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1. 发明申请

US20080197297A1 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US20080197297A1
公开(公告)日：2008-08-21
申请号：US11471434
申请日：2006-06-20
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

2. 发明授权

US07087914B2 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US07087914B2
公开(公告)日：2006-08-08
申请号：US10803526
申请日：2004-03-17
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

3. 发明授权

US07217940B2 Collector for EUV light source 有权
标题翻译： EUV光源收集器
公开(公告)号：US07217940B2
公开(公告)日：2007-05-15
申请号：US10798740
申请日：2004-03-10
申请人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
发明人： William N. Partlo , John Martin Algots , Gerry M. Blumenstock , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , Xiaojiang Pan
IPC分类号： H01J35/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译：公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低材料。刺激机构可以包括RF或微波感应机构。

4. 发明授权

US07361918B2 High repetition rate laser produced plasma EUV light source 有权
标题翻译：高重复率激光产生等离子体EUV光源
公开(公告)号：US07361918B2
公开(公告)日：2008-04-22
申请号：US11471258
申请日：2006-06-20
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.
摘要翻译：公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。

5. 发明授权

US06882674B2 Four KHz gas discharge laser system 有权
标题翻译：四KHz气体放电激光系统
公开(公告)号：US06882674B2
公开(公告)日：2005-04-19
申请号：US10036676
申请日：2001-12-21
申请人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号： H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

6. 发明授权

US07164144B2 EUV light source 有权
标题翻译： EUV光源
公开(公告)号：US07164144B2
公开(公告)日：2007-01-16
申请号：US10900839
申请日：2004-07-27
申请人： William N. Partlo , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , David W. Myers , Ian Roger Oliver , John Viatella , Robert N. Jacques
发明人： William N. Partlo , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov , David W. Myers , Ian Roger Oliver , John Viatella , Robert N. Jacques
IPC分类号： H01J35/20
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.
摘要翻译：激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统包括适于传送移动等离子体引发目标的目标传送系统和具有定义所需等离子体起始位置的焦点的EUV光收集光学元件，靶跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出;以及流轨道误差检测器，其检测目标流轨迹在大致垂直于目标的至少一个轴上的位置的误差来自与期望的等离子体起始位点相交的所需流道的流轨道。

7. 发明授权

US07643528B2 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US07643528B2
公开(公告)日：2010-01-05
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

8. 发明申请

US20090080476A1 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20090080476A1
公开(公告)日：2009-03-26
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/139 , H01S3/083
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

9. 发明申请

US20100074295A1 Immersion lithography laser light source with pulse stretcher 审中-公开
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20100074295A1
公开(公告)日：2010-03-25
申请号：US12592228
申请日：2009-11-20
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edmond Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edmond Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes.
摘要翻译：公开了一种可以包括脉冲气体放电激光光刻光源的装置和方法，脉冲气体放电激光光刻光源可以包括提供种子脉冲的种子激光输出光束的种子激光部分; 接收种子激光输出光束并放大每个种子脉冲的光强度的放大器部分，以提供输出脉冲的大功率激光系统输出光束; 放大器部分可以包括环形功率放大器，其包括放大器部分注入光学器件，其包括至少一个光束扩展棱镜，光束反向器和输入/输出耦合器; 光束扩展光学器件和输出耦合器可以安装在光学组件上，其中光束扩展光学器件相对于光学组件刚性地安装，并且输入/输出耦合器被安装成相对于用于光学对准目的的光学组件的相对运动。

10. 发明授权

US06532247B2 Laser wavelength control unit with piezoelectric driver 有权
公开(公告)号：US06532247B2
公开(公告)日：2003-03-11
申请号：US09794782
申请日：2001-02-27
申请人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
发明人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

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