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1. 发明授权

US08144739B2 System method and apparatus for selecting and controlling light source bandwidth 有权
标题翻译：选择和控制光源带宽的系统方法和装置
公开(公告)号：US08144739B2
公开(公告)日：2012-03-27
申请号：US12605306
申请日：2009-10-23
申请人： Efrain Figueroa , William N. Partlo , John Martin Algots
发明人： Efrain Figueroa , William N. Partlo , John Martin Algots
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , G01J3/02 , G01J3/0237 , G01J3/027 , G01J3/06 , G01J3/14 , G01J3/18 , G01J2003/1208 , G02B5/1828 , H01S3/08004 , H01S3/1055 , H01S3/1067
摘要： The bandwidth selection mechanism includes a first actuator mounted on a second face of a dispersive optical element, the second face being opposite from a reflective face, the first actuator having a first end coupled to a first end block and a second end coupled to a second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body of the dispersive optical element along the longitudinal axis of the body and in a first direction normal to the reflective face of the dispersive optical element. The bandwidth selection mechanism also includes a second actuator being operative to apply equal and opposite forces to bend the body along the longitudinal axis of the body, in a second direction perpendicular to the reflective face of the dispersive optical element.
摘要翻译：所述带宽选择机构包括安装在分散光学元件的第二面上的第一致动器，所述第二面与反射面相对，所述第一致动器具有联接到第一端块的第一端和耦合到第二端的第二端第一致动器可操作以对第一端块和第二端块施加相等且相反的力，以沿着主体的纵向轴线并沿垂直于反射面的第一方向弯曲分散光学元件的主体的色散光学元件。带宽选择机构还包括第二致动器，其可操作以在垂直于分散光学元件的反射面的第二方向上施加相等且相反的力沿着身体的纵向轴线弯曲身体。

2. 发明授权

US07346093B2 DUV light source optical element improvements 有权
标题翻译： DUV光源光学元件改进
公开(公告)号：US07346093B2
公开(公告)日：2008-03-18
申请号：US10808157
申请日：2004-03-23
申请人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
发明人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
IPC分类号： H01S3/08 , H01S3/22
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座从柔性的安装框架开始，挠曲臂将挠性件附接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可以使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

3. 发明授权

US06904073B2 High power deep ultraviolet laser with long life optics 有权
标题翻译：大功率深紫外线激光器，寿命长
公开(公告)号：US06904073B2
公开(公告)日：2005-06-07
申请号：US10384967
申请日：2003-03-08
申请人： Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
发明人： Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
IPC分类号： G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.
摘要翻译：本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲，平均输出脉冲强度大于1.75×6 /瓦/ cm 2，并且与与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比，数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。本说明书中描述的重要改进已分为以下主题类别：（1）由申请人发现的CaF 2 2表面损伤的解决方案，（2）高功率ArF MOPA激光系统的描述（ 3）光束传输单元的描述，（4）偏振考虑（5）高速水冷自动快门能量检测器模块和（6）其他改进。

4. 发明申请

US20100149647A1 System Method and Apparatus for Selecting and Controlling Light Source Bandwidth 有权
标题翻译：用于选择和控制光源带宽的系统方法和装置
公开(公告)号：US20100149647A1
公开(公告)日：2010-06-17
申请号：US12605306
申请日：2009-10-23
申请人： Efrain Figueroa , William N. Partlo , John Martin Algots
发明人： Efrain Figueroa , William N. Partlo , John Martin Algots
IPC分类号： G02B5/04
CPC分类号： H01S3/08009 , G01J3/02 , G01J3/0237 , G01J3/027 , G01J3/06 , G01J3/14 , G01J3/18 , G01J2003/1208 , G02B5/1828 , H01S3/08004 , H01S3/1055 , H01S3/1067
摘要： A mechanism for bandwidth selection includes a dispersive optical element having a body including a reflective face of dispersion including an area of incidence extending in a longitudinal axis direction along the reflective face of the dispersive optical element. The body also includes a first end block, disposed at a first longitudinal end of the body and a second end block, disposed at a second longitudinal end of the body, the second longitudinal end being opposite the first longitudinal end. The bandwidth selection mechanism also includes a first actuator mounted on a second face of the dispersive optical element, the second face being opposite from the reflective face, the first actuator having a first end coupled to the first end block and a second end coupled to the second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body along the longitudinal axis of the body and in a first direction normal to the reflective face of the dispersive optical element. The bandwidth selection mechanism also includes a second actuator mounted on a third face of the dispersive optical element, the third face being normal to the reflective face, the second actuator having a first end coupled to the first end block with a first flexture and a second end coupled to the second end block with a second flexture, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body along the longitudinal axis of the body, in a second direction perpendicular to the reflective face of the dispersive optical element, the second direction also being perpendicular to the first direction the second actuator including a pressurized fluid force application mechanism. A method of selecting bandwidth is also disclosed.
摘要翻译：用于带宽选择的机构包括具有主体的分散光学元件，该主体包括具有沿着沿着分散光学元件的反射面的纵轴方向延伸的入射区域的分散体的反射面。主体还包括设置在主体的第一纵向端部处的第一端部块和设置在主体的第二纵向端部处的第二端部块，第二纵向端部与第一纵向端部相对。所述带宽选择机构还包括安装在所述分散光学元件的第二面上的第一致动器，所述第二面与所述反射面相对，所述第一致动器具有联接到所述第一端块的第一端和联接到所述第一端块的第二端所述第一致动器可操作以对所述第一端块和所述第二端块施加相等且相反的力，以沿着所述主体的纵向轴线并沿着垂直于所述分散光学的反射面的第一方向弯曲所述主体元件。所述带宽选择机构还包括安装在所述分散光学元件的第三面上的第二致动器，所述第三面垂直于所述反射面，所述第二致动器具有第一端部，所述第一端部具有与所述第一端部块连接的第一弯曲部，所述第一致动器可操作以对所述第一端块和所述第二端块施加相等且相反的力，以沿着所述主体的纵向轴线在垂直于第二方向的第二方向上弯曲所述主体到所述分散光学元件的反射面，所述第二方向也垂直于所述第一方向，所述第二致动器包括加压流体力施加机构。还公开了一种选择带宽的方法。

5. 发明申请

US20080197297A1 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US20080197297A1
公开(公告)日：2008-08-21
申请号：US11471434
申请日：2006-06-20
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

6. 发明授权

US07079556B2 Bandwidth control technique for a laser 失效
标题翻译：激光带宽控制技术
公开(公告)号：US07079556B2
公开(公告)日：2006-07-18
申请号：US10670406
申请日：2003-09-24
申请人： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John Martin Algots , Gamaralalage G. Padmabandu
发明人： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John Martin Algots , Gamaralalage G. Padmabandu
IPC分类号： H01S3/09 , H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.
摘要翻译：一种用于放电激光器带宽控制的技术。提供线窄设备具有至少一个压电驱动器和快速带宽检测装置以及具有小于约1.0毫秒的时间响应的带宽控制。在优选实施例中，波长调谐镜在非常窄的转角范围内以每秒超过500次抖动的抖动速率抖动，以使标称波长值的抖动产生期望的一系列激光脉冲的有效带宽。

7. 发明授权

US07217940B2 Collector for EUV light source 有权
标题翻译： EUV光源收集器
公开(公告)号：US07217940B2
公开(公告)日：2007-05-15
申请号：US10798740
申请日：2004-03-10
申请人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
发明人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
IPC分类号： H01J35/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译：公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低材料。刺激机构可以包括RF或微波感应机构。

8. 发明授权

US07087914B2 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US07087914B2
公开(公告)日：2006-08-08
申请号：US10803526
申请日：2004-03-17
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

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