日：2015-12-03
申请号：US14288157
申请日：2014-05-27
申请人： WD Media, LLC
发明人： ALLEN J. BOUREZ , YEW MING CHIONG
IPC分类号： H01J37/32
CPC分类号： H01J37/32899 , H01J37/32715 , H01L21/67103 , H01L21/67173 , H01L21/67712 , H01L21/68771 , H01L21/68785 , H01L21/68792
摘要： Various embodiments provide a substrate carrier configured to rotatably carry at least one substrate through a plurality of processing stations. The substrate carrier includes an integrated heater for heating a first side of the substrate while the second side of the substrate undergoes one or more manufacturing processes at each of the plurality of processing stations, e.g., to promote the desired growth of HAMR media. This can result in the elimination of one or more processing stations, thereby realizing cost savings, decreased substrate processing time, as well as a reduced area within which a substrate processing system can be implemented.
摘要翻译：各种实施例提供了一种被配置为可旋转地承载至少一个基板通过多个处理站的基板载体。衬底载体包括用于加热衬底的第一侧的集成加热器，而衬底的第二侧在多个处理站中的每一个处经历一个或多个制造工艺，例如以促进HAMR介质的期望生长。这可以导致一个或多个处理站的消除，从而实现成本节约，减少的基板处理时间，以及可以实现基板处理系统的减小的面积。

10. 发明授权

US09159592B2 Method and apparatus for an automated tool handling system for a multilevel cleanspace fabricator 有权
标题翻译：用于多层清洁空间制造者的自动化工具处理系统的方法和装置
公开(公告)号：US09159592B2
公开(公告)日：2015-10-13
申请号：US14134705
申请日：2013-12-19
申请人： Frederick A. Flitsch
发明人： Frederick A. Flitsch
IPC分类号： G06F7/00 , G06F19/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67712 , B65G65/005 , B65G2814/0313 , H01L21/67017 , H01L21/67178 , H01L21/67706 , H01L21/67733 , H01L21/67736
摘要： The present invention provides methods and apparatus capable of routine placement and replacement of fabricator tools in a designated tool location. The tool location can be selected from multiple tool locations arranged in a matrix with horizontal and vertical designations. The operation may be fully automated. In another aspect, the invention describes Cleanspace fabricators which use devices to routinely remove and place tooling.
摘要翻译：本发明提供了能够在指定工具位置常规放置和更换制造工具的方法和装置。工具位置可以从布置成矩形的多个工具位置中选择，水平和垂直指定。操作可以完全自动化。在另一方面，本发明描述了使用设备来定期移除和放置工具的清洁空间制造者。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式